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Christidis G, Fabrichnaya OB, Koepfli SM, Poloni E, Winiger J, Fedoryshyn YM, Gusarov AV, Ilatovskaia M, Saenko I, Savinykh G, Shklover V, Leuthold J. Photonic response and temperature evolution of SiO 2/TiO 2 multilayers. JOURNAL OF MATERIALS SCIENCE 2021; 56:18440-18452. [PMID: 34720179 PMCID: PMC8550000 DOI: 10.1007/s10853-021-06557-y] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/04/2021] [Accepted: 09/23/2021] [Indexed: 06/13/2023]
Abstract
UNLABELLED The microstructural and optical reflectivity response of photonic SiO2/TiO2 nanomultilayers have been investigated as a function of temperature and up to the material system's melting point. The nanomultilayers exhibit high, broadband reflectivities up to 1350 °C with values that exceed 75% for a 1 μm broad wavelength range (600-1600 nm). The optimized nanometer sized, dielectric multilayers undergo phase transformations from anatase TiO2 and amorphous SiO2 to the thermodynamically stable phases, rutile and cristobalite, respectively, that alter their structural morphology from the initial multilayers to that of a scatterer. Nonetheless, they retain their photonic characteristics, when characterized on top of selected substrate foils. The thermal behavior of the nanometer sized multilayers has been investigated by differential thermal analysis (DTA) and compared to that of commercially available, mm-sized, annealed powders. The same melting reactions were observed, but the temperatures were lower for the nm-sized samples. The samples were characterized using X-ray powder diffraction before DTA and after annealing at temperatures of 1350 and 1700 °C. The microstructural evolution and phase compositions were investigated by scanning electron microscopy and energy-dispersive X-ray spectroscopy measurements. The limited mutual solubility of one material to another, in combination with the preservation of their optical reflectivity response even after annealing, makes them an interesting material system for high-temperature, photonic coatings, such as photovoltaics, aerospace re-entry and gas turbines, where ultra-high temperatures and intense thermal radiation are present. SUPPLEMENTARY INFORMATION The online version contains supplementary material available at 10.1007/s10853-021-06557-y.
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Affiliation(s)
- George Christidis
- Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland
| | - Olga B. Fabrichnaya
- Institute of Material Sciences, Freiberg University of Mining and Technology, 09599 Freiberg, Germany
| | - Stefan M. Koepfli
- Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland
| | - Erik Poloni
- Department of Materials. ETH Zurich, Complex Materials, 8093 Zurich, Switzerland
| | - Joel Winiger
- Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland
| | - Yuriy M. Fedoryshyn
- Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland
| | - Andrey V. Gusarov
- Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland
| | - Mariia Ilatovskaia
- Institute of Material Sciences, Freiberg University of Mining and Technology, 09599 Freiberg, Germany
| | - Ivan Saenko
- Institute of Material Sciences, Freiberg University of Mining and Technology, 09599 Freiberg, Germany
| | - Galina Savinykh
- Institute of Material Sciences, Freiberg University of Mining and Technology, 09599 Freiberg, Germany
| | - Valery Shklover
- Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland
| | - Juerg Leuthold
- Institute of Electromagnetic Fields, ETH Zurich, Gloriastrasse 35, 8092 Zurich, Switzerland
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Christidis G, Koch U, Poloni E, Leo ED, Cheng B, Koepfli SM, Dorodnyy A, Bouville F, Fedoryshyn Y, Shklover V, Leuthold J. Broadband, High-Temperature Stable Reflector for Aerospace Thermal Radiation Protection. ACS APPLIED MATERIALS & INTERFACES 2020; 12:9925-9934. [PMID: 32003964 DOI: 10.1021/acsami.9b20753] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
A simple and thermally stable photonic heterostructure exhibiting high average reflectivity (⟨R⟩ ≈ 88.8%) across a broad wavelength range (920-1450 nm) is presented. The design combines a thin, highly reflective and broadband metallic substrate (Ta) with an optimized dielectric coating (10 layers) to create an enhanced reflector with improved optical and thermal properties compared to its constituents. The heterostructure exhibits temperature-reversible reflective properties up to 1000 °C. In order to take advantage of the high reflectivity and temperature stable properties of this coating, in a wide range of non-photonic composite materials, we have fabricated heterostructure platelets as additives. By impregnating these additives into other types of materials, their response can be photonically enhanced. Platelets of such a heterostructure have been introduced inside an organic matrix to increase its broadband reflection performance. The platelet-impregnated matrix displays an average reflectivity improvement from 5% to an average of 55% over a 1000 nm range, making it a suitable additive for next generation thermal protection systems (TPS).
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Affiliation(s)
- George Christidis
- Department of Information Technology and Electrical Engineering, Institute of Electromagnetic Fields , ETH Zurich , 8092 Zurich , Switzerland
| | - Ueli Koch
- Department of Information Technology and Electrical Engineering, Institute of Electromagnetic Fields , ETH Zurich , 8092 Zurich , Switzerland
| | - Erik Poloni
- Department of Materials, Complex Materials , ETH Zurich , 8093 Zurich , Switzerland
| | - Eva De Leo
- Department of Information Technology and Electrical Engineering, Institute of Electromagnetic Fields , ETH Zurich , 8092 Zurich , Switzerland
- Polariton Technologies AG , 8038 Zurich , Switzerland
| | - Bojun Cheng
- Department of Information Technology and Electrical Engineering, Institute of Electromagnetic Fields , ETH Zurich , 8092 Zurich , Switzerland
| | - Stefan M Koepfli
- Department of Information Technology and Electrical Engineering, Institute of Electromagnetic Fields , ETH Zurich , 8092 Zurich , Switzerland
| | - Alexander Dorodnyy
- Department of Information Technology and Electrical Engineering, Institute of Electromagnetic Fields , ETH Zurich , 8092 Zurich , Switzerland
| | - Florian Bouville
- Department of Materials, Complex Materials , ETH Zurich , 8093 Zurich , Switzerland
| | - Yuriy Fedoryshyn
- Department of Information Technology and Electrical Engineering, Institute of Electromagnetic Fields , ETH Zurich , 8092 Zurich , Switzerland
| | - Valery Shklover
- Department of Information Technology and Electrical Engineering, Institute of Electromagnetic Fields , ETH Zurich , 8092 Zurich , Switzerland
| | - Juerg Leuthold
- Department of Information Technology and Electrical Engineering, Institute of Electromagnetic Fields , ETH Zurich , 8092 Zurich , Switzerland
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Xu H, Gan Z, Zhou W, Ding Z, Zhang X. A metal-free 3C-SiC/g-C3N4 composite with enhanced visible light photocatalytic activity. RSC Adv 2017. [DOI: 10.1039/c7ra06497g] [Citation(s) in RCA: 17] [Impact Index Per Article: 2.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022] Open
Abstract
Insufficient visible light absorption and fast recombination of the photogenerated electron–hole pairs have seriously hampered the photocatalytic performance of graphitic carbon nitride (g-C3N4) up to now.
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Affiliation(s)
- Hao Xu
- Faculty of Science
- Ningbo University
- Ningbo 315211
- China
| | - Zhixing Gan
- Key Laboratory of Optoelectronic Technology of Jiangsu Province
- School of Physics and Technology
- Nanjing Normal University
- Nanjing 210023
- China
| | - Weiping Zhou
- Department of Applied Physics
- Nanjing University of Science and Technology
- Nanjing 210094
- China
| | - Zuoming Ding
- Key Laboratory of Optoelectronic Technology of Jiangsu Province
- School of Physics and Technology
- Nanjing Normal University
- Nanjing 210023
- China
| | - Xiaowei Zhang
- Faculty of Science
- Ningbo University
- Ningbo 315211
- China
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Dallaeva D, Korostylev E, Bilalov B, Tománek P. Scanning proximal microscopy study of the thin layers of silicon carbide-aluminum nitride solid solution manufactured by fast sublimation epitaxy. EPJ WEB OF CONFERENCES 2013. [DOI: 10.1051/epjconf/20134800002] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/14/2022] Open
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