Accelerated Ultraviolet Treatment of Carbamazepine and NDMA in Water under 222 nm Irradiation

Krypton chloride (KrCl*) excimer ultraviolet (UV) light may provide advantages for contaminant degradation compared to conventional low-pressure (LP) UV. Direct and indirect photolysis as well as UV/hydrogen peroxide-driven advanced oxidation (AOP) of two chemical contaminants were investigated in laboratory grade water (LGW) and treated secondary effluent (SE) for LPUV and filtered KrCl* excimer lamps emitting at 254 and 222 nm, respectively. Carbamazepine (CBZ) and N-nitrosodimethylamine (NDMA) were chosen because of their unique molar absorption coefficient profiles, quantum yields (QYs) at 254 nm, and reaction rate constants with hydroxyl radical. Quantum yields and molar absorption coefficients at 222 nm for both CBZ and NDMA were determined, with measured molar absorption coefficients of 26 422 and 8170 M-1 cm-1, respectively, and QYs of 1.95 × 10-2 and 6.68 × 10-1 mol Einstein-1, respectively. The 222 nm irradiation of CBZ in SE improved degradation compared to that in LGW, likely through promotion of in situ radical formation. AOP conditions improved degradation of CBZ in LGW for both UV LP and KrCl* sources but did not improve NDMA decay. In SE, photolysis of CBZ resulted in decay similar to that of AOP, likely due to the in situ generation of radicals. Overall, the KrCl* 222 nm source significantly improves contaminant degradation compared to that of 254 nm LPUV.

Comparative evaluation of 2-isopropyl-3-methoxypyrazine, 2-isobutyl-3-methoxypyrazine, and 2,4,6-trichloroanisole degradation by ultraviolet/chlorine and ultraviolet/hydrogen peroxide processes

2-Isopropyl-3-methoxypyrazine (IPMP), 2-Isobutyl-3-methoxypyrazine (IBMP), and 2,4,6-Trichloroanisole (TCA) are the primary emerging taste and odor (T&O) compounds in water systems with low thresholds (ng L^-1). The selected T&O compounds are known to be difficult to remove using conventional water treatment processes. In this study, we compared the removal characteristics of the three T&O compounds using UV/Cl₂ and UV/H₂O₂. The removal rates of the three compounds by direct photolysis at 254 nm were less than 10%, even at a high UV dose (approximately 1000 mJ cm^-2). Under conditions of an oxidant injection volume of 5 mg L^-1 and UV dose of 1000 mJ cm^-2, the degradation rate of the target compounds in the UV/H₂O₂ process exceeded that of the UV/Cl₂ process. Moreover, the results revealed that pH has a significant impact on the removal of the T&O compounds during the UV/Cl₂ process. The IPMP, IBMP, and TCA were found to be more reactive with hydroxyl radicals than reactive chlorine species (RCS). A predictive tool was developed to determine the optimal operating condition using the generalized reduced gradient (GRG) nonlinear solver. In the UV/H₂O₂ process, the EED value for 90% removing rate was 0.156 kWh m^-3 for the IPMP, 0.135 kWh m^-3 for the IBMP, and 0.154 kWh m^-3 for the TCA, respectively. In case of the UV/Cl₂, the EED value for 50% removing rate was 0.174 kWh m^-3 for the IPMP, 0.138 kWh m^-3 for the IBMP, and 0.169 kWh m^-3 for the TCA, respectively.