1
|
Ying H, Xie K, Cai H, Li Z, Liu L, Guo X, An M, Shang H, Zheng X. Multifunctional Logic-in-Memory Circuits Based on Reconfigurable WSe 2 Transistors via Enhanced Ambipolarity. ACS NANO 2025; 19:19442-19453. [PMID: 40374270 DOI: 10.1021/acsnano.5c04420] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/17/2025]
Abstract
Ambipolar two-dimensional semiconductors exhibit electrostatically modulable carrier polarity, enabling reconfigurable electronic functionalities critical for the development of logic-in-memory computing architectures. However, the ambipolar conduction is generally weak and unbalanced, in particular, under ambient operating conditions. Here, we develop a universal nonvolatile and reconfigurable device architecture based on tungsten diselenide (WSe2) and delicately enhance its ambipolar transport via scanning probe lithography, demonstrating on/off current ratios approaching 1010 for both electron and hole conductions. By integrating floating-gate architecture and split-gate control, the WSe2 device can be configured into memory, transistor, and diode modes and perform reconfigurable linear and nonlinear logic operations with only one device, such as NAND, AND, OR, NOR, XOR, and XNOR circuits. Eventually, we realize operational logic-in-memory circuits by integrating our WSe2 devices on a printed circuit board, demonstrating reliable half adder and parity-checker circuit operations under ambient conditions.
Collapse
Affiliation(s)
- Haoting Ying
- Zhejiang University, Hangzhou, Zhejiang 310027, China
- Zhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, School of Engineering, Westlake University, Hangzhou, Zhejiang 310030, China
| | - Kanghao Xie
- Zhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, School of Engineering, Westlake University, Hangzhou, Zhejiang 310030, China
| | - Hecheng Cai
- Zhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, School of Engineering, Westlake University, Hangzhou, Zhejiang 310030, China
| | - Zishun Li
- Zhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, School of Engineering, Westlake University, Hangzhou, Zhejiang 310030, China
| | - Lin Liu
- Westlake Institute for Optoelectronics, Fuyang, Hangzhou, Zhejiang 311421, China
| | - Xudong Guo
- Westlake Institute for Optoelectronics, Fuyang, Hangzhou, Zhejiang 311421, China
| | - Minghao An
- Zhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, School of Engineering, Westlake University, Hangzhou, Zhejiang 310030, China
| | - Hongpeng Shang
- Zhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, School of Engineering, Westlake University, Hangzhou, Zhejiang 310030, China
| | - Xiaorui Zheng
- Zhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, School of Engineering, Westlake University, Hangzhou, Zhejiang 310030, China
- Westlake Institute for Optoelectronics, Fuyang, Hangzhou, Zhejiang 311421, China
- Research Center for Industries of the Future, Westlake University, Hangzhou, Zhejiang 310030, China
| |
Collapse
|
2
|
Kang J, Lee H, Tunga A, Xu X, Lin Y, Zhao Z, Ryu H, Tsai CC, Taniguchi T, Watanabe K, Rakheja S, Zhu W. Non-Volatile Reconfigurable Four-Mode van der Waals Transistors and Transformable Logic Circuits. ACS NANO 2025; 19:12948-12959. [PMID: 40145302 DOI: 10.1021/acsnano.4c16862] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 03/28/2025]
Abstract
Emerging applications in data-intensive computing and circuit security demand logic circuits with high functional density, reconfigurability, and energy efficiency. Here, we demonstrate nonvolatile reconfigurable four-mode field-effect transistors (NVR4M-FETs) based on two-dimensional (2D) MoTe2 and CuInP2S6 (CIPS), offering both polarity switching and threshold voltage modulation. The device exploits the ferroelectric polarization of CIPS at the source/drain regions to achieve dynamic control over the transistor polarity, enabling transitions between n-type and p-type states through polarization-induced local electrostatic doping. Additionally, multilayer graphene floating gates are incorporated to modulate the threshold voltage, yielding four distinct nonvolatile operating modes: n-type logic, p-type logic, always-on memory, and always-off memory. Leveraging the four-mode property, the NVR4M-FET can function as a one-transistor-per-bit ternary content-addressable memory (TCAM). In addition, we demonstrate the construction of transformable logic gates with 14 distinct logic functions using two NVR4M-FETs and a reconfigurable half a dder/subtractor using three NVR4M-FETs integrated with load resistors. Furthermore, we show that a 2-input look-up table can be achieved with eight NVR4M-FETs compared to 12 transistors using reconfigurable transistors, highlighting the potential of NVR4M-FETs for high-density logic circuits. These results underscore the potential of NVR4M-FETs as essential building blocks for energy-efficient, in-memory computing, and secure hardware applications.
Collapse
Affiliation(s)
- Junzhe Kang
- Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Hanwool Lee
- Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Ashwin Tunga
- Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Xiaotong Xu
- Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Ye Lin
- Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Zijing Zhao
- Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Hojoon Ryu
- Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Chun-Chia Tsai
- Department of Materials Science and Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Takashi Taniguchi
- Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Kenji Watanabe
- Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Shaloo Rakheja
- Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Wenjuan Zhu
- Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| |
Collapse
|
3
|
Wen Z, Chen J, Zhang Q, Wang G, Wang X, Yang F, Liu Q, Luo X, Liu F. 2D Van Der Waals Ferroelectric Materials and Devices for Neuromorphic Computing. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2025:e2412761. [PMID: 40123312 DOI: 10.1002/smll.202412761] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/29/2024] [Revised: 02/10/2025] [Indexed: 03/25/2025]
Abstract
2D van der Waals (vdW) ferroelectric materials are emerging as transformative components in modern electronics and neuromorphic computing. The atomic-scale thickness, coupled with robust ferroelectric properties and seamless integration into vdW engineering, offers unprecedented opportunities for the development of high-performance and low-power devices. Notably, 2D ferroelectric devices excel in enabling multistate storage and neuromorphic functionalities in emulating synapses or retinas, positioning them as prime candidates for next-generation in-sensor-and-memory units. Despite ongoing challenges such as scalability, material stability, and uniformity, rapid interdisciplinary advancements and advancing nanofabrication processes are driving the field forward. This review delves into the fundamental principles of 2D ferroelectricity, highlights typical materials, and examines key device structures along with their applications in non-von Neumann architecture development and neuromorphic computing. By providing an in-depth overview, this work underscores the potential of 2D ferroelectric materials to revolutionize the future of electronics.
Collapse
Affiliation(s)
- Zhixing Wen
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou, 313001, China
| | - Jiangang Chen
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Qirui Zhang
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Ge Wang
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Xuemei Wang
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Fan Yang
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Qing Liu
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Xiao Luo
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
| | - Fucai Liu
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu, 611731, China
- State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, 611731, China
| |
Collapse
|
4
|
Yan C, Liu H, Yu H, Yang H. Gate-tunable photodetectors based on MoTe 2/MoS 2heterostructures anti-ambipolar transistors. NANOTECHNOLOGY 2025; 36:135202. [PMID: 39808835 DOI: 10.1088/1361-6528/ada9f3] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/23/2024] [Accepted: 01/14/2025] [Indexed: 01/16/2025]
Abstract
Anti-ambipolar transistors (AATs) are considered as a breakthrough technology in the field of electronics and optoelectronics, which is not only widely used in diverse logic circuits, but also crucial for the realization of high-performance photodetectors. The anti-ambipolar characteristics arising from the gate-tunable energy band structure can produce high-performance photodetection at different gate voltages. As a result, this places higher demands on the parametric driving range (ΔVg) and peak-to-valley ratio (PVR) of the AAT. Here, we demonstrate a high-performance photodetector with anti-ambipolar properties based on a van der Waals heterojunction of MoTe2/MoS2. Flexible modulation of carrier concentration and transport by gate voltage achieves a driving voltage range ΔVgas high as 38.4 V and a PVR of 1.6 × 102. Most importantly, MoTe2/MoS2exhibits a pronounced gate-tunable photoresponse, which is attributed to the modulation of photogenerated carrier transport by gate voltage. The MoTe2/MoS2heterojunction photodetector exhibits excellent performance, including an impressive responsivity of 17 A W-1, a high detectivity of 4.2 × 1011cm Hz1/2W-1, an elevated external quantum efficiency of 4 × 103%, and a fast response time of 21 ms. Gate-tunable photodetectors based on MoTe2/MoS2heterostructures AAT have potential to realize optoelectronic devices with high performance, providing a novel strategy to achieve high-performance photodetection.
Collapse
Affiliation(s)
- Cong Yan
- Key Laboratory for Wide-Band Gap Semiconductor Materials and Devices of Education, The School of Microelectronics, Xidian University, Xi'an 710071, People's Republic of China
| | - Hongxia Liu
- Key Laboratory for Wide-Band Gap Semiconductor Materials and Devices of Education, The School of Microelectronics, Xidian University, Xi'an 710071, People's Republic of China
| | - Hao Yu
- Key Laboratory for Wide-Band Gap Semiconductor Materials and Devices of Education, The School of Microelectronics, Xidian University, Xi'an 710071, People's Republic of China
| | - Hangtian Yang
- Key Laboratory for Wide-Band Gap Semiconductor Materials and Devices of Education, The School of Microelectronics, Xidian University, Xi'an 710071, People's Republic of China
| |
Collapse
|
5
|
Liao C, Zhang M, Jiang Y, Zhang S, Li X, Yu L, Song X, Liu K, Wang D, Wang J, Xia C. A reconfigurable memristor diode based on a CuInP 2S 6/graphene lateral heterojunction. NANOSCALE 2025; 17:2011-2019. [PMID: 39641375 DOI: 10.1039/d4nr03400g] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/07/2024]
Abstract
The conventional reconfiguration of transistors requires an additional independent terminal for controllable gate input, which complicates the device structure and makes circuit integration difficult. In this work, we propose a reconfigurable diode based on a 2D layered copper indium thiophosphate (CIPS) and graphene (Gr) van der Waals lateral heterojunction, exhibiting distinctively bias-dependent reconfiguration. The reconfiguration characteristics include reversible memristive behaviors with a current on/off ratio of about 103 and switchable rectifying polarity with a rectifying ratio of up to 3 × 103. This reconfigurable mechanism arises from the lateral bias-induced migration of Cu+ ions, effectively modulating the barrier height at the CIPS and Gr interface. This work provides a simplified reconfigurable solution for electrostatically modulated circuits.
Collapse
Affiliation(s)
- Chuanzheng Liao
- School of Physics, Henan Key Laboratory of Advanced Semiconductor & Functional Device Integration, Henan Normal University, Xinxiang, 453007, China.
| | - Mengyao Zhang
- School of Physics, Henan Key Laboratory of Advanced Semiconductor & Functional Device Integration, Henan Normal University, Xinxiang, 453007, China.
| | - Yurong Jiang
- School of Physics, Henan Key Laboratory of Advanced Semiconductor & Functional Device Integration, Henan Normal University, Xinxiang, 453007, China.
| | - Suicai Zhang
- School of Physics, Henan Key Laboratory of Advanced Semiconductor & Functional Device Integration, Henan Normal University, Xinxiang, 453007, China.
| | - Xueping Li
- School of Physics, Henan Key Laboratory of Advanced Semiconductor & Functional Device Integration, Henan Normal University, Xinxiang, 453007, China.
| | - Leiming Yu
- School of Physics, Henan Key Laboratory of Advanced Semiconductor & Functional Device Integration, Henan Normal University, Xinxiang, 453007, China.
| | - Xiaohui Song
- School of Physics, Henan Key Laboratory of Advanced Semiconductor & Functional Device Integration, Henan Normal University, Xinxiang, 453007, China.
| | - Kang Liu
- Institute of Physics, Henan Academy of Sciences, Zhengzhou 450046, China.
| | - Ding Wang
- Institute of Physics, Henan Academy of Sciences, Zhengzhou 450046, China.
| | - Jianye Wang
- Institute of Physics, Henan Academy of Sciences, Zhengzhou 450046, China.
| | - Congxin Xia
- School of Physics, Henan Key Laboratory of Advanced Semiconductor & Functional Device Integration, Henan Normal University, Xinxiang, 453007, China.
| |
Collapse
|
6
|
Guo T, Pan Z, Li J, Sa Z, Wang X, Shen Y, Yang J, Chen C, Zhao T, Li Z, Chen X, Yang ZX, Zhu G, Huo N, Song X, Zhang S, Zeng H. Reconfigurable Phototransistors Driven by Gate-Dependent Carrier Modulation in WSe 2/Ta 2NiSe 5 van der Waals Heterojunctions. ACS NANO 2025; 19:1302-1315. [PMID: 39716419 DOI: 10.1021/acsnano.4c13679] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/25/2024]
Abstract
Reconfigurable field-effect transistors (RFETs) offer notable benefits on electronic and optoelectronic logic circuits, surpassing the integration, flexibility, and cost-efficiency of conventional complementary metal-oxide semiconductor transistors. The low on/off current ratio of these transistors remains a considerable impediment in the practical application of RFETs. To overcome these limitations, a van der Waals heterojunction (vdWH) transistor composed of WSe2/Ta2NiSe5 has been proposed. By modulating a single back-gate voltage and source-drain voltage inputs, the transistor achieves a switchable polarity configuration and bidirectional rectification, making it capable of functioning as a gate-controlled bidirectional half-wave rectifier. The proposed RFET exhibits tunable positive/negative photovoltaic responses, advanced optoelectronic performance, and a gate-voltage-dependent reversal of the photodetector position. Detailed energy band diagram studies have shown that the reconfigurability of the device arises from carrier blockage resulting from the type-I band structure and carrier injection modulated by gate-dependent Schottky barriers. Consequently, the reconfigurable WSe2/Ta2NiSe5 vdWH holds significant promise for advanced multifunctional optoelectronic device applications.
Collapse
Affiliation(s)
- Tingting Guo
- MIIT Key Laboratory of Advanced Display Materials and Devices, Jiangsu Engineering Research Center for Quantum Dot Display, School of Materials Science and Engineering, Institute of Optoelectronics & Nanomaterials, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, China
| | - Zhidong Pan
- School of Semiconductor Science and Technology, South China Normal University, Foshan 528225, China
| | - Jing Li
- MIIT Key Laboratory of Advanced Display Materials and Devices, Jiangsu Engineering Research Center for Quantum Dot Display, School of Materials Science and Engineering, Institute of Optoelectronics & Nanomaterials, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, China
| | - Zixu Sa
- School of Physics, Shandong University, Jinan 250100, China
| | - Xusheng Wang
- MIIT Key Laboratory of Advanced Display Materials and Devices, Jiangsu Engineering Research Center for Quantum Dot Display, School of Materials Science and Engineering, Institute of Optoelectronics & Nanomaterials, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, China
| | - Yehui Shen
- College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing 210023, PR China
| | - Jialin Yang
- MIIT Key Laboratory of Advanced Display Materials and Devices, Jiangsu Engineering Research Center for Quantum Dot Display, School of Materials Science and Engineering, Institute of Optoelectronics & Nanomaterials, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, China
| | - Chuyao Chen
- MIIT Key Laboratory of Advanced Display Materials and Devices, Jiangsu Engineering Research Center for Quantum Dot Display, School of Materials Science and Engineering, Institute of Optoelectronics & Nanomaterials, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, China
| | - Tong Zhao
- MIIT Key Laboratory of Advanced Display Materials and Devices, Jiangsu Engineering Research Center for Quantum Dot Display, School of Materials Science and Engineering, Institute of Optoelectronics & Nanomaterials, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, China
| | - Zhi Li
- MIIT Key Laboratory of Advanced Display Materials and Devices, Jiangsu Engineering Research Center for Quantum Dot Display, School of Materials Science and Engineering, Institute of Optoelectronics & Nanomaterials, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, China
| | - Xiang Chen
- MIIT Key Laboratory of Advanced Display Materials and Devices, Jiangsu Engineering Research Center for Quantum Dot Display, School of Materials Science and Engineering, Institute of Optoelectronics & Nanomaterials, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, China
| | - Zai-Xing Yang
- School of Physics, Shandong University, Jinan 250100, China
| | - Gangyi Zhu
- College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing 210023, PR China
| | - Nengjie Huo
- School of Semiconductor Science and Technology, South China Normal University, Foshan 528225, China
| | - Xiufeng Song
- MIIT Key Laboratory of Advanced Display Materials and Devices, Jiangsu Engineering Research Center for Quantum Dot Display, School of Materials Science and Engineering, Institute of Optoelectronics & Nanomaterials, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, China
| | - Shengli Zhang
- MIIT Key Laboratory of Advanced Display Materials and Devices, Jiangsu Engineering Research Center for Quantum Dot Display, School of Materials Science and Engineering, Institute of Optoelectronics & Nanomaterials, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, China
| | - Haibo Zeng
- MIIT Key Laboratory of Advanced Display Materials and Devices, Jiangsu Engineering Research Center for Quantum Dot Display, School of Materials Science and Engineering, Institute of Optoelectronics & Nanomaterials, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, China
| |
Collapse
|
7
|
Ghoshal D, Paul G, Sagar S, Shank C, Hurley LA, Hooper N, Tan J, Burns K, Hachtel JA, Ferguson AJ, Blackburn JL, van de Lagemaat J, Miller EM. Spatially Precise Light-Activated Dedoping in Wafer-Scale MoS 2 Films. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2025; 37:e2409825. [PMID: 39443831 PMCID: PMC11756039 DOI: 10.1002/adma.202409825] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/08/2024] [Revised: 10/09/2024] [Indexed: 10/25/2024]
Abstract
2D materials, particularly transition metal dichalcogenides (TMDCs), have shown great potential for microelectronics and optoelectronics. However, a major challenge in commercializing these materials is the inability to control their doping at a wafer scale with high spatial fidelity. Interface chemistry is used with the underlying substrate oxide and concomitant exposure to visible light in ambient conditions for photo-dedoping wafer scale MoS2. It is hypothesized that the oxide layer traps photoexcited holes, leaving behind long-lived electrons that become available for surface reactions with ambient air at sulfur vacancies (defect sites) resulting in dedoping. Additionally, high fidelity spatial control is showcased over the dedoping process, by laser writing, and fine control achieved over the degree of doping by modulating the illumination time and power density. This localized change in MoS2 doping density is very stable (at least 7 days) and robust to processing conditions like high temperature and vacuum. The scalability and ease of implementation of this approach can address one of the major issues preventing the "Lab to Fab" transition of 2D materials and facilitate its seamless integration for commercial applications in multi-logic devices, inverters, and other optoelectronic devices.
Collapse
Affiliation(s)
- Debjit Ghoshal
- Materials, Chemistry, and Computational Sciences DirectorateNational Renewable Energy LaboratoryGoldenCO80401USA
| | - Goutam Paul
- Materials, Chemistry, and Computational Sciences DirectorateNational Renewable Energy LaboratoryGoldenCO80401USA
| | - Srikrishna Sagar
- Materials, Chemistry, and Computational Sciences DirectorateNational Renewable Energy LaboratoryGoldenCO80401USA
| | - Cole Shank
- Materials, Chemistry, and Computational Sciences DirectorateNational Renewable Energy LaboratoryGoldenCO80401USA
| | - Lauren A. Hurley
- Renewable & Sustainable Energy Institute (RASEI)BoulderCO80303USA
- Electrical, Computer and Energy EngineeringUniversity of Colorado BoulderBoulderCO80309USA
| | - Nina Hooper
- Materials, Chemistry, and Computational Sciences DirectorateNational Renewable Energy LaboratoryGoldenCO80401USA
| | - Jeiwan Tan
- Materials, Chemistry, and Computational Sciences DirectorateNational Renewable Energy LaboratoryGoldenCO80401USA
| | - Kory Burns
- Department of Materials Science and EngineeringUniversity of VirginiaCharlottesvilleVA22904USA
| | - Jordan A. Hachtel
- Center for Nanophase Materials SciencesOak Ridge National LaboratoryOak RidgeTN37830USA
| | - Andrew J. Ferguson
- Materials, Chemistry, and Computational Sciences DirectorateNational Renewable Energy LaboratoryGoldenCO80401USA
| | - Jeffrey L. Blackburn
- Materials, Chemistry, and Computational Sciences DirectorateNational Renewable Energy LaboratoryGoldenCO80401USA
| | - Jao van de Lagemaat
- Materials, Chemistry, and Computational Sciences DirectorateNational Renewable Energy LaboratoryGoldenCO80401USA
- Renewable & Sustainable Energy Institute (RASEI)BoulderCO80303USA
| | - Elisa M. Miller
- Materials, Chemistry, and Computational Sciences DirectorateNational Renewable Energy LaboratoryGoldenCO80401USA
- Renewable & Sustainable Energy Institute (RASEI)BoulderCO80303USA
| |
Collapse
|
8
|
Chen C, Zhou Y, Tong L, Pang Y, Xu J. Emerging 2D Ferroelectric Devices for In-Sensor and In-Memory Computing. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2025; 37:e2400332. [PMID: 38739927 PMCID: PMC11733831 DOI: 10.1002/adma.202400332] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/08/2024] [Revised: 04/19/2024] [Indexed: 05/16/2024]
Abstract
The quantity of sensor nodes within current computing systems is rapidly increasing in tandem with the sensing data. The presence of a bottleneck in data transmission between the sensors, computing, and memory units obstructs the system's efficiency and speed. To minimize the latency of data transmission between units, novel in-memory and in-sensor computing architectures are proposed as alternatives to the conventional von Neumann architecture, aiming for data-intensive sensing and computing applications. The integration of 2D materials and 2D ferroelectric materials has been expected to build these novel sensing and computing architectures due to the dangling-bond-free surface, ultra-fast polarization flipping, and ultra-low power consumption of the 2D ferroelectrics. Here, the recent progress of 2D ferroelectric devices for in-sensing and in-memory neuromorphic computing is reviewed. Experimental and theoretical progresses on 2D ferroelectric devices, including passive ferroelectrics-integrated 2D devices and active ferroelectrics-integrated 2D devices, are reviewed followed by the integration of perception, memory, and computing application. Notably, 2D ferroelectric devices have been used to simulate synaptic weights, neuronal model functions, and neural networks for image processing. As an emerging device configuration, 2D ferroelectric devices have the potential to expand into the sensor-memory and computing integration application field, leading to new possibilities for modern electronics.
Collapse
Affiliation(s)
- Chunsheng Chen
- Department of Electronic Engineering and Materials Science and Technology Research CenterThe Chinese University of Hong KongHong Kong SARChina
| | - Yaoqiang Zhou
- Department of Electronic Engineering and Materials Science and Technology Research CenterThe Chinese University of Hong KongHong Kong SARChina
| | - Lei Tong
- Department of Electronic Engineering and Materials Science and Technology Research CenterThe Chinese University of Hong KongHong Kong SARChina
| | - Yue Pang
- Department of Electronic Engineering and Materials Science and Technology Research CenterThe Chinese University of Hong KongHong Kong SARChina
| | - Jianbin Xu
- Department of Electronic Engineering and Materials Science and Technology Research CenterThe Chinese University of Hong KongHong Kong SARChina
| |
Collapse
|
9
|
Kim M, Yeom D, Seok Y, Song J, Jang H, Choi Y, Ko Y, Watanabe K, Taniguchi T, Lee K. Superior P-Type Switching in InSe Nanosheets for Complementary Multifunctional Systems. NANO LETTERS 2024; 24:16090-16098. [PMID: 39585920 DOI: 10.1021/acs.nanolett.4c04624] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/27/2024]
Abstract
van der Waals (vdW) indium selenide (InSe) is receiving attention for its exceptional electron mobility and moderate band gap, enabling various applications. However, the intrinsic n-type behavior of InSe has restricted its use predominantly to n-type devices, constraining its application in complementary integrated microsystems. Here, we show superior ambipolar InSe transistors with vdW bottom contacts, achieving impressive p-type on/off current ratios greater than 109 and Schottky barrier heights approaching the ideal Schottky-Mott limit. By introducing a partially gate-coupled architecture, we also demonstrate an ambipolar-to-unipolar transition and reconfigurable complementary multifunctionality, including n-type and p-type transistors as well as negative and positive rectifiers and breakdown diodes. The rectification polarity and ratio are gate-tunable from 3.5 × 107 down to ∼10 without complex heterostructures, chemical doping, and multigate layouts. The negative and positive breakdowns are reversible, with both the breakdown voltage and switching ratio, which can exceed 108, also being electrically tunable.
Collapse
Affiliation(s)
- Minsu Kim
- School of Electrical Engineering, Korea Advanced Institute of Science & Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Dongju Yeom
- School of Electrical Engineering, Korea Advanced Institute of Science & Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Yongwook Seok
- School of Electrical Engineering, Korea Advanced Institute of Science & Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Jungi Song
- School of Electrical Engineering, Korea Advanced Institute of Science & Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Hanbyeol Jang
- School of Materials Science and Engineering, Gwangju Institute of Science & Technology (GIST), Gwangju 61005, Republic of Korea
- Samsung Semiconductor R&D Center, Yongin 17113, Republic of Korea
| | - YiTaek Choi
- School of Materials Science and Engineering, Gwangju Institute of Science & Technology (GIST), Gwangju 61005, Republic of Korea
- Samsung Semiconductor R&D Center, Yongin 17113, Republic of Korea
| | - Yeonghyeon Ko
- School of Electrical Engineering, Korea Advanced Institute of Science & Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Kenji Watanabe
- Research Center for Electronic and Optical Materials, National Institute for Materials Science, Tsukuba 305-0044, Japan
| | - Takashi Taniguchi
- International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba 305-0044, Japan
| | - Kayoung Lee
- School of Electrical Engineering, Korea Advanced Institute of Science & Technology (KAIST), Daejeon 34141, Republic of Korea
| |
Collapse
|
10
|
Pan J, Wu F, Wang Z, Liu S, Guo P, Yin J, Zhao B, Tian H, Yang Y, Ren TL. Multibarrier Collaborative Modulation Devices with Ultra-High Logic Operation Density. ACS NANO 2024; 18:28189-28197. [PMID: 39361333 DOI: 10.1021/acsnano.4c08009] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/16/2024]
Abstract
The demands for highly miniaturized and multifunctional electronics are rapidly increasing. As scaling-down processes of transistors are restricted by physical limits, reconfigurable electronics with switchable operation functions for different tasks are developed for higher function integration based on split- or vertical-dual-gate structures. To promote the present reconfigurable electronics and exceed the function integration limit, the critical issue is to integrate complex operations into simple circuit forms by establishing more control dimensions. This work proposes a multibarrier collaborative (MBC) modulation architecture to increase the control dimension by multiple forms of potential barriers and achieves combinational and reconfigurable logic operations by a single MBC device. The MBC architecture exhibits ultrahigh logic operation density, including 58.8% area reduction for multiplexer operations and 71.4% area reduction for 4-logic reconfigurable operations. Besides, a hardware security module composed of 4 MBC devices implementing 8 types of logic operations is demonstrated. This work reveals an effective design of function integration for next-generation electronics.
Collapse
Affiliation(s)
- Jiong Pan
- School of Integrated Circuits, Tsinghua University, 100084 Beijing, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, 100084 Beijing, China
| | - Fan Wu
- School of Integrated Circuits, Tsinghua University, 100084 Beijing, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, 100084 Beijing, China
| | - Zeda Wang
- School of Integrated Circuits, Tsinghua University, 100084 Beijing, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, 100084 Beijing, China
| | - Shangjian Liu
- School of Integrated Circuits, Tsinghua University, 100084 Beijing, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, 100084 Beijing, China
| | - Pengwen Guo
- School of Integrated Circuits, Tsinghua University, 100084 Beijing, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, 100084 Beijing, China
| | - Jiaju Yin
- School of Integrated Circuits, Tsinghua University, 100084 Beijing, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, 100084 Beijing, China
| | - Bingchen Zhao
- School of Integrated Circuits, Tsinghua University, 100084 Beijing, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, 100084 Beijing, China
| | - He Tian
- School of Integrated Circuits, Tsinghua University, 100084 Beijing, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, 100084 Beijing, China
| | - Yi Yang
- School of Integrated Circuits, Tsinghua University, 100084 Beijing, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, 100084 Beijing, China
| | - Tian-Ling Ren
- School of Integrated Circuits, Tsinghua University, 100084 Beijing, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, 100084 Beijing, China
| |
Collapse
|
11
|
Guan K, Li Y, Liu L, Sun F, Wang Y, Zheng Z, Zhou W, Zhang C, Cai Z, Wang X, Feng S, Zhang T. Atomic Nb-doping of WS 2 for high-performance synaptic transistors in neuromorphic computing. MICROSYSTEMS & NANOENGINEERING 2024; 10:132. [PMID: 39327437 PMCID: PMC11427458 DOI: 10.1038/s41378-024-00779-1] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/15/2024] [Revised: 07/02/2024] [Accepted: 07/20/2024] [Indexed: 09/28/2024]
Abstract
Owing to the controllable growth and large-area synthesis for high-density integration, interest in employing atomically thin two-dimensional (2D) transition-metal dichalcogenides (TMDCs) for synaptic transistors is increasing. In particular, substitutional doping of 2D materials allows flexible modulation of material physical properties, facilitating precise control in defect engineering for eventual synaptic plasticity. In this study, to increase the switch ratio of synaptic transistors, we selectively performed experiments on WS2 and introduced niobium (Nb) atoms to serve as the channel material. The Nb atoms were substitutionally doped at the W sites, forming a uniform distribution across the entire flakes. The synaptic transistor devices exhibited an improved switch ratio of 103, 100 times larger than that of devices prepared with undoped WS2. The Nb atoms in WS2 play crucial roles in trapping and detrapping electrons. The modulation of channel conductivity achieved through the gate effectively simulates synaptic potentiation, inhibition, and repetitive learning processes. The Nb-WS2 synaptic transistor achieves 92.30% recognition accuracy on the Modified National Institute of Standards and Technology (MNIST) handwritten digit dataset after 125 training iterations. This study's contribution extends to a pragmatic and accessible atomic doping methodology, elucidating the strategies underlying doping techniques for channel materials in synaptic transistors.
Collapse
Affiliation(s)
- Kejie Guan
- i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China
- School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei, Anhui, 230026, China
| | - Yinxiao Li
- i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China
- School of Electronic and Optical Engineering, Nanjing University of Science and Technology, Nanjing, Jiangsu, 210094, China
| | - Lin Liu
- i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China
| | - Fuqin Sun
- i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China
| | - Yingyi Wang
- i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China
- Department of Health and Environmental Sciences, Xi'an Jiaotong-Liverpool University, 111 Renai Road, Suzhou, Jiangsu, 215123, China
| | - Zhuo Zheng
- i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China
| | - Weifan Zhou
- i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China
- School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei, Anhui, 230026, China
| | - Cheng Zhang
- i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China
- Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou, Jiangsu, 215009, China
| | - Zhengyang Cai
- i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China.
- Department of Electronic Engineering, Jiangnan University, Wuxi, Jiangsu, 214122, China.
| | - Xiaowei Wang
- i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China.
- School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei, Anhui, 230026, China.
| | - Simin Feng
- i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China.
- School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei, Anhui, 230026, China.
| | - Ting Zhang
- i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China.
- School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei, Anhui, 230026, China.
- Nano-X Vacuum Interconnected Workstation, Suzhou Institute of Nano-Tech & Nano-Bionics (SINANO), Chinese Academy of Sciences (CAS), Suzhou, Jiangsu, 215123, China.
| |
Collapse
|
12
|
Liu H, Lai Q, Fu J, Zhang S, Fu Z, Zeng H. Reversible flexoelectric domain engineering at the nanoscale in van der Waals ferroelectrics. Nat Commun 2024; 15:4556. [PMID: 38811549 PMCID: PMC11136971 DOI: 10.1038/s41467-024-48892-z] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/17/2024] [Accepted: 05/16/2024] [Indexed: 05/31/2024] Open
Abstract
The universal flexoelectric effect in solids provides a mechanical pathway for controlling electric polarization in ultrathin ferroelectrics, eliminating potential material breakdown from a giant electric field at the nanoscale. One challenge of this approach is arbitrary implementation, which is strongly hindered by one-way switching capability. Here, utilizing the innate flexibility of van der Waals materials, we demonstrate that ferroelectric polarization and domain structures can be mechanically, reversibly, and arbitrarily switched in two-dimensional CuInP2S6 via the nano-tip imprinting technique. The bidirectional flexoelectric control is attributed to the extended tip-induced deformation in two-dimensional systems with innate flexibility at the atomic scale. By employing an elastic substrate, artificial ferroelectric nanodomains with lateral sizes as small as ~80 nm are noninvasively generated in an area of 1 μm2, equal to a density of 31.4 Gbit/in2. Our results highlight the potential applications of van der Waals ferroelectrics in data storage and flexoelectronics.
Collapse
Affiliation(s)
- Heng Liu
- International Center for Quantum Design of Functional Materials (ICQD), Hefei National Research Center for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei, 230026, China
- CAS Key Laboratory of Strongly Coupled Quantum Matter Physics, Department of Physics, University of Science and Technology of China, Hefei, Anhui, 230026, China
- Hefei National Laboratory, University of Science and Technology of China, Hefei, 230088, China
| | - Qinglin Lai
- International Center for Quantum Design of Functional Materials (ICQD), Hefei National Research Center for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei, 230026, China
- CAS Key Laboratory of Strongly Coupled Quantum Matter Physics, Department of Physics, University of Science and Technology of China, Hefei, Anhui, 230026, China
- Hefei National Laboratory, University of Science and Technology of China, Hefei, 230088, China
| | - Jun Fu
- International Center for Quantum Design of Functional Materials (ICQD), Hefei National Research Center for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei, 230026, China
- CAS Key Laboratory of Strongly Coupled Quantum Matter Physics, Department of Physics, University of Science and Technology of China, Hefei, Anhui, 230026, China
- Hefei National Laboratory, University of Science and Technology of China, Hefei, 230088, China
| | - Shijie Zhang
- College of Physics and Electronic Information, Yunnan Normal University, Kunming, 650500, China
- Yunnan Key Laboratory of Opto-Electronic Information Technology, Kunming, 650500, China
| | - Zhaoming Fu
- College of Physics and Electronic Information, Yunnan Normal University, Kunming, 650500, China
- Yunnan Key Laboratory of Opto-Electronic Information Technology, Kunming, 650500, China
| | - Hualing Zeng
- International Center for Quantum Design of Functional Materials (ICQD), Hefei National Research Center for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei, 230026, China.
- CAS Key Laboratory of Strongly Coupled Quantum Matter Physics, Department of Physics, University of Science and Technology of China, Hefei, Anhui, 230026, China.
- Hefei National Laboratory, University of Science and Technology of China, Hefei, 230088, China.
| |
Collapse
|
13
|
Yang J, Cai Y, Wang F, Li S, Zhan X, Xu K, He J, Wang Z. A Reconfigurable Bipolar Image Sensor for High-Efficiency Dynamic Vision Recognition. NANO LETTERS 2024; 24:5862-5869. [PMID: 38709809 DOI: 10.1021/acs.nanolett.4c01190] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/08/2024]
Abstract
Dynamic vision perception and processing (DVPP) is in high demand by booming edge artificial intelligence. However, existing imaging systems suffer from low efficiency or low compatibility with advanced machine vision techniques. Here, we propose a reconfigurable bipolar image sensor (RBIS) for in-sensor DVPP based on a two-dimensional WSe2/GeSe heterostructure device. Owing to the gate-tunable and reversible built-in electric field, its photoresponse shows bipolarity as being positive or negative. High-efficiency DVPP incorporating front-end RBIS and back-end CNN is then demonstrated. It shows a high recognition accuracy of over 94.9% on the derived DVS128 data set and requires much fewer neural network parameters than that without RBIS. Moreover, we demonstrate an optimized device with a vertically stacked structure and a stable nonvolatile bipolarity, which enables more efficient DVPP hardware. Our work demonstrates the potential of fabricating DVPP devices with a simple structure, high efficiency, and outputs compatible with advanced algorithms.
Collapse
Affiliation(s)
- Jia Yang
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Yuchen Cai
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Feng Wang
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Shuhui Li
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China
| | - Xueying Zhan
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China
| | - Kai Xu
- Hangzhou Global Scientific and Technological Innovation Center, School of Micro-Nano Electronics, Zhejiang University, Hangzhou 310027, China
| | - Jun He
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
- Key Laboratory of Artificial Micro- and Nano-structures of Ministry of Education, School of Physics and Technology, Wuhan University, Wuhan 430072, China
| | - Zhenxing Wang
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, National Center for Nanoscience and Technology, Beijing 100190, China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
| |
Collapse
|
14
|
Kim SW, Seo J, Lee S, Shen D, Kim Y, Choi HH, Yoo H, Kim HH. Nonvolatile Reconfigurable Logic Device Based on Photoinduced Interfacial Charge Trapping in van der Waals Gap. ACS APPLIED MATERIALS & INTERFACES 2024; 16:22131-22138. [PMID: 38632927 DOI: 10.1021/acsami.4c01627] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 04/19/2024]
Abstract
Due to the increasing complexity in miniaturization of electronic devices, reconfigurable field-effect transistors (RFETs) have emerged as a solution. Although the foundational concepts of RFETs have matured over two decades, ongoing breakthroughs are needed to address challenges such as improving the device performance as well as achieving balanced symmetry between n-type and p-type transport modes with long-term stability. Herein, we present a nonvolatile WSe2-based RFET that utilizes photoassisted interfacial charge trapping at the h-BN and SiO2 interface. Unlike typical RFETs with two gate electrodes, our RFETs achieved polarity control with a single operating gate activated exclusively under white-light exposure. The threshold voltage was tunable, ranging from 27.4 (-31.6 V) to 0.9 (+19.5 V), allowing selective activation of n-type (p-type) operation at VGS = 0 V. Additionally, our WSe2-based RFETs show superior repeatability and long-term stability. Leveraging these advantages, various reconfigurable logic circuits were successfully demonstrated, including complementary inverters and switch circuits as well as pull-up and pull-down circuits, highlighting the potential of WSe2 FETs for future advancements of integrated circuits.
Collapse
Affiliation(s)
- Sun Woo Kim
- School of Materials Science and Engineering, Kumoh National Institute of Technology, Gumi 39177, Korea
- Department of Energy Engineering Convergence, Kumoh National Institute of Technology, Gumi 39177, Korea
| | - Juhyung Seo
- Department of Electronic Engineering, Gachon University, Seongnam 13120, Korea
| | - Subin Lee
- Department of Electronic Engineering, Gachon University, Seongnam 13120, Korea
| | - Daozhi Shen
- School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai 200240, China
| | - Youngjin Kim
- Department of Materials Engineering and Convergence Technology, Gyeongsang National University, Jinju 52828, Korea
| | - Hyun Ho Choi
- Department of Materials Engineering and Convergence Technology, Gyeongsang National University, Jinju 52828, Korea
| | - Hocheon Yoo
- Department of Electronic Engineering, Gachon University, Seongnam 13120, Korea
| | - Hyun Ho Kim
- School of Materials Science and Engineering, Kumoh National Institute of Technology, Gumi 39177, Korea
- Department of Energy Engineering Convergence, Kumoh National Institute of Technology, Gumi 39177, Korea
| |
Collapse
|
15
|
Liu Q, Cui S, Bian R, Pan E, Cao G, Li W, Liu F. The Integration of Two-Dimensional Materials and Ferroelectrics for Device Applications. ACS NANO 2024; 18:1778-1819. [PMID: 38179983 DOI: 10.1021/acsnano.3c05711] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/06/2024]
Abstract
In recent years, there has been growing interest in functional devices based on two-dimensional (2D) materials, which possess exotic physical properties. With an ultrathin thickness, the optoelectrical and electrical properties of 2D materials can be effectively tuned by an external field, which has stimulated considerable scientific activities. Ferroelectric fields with a nonvolatile and electrically switchable feature have exhibited enormous potential in controlling the electronic and optoelectronic properties of 2D materials, leading to an extremely fertile area of research. Here, we review the 2D materials and relevant devices integrated with ferroelectricity. This review starts to introduce the background about the concerned themes, namely 2D materials and ferroelectrics, and then presents the fundamental mechanisms, tuning strategies, as well as recent progress of the ferroelectric effect on the optical and electrical properties of 2D materials. Subsequently, the latest developments of 2D material-based electronic and optoelectronic devices integrated with ferroelectricity are summarized. Finally, the future outlook and challenges of this exciting field are suggested.
Collapse
Affiliation(s)
- Qing Liu
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 313099, China
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Silin Cui
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 313099, China
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Renji Bian
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 313099, China
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Er Pan
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 313099, China
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Guiming Cao
- School of Information Science and Technology, Xi Chang University, 615013 Xi'an, China
| | - Wenwu Li
- Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Department of Materials Science, Fudan University, Shanghai 200433, China
| | - Fucai Liu
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 313099, China
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| |
Collapse
|
16
|
Ryu H, Kang J, Park M, Bae B, Zhao Z, Rakheja S, Lee K, Zhu W. Low-Thermal-Budget Ferroelectric Field-Effect Transistors Based on CuInP 2S 6 and InZnO. ACS APPLIED MATERIALS & INTERFACES 2023; 15:53671-53677. [PMID: 37947841 DOI: 10.1021/acsami.3c10582] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/12/2023]
Abstract
In this paper, we demonstrate low-thermal-budget ferroelectric field-effect transistors (FeFETs) based on the two-dimensional ferroelectric CuInP2S6 (CIPS) and oxide semiconductor InZnO (IZO). The CIPS/IZO FeFETs exhibit nonvolatile memory windows of ∼1 V, low off-state drain currents, and high carrier mobilities. The ferroelectric CIPS layer serves a dual purpose by providing electrostatic doping in IZO and acting as a passivation layer for the IZO channel. We also investigate the CIPS/IZO FeFETs as artificial synaptic devices for neural networks. The CIPS/IZO synapse demonstrates a sizable dynamic ratio (125) and maintains stable multilevel states. Neural networks based on CIPS/IZO FeFETs achieve an accuracy rate of over 80% in recognizing MNIST handwritten digits. These ferroelectric transistors can be vertically stacked on silicon complementary metal-oxide semiconductor (CMOS) with a low thermal budget, offering broad applications in CMOS+X technologies and energy-efficient 3D neural networks.
Collapse
Affiliation(s)
- Hojoon Ryu
- Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Junzhe Kang
- Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Minseong Park
- Department of Electrical and Computer Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
| | - Byungjoon Bae
- Department of Electrical and Computer Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
| | - Zijing Zhao
- Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Shaloo Rakheja
- Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| | - Kyusang Lee
- Department of Electrical and Computer Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
- Department of Material Science and Engineering, University of Virginia, Charlottesville, Virginia 22904, United States
| | - Wenjuan Zhu
- Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States
| |
Collapse
|
17
|
Weng X, Qi L, Tang W, Iqbal MA, Kang C, Wu K, Zeng YJ. Polarization enhanced photoresponse of InSe via 2D ferroelectric CuCrP 2S 6. RSC Adv 2023; 13:33588-33594. [PMID: 38020035 PMCID: PMC10653041 DOI: 10.1039/d3ra05888c] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/29/2023] [Accepted: 11/10/2023] [Indexed: 12/01/2023] Open
Abstract
Two-dimensional CuCrP2S6 possesses significant potential for low-power non-volatile devices owing to its multiferroic properties. Nonetheless, comprehensive investigations regarding the modulation of CuCrP2S6 polarization for enhancing semiconductor photodetection capabilities and its potential applications in ferroelectric non-volatile devices are still relatively scarce. In this study, we present a novel, non-volatile, tunable photodetector engineered through the integration of a ferroelectric heterostructure comprising CuCrP2S6 and InSe. Our findings reveal that distinct ferroelectric polarization states of CuCrP2S6 exert varying modulation effects on the InSe photodetection performance. Notably, optimized results give a responsivity of 1839 A W-1 and a detectivity of 1.9 × 1012 Jones at a 300 nm wavelength, featuring a substantial 20.7-fold difference in responsivity between the two polarization states. This investigation underscores the immense potential of CuCrP2S6 in the development of non-volatile, multi-state optoelectronic devices.
Collapse
Affiliation(s)
- Xiaoliang Weng
- Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University Shenzhen 518060 P. R. China
| | - Lu Qi
- Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University Shenzhen 518060 P. R. China
| | - Wei Tang
- Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University Shenzhen 518060 P. R. China
| | - Muhammad Ahsan Iqbal
- Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University Shenzhen 518060 P. R. China
| | - Chenxu Kang
- Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University Shenzhen 518060 P. R. China
| | - Kewen Wu
- Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University Shenzhen 518060 P. R. China
| | - Yu-Jia Zeng
- Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Physics and Optoelectronic Engineering, Shenzhen University Shenzhen 518060 P. R. China
| |
Collapse
|
18
|
Ram A, Maity K, Marchand C, Mahmoudi A, Kshirsagar AR, Soliman M, Taniguchi T, Watanabe K, Doudin B, Ouerghi A, Reichardt S, O'Connor I, Dayen JF. Reconfigurable Multifunctional van der Waals Ferroelectric Devices and Logic Circuits. ACS NANO 2023; 17:21865-21877. [PMID: 37864568 DOI: 10.1021/acsnano.3c07952] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/23/2023]
Abstract
Emerging reconfigurable devices are fast gaining popularity in the search for next-generation computing hardware, while ferroelectric engineering of the doping state in semiconductor materials has the potential to offer alternatives to traditional von-Neumann architecture. In this work, we combine these concepts and demonstrate the suitability of reconfigurable ferroelectric field-effect transistors (Re-FeFETs) for designing nonvolatile reconfigurable logic-in-memory circuits with multifunctional capabilities. Modulation of the energy landscape within a homojunction of a 2D tungsten diselenide (WSe2) layer is achieved by independently controlling two split-gate electrodes made of a ferroelectric 2D copper indium thiophosphate (CuInP2S6) layer. Controlling the state encoded in the program gate enables switching between p, n, and ambipolar FeFET operating modes. The transistors exhibit on-off ratios exceeding 106 and hysteresis windows of up to 10 V width. The homojunction can change from Ohmic-like to diode behavior with a large rectification ratio of 104. When programmed in the diode mode, the large built-in p-n junction electric field enables efficient separation of photogenerated carriers, making the device attractive for energy-harvesting applications. The implementation of the Re-FeFET for reconfigurable logic functions shows how a circuit can be reconfigured to emulate either polymorphic ferroelectric NAND/AND logic-in-memory or electronic XNOR logic with a long retention time exceeding 104 s. We also illustrate how a circuit design made of just two Re-FeFETs exhibits high logic expressivity with reconfigurability at runtime to implement several key nonvolatile 2-input logic functions. Moreover, the Re-FeFET circuit demonstrates high compactness, with an up to 80% reduction in transistor count compared to standard CMOS design. The 2D van de Waals Re-FeFET devices therefore exhibit promising potential for both More-than-Moore and beyond-Moore future of electronics, in particular for an energy-efficient implementation of in-memory computing and machine learning hardware, due to their multifunctionality and design compactness.
Collapse
Affiliation(s)
- Ankita Ram
- Université de Strasbourg, IPCMS-CNRS UMR 7504, 23 Rue du Loess, 67034 Strasbourg, France
| | - Krishna Maity
- Université de Strasbourg, IPCMS-CNRS UMR 7504, 23 Rue du Loess, 67034 Strasbourg, France
| | - Cédric Marchand
- École Centrale de Lyon, 36 Avenue Guy de Collongue, Ecully 69134, France
| | - Aymen Mahmoudi
- Université Paris-Saclay, CNRS, Centre de Nanosciences et de Nanotechnologies, 91120 Palaiseau, France
| | - Aseem Rajan Kshirsagar
- Department of Physics and Materials Science, University of Luxembourg, Luxembourg 1511, Luxembourg
| | - Mohamed Soliman
- Université de Strasbourg, IPCMS-CNRS UMR 7504, 23 Rue du Loess, 67034 Strasbourg, France
| | - Takashi Taniguchi
- Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Kenji Watanabe
- Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Bernard Doudin
- Université de Strasbourg, IPCMS-CNRS UMR 7504, 23 Rue du Loess, 67034 Strasbourg, France
- Institut Universitaire de France, 1 rue Descartes, 75231 Paris cedex 05, France
| | - Abdelkarim Ouerghi
- Université Paris-Saclay, CNRS, Centre de Nanosciences et de Nanotechnologies, 91120 Palaiseau, France
| | - Sven Reichardt
- Department of Physics and Materials Science, University of Luxembourg, Luxembourg 1511, Luxembourg
| | - Ian O'Connor
- École Centrale de Lyon, 36 Avenue Guy de Collongue, Ecully 69134, France
| | - Jean-Francois Dayen
- Université de Strasbourg, IPCMS-CNRS UMR 7504, 23 Rue du Loess, 67034 Strasbourg, France
- Institut Universitaire de France, 1 rue Descartes, 75231 Paris cedex 05, France
| |
Collapse
|
19
|
Cao A, Li S, Chen H, Deng M, Xu X, Shang L, Li Y, Cui A, Hu Z. A polar-switchable and controllable negative phototransistor for information encryption. MATERIALS HORIZONS 2023; 10:5099-5109. [PMID: 37691576 DOI: 10.1039/d3mh01120h] [Citation(s) in RCA: 9] [Impact Index Per Article: 4.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/12/2023]
Abstract
Anomalous negative phototransistors have emerged as a distinct research area, characterized by a decrease in channel current under light illumination. Recently, their potential applications have been expanded beyond photodetection. Despite the considerable attention given to negative phototransistors, negative photoconductance (NPC) in particular remains relatively unexplored, with limited research advancements as compared to well-established positive phototransistors. In this study, we designed ferroelectric field-effect transistors (FeFETs) based on the WSe2/CIPS van der Waals (vdW) vertical heterostructures with a buried-gated architecture. The transistor exhibits NPC and positive photoconductance (PPC), demonstrating the significant role of ferroelectric polarization in the distinctive photoresponse. The observed inverse photoconductance can be attributed to the dynamic switching of ferroelectric polarization and interfacial charge transfer processes, which have been investigated experimentally and theoretically using Density Functional Theory (DFT). The unique phenomena enable the coexistence of controllable and polarity-switchable PPC and NPC. The novel feature holds tremendous potential for applications in optical encryption, where the specific gate voltages and light can serve as universal keys to achieve modulation of conductivity. The ability to manipulate conductivity in response to optical stimuli opens up new avenues for developing secure communication systems and data storage technologies. Harnessing this feature enables the design of advanced encryption schemes that rely on the unique properties of our material system. The study not only advances the development of NPC but also paves the way for more robust and efficient methods of optical encryption, ensuring the confidentiality and integrity of critical information in various domains, including data transmission, and information security.
Collapse
Affiliation(s)
- Aiping Cao
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China.
| | - Shubing Li
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China.
| | - Hongli Chen
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China.
| | - Menghan Deng
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China.
| | - Xionghu Xu
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China.
| | - Liyan Shang
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China.
| | - Yawei Li
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China.
| | - Anyang Cui
- Key Laboratory of Optoelectronic Material and Device, Department of Physics, Shanghai Normal University, Shanghai 200234, China
| | - Zhigao Hu
- Technical Center for Multifunctional Magneto-Optical Spectroscopy (Shanghai), Engineering Research Center of Nanophotonics & Advanced Instrument (Ministry of Education), Department of Physics, School of Physics and Electronic Science, East China Normal University, Shanghai 200241, China.
- Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, Shanxi 030006, China
| |
Collapse
|
20
|
Schwarz M, Vethaak TD, Derycke V, Francheteau A, Iniguez B, Kataria S, Kloes A, Lefloch F, Lemme M, Snyder JP, Weber WM, Calvet LE. The Schottky barrier transistor in emerging electronic devices. NANOTECHNOLOGY 2023; 34:352002. [PMID: 37100049 DOI: 10.1088/1361-6528/acd05f] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/30/2022] [Accepted: 04/25/2023] [Indexed: 06/16/2023]
Abstract
This paper explores how the Schottky barrier (SB) transistor is used in a variety of applications and material systems. A discussion of SB formation, current transport processes, and an overview of modeling are first considered. Three discussions follow, which detail the role of SB transistors in high performance, ubiquitous and cryogenic electronics. For high performance computing, the SB typically needs to be minimized to achieve optimal performance and we explore the methods adopted in carbon nanotube technology and two-dimensional electronics. On the contrary for ubiquitous electronics, the SB can be used advantageously in source-gated transistors and reconfigurable field-effect transistors (FETs) for sensors, neuromorphic hardware and security applications. Similarly, judicious use of an SB can be an asset for applications involving Josephson junction FETs.
Collapse
Affiliation(s)
| | - Tom D Vethaak
- Department of Microtechnology and Nanoscience, Chalmers University of Technology, SE-412 96 Gothenburg, Sweden
| | - Vincent Derycke
- Université Paris-Saclay, CEA, CNRS, NIMBE, LICSEN, Gif-sur-Yvette, F-91191, France
| | | | | | | | | | - Francois Lefloch
- University Grenoble Alps, GINP, CEA-IRIG-PHELIQS, Grenoble, France
| | | | | | - Walter M Weber
- Technische Universität Wien, Institute of Solid State Electronics, Vienna, Austria
| | | |
Collapse
|
21
|
Xiao Y, Zou G, Huo J, Sun T, Feng B, Liu L. Locally Thinned, Core-Shell Nanowire-Integrated Multi-gate MoS 2 Transistors for Active Control of Extendable Logic. ACS APPLIED MATERIALS & INTERFACES 2023; 15:1563-1573. [PMID: 36560862 DOI: 10.1021/acsami.2c17788] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/17/2023]
Abstract
Field-effect transistor (FET) devices with multi-gate coupled structures usually exhibit special electrical properties and are suitable for fabricating multifunctional devices. Among them, the 1D nanowire gate configuration has become a promising gate design to tailor 2D FET performances. However, due to possible short circuiting induced by nanowire contact and the high requirement for precision manipulation, the integration of multi-nanowires as gates in a single 2D electronic system remains a grand challenge. Herein, local laser--thinned multiple core-shell SiC@SiO2 nanowires are successfully integrated into MoS2 transistors as multi-gates for active control of extendable logic applications. Nanowire gates (NGs) locally enhance the carrier transportation, and the use of multiple NGs can achieve designed band structures to tune the performance of the device. For core-shell structures, a semiconducting core is used to introduce a gate bias, and the insulating shell provides protection against short circuiting between NGs, facilitating nanowire assembly. Furthermore, a global control gate is introduced to co-tune the overall electrical characteristics, while active control of logic devices and extendable inputs are achieved based on this model. This work proposes a novel nanowire multi-gate configuration, which provides possibilities for localized, precise control of band structures and the fabrication of highly integrated, multifunctional, and controllable nano-devices.
Collapse
Affiliation(s)
- Yu Xiao
- Department of Mechanical Engineering, State Key Laboratory of Tribology, Key Laboratory for Advanced Manufacturing by Materials Processing Technology, Ministry of Education of PR China, Tsinghua University, Beijing 100084, P. R. China
| | - Guisheng Zou
- Department of Mechanical Engineering, State Key Laboratory of Tribology, Key Laboratory for Advanced Manufacturing by Materials Processing Technology, Ministry of Education of PR China, Tsinghua University, Beijing 100084, P. R. China
| | - Jinpeng Huo
- Department of Mechanical Engineering, State Key Laboratory of Tribology, Key Laboratory for Advanced Manufacturing by Materials Processing Technology, Ministry of Education of PR China, Tsinghua University, Beijing 100084, P. R. China
| | - Tianming Sun
- Department of Mechanical Engineering, State Key Laboratory of Tribology, Key Laboratory for Advanced Manufacturing by Materials Processing Technology, Ministry of Education of PR China, Tsinghua University, Beijing 100084, P. R. China
- College of Materials Science and Engineering, Taiyuan University of Technology, Taiyuan 030024, Shanxi Province, China
| | - Bin Feng
- Department of Mechanical Engineering, State Key Laboratory of Tribology, Key Laboratory for Advanced Manufacturing by Materials Processing Technology, Ministry of Education of PR China, Tsinghua University, Beijing 100084, P. R. China
| | - Lei Liu
- Department of Mechanical Engineering, State Key Laboratory of Tribology, Key Laboratory for Advanced Manufacturing by Materials Processing Technology, Ministry of Education of PR China, Tsinghua University, Beijing 100084, P. R. China
| |
Collapse
|
22
|
Jin T, Mao J, Gao J, Han C, Loh KP, Wee ATS, Chen W. Ferroelectrics-Integrated Two-Dimensional Devices toward Next-Generation Electronics. ACS NANO 2022; 16:13595-13611. [PMID: 36099580 DOI: 10.1021/acsnano.2c07281] [Citation(s) in RCA: 29] [Impact Index Per Article: 9.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
Ferroelectric materials play an important role in a wide spectrum of semiconductor technologies and device applications. Two-dimensional (2D) van der Waals (vdW) ferroelectrics with surface-insensitive ferroelectricity that is significantly different from their traditional bulk counterparts have further inspired intensive interest. Integration of ferroelectrics into 2D-layered-material-based devices is expected to offer intriguing working principles and add desired functionalities for next-generation electronics. Herein, fundamental properties of ferroelectric materials that are compatible with 2D devices are introduced, followed by a critical review of recent advances on the integration of ferroelectrics into 2D devices. Representative device architectures and corresponding working mechanisms are discussed, such as ferroelectrics/2D semiconductor heterostructures, 2D ferroelectric tunnel junctions, and 2D ferroelectric diodes. By leveraging the favorable properties of ferroelectrics, a variety of functional 2D devices including ferroelectric-gated negative capacitance field-effect transistors, programmable devices, nonvolatile memories, and neuromorphic devices are highlighted, where the application of 2D vdW ferroelectrics is particularly emphasized. This review provides a comprehensive understanding of ferroelectrics-integrated 2D devices and discusses the challenges of applying them into commercial electronic circuits.
Collapse
Affiliation(s)
- Tengyu Jin
- Joint School of National University of Singapore and Tianjin University, International Campus of Tianjin University, Binhai New City, Fuzhou 350207, P. R. China
- Department of Physics, National University of Singapore, Singapore 117542, Singapore
| | - Jingyu Mao
- Department of Physics, National University of Singapore, Singapore 117542, Singapore
| | - Jing Gao
- Department of Physics, National University of Singapore, Singapore 117542, Singapore
| | - Cheng Han
- SZU-NUS Collaborative Innovation Center for Optoelectronic Science & Technology, International Collaborative Laboratory of 2D Materials for Optoelectronics Science and Technology of Ministry of Education, Institute of Microscale Optoelectronics, Shenzhen University, Shenzhen 518060, P. R. China
| | - Kian Ping Loh
- Joint School of National University of Singapore and Tianjin University, International Campus of Tianjin University, Binhai New City, Fuzhou 350207, P. R. China
- Department of Chemistry, National University of Singapore, Singapore 117543, Singapore
| | - Andrew T S Wee
- Department of Physics, National University of Singapore, Singapore 117542, Singapore
| | - Wei Chen
- Joint School of National University of Singapore and Tianjin University, International Campus of Tianjin University, Binhai New City, Fuzhou 350207, P. R. China
- Department of Physics, National University of Singapore, Singapore 117542, Singapore
- Department of Chemistry, National University of Singapore, Singapore 117543, Singapore
- National University of Singapore (Suzhou) Research Institute, 377 Lin Quan Street, Suzhou Industrial Park, Suzhou 215123, P. R. China
| |
Collapse
|
23
|
Jia T, Chen Y, Cai Y, Dai W, Zhang C, Yu L, Yue W, Kimura H, Yao Y, Yu S, Guo Q, Cheng Z. Ferroelectricity and Piezoelectricity in 2D Van der Waals CuInP2S6 Ferroelectric Tunnel Junctions. NANOMATERIALS 2022; 12:nano12152516. [PMID: 35893484 PMCID: PMC9332483 DOI: 10.3390/nano12152516] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 07/04/2022] [Revised: 07/15/2022] [Accepted: 07/15/2022] [Indexed: 11/16/2022]
Abstract
CuInP2S6 (CIPS) is a novel two-dimensional (2D) van der Waals (vdW) ferroelectric layered material with a Curie temperature of TC~315 K, making it promising for great potential applications in electronic and photoelectric devices. Herein, the ferroelectric and electric properties of CIPS at different thicknesses are carefully evaluated by scanning probe microscopy techniques. Some defects in some local regions due to Cu deficiency lead to a CuInP2S6–In4/3P2S6 (CIPS–IPS) paraelectric phase coexisting with the CIPS ferroelectric phase. An electrochemical strain microscopy (ESM) study reveals that the relaxation times corresponding to the Cu ions and the IPS ionospheres are not the same, with a significant difference in their response to DC voltage, related to the rectification effect of the ferroelectric tunnel junction (FTJ). The electric properties of the FTJ indicate Cu+ ion migration and propose that the current flow and device performance are dynamically controlled by an interfacial Schottky barrier. The addition of the ferroelectricity of CIPS opens up applications in memories and sensors, actuators, and even spin-orbit devices based on 2D vdW heterostructures.
Collapse
Affiliation(s)
- Tingting Jia
- Institute of Advanced Materials Science and Engineering, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China; (Y.C.); (Y.C.); (W.D.); (C.Z.); (L.Y.); (W.Y.); (S.Y.)
- School of Materials Science and Engineering, Hubei University, Wuhan 430062, China
- Correspondence: (T.J.); (Q.G.); (Z.C.)
| | - Yanrong Chen
- Institute of Advanced Materials Science and Engineering, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China; (Y.C.); (Y.C.); (W.D.); (C.Z.); (L.Y.); (W.Y.); (S.Y.)
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, China;
| | - Yali Cai
- Institute of Advanced Materials Science and Engineering, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China; (Y.C.); (Y.C.); (W.D.); (C.Z.); (L.Y.); (W.Y.); (S.Y.)
- School of Materials Science and Engineering, Hubei University, Wuhan 430062, China
| | - Wenbin Dai
- Institute of Advanced Materials Science and Engineering, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China; (Y.C.); (Y.C.); (W.D.); (C.Z.); (L.Y.); (W.Y.); (S.Y.)
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, China;
| | - Chong Zhang
- Institute of Advanced Materials Science and Engineering, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China; (Y.C.); (Y.C.); (W.D.); (C.Z.); (L.Y.); (W.Y.); (S.Y.)
- School of Materials Science and Engineering, Hubei University, Wuhan 430062, China
| | - Liang Yu
- Institute of Advanced Materials Science and Engineering, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China; (Y.C.); (Y.C.); (W.D.); (C.Z.); (L.Y.); (W.Y.); (S.Y.)
- Nano Science and Technology Institute, University of Science and Technology of China, Suzhou 215125, China
| | - Wenfeng Yue
- Institute of Advanced Materials Science and Engineering, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China; (Y.C.); (Y.C.); (W.D.); (C.Z.); (L.Y.); (W.Y.); (S.Y.)
- Nano Science and Technology Institute, University of Science and Technology of China, Suzhou 215125, China
| | - Hideo Kimura
- School of Environmental and Material Engineering, Yantai University, Yantai 264005, China;
| | - Yingbang Yao
- School of Materials and Energy, Guangdong University of Technology, Guangzhou 510006, China;
| | - Shuhui Yu
- Institute of Advanced Materials Science and Engineering, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China; (Y.C.); (Y.C.); (W.D.); (C.Z.); (L.Y.); (W.Y.); (S.Y.)
| | - Quansheng Guo
- School of Materials Science and Engineering, Hubei University, Wuhan 430062, China
- Correspondence: (T.J.); (Q.G.); (Z.C.)
| | - Zhenxiang Cheng
- Institute for Superconducting & Electronic Materials, University of Wollongong, Innovation Campus, North Wollongong, NSW 2500, Australia
- Correspondence: (T.J.); (Q.G.); (Z.C.)
| |
Collapse
|