Influence of Thickness on the Electrical Transport Properties of Exfoliated Bi2Te3 Ultrathin Films

Electron-phonon coupling in copper intercalated Bi[Formula: see text]Se[Formula: see text]

We report charge and heat transport studies in copper-intercalated topological insulator Bi[Formula: see text]Se[Formula: see text] hybrid devices. Measured conductivity shows impact of quantum corrections, electron-electron and electron-phonon interactions. Our shot noise measurements reveal that heat flux displays a crossover between [Formula: see text] and [Formula: see text] with the increase of temperature. The results might be explained by a model of inelastic electron scattering on disorder, increasing the role of transverse acoustic phonons in the electron-phonon coupling process.

Magnetic field-dependent resistance crossover and anomalous magnetoresistance in topological insulator Bi2Te3

We report a metal-insulator like transition in single-crystalline 3D topological insulator Bi2Te3at a temperature of 230 K in the presence of an external magnetic field applied normal to the surface. This transition becomes more prominent at larger magnetic field strength with the residual resistance value increasing linearly with the magnetic field. At low temperature, the magnetic field dependence of the magnetoresistance shows a transition from logarithmic to linear behavior and the onset magnetic field value for this transition decreases with increasing temperature. The logarithmic magnetoresistance indicates the weak anti-localization of the surface Dirac electrons while the high temperature behavior originates from the bulk carriers due to intrinsic impurities. At even higher temperatures beyond ∼230 K, a completely classical Lorentz model type quadratic behavior of the magnetoresistance is observed. We also show that the experimentally observed anomalies at ∼230 K in the magneto-transport properties do not originate from any stacking fault in Bi2Te3.

Electrochemically exfoliated thin Bi2Se3 films and van der Waals heterostructures Bi2Se3/graphene

Thin Bi₂Se₃ flakes with few nanometer thicknesses and sized up to 350 μm were created by using electrochemical splitting from high-quality Bi₂Se₃ bulk monocrystals. The dependence of film resistance on the Bi₂Se₃ flake thickness demonstrates that, at room temperature, the bulk conductivity becomes negligible in comparison with the surface conductivity for films with thicknesses lower than 80 nm. Unexpectedly, all these films demonstrated p-type conductivity. The doping effect with sulfur or sulfur-related radicals during electrochemical exfoliation is suggested for the p-type conductivity of the exfoliated Bi₂Se₃ films. The formation of 2-8 nm films was predominantly found. Van der Waals (vdW) heterostructures of Bi₂Se₃/Graphene/SiO₂/Si were created and their properties were compared with that of Bi₂Se₃ on the SiO₂/Si substrate. The increase of the conductivity and carrier mobility in Bi₂Se₃ flakes of 3-5 times was found for vdW heterostructures with graphene. Thin Bi₂Se₃ films are potentially interesting for applications for spintronics, nano- and optoelectronics.

Ultrathin Topological Insulator Absorber: Unique Dielectric Behavior of Bi2Te3 Nanosheets Based on Conducting Surface States

Topological insulators exhibit great potential in the fields of electronics and semiconductors for their gapless surface states. Intriguingly, most topological insulators are possibly excellent microwave-absorbing materials because of easy adjustment of electrical transport based on conducting surface states in the nanostructure. Herein, topological insulator Bi₂Te₃ nanosheets are synthesized by a simple solvothermal method. The material demonstrates a unique dielectric behavior based on conducting surface states, resulting in excellent microwave-absorbing performance. Benefiting from the outstanding impedance matching, Bi₂Te₃ nanosheets exhibit an ultrathin microwave absorption with the qualified frequency bandwidth of 3.0 GHz at only 0.77 mm thickness, which is thinner than other absorbers in reported references. Moreover, a strong reflection loss of -41 dB at 0.8 mm is achieved. The result provides a new approach for developing ultrathin microwave absorption materials at the submillimeter scale.

Weak Antilocalization at the Atomic-Scale Limit of Metal Film Thickness

Creation of the 2D metallic layers with the thickness as small as a few atomic layers and investigation of their properties are interesting and challenging tasks of the modern condensed-matter physics. One of the possible ways to grow such layers resides in the synthesis of the so-called metal-induced reconstructions on silicon (i.e., silicon substrates covered with ordered metal films of monolayer or submonolayer thickness). The 2D Au-Tl compound on Si(111) surface having [Formula: see text] periodicity belongs to the family of the reconstructions incorporating heavy-metal atoms with a strong spin-orbit coupling (SOC). In such systems, strong SOC results in the spin-splitting of surface-state bands due to the Rashba effect, the occurrence of which was experimentally proved. Another remarkable consequence of a strong SOC that manifests itself in the transport properties is a weak antilocalization (WAL) effect, which has never been explored in the metal layers of atomic thickness. In the present study, the transport and magnetotransport properties of the 2D Au-Tl compound on Si(111) surface were investigated at low temperatures down to ∼2.0 K. The compound was proved to show behavior of the 2D nearly free electron gas system with metallic conduction, as indicated by Ioffe-Regel criterion. It demonstrates the WAL effect which is interpreted in the framework of Hikami-Larkin-Nagaoka theory, and possible mechanisms of the electron decoherence are discussed. Bearing in mind that besides the (Au, Tl)/Si(111)[Formula: see text] system, there are many other ordered atomic-layer metal films on silicon differing by composition, structure, strength of SOC, and spin texture, which provide a promising area for prospective investigations of the WAL effect at the atomic-scale limit when the film thickness is less than the electron wavelength.