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For: Kang HY, Hwangbo CK. Optical design of hybrid-type attenuated phase-shift masks for extreme-ultraviolet lithography by use of a Fabry-Perot interference filter. Appl Opt 2008;47:C75-C78. [PMID: 18449274 DOI: 10.1364/ao.47.000c75] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/26/2023]

For:	Kang HY, Hwangbo CK. Optical design of hybrid-type attenuated phase-shift masks for extreme-ultraviolet lithography by use of a Fabry-Perot interference filter. Appl Opt 2008;47:C75-C78. [PMID: 18449274 DOI: 10.1364/ao.47.000c75] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/26/2023]

Number	Cited by Other Article(s)
1	Absorber stack with transparent conductive oxide layer for extreme ultraviolet lithography. ACTA ACUST UNITED AC 2009. [DOI: 10.1116/1.3043471] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/17/2022] Abstract Collapse Key Words Collapse MESH Headings Collapse Grants Collapse Affiliation(s) Collapse

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Cited by Other Article(s)

Absorber stack with transparent conductive oxide layer for extreme ultraviolet lithography. ACTA ACUST UNITED AC 2009. [DOI: 10.1116/1.3043471] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/17/2022]