Frustrated Lewis Pair-Promoted Organocatalytic Transformation of Hydrosilanes into Silanols with Water Oxidant

Owing to their unique properties, the silanols have attracted intense attention but remain challenging to prepare from the organocatalytic oxidation of hydrosilanes using H2O as a green oxidant. Herein, we employ a frustrated Lewis pair (FLP) to successfully suppress the formation of undesired siloxanes and produce silanols in high to excellent yields in the presence of H2O. Mechanistic studies suggest that the reaction is initiated with the activation of FLP by H2O rather than by silanes and goes through a concerted SN2 mechanism. More importantly, the combination of the FLP-catalyzed oxidation of hydrosilanes with B(C6F5)3-catalyzed dehydrogenation enables us to realize the precise synthesis of sequence-controlled oligosiloxanes. This method exhibits a broad substrate scope and can be easily scaled up, thus exhibiting promising application potentials in the precision synthesis of silicon-containing polymer materials.

Reinvigorating Photo-Activated R-Alkoxysilanes Containing 2-Nitrobenzyl Protecting Groups as Stable Precursors for Photo-Driven Si-O Bond Formation in Polymerization and Surface Modification

This study aimed to revitalize silicon-based sol-gel chemistry methodologies utilizing photoprotected R-alkoxysilanes to control the synthesis of unique silicon-based materials. We have investigated the synthesis, characterization, light-induced deprotection, and subsequent polymerization/surface functionalization through the use of 2-nitrobenzyloxy-based photoremovable protecting groups (PPGs) as alkoxy reactive groups on ethyl and phenyl (R x -(alkoxy) y silanes, with x = 0-3 and y = 1-3). The photochemical dynamics, relative efficiencies, and kinetics of the novel alkoxysilane-based PPGs were thoroughly investigated using UV light irradiation by NMR and UV/vis methods. We then explored the tin-catalyzed coupling of photodeprotected products (R x -silanols) to form polymers/oligomers. We have found that photoenabled removal of PPGs and conversion to silanols from all silane systems studied is achieved. Furthermore, these deprotected species are polymerizable into siloxanes and effectively used as light-controlled surface modifiers with masking techniques of which proof-of-concept examples are given, enabling promising application as photolithographic reagents.

Photoactivated silicon–oxygen and silicon–nitrogen heterodehydrocoupling with a commercially available iron compound

A commercially available iron readily engages in catalytic Si–O and Si–N bond formation under visible light irradiation.

Non-aqueous selective synthesis of orthosilicic acid and its oligomers

Orthosilicic acid (Si(OH)₄) and its small condensation compounds are among the most important silicon compounds but have never been isolated, due to their instability. These compounds would be highly useful building blocks for advanced materials if they became available at high purity. Here we show a simple procedure to selectively synthesize orthosilicic acid and its dimer, cyclic trimer and tetramer in organic solvents. Isolation of orthosilicic acid, the dimer and the cyclic tetramer as hydrogen-bonded crystals with tetrabutylammonium halides and the cyclic trimer as solvent-containing crystals is also described. The solid-state structures of these compounds are unambiguously clarified by single crystal X-ray and neutron diffraction studies. The usefulness of orthosilicic acid and its oligomers prepared by the new procedure is demonstrated by the synthesis of functionalized oligosiloxanes.

Orthosilicic acid is essential to many natural and synthetic materials but notoriously difficult to isolate, limiting its use in materials synthesis. Here, the authors successfully synthesize and stabilize orthosilicic acid and its oligomers, making available a new family of building blocks for silicon oxide-based materials.