Shushanian A, Iida D, Zhuang Z, Han Y, Ohkawa K. Analysis of the n-GaN electrochemical etching process and its mechanism in oxalic acid.
RSC Adv 2022;
12:4648-4655. [PMID:
35425502 PMCID:
PMC8981382 DOI:
10.1039/d1ra07992a]
[Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/31/2021] [Accepted: 01/25/2022] [Indexed: 01/05/2023] Open
Abstract
We studied the wet electrochemical etching of n-GaN films in oxalic acid. The electrooxidation processes occur in a potentiostatic mode in the voltage range of 5 to 20 V. We described the formation of the porous n-GaN layer structures in several ways. Firstly, we observed the microphotographs of the cross section to characterize the nanostructure. Secondly, we examined the reaction products in a liquid phase using ICP-OES and TOC-TN methods, while vapor-phase products were examined by gas chromatography. Finally, according to the product data analysis, we demonstrate a mechanism for the electrochemical oxidation of n-GaN in oxalic acid, which involves 6 electrons.
We studied the mechanism of wet electrochemical etching of n-GaN films in oxalic acid.![]()
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