Okada H, Mayama K, Goto Y, Kusunoki I, Yanagihara M. Thermal stability of sputtered Mo/X and W/X (X = BN:O, B(4)C:O, Si, and C) multilayer soft-x-ray mirrors.
APPLIED OPTICS 1994;
33:4219-4224. [PMID:
20935776 DOI:
10.1364/ao.33.004219]
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Abstract
We prepared eight samples of Mo/X and W/X (X = BN:O, B(4)C:O, Si, and C) multilayers by magnetron sputtering. Analyses of x-ray photoelectron spectroscopy for the boron nitride and the B(4)C layers showed the concentration of O to be nonnegligible. We have evaluated the thermal stability by measuring soft-x-ray specular reflectances before and after thermal annealing occurs at temperatures as high as 700 °C. The results suggest that the thermal stability depends largely on the inclusion of low-density materials and not on the type of metal. Of the four low-density materials studied, BN:O is thermally the most stable, and the Mo/BN:O multilayer, the most stable among the eight samples, shows stability as high as 700 °C.
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