Extraordinary low transmission effects for ultra-thin patterned metal films

Nanostructured Color Filters: A Review of Recent Developments

Color plays an important role in human life: without it life would be dull and monochromatic. Printing color with distinct characteristics, like hue, brightness and saturation, and high resolution, are the main characteristic of image sensing devices. A flexible design of color filter is also desired for angle insensitivity and independence of direction of polarization of incident light. Furthermore, it is important that the designed filter be compatible with the image sensing devices in terms of technology and size. Therefore, color filter requires special care in its design, operation and integration. In this paper, we present a comprehensive review of nanostructured color filter designs described to date and evaluate them in terms of their performance.

Polarization independent subtractive color printing based on ultrathin hexagonal nanodisk-nanohole hybrid structure arrays

Structural color printing based on plasmonic metasurfaces has been recognized as a promising alternative to the conventional dye colorants, though the color brightness and polarization tolerance are still a great challenge for practical applications. In this work, we report a novel plasmonic metasurface for subtractive color printing employing the ultrathin hexagonal nanodisk-nanohole hybrid structure arrays. Through both the experimental and numerical investigations, the subtractive color thus generated taking advantages of extraordinary low transmission (ELT) exhibits high brightness, polarization independence and wide color tunability by varying key geometrical parameters. In addition, other regular patterns including square, pentagonal and circular shapes are also surveyed, and reveal a high color brightness, wide gamut and polarization independence as well. These results indicate that the demonstrated plasmonic metasurface has various potential applications in high-definition displays, high-density optical data storage, imaging and filtering technologies.

Flexible Plasmonic Color Filters Fabricated via Nanotransfer Printing with Nanoimprint-Based Planarization

We investigated the preparation and performance of large-area transmission-type flexible plasmonic color filters (PCFs). These large-area PCFs were fabricated based on a nanotransfer printing (nTP) process that involves nanoimprint-based planarization. This process is a simple surface treatment for easy transfer of a metal to a flexible plastic substrate and formation of patterned aluminum nanodots and nanoholes on a substrate surface with poor roughness. Rabbit-ear structures can form during the nTP process, and this phenomenon was analyzed by numerical simulation. As defects were not detected in a 10 000-round bending test, the PCFs fabricated using this nTP process have excellent mechanical properties.

Fabrication of nanostructured transmissive optical devices on ITO-glass with UV1116 photoresist using high-energy electron beam lithography

High-energy electron beam lithography for patterning nanostructures on insulating substrates can be challenging. For high resolution, conventional resists require large exposure doses and for reasonable throughput, using typical beam currents leads to charge dissipation problems. Here, we use UV1116 photoresist (Dow Chemical Company), designed for photolithographic technologies, with a relatively low area dose at a standard operating current (80 kV, 40-50 μC cm^-2, 1 nAs^-1) to pattern over large areas on commercially coated ITO-glass cover slips. The minimum linewidth fabricated was ∼33 nm with 80 nm spacing; for isolated structures, ∼45 nm structural width with 50 nm separation. Due to the low beam dose, and nA current, throughput is high. This work highlights the use of UV1116 photoresist as an alternative to conventional e-beam resists on insulating substrates. To evaluate suitability, we fabricate a range of transmissive optical devices, that could find application for customized wire-grid polarisers and spectral filters for imaging, which operate based on the excitation of surface plasmon polaritons in nanosized geometries, with arrays encompassing areas ∼0.25 cm².

Electrospinning-derived ultrafine silver–carbon composite nanofibers for flexible transparent conductive films

Hybrid TCFs with good conductivity, transparency, flexibility and environment resistance abilities were fabricated through partially substituting AgNWs with ultrafine Ag/CNFs.

Resonant metamaterials for contrast enhancement in optical lithography

The transmission through ultra-thin metal films is noticeable and thus limits their potential for the formation of lithographic masks. By sub-wavelength patterning of a metal film with a post structure, a resonant metamaterial is formed, which can effectively suppress the transmission. Measurements as well as calculations identify the width of the metal islands as a critical geometrical feature. Hence, the extraordinarily low transmission effect can be explained by the resonant response of single scatterers known as Localized Surface Plasmon Resonances (LSPR). A potential application of this suppressed transmission effect to thin metal masks in optical lithography is experimentally investigated.