Huang L, Xu K, Yuan D, Hu J, Wang X, Xu S. Sub-wavelength patterned pulse laser lithography for efficient fabrication of large-area metasurfaces.
Nat Commun 2022;
13:5823. [PMID:
36192549 PMCID:
PMC9530239 DOI:
10.1038/s41467-022-33644-8]
[Citation(s) in RCA: 5] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/15/2022] [Accepted: 09/20/2022] [Indexed: 11/09/2022] Open
Abstract
Rigorously designed sub-micrometer structure arrays are widely used in metasurfaces for light modulation. One of the glaring restrictions is the unavailability of easily accessible fabrication methods to efficiently produce large-area and freely designed structure arrays with nanoscale resolution. We develop a patterned pulse laser lithography (PPLL) approach to create structure arrays with sub-wavelength feature resolution and periods from less than 1 μm to over 15 μm on large-area thin films with substrates under ambient conditions. Separated ultrafast laser pulses with patterned wavefront by quasi-binary phase masks rapidly create periodic ablated/modified structures by high-speed scanning. The gradient intensity boundary and circular polarization of the wavefront weaken diffraction and polarization-dependent asymmetricity effects during light propagation for high uniformity. Structural units of metasurfaces are obtained on metal and inorganic photoresist films, such as antennas, catenaries, and nanogratings. We demonstrate a large-area metasurface (10 × 10 mm2) revealing excellent infrared absorption (3–7 μm), which comprises 250,000 concentric rings and takes only 5 minutes to produce.
Fabrication of metasurfaces with nanoscale structures is inefficient for large areas. Here, the authors introduce patterned pulse laser lithography for creating structured arrays with sub-wavelength feature on large-area thin films under ambient conditions.
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