From covalent bonding to coalescence of metallic nanorods

Controllable growth of aluminum nanorods using physical vapor deposition

This letter proposes and experimentally demonstrates that oxygen, through action as a surfactant, enables the growth of aluminum nanorods using physical vapor deposition. Based on the mechanism through which oxygen acts, the authors show that the diameter of aluminum nanorods can be controlled from 50 to 500 nm by varying the amount of oxygen present, through modulating the vacuum level, and by varying the substrate temperature. When grown under medium vacuum, the nanorods are in the form of an aluminum metal - aluminum oxide core-shell. The thickness of the oxide shell is ~2 nm as grown and is stable when maintained in ambient for 30 days or annealed in air at 475 K for 1 day. As annealing temperature is increased, the nanorod morphology remains stable while the ratio of oxide shell to metallic core increases, resulting in a fully aluminum oxide nanorod at 1,475 K.

Smallest metallic nanorods using physical vapor deposition

Physical vapor deposition provides a controllable means of growing two-dimensional metallic thin films and one-dimensional metallic nanorods. While theories exist for the growth of metallic thin films, their counterpart for the growth of metallic nanorods is absent. Because of this absence, the lower limit of the nanorod diameter is theoretically unknown; consequently the experimental pursuit of the smallest nanorods has no clear target. This Letter reports a closed-form theory that defines the diameter of the smallest metallic nanorods using physical vapor deposition. Further, the authors verify the theory using lattice kinetic Monte Carlo simulations and validate the theory using published experimental data. Finally, the authors carry out a series of theory-guided experiments to grow well-separated metallic nanorods of ∼10  nm in diameter, which are the smallest ever reported using physical vapor deposition.