Thermoplasmonic Controlled Optical Absorber Based on a Liquid Crystal Metasurface

Metasurfaces can be realized by organizing subwavelength elements (e.g., plasmonic nanoparticles) on a reflective surface covered with a dielectric layer. Such an array of resonators, acting collectively, can completely absorb the resulting resonant wavelength. Unfortunately, despite the excellent optical properties of metasurfaces, they lack the tunability to perform as adaptive optical components. To boost the utilization of metasurfaces and realize a new generation of dynamically controlled optical components, we report our recent finding based on the powerful combination of an innovative metasurface-optical absorber and nematic liquid crystals (NLCs). The metasurface consists of self-assembled silver nanocubes (AgNCs) immobilized on a 50 nm thick gold layer by using a polyelectrolyte multilayer as a dielectric spacer. The resulting optical absorbers show a well-defined reflection band centered in the near-infrared of the electromagnetic spectrum (750-770 nm), a very high absorption efficiency (∼60%) at the resonant wavelength, and an elevated photothermal efficiency estimated from the time constant value (34 s). Such a metasurface-based optical absorber, combined with an NLC layer, planarly aligned via a photoaligned top cover glass substrate, shows homogeneous NLC alignment and an absorption band photothermally tunable over approximately 46 nm. Detailed thermographic studies and spectroscopic investigations highlight the extraordinary capability of the active metasurface to be used as a light-controllable optical absorber.

Monolayer Plasmonic Nanoframes as Large-Area, Broadband Metasurface Absorbers

Broadband absorbers are useful ultraviolet protection, energy harvesting, sensing, and thermal imaging. The thinner these structures are, the more device-relevant they become. However, it is difficult to synthesize ultrathin absorbers in a scalable and straightforward manner. A general and straightforward synthetic strategy for preparing ultrathin, broadband metasurface absorbers that do not rely on cumbersome lithographic steps is reported. These materials are prepared through the surface-assembly of plasmonic octahedral nanoframes (NFs) into large-area ordered monolayers via drop-casting with subsequent air-drying at room temperature. This strategy is used to produce three types of ultrathin broadband absorbers with thicknesses of ≈200 nm and different lattice symmetries (loose hexagonal, twisted hexagonal, dense hexagonal), all of which exhibit efficient light absorption (≈90%) across wavelengths ranging from 400-800 nm. Their broadband absorption is attributed to the hollow morphologies of the NFs, the incorporation of a high-loss material (i.e., Pt), and the strong field enhancement resulting from surface assembly. The broadband absorption is found to be polarization-independent and maintained for a wide range of incidence angles (±45°). The ability to design and fabricate broadband metasurface absorbers using this high-throughput surface-based assembly strategy is a significant step toward the large-scale, rapid manufacturing of nanophotonic structures and devices.

Ultra-Thin and Lithography-Free Transmissive Color Filter Based on Doped Indium Gallium Zinc Oxide with High Performance

A kind of ultra-thin transmissive color filter based on a metal-semiconductor-metal (MSM) structure is proposed. The displayed color can cover the entire visible range and switches after H₂ treatment. An indium gallium zinc oxide (IGZO) semiconductor was employed, as the concentration of charge carriers can be controlled to adjust the refractive index and achieve certain colors. The color modulation in the designed structure was verified using the rigorous coupled wave analysis (RCWA) method. The angular independence of the relative transmission could reach up to 60°, and polarization-insensitive performance could also be maintained. Numerical results demonstrated that the thickness of IGZO was the key parameter to concentrate the incident light. The overall structure is planar and lithography-free and can be produced with simple preparation steps. The obtained results can also be extended to other similar resonators where a proper cavity allows dynamical functionality.

Lithography-free and high-efficiency preparation of black phosphorous devices by direct evaporation through shadow mask

Two-dimensional (2D) materials including black phosphorus (BP) have been extensively investigated because of their exotic physical properties and potential applications in nanoelectronics and optoelectronics. Fabricating BP based devices is challenging because BP is extremely sensitive to the external environment, especially to the chemical contamination during the lithography process. The direct evaporation through shadow mask technique is a clean method for lithography-free electrode patterning of 2D materials. Herein, we employ the lithography-free evaporation method for the construction of BP based field-effect transistors and photodetectors and systematically compare their performances with those of BP counterparts fabricated by conventional lithography and transfer electrode methods. The results show that BP devices fabricated by direct evaporation method possess higher mobility, faster response time, and smaller hysteresis than those prepared by the latter two methods. This can be attributed to the clean interface between BP and evaporated-electrodes as well as the lower Schottky barrier height of 20.2 meV, which is given by the temperature-dependent electrical results. Furthermore, the BP photodetectors exhibit a broad-spectrum response and polarization sensitivity. Our work elucidates a universal, low-cost and high-efficiency method to fabricate BP devices for optoelectronic applications.

Tunable Narrowband Silicon-Based Thermal Emitter with Excellent High-Temperature Stability Fabricated by Lithography-Free Methods

Thermal emitters with properties of wavelength-selective and narrowband have been highly sought after for a variety of potential applications due to their high energy efficiency in the mid-infrared spectral range. In this study, we theoretically and experimentally demonstrate the tunable narrowband thermal emitter based on fully planar Si-W-SiN/SiNO multilayer, which is realized by the excitation of Tamm plasmon polaritons between a W layer and a SiN/SiNO-distributed Bragg reflector. In conjunction with electromagnetic simulations by the FDTD method, the optimum structure design of the emitter is implemented by 2.5 periods of DBR structure, and the corresponding emitter exhibits the nearly perfect narrowband absorption performance at the resonance wavelength and suppressed absorption performance in long wave range. Additionally, the narrowband absorption peak is insensitive to polarization mode and has a considerable angular tolerance of incident light. Furthermore, the actual high-quality Si-W-SiN/SiNO emitters are fabricated through lithography-free methods including magnetron sputtering and PECVD technology. The experimental absorption spectra of optimized emitters are found to be in good agreement with the simulated absorption spectra, showing the tunable narrowband absorption with all peak values of over 95%. Remarkably, the fabricated Si-W-SiN/SiNO emitter presents excellent high-temperature stability for several heating/cooling cycles confirmed up to 1200 K in Ar ambient. This easy-to-fabricate and tunable narrowband refractory emitter paves the way for practical designs in various photonic and thermal applications, such as thermophotovoltaic and IR radiative heaters.

Simple Lithography-Free Single Cell Micropatterning using Laser-Cut Stencils

Micropatterning techniques have been widely used in cell biology to study effects of controlling cell shape and size on cell fate determination at single cell resolution. Current state-of-the-art single cell micropatterning techniques involve soft lithography and micro-contact printing, which is a powerful technology, but requires trained engineering skills and certain facility support in microfabrication. These limitations require a more accessible technique. Here, we describe a simple alternative lithography-free method: stencil-based single cell patterning. We provide step-by-step procedures including stencil design, polyacrylamide hydrogel fabrication, stencil-based protein incorporation, and cell plating and culture. This simple method can be used to pattern an array of as many as 2,000 cells. We demonstrate the patterning of cardiomyocytes derived from single human induced pluripotent stem cells (hiPSC) with distinct cell shapes, from a 1:1 square to a 7:1 adult cardiomyocyte-like rectangle. This stencil-based single cell patterning is lithography-free, technically robust, convenient, inexpensive, and most importantly accessible to those with a limited bioengineering background.

The Growth of Graphene on Ni-Cu Alloy Thin Films at a Low Temperature and Its Carbon Diffusion Mechanism

Carbon solid solubility in metals is an important factor affecting uniform graphene growth by chemical vapor deposition (CVD) at high temperatures. At low temperatures, however, it was found that the carbon diffusion rate (CDR) on the metal catalyst surface has a greater impact on the number and uniformity of graphene layers compared with that of the carbon solid solubility. The CDR decreases rapidly with decreasing temperatures, resulting in inhomogeneous and multilayer graphene. In the present work, a Ni-Cu alloy sacrificial layer was used as the catalyst based on the following properties. Cu was selected to increase the CDR, while Ni was used to provide high catalytic activity. By plasma-enhanced CVD, graphene was grown on the surface of Ni-Cu alloy under low pressure using methane as the carbon source. The optimal composition of the Ni-Cu alloy, 1:2, was selected through experiments. In addition, the plasma power was optimized to improve the graphene quality. On the basis of the parameter optimization, together with our previously-reported, in-situ, sacrificial metal-layer etching technique, relatively homogeneous wafer-size patterned graphene was obtained directly on a 2-inch SiO2/Si substrate at a low temperature (~600 °C).

Typography-Like 3D-Printed Templates for the Lithography-Free Fabrication of Microfluidic Chips

Typography-like templates for polydimethylsiloxane (PDMS) microfluidic chips using a fused deposition modeling (FDM) three-dimensional (3D) printer are presented. This rapid and fast proposed scheme did not require complicated photolithographic fabrication facilities and could deliver resolutions of ~100 μm. Polylactic acid (PLA) was adopted as the material to generate the 3D-printed units, which were then carefully assembled on a glass substrate using a heat-melt-curd strategy. This craft of bonding offers a cost-effective way to design and modify the templates of microfluidic channels, thus reducing the processing time of microfluidic chips. Finally, a flexible microfluidic chip to be employed for cell-based drug screening was developed based on the modularized 3D-printed templates. The lithography-free, typography-like, 3D-printed templates create a modularized fabrication process and promote the prevalence of integrated microfluidic systems with minimal requirements and improved efficiency.

Intensity Switchable and Wide-Angle Mid-Infrared Perfect Absorber with Lithography-Free Phase-Change Film of Ge2Sb2Te5

The range of fundamental phenomena and applications achievable by metamaterials (MMs) can be significantly extended by dynamic control over the optical response. A mid-infrared tunable absorber which consists of lithography-free planar multilayered dielectric stacks and germanium antimony tellurium alloy (Ge₂Sb₂Te₅, GST) thin film was presented and studied. The absorption spectra under amorphous and crystalline phase conditions was evaluated by the transfer matrix method (TMM). It was shown that significant tuning of absorption can be achieved by switching the phase of thin layer of GST between amorphous and crystalline states. The near unity (>90%) absorption can be significant maintained by incidence angles up to 75 under crystalline state for both transverse electric (TE) and transverse magnetic (TM) polarizations. The proposed method enhances the functionality of MMs-based absorbers and has great potential for application to filters, emitters, and sensors.

Lithography-Free Electrochemical Patterning of Conductive Substrates with Metal Oxides

Reactive interface patterning promoted by lithographic electrochemistry serves as a facile method for generating submicron structures on conductive substrates. A binary-potential step applied to a metal layer with a resist overlayer allows silicon to be patterned with metal oxides. In this study, the role and influence of the resist overlayer on the uniformity of pattern formation are examined. The ability of the resist to detach from the underlying metal is a critical determinant of pattern geometry. By choosing an appropriate resist, large patterns with submicron precision are generated quickly by the application of the binary-potential steps. From this information, a lithography-free approach to generating identical patterns is achieved with simple resists such as that furnished from a lacquer-water emulsion, thus greatly simplifying the patterning of silicon with metal oxide catalysts.

Large-Scale, Lithography-Free Production of Transparent Nanostructured Surface for Dual-Functional Electrochemical and SERS Sensing

In this work, we present a dual-functional sensor that can perform surface-enhanced Raman spectroscopy (SERS) based identification and electrochemical (EC) quantification of analytes in liquid samples. A lithography-free reactive ion etching process was utilized to obtain nanostructures of high aspect ratios distributed homogeneously on a 4 in. fused silica wafer. The sensor was made up of three-electrode array, obtained by subsequent e-beam evaporation of Au on nanostructures in selected areas through a shadow mask. The SERS performance was evaluated through surface-averaged enhancement factor (EF), which was ∼6.2 × 10⁵, and spatial uniformity of EF, which was ∼13% in terms of relative standard deviation. Excellent electrochemical performance and reproducibility were revealed by recording cyclic voltammograms. On nanostructured electrodes, paracetamol (PAR) showed an improved quasi-reversible behavior with decrease in peak potential separation (ΔE_p ∼ 90 mV) and higher peak currents (I_pa/I_pc ∼ 1), compared to planar electrodes (ΔE_p ∼ 560 mV). The oxidation potential of PAR was also lowered by ∼80 mV on nanostructured electrodes. To illustrate dual-functional sensing, quantitative evaluation of PAR ranging from 30 μM to 3 mM was realized through EC detection, and the presence of PAR was verified by its SERS fingerprint.

Inkjet printing short-channel polymer transistors with high-performance and ultrahigh photoresponsivity

Inkjet-printed short-channel polymer transistors exhibit a high performance (μavg = 1.20 cm(2) V(-1) s(-1) ). With a 50 μm orifice nozzle, polymer transistors with a sub-micrometer (700 nm) channel length are mass-fabricated with good uniformity and reproducibility. In addition, owing to the device geometry, an ultrahigh photoresponsivity up to 10(6) A W(-1) is achieved, which realizes economical, lithography-free photodetectors.