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Lee S, Park GM, Kim Y, Lee SH, Jung SJ, Hong J, Kim SC, Won SO, Lee AS, Chung YJ, Kim JY, Kim H, Baek SH, Kim JS, Park TJ, Kim SK. Unlocking the Potential of Porous Bi 2Te 3-Based Thermoelectrics Using Precise Interface Engineering through Atomic Layer Deposition. ACS APPLIED MATERIALS & INTERFACES 2024; 16:17683-17691. [PMID: 38531014 DOI: 10.1021/acsami.4c01946] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 03/28/2024]
Abstract
Porous thermoelectric materials offer exciting prospects for improving the thermoelectric performance by significantly reducing the thermal conductivity. Nevertheless, porous structures are affected by issues, including restricted enhancements in performance attributed to decreased electronic conductivity and degraded mechanical strength. This study introduces an innovative strategy for overcoming these challenges using porous Bi0.4Sb1.6Te3 (BST) by combining porous structuring and interface engineering via atomic layer deposition (ALD). Porous BST powder was produced by selectively dissolving KCl in a milled mixture of BST and KCl; the interfaces were engineered by coating ZnO films through ALD. This novel architecture remarkably reduced the thermal conductivity owing to the presence of several nanopores and ZnO/BST heterointerfaces, promoting efficient phonon scattering. Additionally, the ZnO coating mitigated the high resistivity associated with the porous structure, resulting in an improved power factor. Consequently, the ZnO-coated porous BST demonstrated a remarkable enhancement in thermoelectric efficiency, with a maximum zT of approximately 1.53 in the temperature range of 333-353 K, and a zT of 1.44 at 298 K. Furthermore, this approach plays a significant role in enhancing the mechanical strength, effectively mitigating a critical limitation of porous structures. These findings open new avenues for the development of advanced porous thermoelectric materials and highlight their potential for precise interface engineering through the ALD.
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Affiliation(s)
- Seunghyeok Lee
- Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea
- Department of Materials Science and Chemical Engineering, Hanyang University, Ansan 15588, South Korea
| | - Gwang Min Park
- Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea
- KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul 02841, South Korea
| | - Younghoon Kim
- Graduate School of Materials and Devices, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, South Korea
| | - So-Hyeon Lee
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, South Korea
| | - Sung-Jin Jung
- Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea
| | - Junpyo Hong
- Materials Architecturing Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea
- Convergence Research Center for Solutions to Electromagnetic Interference in Future-Mobility, Korea Institute of Science and Technology, Seoul 02792, South Korea
| | - Sung-Chul Kim
- Advanced Analysis and Data Center, Korea Institute of Science and Technology, Seoul 02792, South Korea
| | - Sung Ok Won
- Advanced Analysis and Data Center, Korea Institute of Science and Technology, Seoul 02792, South Korea
| | - Albert S Lee
- Materials Architecturing Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea
- Convergence Research Center for Solutions to Electromagnetic Interference in Future-Mobility, Korea Institute of Science and Technology, Seoul 02792, South Korea
| | - Yoon Jang Chung
- Department of Chemical and Biological Engineering, Korea University, Seoul 02841, South Korea
| | - Ju-Young Kim
- Graduate School of Materials and Devices, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, South Korea
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, South Korea
| | - Heesuk Kim
- Soft Hybrid Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea
| | - Seung-Hyub Baek
- Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea
| | - Jin-Sang Kim
- Institute of Advanced Composite Materials, Korea Institute of Science and Technology, Wanju 55324, South Korea
| | - Tae Joo Park
- Department of Materials Science and Chemical Engineering, Hanyang University, Ansan 15588, South Korea
| | - Seong Keun Kim
- Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea
- KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul 02841, South Korea
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Zhang J, Wei P, Zhang H, Li L, Zhu W, Nie X, Zhao W, Zhang Q. Enhanced Contact Performance and Thermal Tolerance of Ni/Bi 2Te 3 Joints for Bi 2Te 3-Based Thermoelectric Devices. ACS APPLIED MATERIALS & INTERFACES 2023; 15:22705-22713. [PMID: 37126364 DOI: 10.1021/acsami.3c01904] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/11/2023]
Abstract
Ni metal has been widely used as a barrier layer in Bi2Te3-based thermoelectric devices, which establishes stable joints to link Bi2Te3-based legs and electrodes. However, the Ni/Bi2Te3 joints become very fragile when the devices were exposed to high temperature, causing severe performance deterioration and even device failure. Herein, stable Ni/Bi2Te3 joints have been established by arc spraying of the Ni barrier layer on the Bi2Te3-based alloys. The interface microstructure and contact performance including the bonding strength and contact resistivity of the arc-sprayed Ni/Bi2Te3 joints are investigated. The results indicate that, as compared with traditional Ni/Bi2Te3 joints, the arc-sprayed Ni/Bi2Te3 joints have comparably low contact resistivity while possessing a 50% higher bonding strength. Aging the joints as an exposure to high-temperature circumstances, the arc-sprayed Ni/Bi2Te3 joints exhibit much better tolerance to the thermal shock with stable bonding strength and contact resistivity. The enhanced interfacial contact performance and thermal tolerance should be attributed to the thick Ni barrier layer and interface reaction layer with good Ohmic contact. This work provides an effective strategy to establish stable joints for the Bi2Te3-based thermoelectric devices with improved thermal stability.
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Affiliation(s)
- Jianqiang Zhang
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China
| | - Ping Wei
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China
- Foshan Xianhu Laboratory of the Advanced Energy Science and Technology Guangdong Laboratory, Foshan 528000, China
| | - Huiqiang Zhang
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China
| | - Longzhou Li
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China
| | - Wanting Zhu
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China
| | - Xiaolei Nie
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China
| | - Wenyu Zhao
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China
- Foshan Xianhu Laboratory of the Advanced Energy Science and Technology Guangdong Laboratory, Foshan 528000, China
| | - Qingjie Zhang
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China
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Carrier Modulation in Bi2Te3-Based Alloys via Interfacial Doping with Atomic Layer Deposition. COATINGS 2020. [DOI: 10.3390/coatings10060572] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
Abstract
The carrier concentration in Bi2Te3-based alloys is a decisive factor in determining their thermoelectric performance. Herein, we propose a novel approach to modulate the carrier concentration via the encapsulation of the alloy precursor powders. Atomic layer deposition (ALD) of ZnO and SnO2 was performed over the Bi2Te2.7Se0.3 powders. After spark plasma sintering at 500 °C for 20 min, the carrier concentration in the ZnO-coated samples decreased, while the carrier concentration in the SnO2-coated samples increased. This trend was more pronounced as the number of ALD cycles increased. This was attributed to the intermixing of the metal ions at the interface. Zn2+ substituted for Bi3+ at the interface acted as an acceptor, while Sn4+ substituted for Bi3+ acted as a donor. This indicates that the carrier concentration can be adjusted depending on the materials deposited with ALD. The use of fine powders changes the carrier concentration more strongly, because the quantity of material deposited increases with the effective surface area. Therefore, the proposed approach would provide opportunities to precisely optimize the carrier concentration for high thermoelectric performance.
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