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For: Chen HL, Wang LA. Hexamethyldisiloxane film as the bottom antireflective coating layer for ArF excimer laser lithography. Appl Opt 1999;38:4885-4890. [PMID: 18323979 DOI: 10.1364/ao.38.004885] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/26/2023]

For:	Chen HL, Wang LA. Hexamethyldisiloxane film as the bottom antireflective coating layer for ArF excimer laser lithography. Appl Opt 1999;38:4885-4890. [PMID: 18323979 DOI: 10.1364/ao.38.004885] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/26/2023]

Number	Cited by Other Article(s)
1	Low-dielectric constant bisbenzo(cyclobutene) and fluorinated poly(arylene)ether films as bottom anti-reflective coating layers for ArF lithography. ACTA ACUST UNITED AC 2001. [DOI: 10.1116/1.1421552] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/17/2022] Abstract Collapse Key Words Collapse MESH Headings Collapse Grants Collapse Affiliation(s) Collapse

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Cited by Other Article(s)

Low-dielectric constant bisbenzo(cyclobutene) and fluorinated poly(arylene)ether films as bottom anti-reflective coating layers for ArF lithography. ACTA ACUST UNITED AC 2001. [DOI: 10.1116/1.1421552] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/17/2022]