Effects of nitrogen composition on the resistivity of reactively sputtered TaN thin films

Role of Surface Chemistry of Ta Metal Foil on the Growth of GaN Nanorods by Laser Molecular Beam Epitaxy and Their Field Emission Characteristics

This study investigates the influence of surface nitridation of Ta metal foil substrates on the growth of GaN nanorods using the laser molecular beam epitaxy (LMBE) technique and the field emission characteristics of the grown GaN nanorod ensemble. Surface morphology examinations underscore the pivotal role of Ta foil nitridation in shaping the dimensions and densities of GaN nanorods. Bare Ta foil fosters the formation of high-density, vertically self-aligned GaN nanorods at a growth temperature of 700 °C. Furthermore, the density of these nanorods is directly related to the duration of Ta foil nitridation, with increased duration leading to a reduced nanorod density. X-ray Photoelectron Spectroscopy (XPS) studies reveal that the transition of the Ta foil surface from tantalum oxide to tantalum nitride during nitridation emerges as a crucial factor influencing GaN nanorod growth. Photoluminescence (PL) spectroscopy at ambient temperature reveals a strong near-band-edge (NBE) emission peak with negligible defect-related peaks, displaying the high optical quality of the GaN nanorods. The highly dense vertically aligned GaN nanorod ensemble growth without Ta prenitridation exhibits the most favorable field emission performance, featuring a turn-on field of 2.1 V/μm, a field enhancement factor of 2480, and a stable long-term operation at the emission current density of 2.26 mA/cm2. This study advances the understanding of the role of the surface chemistry of metal foil in determining GaN nanorod growth and opens up exciting possibilities for tailoring advanced optoelectronic devices for specific application requirements.

Effects of W Content on Structural and Mechanical Properties of TaWN Films

In this study, TaWN films were fabricated through co-sputtering. The effects of W addition on the structural variation and mechanical properties of these films were investigated. TaWN films formed face-centered cubic (fcc) solid solutions. With the increase in the W content, the fcc phase varied from TaN-dominant to W2N-dominant, which was accompanied by a decrease in the lattice constant and alterations in material characteristics, such as the chemical bonding and mechanical properties. The phase change was further correlated with the bonding characteristics of films examined by X-ray photoelectron spectroscopy. The hardness increased from 21.7 GPa for a Ta54N46 film to 23.2–31.9 GPa for TaWN films, whereas the Young’s modulus increased from 277 GPa for the Ta54N46 film to 302–391 GPa for the TaWN films. The enhancement in films’ mechanical properties was attributed to the strengthening of the solid solution and the phase change. The wear behavior of the fabricated TaWN films was evaluated using the pin-on-disk test. The Ta17W55N28 and Ta36W24N40 films exhibited an abrasive wear behavior and low wear rates of 4.9–7.6 × 10−6 mm3/Nm.

Structural and Mechanical Properties of Fluorine-Containing TaCxNy Thin Films Deposited by Reactive Magnetron Sputtering

TaN thin-film coatings are well known for their good mechanical properties, acceptable toughness, as well as good biocompatibility. However, the friction coefficient of these films is sometimes too high, or the hemocompatibility is poor. The purpose of this study is to reduce the friction coefficient and increase the hydrophobicity of TaN coatings by introducing carbon and fluorine into the coatings. This study has never been conducted by other researchers. Fluorine-containing tantalum carbonitride (i.e., F–TaCxNy) top layers were deposited on TaN/Ta interlayers by reactive sputtering with fixed nitrogen and various hexafluoroethane (C2F6) mass flow rates. During the deposition process, C2F6 gas with various mass flow rates was added. After deposition, these F–TaCxNy multi-layered films were then characterized using XRD, XPS, FTIR, FESEM, WDS, a nano-indenter, a water contact-angle measurement system, and a tribometer. The tribological tests were carried out in the environment with and without humidity. The surface energies of the films were examined with water contact-angle variation. According to structural analysis, TaN phase would transform to TaCxNy with the increase in the C2F6 mass flow rate, which would result in a decrease in the friction coefficient and an increase in hydrophobicity. The films’ hardness (H, increased at most by 20%), elastic modulus (E), and H/E ratio first increased then decreased, most likely due to the increase in relatively soft C–F bonding. According to the results obtained from tribotesting, it was found that an increase in carbon and fluorine contents in the films reduces the friction by more than 30%, and wear rate by more than 50%. More importantly, the effects of moisture on the friction coefficient can be minimized to almost nothing. In a water contact-angle study, the contact angle increased from 60° to 85° with the increase in C2F6 mass flow rates. This evidence illustrated that hemocompatibility of the TaN thin film can be significantly enhanced through the formation of Ta–C and C–Fx bonding. The chemical composition and bonding status of these films, especially the existence of C–Fx bonds, were studied by FTIR and XPS. In sum, with the increased C2F6 mass flow rate, the carbon and fluorine contents in the films increased, while the nitrogen content decreased. The structure, bonding status, and compositions varied accordingly. The tribological behaviors were significantly improved. Furthermore, by carrying out tribotesting in humid air and a dry argon environment, it was confirmed that the greater the fluorine content, the less sensitive the films would be to environment change. This is attributable to the induced lower surface energy and reduced adsorption to water vapor due to the increase in C–Fx bonds. The successfully fabricated and studied F–TaCxNy films could be applied in many areas such as artificial blood vessels, or precision components in an atmospheric or vacuum environment.

Self-supported amorphous TaNx(Oy)/nickel foam thin film as an advanced electrocatalyst for hydrogen evolution reaction

Chemical vapor deposited (CVD) amorphous tantalum-oxy nitride film on porous three-dimensional (3D) nickel foam (TaN_x(O_y)/NF) utilizing tantalum precursor, tris(diethylamino)(ethylimino)tantalum(V), ([Ta(NEt)(NEt₂)₃]) with preformed Ta-N bonds is reported as a potential self-supported electrocatalyst for hydrogen evolution reaction (HER). The morphological analyses revealed the formation of thin film of core-shell structured TaN_x(O_y) coating (ca. 236 nm) on NF. In 0.5 M H₂SO₄, TaN_x(O_y)/NF exhibited enhanced HER activity with a low onset potential as compared to the bare NF (-50 mV vs. -166 mV). The TaN_x(O_y)/NF samples also displayed higher current density (-11.08 mA cm^-2vs. -3.36 mA cm^-2 at 400 mV), lower Tafel slope (151 mV dec^-1vs. 179 mV dec^-1) and lower charge transfer resistance exemplifying the advantage of TaN_x(O_y) coating towards enhanced HER performance. The enhanced HER catalytic activity is attributed to the synergistic effect between the amorphous TaN_x(O_y) film and the nickel foam.

Study on the Electrical, Structural, Chemical and Optical Properties of PVD Ta(N) Films Deposited with Different N2 Flow Rates

By reactive DC magnetron sputtering from a pure Ta target onto silicon substrates, Ta(N) films were prepared with different N2 flow rates of 0, 12, 17, 25, 38, and 58 sccm. The effects of N2 flow rate on the electrical properties, crystal structure, elemental composition, and optical properties of Ta(N) were studied. These properties were characterized by the four-probe method, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and spectroscopic ellipsometry (SE). Results show that the deposition rate decreases with an increase of N2 flows. Furthermore, as resistivity increases, the crystal size decreases, the crystal structure transitions from β-Ta to TaN(111), and finally becomes the N-rich phase Ta3N5(130, 040). Studying the optical properties, it is found that there are differences in the refractive index (n) and extinction coefficient (k) of Ta(N) with different thicknesses and different N2 flow rates, depending on the crystal size and crystal phase structure.

From single-site tantalum complexes to nanoparticles of Ta x N y and TaO x N y supported on silica: elucidation of synthesis chemistry by dynamic nuclear polarization surface enhanced NMR spectroscopy and X-ray absorption spectroscopy

Air-stable catalysts consisting of tantalum nitride nanoparticles represented as a mixture of Ta x N y and TaO x N y with diameters in the range of 0.5 to 3 nm supported on highly dehydroxylated silica were synthesized from TaMe5 (Me = methyl) and dimeric Ta2(OMe)10 with guidance by the principles of surface organometallic chemistry (SOMC). Characterization of the supported precursors and the supported nanoparticles formed from them was carried out by IR, NMR, UV-Vis, extended X-ray absorption fine structure, and X-ray photoelectron spectroscopies complemented with XRD and high-resolution TEM, with dynamic nuclear polarization surface enhanced NMR spectroscopy being especially helpful by providing enhanced intensities of the signals of 1H, 13C, 29Si, and 15N at their natural abundances. The characterization data provide details of the synthesis chemistry, including evidence of (a) O2 insertion into Ta-CH3 species on the support and (b) a binuclear to mononuclear transformation of species formed from Ta2(OMe)10 on the support. A catalytic test reaction, cyclooctene epoxidation, was used to probe the supported nanoparticles, with 30% H2O2 serving as the oxidant. The catalysts gave selectivities up to 98% for the epoxide at conversions as high as 99% with a 3.4 wt% loading of Ta present as Ta x N y /TaO x N y .

Structural properties and corrosion resistance of tantalum nitride coatings produced by reactive DC magnetron sputtering

There is a correlation between the corrosion resistance, structure, roughness and the porosity of TaN sputtered films.