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Zhu L, Jiang R, Chen C. Fabrication of a Janus Copper Mesh by SiO 2 Spraying for Unidirectional Water Transportation and Oil/Water Separation. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2024; 40:8694-8702. [PMID: 38587567 DOI: 10.1021/acs.langmuir.4c00569] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/09/2024]
Abstract
Massive discharge of oily wastewater and frequent occurrence of offshore oil spills have posed an enormous threat to the socioeconomic and ecological environments. Janus membranes with asymmetric wettability properties have great potential for oil/water separation applications and have attracted widespread attention. However, existing Janus membranes still suffer from complex and costly manufacturing processes, low permeability, and poor recyclability. Herein, a novel and facile strategy was proposed to fabricate a Janus copper mesh with opposite wettability for unidirectional water transport and efficient oil/water separation. The hydrophilic side of the Janus copper mesh was prepared by coating it with Cu(OH)2 nanoneedles via a chemical oxidation method. The hydrophobic side was fabricated by coating it with hydrophobic SiO2 nanoparticles via a facile spraying method. The as-prepared Janus copper mesh showed asymmetric surface wettability, which can achieve unidirectional water transport and efficient oil/water separation with excellent recyclability, exhibiting great application potential for droplet manipulation and wastewater purification.
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Affiliation(s)
- Linfeng Zhu
- School of Mechanical Engineering, Sichuan University, Chengdu, Sichuan 610065, People's Republic of China
| | - Ruisong Jiang
- School of Mechanical Engineering, Sichuan University, Chengdu, Sichuan 610065, People's Republic of China
| | - Chaolang Chen
- School of Mechanical Engineering, Sichuan University, Chengdu, Sichuan 610065, People's Republic of China
- National United Engineering Laboratory for Advanced Bearing Tribology, Henan University of Science and Technology, Luoyang, Henan 471023, People's Republic of China
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Mukhopadhyay AK, Roy A, Bhattacharjee G, Das SC, Majumdar A, Wulff H, Hippler R. Surface Stoichiometry and Depth Profile of Ti x-Cu yN z Thin Films Deposited by Magnetron Sputtering. MATERIALS (BASEL, SWITZERLAND) 2021; 14:3191. [PMID: 34207839 PMCID: PMC8227993 DOI: 10.3390/ma14123191] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/24/2021] [Revised: 05/28/2021] [Accepted: 06/02/2021] [Indexed: 11/23/2022]
Abstract
We report the surface stoichiometry of Tix-CuyNz thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS). At a larger depth, the relative composition of Cu and Ti in the film is increased compared to the surface. The amount of adventitious carbon which is present on the film surface strongly decreases with film depth. Deposited films also contain a significant amount of oxygen whose origin is not fully clear. Grazing incidence X-ray diffraction (GIXD) shows a Cu3N phase on the surface, while transmission electron microscopy (TEM) indicates a polycrystalline structure and the presence of a Ti3CuN phase.
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Affiliation(s)
- Arun Kumar Mukhopadhyay
- Department of Physics, Indian Institute of Engineering Science and Technology, Shibpur, Howrah 711103, India; (A.K.M.); (A.R.); (A.M.)
- Department of Physics, Dinabandhu Andrews College, 54 Raja S.C. Mallick Road, Kolkata 700008, India
| | - Avishek Roy
- Department of Physics, Indian Institute of Engineering Science and Technology, Shibpur, Howrah 711103, India; (A.K.M.); (A.R.); (A.M.)
- Department of Electronics, Vidyasagar College, 39 Sankar Ghosh Lane, Kolkata 700006, India
| | - Gourab Bhattacharjee
- Surface Physics and Material Science Division, Saha Institute of Nuclear Physics, HBNI, 1/AF Bidhannagar, Kolkata 700064, India;
| | | | - Abhijit Majumdar
- Department of Physics, Indian Institute of Engineering Science and Technology, Shibpur, Howrah 711103, India; (A.K.M.); (A.R.); (A.M.)
- Institute of Physics, University of Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany;
| | - Harm Wulff
- Institute of Physics, University of Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany;
| | - Rainer Hippler
- Institute of Physics, University of Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany;
- Institute of Physics, Czech Academy of Sciences, Na Slovance 2, 18221 Prague, Czech Republic
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