Structural, morphological, optical, and photoluminescence properties of nanocrystalline PbS thin films grown by chemical bath deposition

Annealing Effect on the Structure and Optical Properties of CBD-ZnS Thin Films for Windscreen Coating

Zinc sulfide (ZnS) thin films were prepared and synthesized by the chemical bath deposition (CBD) technique on microscopic glass substrates using stoichiometric amounts of the precursor materials (ZnSO₄·7H₂O, NH₄OH, and CS(NH₂)₂). Structural, morphological, compositional, and optical characterization of the films were studied. The obtained thin films were found to exhibit polycrystalline possessions. The effect of annealing temperature on the crystallographic structure and optical bandgap of ZnS thin films were both examined. The grain size and unit cell volume were both found to be increased. In addition, the strain, dislocation density, and the number of crystallites were found to be decreased with annealing temperature at 300 °C. However, the annealed sample was perceived to have more Zn content than S. The optical characterization reveals that the transmittance was around 76% of the as-deposited thin film and had been decreased to ~50% with the increasing of the annealing temperature. At the same time, the bandgap energy of the as-deposited film was 3.98 eV and was found to be decreased to 3.93 eV after annealing.

Enhancement of photosensitivity of thermally evaporated crystalline PbS thin films by low energy oxygen ions implantation

This study presents the effect of low energy (120 KeV) O-ions implantation on the photosensitivity of PbS thin films by vacuum thermal evaporator (VTE). The crystallite size (D) of PbS films decreased from 32.8 nm to 17.4 nm and the bandgap (E g) increased from 1.61 eV to 1.76 eV as the fluence increased from 0.5 × 1016 ions cm−2 to 1.5 × 1016 ions cm−2. The PL spectra of O-ions implanted PbS thin films showed a dominant peak at 381 nm regardless the fluence of implantation. The photocurrent sharply increased by the implantation of O-ions (0.5 × 1016 ions cm−2) due to the creation of ‘shallow traps’ in the forbidden gap of PbS thin films under illumination of visible light (100 mW cm−2). The highest photosensitivity of O-ions implanted PbS thin films was observed due to the creation of proper traps for the photoconduction for the particular dose of 0.5 × 1016 ions cm−2.