Characterization of megahertz X-ray laser beams by multishot desorption imprints in PMMA

Microscopic Kinetics in Poly(Methyl Methacrylate) Exposed to a Single Ultra-Short XUV/X-ray Laser Pulse

We study the behavior of poly(methyl methacrylate) (PMMA) exposed to femtosecond pulses of extreme ultraviolet and X-ray laser radiation in the single-shot damage regime. The employed microscopic simulation traces induced electron cascades, the thermal energy exchange of electrons with atoms, nonthermal modification of the interatomic potential, and a triggered atomic response. We identify that the nonthermal hydrogen decoupling triggers ultrafast fragmentation of PMMA strains at the absorbed threshold dose of ~0.07 eV/atom. At higher doses, more hydrogen atoms detach from their parental molecules, which, at the dose of ~0.5 eV/atom, leads to a complete separation of hydrogens from carbon and oxygen atoms and fragmentation of MMA molecules. At the dose of ~0.7 eV/atom, the band gap completely collapses indicating that a metallic liquid is formed with complete atomic disorder. An estimated single-shot ablation threshold and a crater depth as functions of fluence agree well with the experimental data collected.

Tomography of a seeded free-electron laser focal spot: qualitative and quantitative comparison of two reconstruction methods for spot size characterization

Performing experiments at free-electron lasers (FELs) requires an exhaustive knowledge of the pulse temporal and spectral profile, as well as the focal spot shape and size. Operating FELs in the extreme ultraviolet (EUV) and soft X-ray (SXR) spectral regions calls for designing ad-hoc optical layouts to transport and characterize the EUV/SXR beam, as well as tailoring its spatial dimensions at the focal plane down to sizes in the few micrometers range. At the FERMI FEL (Trieste, Italy) this task is carried out by the Photon Analysis Delivery and Reduction System (PADReS). In particular, to meet the different experimental requests on the focal spot shape and size, a proper tuning of the optical systems is required, and this should be monitored by means of dedicated techniques. Here, we present and compare two reconstruction methods for spot characterization: single-shot imprints captured via ablation on a poly(methyl methacrylate) sample (PMMA) and pulse profiles retrieved by means of a Hartmann wavefront sensor (WFS). By recording complementary datasets at and nearby the focal plane, we exploit the tomography of the pulse profile along the beam propagation axis, as well as a qualitative and quantitative comparison between these two reconstruction methods.

Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy

Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions. However, the technique poses a number of challenges when used for optical systems with numerical apertures (NA) > 0.1. A high-numerical-aperture Hartmann wavefront sensor was employed at the free electron laser FLASH for the characterization of a Schwarzschild objective. These are widely used in EUV to achieve very small foci, particularly for photolithography. For this purpose, Schwarzschild objectives require highly precise alignment. The phase measurements acquired with the wavefront sensor were analyzed employing two different methods, namely, the classical calculation of centroid positions and Fourier demodulation. Results from both approaches agree in terms of wavefront maps with negligible degree of discrepancy.