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Matyushov AD, Spetzler B, Zaeimbashi M, Zhou J, Qian Z, Golubeva EV, Tu C, Guo Y, Chen BF, Wang D, Will-Cole A, Chen H, Rinaldi M, McCord J, Faupel F, Sun NX. Curvature and Stress Effects on the Performance of Contour-Mode Resonant ΔE Effect Magnetometers. ADVANCED MATERIALS TECHNOLOGIES 2021; 6:2100294. [PMID: 35558167 PMCID: PMC9090164 DOI: 10.1002/admt.202100294] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/15/2021] [Indexed: 06/15/2023]
Abstract
Miniaturized piezoelectric/magnetostrictive contour-mode resonators have been shown to be effective magnetometers by exploiting the ΔE effect. With dimensions of ~100-200 μm across and <1 μm thick, they offer high spatial resolution, portability, low power consumption, and low cost. However, a thorough understanding of the magnetic material behavior in these devices has been lacking, hindering performance optimization. This manuscript reports on the strong, nonlinear correlation observed between the frequency response of these sensors and the stress-induced curvature of the resonator plate. The resonance frequency shift caused by DC magnetic fields drops off rapidly with increasing curvature: about two orders of magnitude separate the highest and lowest frequency shift in otherwise identical devices. Similarly, an inverse correlation with the quality factor was found, suggesting a magnetic loss mechanism. The mechanical and magnetic properties are theoretically analyzed using magnetoelastic finite-element and magnetic domain-phase models. The resulting model fits the measurements well and is generally consistent with additional results from magneto-optical domain imaging. Thus, the origin of the observed behavior is identified and broader implications for the design of nano-magnetoelastic devices are derived. By fabricating a magnetoelectric nano-plate resonator with low curvature, a record-high DC magnetic field sensitivity of 5 Hz/nT is achieved.
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Affiliation(s)
- Alexei D Matyushov
- Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | | | - Mohsen Zaeimbashi
- Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | - James Zhou
- Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | - Zhenyun Qian
- Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | | | - Cheng Tu
- Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | - Yingxue Guo
- Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | - Brian F Chen
- Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | - Damo Wang
- Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | - Alexandria Will-Cole
- Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | - Huaihao Chen
- Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | - Matteo Rinaldi
- Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115, United States
| | - Jeffrey McCord
- Institute of Material Science, Kiel University, 24118 Kiel, Germany
| | - Franz Faupel
- Institute of Material Science, Kiel University, 24118 Kiel, Germany
| | - Nian X Sun
- Department of Electrical and Computer Engineering, Northeastern University, Boston, Massachusetts 02115, United States
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Koza JA, Karnbach F, Uhlemann M, McCord J, Mickel C, Gebert A, Baunack S, Schultz L. Electrocrystallisation of CoFe alloys under the influence of external homogeneous magnetic fields—Properties of deposited thin films. Electrochim Acta 2010. [DOI: 10.1016/j.electacta.2009.08.069] [Citation(s) in RCA: 27] [Impact Index Per Article: 1.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/20/2022]
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