Critical Process Variables for Uv-Ozone Etching of Photoresist

Nanoscale rings fabricated using self-assembled triblock terpolymer templates

Although there has been extensive work on the use of self-assembled diblock copolymers for nanolithography, there are few reports of the use of multiblock copolymers, which can form a more diverse range of nanoscale pattern geometries. Pattern transfer from a self-assembled poly(butadiene-b-styrene-b-methyl methacrylate) (PB-b-PS-b-PMMA) triblock terpolymer thin film has been investigated. Polymers of different total molecular weight were synthesized with a predicted morphology consisting of PMMA-core/PS-shell cylinders in a PB matrix. By adjusting the solvent-annealing conditions and the film thickness, thin films with vertically oriented cylinders were formed. The PMMA cylinder cores and the PB matrix were then removed using selective etching to leave an array of PS rings, and the ring pattern was transferred into a silica film by reactive ion etching to form 19 nm high silica rings. This result illustrates the design and use of triblock terpolymers for self-assembled lithography.