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For: Oskam G, Long JG, Nikolova M, Searson PC. Electrochemical Deposition of Metals on Semiconductors. ACTA ACUST UNITED AC 2011. [DOI: 10.1557/proc-451-257] [Citation(s) in RCA: 8] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/13/2022]
Number Cited by Other Article(s)
1
Epitaxial Growth of Metals on Semiconductors Via Electrodeposition. NANOFABRICATION 2012. [DOI: 10.1007/978-3-7091-0424-8_9] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/15/2022]  Open
2
Tang J, White M, Stucky GD, McFarland EW. Electrochemical fabrication of large-area Au/TiO2 junctions. Electrochem commun 2003. [DOI: 10.1016/s1388-2481(03)00108-5] [Citation(s) in RCA: 39] [Impact Index Per Article: 1.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/27/2022]  Open
3
Pb deposition on n-Si(111) electrodes. Electrochim Acta 1999. [DOI: 10.1016/s0013-4686(99)00261-3] [Citation(s) in RCA: 51] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/23/2022]
4
Pasa AA, Schwarzacher W. Electrodeposition of Thin Films and Multilayers on Silicon. ACTA ACUST UNITED AC 1999. [DOI: 10.1002/(sici)1521-396x(199905)173:1<73::aid-pssa73>3.0.co;2-8] [Citation(s) in RCA: 55] [Impact Index Per Article: 2.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/11/2022]
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