1
|
Söll A, Lopriore E, Ottesen A, Luxa J, Pasquale G, Sturala J, Hájek F, Jarý V, Sedmidubský D, Mosina K, Sokolović I, Rasouli S, Grasser T, Diebold U, Kis A, Sofer Z. High-κ Wide-Gap Layered Dielectric for Two-Dimensional van der Waals Heterostructures. ACS Nano 2024; 18:10397-10406. [PMID: 38557003 PMCID: PMC11025129 DOI: 10.1021/acsnano.3c10411] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/23/2023] [Revised: 03/13/2024] [Accepted: 03/20/2024] [Indexed: 04/04/2024]
Abstract
van der Waals heterostructures of two-dimensional materials have unveiled frontiers in condensed matter physics, unlocking unexplored possibilities in electronic and photonic device applications. However, the investigation of wide-gap, high-κ layered dielectrics for devices based on van der Waals structures has been relatively limited. In this work, we demonstrate an easily reproducible synthesis method for the rare-earth oxyhalide LaOBr, and we exfoliate it as a 2D layered material with a measured static dielectric constant of 9 and a wide bandgap of 5.3 eV. Furthermore, our research demonstrates that LaOBr can be used as a high-κ dielectric in van der Waals field-effect transistors with high performance and low interface defect concentrations. Additionally, it proves to be an attractive choice for electrical gating in excitonic devices based on 2D materials. Our work demonstrates the versatile realization and functionality of 2D systems with wide-gap and high-κ van der Waals dielectric environments.
Collapse
Affiliation(s)
- Aljoscha Söll
- Department
of Inorganic Chemistry, University of Chemistry
and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic
| | - Edoardo Lopriore
- Institute
of Electrical and Microengineering, École
Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
- Institute
of Materials Science and Engineering, École
Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
| | - Asmund Ottesen
- Institute
of Electrical and Microengineering, École
Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
- Institute
of Materials Science and Engineering, École
Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
| | - Jan Luxa
- Department
of Inorganic Chemistry, University of Chemistry
and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic
| | - Gabriele Pasquale
- Institute
of Electrical and Microengineering, École
Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
- Institute
of Materials Science and Engineering, École
Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
| | - Jiri Sturala
- Department
of Inorganic Chemistry, University of Chemistry
and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic
| | - František Hájek
- Institute
of Physics of the Czech Academy of Sciences, v.v.i., Cukrovarnická 10, 162 00, Prague 6, Czech Republic
| | - Vítězslav Jarý
- Institute
of Physics of the Czech Academy of Sciences, v.v.i., Cukrovarnická 10, 162 00, Prague 6, Czech Republic
| | - David Sedmidubský
- Department
of Inorganic Chemistry, University of Chemistry
and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic
| | - Kseniia Mosina
- Department
of Inorganic Chemistry, University of Chemistry
and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic
| | - Igor Sokolović
- Institute
of Microelectronics, TU Wien, Gußhausstraße 27−29, 1040 Vienna, Austria
- Institute
of Applied Physics, TU Wien, Wiedner Hauptstraße 8−10, 1040 Vienna, Austria
| | - Saeed Rasouli
- Institute
of Applied Physics, TU Wien, Wiedner Hauptstraße 8−10, 1040 Vienna, Austria
| | - Tibor Grasser
- Institute
of Microelectronics, TU Wien, Gußhausstraße 27−29, 1040 Vienna, Austria
| | - Ulrike Diebold
- Institute
of Applied Physics, TU Wien, Wiedner Hauptstraße 8−10, 1040 Vienna, Austria
| | - Andras Kis
- Institute
of Electrical and Microengineering, École
Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
- Institute
of Materials Science and Engineering, École
Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
| | - Zdeněk Sofer
- Department
of Inorganic Chemistry, University of Chemistry
and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic
| |
Collapse
|
2
|
Park I, Choi J, Kim J, Kong BD, Lee JS. Effect of Quasi-One-Dimensional Properties on Source/Drain Contacts in Vertical Nanowire Field-Effect Transistors (VNWFETs). Micromachines (Basel) 2024; 15:481. [PMID: 38675292 DOI: 10.3390/mi15040481] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/18/2024] [Revised: 03/26/2024] [Accepted: 03/29/2024] [Indexed: 04/28/2024]
Abstract
In this study, we investigated the influence of quasi-one-dimensional (Quasi-1D) characteristics on the source and drain contact resistances within vertical nanowire (NW) field-effect transistors (FETs) of diminutive diameter. The top contact of the NW is segregated into two distinct regions: the first encompassing the upper surface, designated as the axial contact, and the second encircling the side surface, known as the radial contact, which is formed during the top-contact metal deposition process. Quantum confinement effects, prominent within Quasi-1D NWs, exert significant constraints on radial transport, consequently inducing a noticeable impact on contact resistance. Notably, in the radial direction, electron tunneling occurs only through quantized, discrete energy levels. Conversely, along the axial direction, electron tunneling freely traverses continuous energy levels. In a meticulous numerical analysis, these disparities in transport mechanisms unveiled that NWs with diameters below 30 nm exhibit a markedly higher radial contact resistance compared to their axial counterparts. Furthermore, an increase in the overlap length (less than 5 nm) contributes to a modest reduction in radial resistance; however, it remains consistently higher than the axial contact resistance.
Collapse
Affiliation(s)
- Iksoo Park
- Department of Electrical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
| | - Jaeyong Choi
- Department of Electrical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
| | - Jungsik Kim
- Department of Electrical Engineering, Gyeongsang National University, Jinju 52828, Republic of Korea
| | - Byoung Don Kong
- Department of Electrical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
| | - Jeong-Soo Lee
- Department of Electrical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea
| |
Collapse
|
3
|
Seo SE, Kim KH, Ha S, Oh H, Kim J, Kim S, Kim L, Seo M, An JE, Park YM, Lee KG, Kim YK, Kim WK, Hong JJ, Song HS, Kwon OS. Synchronous Diagnosis of Respiratory Viruses Variants via Receptonics Based on Modeling Receptor-Ligand Dynamics. Adv Mater 2024; 36:e2303079. [PMID: 37487578 DOI: 10.1002/adma.202303079] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/03/2023] [Revised: 07/19/2023] [Indexed: 07/26/2023]
Abstract
The transmission and pathogenesis of highly contagious fatal respiratory viruses are increasing, and the need for an on-site diagnostic platform has arisen as an issue worldwide. Furthermore, as the spread of respiratory viruses continues, different variants have become the dominant circulating strains. To prevent virus transmission, the development of highly sensitive and accurate on-site diagnostic assays is urgently needed. Herein, a facile diagnostic device is presented for multi-detection based on the results of detailed receptor-ligand dynamics simulations for the screening of various viral strains. The novel bioreceptor-treated electronics (receptonics) device consists of a multichannel graphene transistor and cell-entry receptors conjugated to N-heterocyclic carbene (NHC). An ultrasensitive multi-detection performance is achieved without the need for sample pretreatment, which will enable rapid diagnosis and prevent the spread of pathogens. This platform can be applied for the diagnosis of variants of concern in clinical respiratory virus samples and primate models. This multi-screening platform can be used to enhance surveillance and discriminate emerging virus variants before they become a severe threat to public health.
Collapse
Affiliation(s)
- Sung Eun Seo
- Infectious Disease Research Center, Korea Research Institute of Bioscience and Biotechnology (KRIBB), 125 Gwahak-ro, Yuseong-gu, Daejeon, 34141, Republic of Korea
- Department of Civil and Environmental Engineering, Yonsei University, Seoul, 03722, Republic of Korea
| | - Kyung Ho Kim
- Infectious Disease Research Center, Korea Research Institute of Bioscience and Biotechnology (KRIBB), 125 Gwahak-ro, Yuseong-gu, Daejeon, 34141, Republic of Korea
- Immunotherapy Research Center, Korea Research Institute of Bioscience and Biotechnology (KRIBB), Daejeon, 34141, Republic of Korea
| | - Siyoung Ha
- Infectious Disease Research Center, Korea Research Institute of Bioscience and Biotechnology (KRIBB), 125 Gwahak-ro, Yuseong-gu, Daejeon, 34141, Republic of Korea
- School of Pharmacy, University of Maryland Eastern Shore, Princess Anne, MD, 21853, USA
| | - Hanseul Oh
- College of Veterinary Medicine, Chungbuk National University, Cheongju, 28644, Republic of Korea
| | - Jinyeong Kim
- Infectious Disease Research Center, Korea Research Institute of Bioscience and Biotechnology (KRIBB), 125 Gwahak-ro, Yuseong-gu, Daejeon, 34141, Republic of Korea
| | - Soomin Kim
- Infectious Disease Research Center, Korea Research Institute of Bioscience and Biotechnology (KRIBB), 125 Gwahak-ro, Yuseong-gu, Daejeon, 34141, Republic of Korea
- Department of Civil and Environmental Engineering, Yonsei University, Seoul, 03722, Republic of Korea
| | - Lina Kim
- Infectious Disease Research Center, Korea Research Institute of Bioscience and Biotechnology (KRIBB), 125 Gwahak-ro, Yuseong-gu, Daejeon, 34141, Republic of Korea
| | - Minah Seo
- Sensor System Research Center, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea
- KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul, 02841, Republic of Korea
| | - Jai Eun An
- Infectious Disease Research Center, Korea Research Institute of Bioscience and Biotechnology (KRIBB), 125 Gwahak-ro, Yuseong-gu, Daejeon, 34141, Republic of Korea
| | - Yoo Min Park
- Center for NanoBio Development, National NanoFab Center, 291 Daehak-ro, Yuseong-gu, Daejeon, 34141, Republic of Korea
| | - Kyoung G Lee
- Center for NanoBio Development, National NanoFab Center, 291 Daehak-ro, Yuseong-gu, Daejeon, 34141, Republic of Korea
| | - Yu Kyung Kim
- Department of Clinical Pathology, School of Medicine, Kyungpook National University, Daegu, 41944, Republic of Korea
| | - Woo-Keun Kim
- Department of Predictive Toxicology, Korea Institute of Toxicology, 141 Gajeong-ro, Yuseong-gu, Daejeon, 34114, Republic of Korea
| | - Jung Joo Hong
- National Primate Research Center, Korea Research Institute of Bioscience and Biotechnology, Cheongju, 28116, Republic of Korea
- KRIBB School of Bioscience, Korea University of Science & Technology (UST), Daejeon, 34141, Republic of Korea
| | - Hyun Seok Song
- Sensor System Research Center, Korea Institute of Science and Technology, Seoul, 02792, Republic of Korea
| | - Oh Seok Kwon
- SKKU Advanced Institute of Nanotechnology (SAINT), Department of Nano Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
- Department of Nano Science and Technology, Sungkyunkwan University, Suwon, 16419, Republic of Korea
| |
Collapse
|
4
|
Awasthi C, Khan A, Islam SS. PdSe 2/MoSe 2: a promising van der Waals heterostructure for field effect transistor application. Nanotechnology 2024; 35:195202. [PMID: 38295411 DOI: 10.1088/1361-6528/ad2482] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/01/2023] [Accepted: 01/31/2024] [Indexed: 02/02/2024]
Abstract
The field-effect transistor (FET) is a fundamental component of semiconductors and the electronic industry. High on-current and mobility with layer-dependent features are required for outstanding FET channel material. Two-dimensional materials are advantageous over bulk materials owing to their higher mobility, high ON/OFF ratio, low tunneling current, and leakage problems. Moreover, two-dimensional heterostructures provide a better way to tune electrical properties. In this work, the two distinct possibilities of PdSe2/MoSe2heterostructure have been employed through mechanical exfoliation and analyzed their electrical response. These diffe approaches to heterostructure formation serve as crucial components of our investigation, allowing us to explore and evaluate the unique electronic properties arising from each design. This work demonstrates that the heterostructure possesses a better ON/OFF ratio of ∼5.78 × 105, essential in switching characteristics. Moreover, MoSe2provides a defect-free interface to PdSe2, resulting in a higher ON current of ∼10μA and mobility of ∼63.7 cm2V-1s-1, necessary for transistor applications. In addition, comprehending the process of charge transfer occurring at the interface between transition metal dichalcogenides is fundamental for advancing next-generation technologies. This work provides insights into the interface formed between the PdSe2and MoSe2that can be harnessed in transistor applications.
Collapse
Affiliation(s)
- Chetan Awasthi
- Centre for Nanoscience and Nanotechnology, Jamia Millia Islamia, New Delhi 110025, India
| | - Afzal Khan
- State Key Laboratory of Silicon Materials and School of Materials Science and Engineering, Zhejiang University, Hangzhou-310027, People's Republic of China
- Institute of Micro-/Nanotechnology and Precision Engineering, School of Mechanical Engineering, Zhejiang University, Hangzhou-310058, People's Republic of China
| | - S S Islam
- Centre for Nanoscience and Nanotechnology, Jamia Millia Islamia, New Delhi 110025, India
| |
Collapse
|
5
|
Neu YC, Lin YS, Weng YH, Chen WC, Liu CL, Lin BH, Lin YC, Chen WC. Reversible Molecular Conformation Transitions of Smectic Liquid Crystals for Light/Bias-Gated Transistor Memory. ACS Appl Mater Interfaces 2024; 16:7500-7511. [PMID: 38300744 PMCID: PMC10875644 DOI: 10.1021/acsami.3c16882] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/10/2023] [Revised: 01/17/2024] [Accepted: 01/22/2024] [Indexed: 02/03/2024]
Abstract
In recent years, organic photonic field-effect transistors have made remarkable progress with the rapid development of conjugated polycrystalline materials. Liquid crystals, with their smooth surface, defined layer thickness, and crystalline structures, are commonly used for these advantages. In this work, a series of smectic liquid crystalline molecules, 2,9-didecyl-dinaphtho-thienothiophene (C10-DNTT), 2,7-didecyl-benzothieno-benzothiopene (C10-BTBT), 3,9-didecyl-dinaphtho-thiophene (C10-DNT), and didecyl-sexithiophene (C10-6T), have been used in photonic transistor memory, functioning as both hole-transport channels and electron traps to investigate systematically the reasons and mechanisms behind the memory behavior of smectic liquid crystals. After thermal annealing, C10-BTBT and C10-6T/C10-DNTT are homeotropically aligned from the smectic A and smectic X phases, respectively. The 3D-ordered structure of these smectic-aligned crystals contributed to efficient photowriting and electrical erasing processes. Among them, the device performance of C10-BTBT was particularly significant, with a memory window of 21 V. The memory ratio could reach 1.5 × 106 and maintain a memory ratio of over 3 orders after 10,000 s, contributing to its smectic A structure. Through the research, we confirmed the memory and light/bias-gated behaviors of these smectic liquid crystalline molecules, attributing them to reversible molecular conformation transitions and the inherent structural inhomogeneity inside the polycrystalline channel layer.
Collapse
Affiliation(s)
- Yi-Chieh Neu
- Department
of Chemical Engineering, National Taiwan
University, Taipei 10617, Taiwan
| | - Yi-Sa Lin
- Department
of Chemical Engineering, National Taiwan
University, Taipei 10617, Taiwan
| | - Yi-Hsun Weng
- Department
of Chemical Engineering, National Taiwan
University, Taipei 10617, Taiwan
| | - Wei-Cheng Chen
- Department
of Chemical Engineering, National Taiwan
University, Taipei 10617, Taiwan
| | - Cheng-Liang Liu
- Department
of Materials Science and Engineering, National
Taiwan University, Taipei 10617, Taiwan
- Advanced
Research Center for Green Materials Science and Technology, National Taiwan University, Taipei 10617, Taiwan
| | - Bi-Hsuan Lin
- National
Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
| | - Yan-Cheng Lin
- Advanced
Research Center for Green Materials Science and Technology, National Taiwan University, Taipei 10617, Taiwan
- Department
of Chemical Engineering, National Cheng
Kung University, Tainan 70101, Taiwan
| | - Wen-Chang Chen
- Department
of Chemical Engineering, National Taiwan
University, Taipei 10617, Taiwan
- Advanced
Research Center for Green Materials Science and Technology, National Taiwan University, Taipei 10617, Taiwan
| |
Collapse
|
6
|
Liu J, Su L, Zhang X, Shtansky DV, Fang X. Ferroelectric-Optoelectronic Hybrid System for Photodetection. Small Methods 2024; 8:e2300319. [PMID: 37312397 DOI: 10.1002/smtd.202300319] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/12/2023] [Revised: 04/28/2023] [Indexed: 06/15/2023]
Abstract
Photodetectors (PDs), as functional devices based on photon-to-electron conversion, are an indispensable component for the next-generation Internet of Things system. The research of advanced and efficient PDs that meet the diverse demands is becoming a major task. Ferroelectric materials can develop a unique spontaneous polarization due to the symmetry-breaking of the unit cell, which is switchable under an external electric field. Ferroelectric polarization field has the intrinsic characteristics of non-volatilization and rewritability. Introducing ferroelectrics to effectively manipulate the band bending and carrier transport can be non-destructive and controllable in the ferroelectric-optoelectronic hybrid systems. Hence, ferroelectric integration offers a promising strategy for high-performance photoelectric detection. This paper reviews the fundamentals of optoelectronic and ferroelectric materials, and their interactions in hybrid photodetection systems. The first section introduces the characteristics and applications of typical optoelectronic and ferroelectric materials. Then, the interplay mechanisms, modulation effects, and typical device structures of ferroelectric-optoelectronic hybrid systems are discussed. Finally, in summary and perspective section, the progress of ferroelectrics integrated PDs is summed up and the challenges of ferroelectrics in the field of optoelectronics are considered.
Collapse
Affiliation(s)
- Jie Liu
- Department of Materials Science, State Key Laboratory of Molecular Engineering of Polymers, Institute of Optoelectronics, Fudan University, Shanghai, 200438, P. R. China
| | - Li Su
- Department of Materials Science, State Key Laboratory of Molecular Engineering of Polymers, Institute of Optoelectronics, Fudan University, Shanghai, 200438, P. R. China
| | - Xinglong Zhang
- Department of Materials Science, State Key Laboratory of Molecular Engineering of Polymers, Institute of Optoelectronics, Fudan University, Shanghai, 200438, P. R. China
| | - Dmitry V Shtansky
- National University of Science and Technology "MISIS", Moscow, 119049, Russia
| | - Xiaosheng Fang
- Department of Materials Science, State Key Laboratory of Molecular Engineering of Polymers, Institute of Optoelectronics, Fudan University, Shanghai, 200438, P. R. China
| |
Collapse
|
7
|
Liu H, Wu Y, Wu Z, Liu S, Zhang VL, Yu T. Coexisting Phases in Transition Metal Dichalcogenides: Overview, Synthesis, Applications, and Prospects. ACS Nano 2024; 18:2708-2729. [PMID: 38252696 DOI: 10.1021/acsnano.3c10665] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/24/2024]
Abstract
Over the past decade, significant advancements have been made in phase engineering of two-dimensional transition metal dichalcogenides (TMDCs), thereby allowing controlled synthesis of various phases of TMDCs and facile conversion between them. Recently, there has been emerging interest in TMDC coexisting phases, which contain multiple phases within one nanostructured TMDC. By taking advantage of the merits from the component phases, the coexisting phases offer enhanced performance in many aspects compared with single-phase TMDCs. Herein, this review article thoroughly expounds the latest progress and ongoing efforts on the syntheses, properties, and applications of TMDC coexisting phases. The introduction section overviews the main phases of TMDCs (2H, 3R, 1T, 1T', 1Td), along with the advantages of phase coexistence. The subsequent section focuses on the synthesis methods for coexisting phases of TMDCs, with particular attention to local patterning and random formations. Furthermore, on the basis of the versatile properties of TMDC coexisting phases, their applications in magnetism, valleytronics, field-effect transistors, memristors, and catalysis are discussed. Lastly, a perspective is presented on the future development, challenges, and potential opportunities of TMDC coexisting phases. This review aims to provide insights into the phase engineering of 2D materials for both scientific and engineering communities and contribute to further advancements in this emerging field.
Collapse
Affiliation(s)
- Haiyang Liu
- School of Physics and Technology, Wuhan University, Wuhan 430072, China
| | - Yaping Wu
- School of Physics and Technology, Xiamen University, Xiamen 361005, China
| | - Zhiming Wu
- School of Physics and Technology, Xiamen University, Xiamen 361005, China
| | - Sheng Liu
- School of Physics and Technology, Wuhan University, Wuhan 430072, China
- Wuhan Institute of Quantum Technology, Wuhan 430206, China
| | - Vanessa Li Zhang
- School of Physics and Technology, Wuhan University, Wuhan 430072, China
| | - Ting Yu
- School of Physics and Technology, Wuhan University, Wuhan 430072, China
| |
Collapse
|
8
|
Liu Q, Cui S, Bian R, Pan E, Cao G, Li W, Liu F. The Integration of Two-Dimensional Materials and Ferroelectrics for Device Applications. ACS Nano 2024; 18:1778-1819. [PMID: 38179983 DOI: 10.1021/acsnano.3c05711] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 01/06/2024]
Abstract
In recent years, there has been growing interest in functional devices based on two-dimensional (2D) materials, which possess exotic physical properties. With an ultrathin thickness, the optoelectrical and electrical properties of 2D materials can be effectively tuned by an external field, which has stimulated considerable scientific activities. Ferroelectric fields with a nonvolatile and electrically switchable feature have exhibited enormous potential in controlling the electronic and optoelectronic properties of 2D materials, leading to an extremely fertile area of research. Here, we review the 2D materials and relevant devices integrated with ferroelectricity. This review starts to introduce the background about the concerned themes, namely 2D materials and ferroelectrics, and then presents the fundamental mechanisms, tuning strategies, as well as recent progress of the ferroelectric effect on the optical and electrical properties of 2D materials. Subsequently, the latest developments of 2D material-based electronic and optoelectronic devices integrated with ferroelectricity are summarized. Finally, the future outlook and challenges of this exciting field are suggested.
Collapse
Affiliation(s)
- Qing Liu
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 313099, China
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Silin Cui
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 313099, China
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Renji Bian
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 313099, China
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Er Pan
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 313099, China
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Guiming Cao
- School of Information Science and Technology, Xi Chang University, 615013 Xi'an, China
| | - Wenwu Li
- Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and Perception, Institute of Optoelectronics, Department of Materials Science, Fudan University, Shanghai 200433, China
| | - Fucai Liu
- Yangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 313099, China
- School of Optoelectronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
| |
Collapse
|
9
|
He J, Cao X, Liu H, Liang Y, Chen H, Xiao M, Zhang Z. Power and Sensitivity Management of Carbon Nanotube Transistor Glucose Biosensors. ACS Appl Mater Interfaces 2024; 16:1351-1360. [PMID: 38150673 DOI: 10.1021/acsami.3c17309] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/29/2023]
Abstract
Continuous glucose monitoring (CGM), which is significant for the daily management of diabetes, requires a low-power-consumption sensor system that can track low nanomolar levels of glucose in physiological fluids, such as sweat and tears. However, traditional electrochemical methods are limited to analytes in micromolar to millimolar ranges and entail high power consumption. Carbon nanotube (CNT) film field-effect transistors (FETs) are promising for constructing extremely sensitive biosensors, but their wide applications in CGM are limited by the strong screening effect of physiological fluids and the zero charge of glucose molecules. In this study, we demonstrate a glucose aptamer-modified CNT FET biosensor to realize a highly sensitive CGM system with sub-nW power consumption by applying a suitable gate voltage. A positive gate voltage can enlarge the effective Debye screening length at the double layer to reduce the local ion population nearby and then improve the sensitivity of the FET-based biosensors by 5 times. We construct CNT FET sensors for CGM with a limit of detection of 0.5 fM, a record dynamic range up to 109, and a power consumption down to ∼100 pW. The proposed field-modulated sensing performance scheme is applicable to other aptamer-based FET biosensors for detecting neutral or less charged molecules and opens opportunities to develop facilely modulated, highly sensitive, low-power, and noninvasive CGM systems.
Collapse
Affiliation(s)
- Jianping He
- Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Hunan 411105, China
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, Department of Electronics, Peking University, Beijing 100871, China
| | - Xianmao Cao
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, Department of Electronics, Peking University, Beijing 100871, China
- School of Integrated Circuits, Beijing University of Posts and Telecommunications, Beijing 100876, China
| | - Haiyang Liu
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, Department of Electronics, Peking University, Beijing 100871, China
| | - Yuqi Liang
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, Department of Electronics, Peking University, Beijing 100871, China
| | - Hong Chen
- Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Hunan 411105, China
| | - Mengmeng Xiao
- Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Hunan 411105, China
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, Department of Electronics, Peking University, Beijing 100871, China
| | - Zhiyong Zhang
- Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Hunan 411105, China
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, Department of Electronics, Peking University, Beijing 100871, China
| |
Collapse
|
10
|
Lin WH, Li CS, Wu CI, Rossman GR, Atwater HA, Yeh NC. Dramatically Enhanced Valley-Polarized Emission by Alloying and Electrical Tuning of Monolayer WTe 2 x S 2(1- x ) Alloys at Room Temperature with 1T'-WTe 2 -Contact. Adv Sci (Weinh) 2024; 11:e2304890. [PMID: 37974381 PMCID: PMC10787083 DOI: 10.1002/advs.202304890] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/18/2023] [Revised: 09/25/2023] [Indexed: 11/19/2023]
Abstract
Monolayer ternary tellurides based on alloying different transition metal dichalcogenides (TMDs) can result in new two-dimensional (2D) materials ranging from semiconductors to metals and superconductors with tunable optical and electrical properties. Semiconducting WTe2 x S2(1- x ) monolayer possesses two inequivalent valleys in the Brillouin zone, each valley coupling selectively with circularly polarized light (CPL). The degree of valley polarization (DVP) under the excitation of CPL represents the purity of valley polarized photoluminescence (PL), a critical parameter for opto-valleytronic applications. Here, new strategies to efficiently tailor the valley-polarized PL from semiconducting monolayer WTe2 x S2(1- x ) at room temperature (RT) through alloying and back-gating are presented. The DVP at RT is found to increase drastically from < 5% in WS2 to 40% in WTe0.12 S1.88 by Te-alloying to enhance the spin-orbit coupling. Further enhancement and control of the DVP from 40% up to 75% is demonstrated by electrostatically doping the monolayer WTe0.12 S1.88 via metallic 1T'-WTe2 electrodes, where the use of 1T'-WTe2 substantially lowers the Schottky barrier height (SBH) and weakens the Fermi-level pinning of the electrical contacts. The demonstration of drastically enhanced DVP and electrical tunability in the valley-polarized emission from 1T'-WTe2 /WTe0.12 S1.88 heterostructures paves new pathways towards harnessing valley excitons in ultrathin valleytronic devices for RT applications.
Collapse
Affiliation(s)
- Wei-Hsiang Lin
- Department of Applied Physics, California Institute of Technology, Pasadena, CA, 91125, USA
| | - Chia-Shuo Li
- Graduate Institute of Photonics and Optoelectronics and Department of Electrical Engineering, National Taiwan University, Taipei, Taiwan, 106, P. R. China
| | - Chih-I Wu
- Graduate Institute of Photonics and Optoelectronics and Department of Electrical Engineering, National Taiwan University, Taipei, Taiwan, 106, P. R. China
| | - George R Rossman
- Department of Geological and Planetary Sciences, California Institute of Technology, Pasadena, CA, 91125, USA
| | - Harry A Atwater
- Department of Applied Physics, California Institute of Technology, Pasadena, CA, 91125, USA
| | - Nai-Chang Yeh
- Department of Physics, California Institute of Technology, Pasadena, CA, 91125, USA
- Kavli Nanoscience Institute, California Institute of Technology, Pasadena, CA, 91125, USA
| |
Collapse
|
11
|
Sung CY, Lin CY, Chueh CC, Lin YC, Chen WC. Investigating the Mobility-Compressibility Properties of Conjugated Polymers by the Contact Film Transfer Method with Prestrain. Macromol Rapid Commun 2024; 45:e2300058. [PMID: 36913597 DOI: 10.1002/marc.202300058] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/01/2023] [Revised: 02/28/2023] [Indexed: 03/14/2023]
Abstract
Up to now, researches on the mobility-stretchability of semiconducting polymers are extensively investigated, but little attention was paid to their morphology and field-effect transistor characteristics under compressive strains, which is equally crucial in wearable electronic applications. In this work, a contact film transfer method is applied to evaluate the mobility-compressibility properties of conjugated polymers. A series of isoindigo-bithiophene conjugated polymers with symmetric carbosilane side chains (P(SiSi)), siloxane-terminated alkyl side chains (P(SiOSiO)), and combined asymmetric side chains (P(SiOSi)) are investigated. Accordingly, a compressed elastomer slab is used to transfer and compress the polymer films by releasing prestrain, and the morphology and mobility evolutions of these polymers are tracked. It is found that P(SiOSi) outperforms the other symmetric polymers including P(Si─Si) and P(SiO─SiO), having the ability to dissipate strain with its shortened lamellar spacing and orthogonal chain alignment. Notably, the mechanical durability of P(SiOSi) is also enhanced after consecutive compress-release cycles. In addition, the contact film transfer technique is demonstrated to be applicable to investigate the compressibility of different semiconducting polymers. These results demonstrate a comprehensive approach to understand the mobility-compressibility properties of semiconducting polymers under tensile and compressive strains.
Collapse
Affiliation(s)
- Chih-Yuan Sung
- Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan
| | - Chia-Yu Lin
- Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan
| | - Chu-Chen Chueh
- Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan
- Advanced Research Center for Green Materials Science and Technology, National Taiwan University, Taipei, 10617, Taiwan
| | - Yan-Cheng Lin
- Department of Chemical Engineering, National Cheng Kung University, Tainan City, 70101, Taiwan
- Advanced Research Center for Green Materials Science and Technology, National Taiwan University, Taipei, 10617, Taiwan
| | - Wen-Chang Chen
- Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan
- Advanced Research Center for Green Materials Science and Technology, National Taiwan University, Taipei, 10617, Taiwan
| |
Collapse
|
12
|
Zhao S, Zhao Y, Li C, Wang W, Liu HY, Cui L, Li X, Yang Z, Zhang A, Wang Y, Lin Y, Hao T, Yin J, Kang J, Zhu J. Aramid Nanodielectrics for Ultraconformal Transparent Electronic Skins. Adv Mater 2024; 36:e2305479. [PMID: 37705254 DOI: 10.1002/adma.202305479] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/08/2023] [Revised: 09/09/2023] [Indexed: 09/15/2023]
Abstract
On-skin electronics require minimal thicknesses and decent transparency for conformal contact, imperceptible wearing, and visual aesthetics. It is challenging to search for advanced ultrathin dielectrics capable of supporting the active components while maintaining bending softness, easy handling, and wafer-scale processability. Here, self-delaminated aramid nanodielectrics (ANDs) are demonstrated, enabling any skin-like electronics easily exfoliated from the processing substrates after complicated nanofabrication. In addition, ANDs are mechanically strong, chemically and thermally stable, transparent and breathable, therefore are ideal substrates for soft electronics. As demonstrated, compliant epidermal electrodes comprising silver nanowires and ANDs can successfully record high-quality electromyogram signals with low motion artifacts and satisfying sweat and water resistance. Furthermore, ANDs can serve as both substrates and dielectrics in single-walled carbon nanotube field-effect transistors (FETs) with a merely 160-nm thickness, which can be operated within 4 V with on/off ratios of 1.4 ± 0.5 × 105 , mobilities of 39.9 ± 2.2 cm2 V-1 s-1 , and negligible hysteresis. The ultraconformal FETs can function properly when wrapped around human hair without any degradation in performance.
Collapse
Affiliation(s)
- Sanchuan Zhao
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Yingtao Zhao
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Chenning Li
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Wei Wang
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Hai-Yang Liu
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Lei Cui
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Xiang Li
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Zhenhua Yang
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Anni Zhang
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Yurou Wang
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Yuxuan Lin
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Tailang Hao
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Jun Yin
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| | - Joohoon Kang
- School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea
| | - Jian Zhu
- School of Materials Science and Engineering, National Institute for Advanced Materials Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin, 300350, P. R. China
| |
Collapse
|
13
|
Perinot A, Scuratti F, Scaccabarozzi AD, Tran K, Salazar-Rios JM, Loi MA, Salvatore G, Fabiano S, Caironi M. Solution-Processed Polymer Dielectric Interlayer for Low-Voltage, Unipolar n-Type Organic Field-Effect Transistors. ACS Appl Mater Interfaces 2023; 15:56095-56105. [PMID: 37990398 DOI: 10.1021/acsami.3c11285] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/23/2023]
Abstract
The integration of organic electronic circuits into real-life applications compels the fulfillment of a range of requirements, among which the ideal operation at a low voltage with reduced power consumption is paramount. Moreover, these performance factors should be achieved via solution-based fabrication schemes in order to comply with the promise of cost- and energy-efficient manufacturing offered by an organic, printed electronic technology. Here, we propose a solution-based route for the fabrication of low-voltage organic transistors, encompassing ideal device operation at voltages below 5 V and exhibiting n-type unipolarization. This process is widely applicable to a variety of semiconducting and dielectric materials. We achieved this through the use of a photo-cross-linked, low-k dielectric interlayer, which is used to fabricate multilayer dielectric stacks with areal capacitances of up to 40 nF/cm2 and leakage currents below 1 nA/cm2. Because of the chosen azide-based cross-linker, the dielectric promotes n-type unipolarization of the transistors and demonstrated to be compatible with different classes of semiconductors, from conjugated polymers to carbon nanotubes and low-temperature metal oxides. Our results demonstrate a general applicability of our unipolarizing dielectric, facilitating the implementation of complementary circuitry of emerging technologies with reduced power consumption.
Collapse
Affiliation(s)
- Andrea Perinot
- Center for Nano Science and Technology, Istituto Italiano di Tecnologia, Via Raffaele Rubattino 81, 20134 Milan, Italy
| | - Francesca Scuratti
- Center for Nano Science and Technology, Istituto Italiano di Tecnologia, Via Raffaele Rubattino 81, 20134 Milan, Italy
| | - Alberto D Scaccabarozzi
- Center for Nano Science and Technology, Istituto Italiano di Tecnologia, Via Raffaele Rubattino 81, 20134 Milan, Italy
| | - Karolina Tran
- Photophysics and OptoElectronics, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
| | - Jorge Mario Salazar-Rios
- Photophysics and OptoElectronics, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
| | - Maria Antonietta Loi
- Photophysics and OptoElectronics, Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands
| | - Giovanni Salvatore
- Department of Molecular Sciences and Nanosystems, Ca' Foscari University of Venice, Via Torino, 155─Alfa Building, 30172 Mestre Venice, Italy
| | - Simone Fabiano
- Laboratory of Organic Electronics, Department of Science and Technology, Linköping University, 60 174 Norrköping, Sweden
| | - Mario Caironi
- Center for Nano Science and Technology, Istituto Italiano di Tecnologia, Via Raffaele Rubattino 81, 20134 Milan, Italy
| |
Collapse
|
14
|
Yan ZY, Hou Z, Xue KH, Tian H, Lu T, Xue J, Wu F, Zhao R, Shao M, Yan J, Yan A, Wang Z, Shen P, Zhao M, Miao X, Lin Z, Liu H, Yang Y, Ren TL. Landauer-QFLPS Model for Mixed Schottky-Ohmic Contact Two-Dimensional Transistors. Adv Sci (Weinh) 2023; 10:e2303734. [PMID: 37814361 DOI: 10.1002/advs.202303734] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/08/2023] [Revised: 08/22/2023] [Indexed: 10/11/2023]
Abstract
Two-dimensional material-based field-effect transistors (2DM-FETs) are playing a revolutionary role in electronic devices. However, before electronic design automation (EDA) for 2DM-FETs can be achieved, it remains necessary to determine how to incorporate contact transports into model. Reported methods compromise between physical intelligibility and model compactness due to the heterojunction nature. To address this, quasi-Fermi-level phase space theory (QFLPS) is generalized to incorporate contact transports using the Landauer formula. It turns out that the Landauer-QFLPS model effectively overcomes the issue of concern. The proposed new formula can describe 2DM-FETs with Schottky or Ohmic contacts with superior accuracy and efficiency over previous methods, especially when describing non-monotonic drain conductance characteristics. A three-bit threshold inverter quantizer (TIQ) circuit is fabricated using ambipolar black phosphorus and it is demonstrated that the model accurately predicts circuit performance. The model could be very effective and valuable in the development of 2DM-FET-based integrated circuits.
Collapse
Affiliation(s)
- Zhao-Yi Yan
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Zhan Hou
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Kan-Hao Xue
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430074, China
- Hubei Yangtze Memory Laboratories, Wuhan, 430205, China
| | - He Tian
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Tian Lu
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Junying Xue
- Department of Chemistry, Tsinghua University, Beijing, 100084, China
| | - Fan Wu
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Ruiting Zhao
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Minghao Shao
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Jianlan Yan
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Anzhi Yan
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Zhenze Wang
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Penghui Shen
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Mingyue Zhao
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Xiangshui Miao
- School of Integrated Circuits, Huazhong University of Science and Technology, Wuhan, 430074, China
- Hubei Yangtze Memory Laboratories, Wuhan, 430205, China
| | - Zhaoyang Lin
- Department of Chemistry, Tsinghua University, Beijing, 100084, China
| | - Houfang Liu
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Yi Yang
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| | - Tian-Ling Ren
- School of Integrated Circuits, Tsinghua University, Beijing, 100084, China
- Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing, 100084, China
| |
Collapse
|
15
|
Wang L, Guo Z, Lan Q, Song W, Zhong Z, Yang K, Zhao T, Huang H, Zhang C, Shi W. Controllable Carrier Doping in Two-Dimensional Materials Using Electron-Beam Irradiation and Scalable Oxide Dielectrics. Micromachines (Basel) 2023; 14:2125. [PMID: 38004982 PMCID: PMC10673063 DOI: 10.3390/mi14112125] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/31/2023] [Revised: 11/17/2023] [Accepted: 11/18/2023] [Indexed: 11/26/2023]
Abstract
Two-dimensional (2D) materials, characterized by their atomically thin nature and exceptional properties, hold significant promise for future nano-electronic applications. The precise control of carrier density in these 2D materials is essential for enhancing performance and enabling complex device functionalities. In this study, we present an electron-beam (e-beam) doping approach to achieve controllable carrier doping effects in graphene and MoS2 field-effect transistors (FETs) by leveraging charge-trapping oxide dielectrics. By adding an atomic layer deposition (ALD)-grown Al2O3 dielectric layer on top of the SiO2/Si substrate, we demonstrate that controllable and reversible carrier doping effects can be effectively induced in graphene and MoS2 FETs through e-beam doping. This new device configuration establishes an oxide interface that enhances charge-trapping capabilities, enabling the effective induction of electron and hole doping beyond the SiO2 breakdown limit using high-energy e-beam irradiation. Importantly, these high doping effects exhibit non-volatility and robust stability in both vacuum and air environments for graphene FET devices. This methodology enhances carrier modulation capabilities in 2D materials and holds great potential for advancing the development of scalable 2D nano-devices.
Collapse
Affiliation(s)
- Lu Wang
- State Key Laboratory of Surface Physics, Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, China
| | - Zejing Guo
- State Key Laboratory of Surface Physics, Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, China
| | - Qing Lan
- State Key Laboratory of Surface Physics, Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, China
| | - Wenqing Song
- State Key Laboratory of Surface Physics, Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, China
| | - Zhipeng Zhong
- Shanghai Frontiers Science Research Base of Intelligent Optoelectronic and Perception, Institute of Optoelectronic and Department of Material Science, Fudan University, Shanghai 200433, China
| | - Kunlin Yang
- State Key Laboratory of Surface Physics, Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, China
| | - Tuoyu Zhao
- State Key Laboratory of Surface Physics, Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, China
| | - Hai Huang
- Shanghai Frontiers Science Research Base of Intelligent Optoelectronic and Perception, Institute of Optoelectronic and Department of Material Science, Fudan University, Shanghai 200433, China
| | - Cheng Zhang
- State Key Laboratory of Surface Physics, Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, China
| | - Wu Shi
- State Key Laboratory of Surface Physics, Institute for Nanoelectronic Devices and Quantum Computing, Fudan University, Shanghai 200433, China
- Zhangjiang Fudan International Innovation Center, Fudan University, Shanghai 201210, China
| |
Collapse
|
16
|
Hou T, Li D, Qu Y, Hao Y, Lai Y. The Role of Carbon in Metal-Organic Chemical Vapor Deposition-Grown MoS 2 Films. Materials (Basel) 2023; 16:7030. [PMID: 37959627 PMCID: PMC10647219 DOI: 10.3390/ma16217030] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/25/2023] [Revised: 10/20/2023] [Accepted: 11/01/2023] [Indexed: 11/15/2023]
Abstract
Acquiring homogeneous and reproducible wafer-scale transition metal dichalcogenide (TMDC) films is crucial for modern electronics. Metal-organic chemical vapor deposition (MOCVD) offers a promising approach for scalable production and large-area integration. However, during MOCVD synthesis, extraneous carbon incorporation due to organosulfur precursor pyrolysis is a persistent concern, and the role of unintentional carbon incorporation remains elusive. Here, we report the large-scale synthesis of molybdenum disulfide (MoS2) thin films, accompanied by the formation of amorphous carbon layers. Using Raman, photoluminescence (PL) spectroscopy, and transmission electron microscopy (TEM), we confirm how polycrystalline MoS2 combines with extraneous amorphous carbon layers. Furthermore, by fabricating field-effect transistors (FETs) using the carbon-incorporated MoS2 films, we find that traditional n-type MoS2 can transform into p-type semiconductors owing to the incorporation of carbon, a rare occurrence among TMDC materials. This unexpected behavior expands our understanding of TMDC properties and opens up new avenues for exploring novel device applications.
Collapse
Affiliation(s)
- Tianyu Hou
- National Laboratory of Solid State Microstructures, School of Physics, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, China
| | - Di Li
- Key Laboratory of Photovoltaic and Energy Conservation Materials, Institute of Solid State Physics, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China
| | - Yan Qu
- The Sixth Element (Changzhou) Materials Technology Co., Ltd. and Jiangsu Jiangnan Xiyuan Graphene Technology Co., Ltd., Changzhou 213161, China
| | - Yufeng Hao
- National Laboratory of Solid State Microstructures, School of Physics, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, China
| | - Yun Lai
- National Laboratory of Solid State Microstructures, School of Physics, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, China
| |
Collapse
|
17
|
Zeitter N, Hippchen N, Weidlich A, Jäger P, Ludwig P, Rominger F, Dreuw A, Freudenberg J, Bunz UHF. Hexakis-TIPS-Alkynylated Nonacenes: Persistent and Processible. Chemistry 2023; 29:e202302323. [PMID: 37490332 DOI: 10.1002/chem.202302323] [Citation(s) in RCA: 3] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/20/2023] [Revised: 07/25/2023] [Accepted: 07/25/2023] [Indexed: 07/26/2023]
Abstract
Four substituted nonacenes were prepared and characterized by UV-vis and EPR spectroscopy and X-ray crystallography. The compounds are the most stable and soluble nonacenes to date - due to six strategically placed triisopropylsilyl(TIPS)-ethynyl groups. They are stable for several weeks in the solid state. In dilute solution their half-life is 5-9 h. Crystal structure analyses of two nonacenes prove their structures. A nonacene derivative was tested in a solution-processed transistor and exhibits ambipolar charge transport (μe =0.007 cm2 /Vs; μh =0.023 cm2 /Vs).
Collapse
Affiliation(s)
- Nico Zeitter
- Organisch-Chemisches Institut, Ruprecht-Karls-Universität Heidelberg, Im Neuenheimer Feld 270, 69120, Heidelberg, Germany
| | - Nikolai Hippchen
- Organisch-Chemisches Institut, Ruprecht-Karls-Universität Heidelberg, Im Neuenheimer Feld 270, 69120, Heidelberg, Germany
| | - Anna Weidlich
- Interdisciplinary Center for Scientific Computing, Ruprecht-Karls-Universität Heidelberg, Im Neuenheimer Feld 205, 69120, Heidelberg, Germany
| | - Patrick Jäger
- Organisch-Chemisches Institut, Ruprecht-Karls-Universität Heidelberg, Im Neuenheimer Feld 270, 69120, Heidelberg, Germany
| | - Philipp Ludwig
- Organisch-Chemisches Institut, Ruprecht-Karls-Universität Heidelberg, Im Neuenheimer Feld 270, 69120, Heidelberg, Germany
| | - Frank Rominger
- Organisch-Chemisches Institut, Ruprecht-Karls-Universität Heidelberg, Im Neuenheimer Feld 270, 69120, Heidelberg, Germany
| | - Andreas Dreuw
- Interdisciplinary Center for Scientific Computing, Ruprecht-Karls-Universität Heidelberg, Im Neuenheimer Feld 205, 69120, Heidelberg, Germany
| | - Jan Freudenberg
- Organisch-Chemisches Institut, Ruprecht-Karls-Universität Heidelberg, Im Neuenheimer Feld 270, 69120, Heidelberg, Germany
| | - Uwe H F Bunz
- Organisch-Chemisches Institut, Ruprecht-Karls-Universität Heidelberg, Im Neuenheimer Feld 270, 69120, Heidelberg, Germany
| |
Collapse
|
18
|
Qiu X, Xia J, Liu Y, Chen PA, Huang L, Wei H, Ding J, Gong Z, Zeng X, Peng C, Chen C, Wang X, Jiang L, Liao L, Hu Y. Ambient-Stable 2D Dion-Jacobson Phase Tin Halide Perovskite Field-Effect Transistors with Mobility over 1.6 Cm 2 V -1 s -1. Adv Mater 2023; 35:e2305648. [PMID: 37603829 DOI: 10.1002/adma.202305648] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/12/2023] [Revised: 08/10/2023] [Indexed: 08/23/2023]
Abstract
Solution-processed metal halide perovskites hold immense potential for the advancement of next-generation field-effect transistors (FETs). However, the instability of perovskite-based transistors has impeded their progress and practical applications. Here, ambient-stable high-performance FETs based on 2D Dion-Jacobson phase tin halide perovskite BDASnI4 , which has high film quality and excellent electrical properties, are reported. The perovskite channels are established by engineering the film crystallization process via the employment of ammonium salt interlayers and the incorporation of NH4 SCN additives within the precursor solution. The refined FETs demonstrate field-effect hole mobilities up to 1.61 cm2 V-1 s-1 and an on/off ratio surpassing 106 . Moreover, the devices show impressive operational and environmental stability and retain their functional performance even after being exposed to ambient conditions with a temperature of 45 °C and humidity of 45% for over 150 h.
Collapse
Affiliation(s)
- Xincan Qiu
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, China
- Key Laboratory of Hunan Province for 3D Scene Visualization and Intelligence Education (2023TP1038), School of Electronic Information, Hunan First Normal University, Changsha, 410205, China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, China
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Jiangnan Xia
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, China
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Yu Liu
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, China
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Ping-An Chen
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, China
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Lanyu Huang
- School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Huan Wei
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, China
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Jiaqi Ding
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, China
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Zhenqi Gong
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, China
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Xi Zeng
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, China
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Chengyuan Peng
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, China
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Chen Chen
- Science and Technology on Advanced Ceramic Fibers and Composites Laboratory, College of Aerospace Science and Engineering, National University of Defense Technology, Changsha, 410000, China
| | - Xiao Wang
- School of Physics and Electronics, Hunan University, Changsha, 410082, China
| | - Lang Jiang
- Beijing National Laboratory for Molecular Sciences, Institute of Chemistry Chinese Academy of Sciences, Beijing, 100190, China
| | - Lei Liao
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, China
| | - Yuanyuan Hu
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, China
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, China
| |
Collapse
|
19
|
Nisar S, Basha B, Dastgeer G, Shahzad ZM, Kim H, Rabani I, Rasheed A, Al‐Buriahi MS, Irfan A, Eom J, Kim D. A Novel Biosensing Approach: Improving SnS 2 FET Sensitivity with a Tailored Supporter Molecule and Custom Substrate. Adv Sci (Weinh) 2023; 10:e2303654. [PMID: 37863822 PMCID: PMC10667857 DOI: 10.1002/advs.202303654] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/05/2023] [Revised: 08/28/2023] [Indexed: 10/22/2023]
Abstract
The exclusive features of two-dimensional (2D) semiconductors, such as high surface-to-volume ratios, tunable electronic properties, and biocompatibility, provide promising opportunities for developing highly sensitive biosensors. However, developing practical biosensors that can promptly detect low concentrations of target analytes remains a challenging task. Here, a field-effect-transistor comprising n-type transition metal dichalcogenide tin disulfide (SnS2 ) is developed over the hexagonal boron nitride (h-BN) for the detection of streptavidin protein (Strep.) as a target analyte. A self-designed receptor based on the pyrene-lysine conjugated with biotin (PLCB) is utilized to maintain the sensitivity of the SnS2 /h-BN FET because of the π-π stacking. The detection capabilities of SnS2 /h-BN FET are investigated using both Raman spectroscopy and electrical characterizations. The real-time electrical measurements exhibit that the SnS2 /h-BN FET is capable of detecting streptavidin at a remarkably low concentration of 0.5 pm, within 13.2 s. Additionally, the selectivity of the device is investigated by measuring its response against a Cow-like serum egg white protein (BSA), having a comparative molecular weight to that of the streptavidin. These results indicate a high sensitivity and rapid response of SnS2 /h-BN biosensor against the selective proteins, which can have significant implications in several fields including point-of-care diagnostics, drug discovery, and environmental monitoring.
Collapse
Affiliation(s)
- Sobia Nisar
- Department of Electrical EngineeringSejong UniversitySeoul05006Republic of Korea
- Department of Convergence Engineering for Intelligent DroneSejong UniversitySeoul05006Republic of Korea
| | - Beriham Basha
- Department of PhysicsCollege of SciencesPrincess Nourah bint Abdulrahman UniversityP. O Box 84428Riyadh11671Saudi Arabia
| | - Ghulam Dastgeer
- Department of Physics and AstronomySejong UniversitySeoul05006Republic of Korea
| | - Zafar M. Shahzad
- SKKU Advanced Institute of Nanotechnology (SAINT) and Department of Chemical and Polymer EngineeringSungkyunkwan UniversitySuwon16419Republic of Korea
- Department of Chemical and Polymer EngineeringUniversity of Engineering & TechnologyFaisalabad CampusLahore38000Pakistan
| | - Honggyun Kim
- Department of Semiconductor Systems EngineeringSejong UniversitySeoul05006Republic of Korea
| | - Iqra Rabani
- Department of Nanotechnology and Advanced Materials EngineeringSejong UniversitySeoul05006Republic of Korea
| | - Aamir Rasheed
- School of Materials Science and EngineeringAnhui UniversityHefeiAnhui230601People's Republic of China
| | | | - Ahmad Irfan
- Department of ChemistryCollege of ScienceKing Khalid UniversityP.O. Box 9004Abha61413Saudi Arabia
| | - Jonghwa Eom
- Department of Physics and AstronomySejong UniversitySeoul05006Republic of Korea
| | - Deok‐kee Kim
- Department of Electrical EngineeringSejong UniversitySeoul05006Republic of Korea
- Department of Semiconductor Systems EngineeringSejong UniversitySeoul05006Republic of Korea
| |
Collapse
|
20
|
Kang YZ, An GH, Jeon MG, Shin SJ, Kim SJ, Choi M, Lee JB, Kim TY, Rahman IN, Seo HY, Oh S, Cho B, Choi J, Lee HS. Increased Mobility and Reduced Hysteresis of MoS 2 Field-Effect Transistors via Direct Surface Precipitation of CsPbBr 3-Nanoclusters for Charge Transfer Doping. Nano Lett 2023; 23:8914-8922. [PMID: 37722002 DOI: 10.1021/acs.nanolett.3c02293] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/20/2023]
Abstract
Transition-metal dichalcogenides (TMDs) and metal halide perovskites (MHPs) have been investigated for various applications, owing to their unique physical properties and excellent optoelectronic functionalities. TMD monolayers synthesized via chemical vapor deposition (CVD), which are advantageous for large-area synthesis, exhibit low mobility and prominent hysteresis in the electrical signals of field-effect transistors (FETs) because of their native defects. In this study, we demonstrate an increase in electrical mobility by ∼170 times and reduced hysteresis in the current-bias curves of MoS2 FETs hybridized with CsPbBr3 for charge transfer doping, which is implemented via solution-based CsPbBr3-nanocluster precipitation on CVD-grown MoS2 monolayer FETs. Electrons injected from CsPbBr3 into MoS2 induce heavy n-doping and heal point defects in the MoS2 channel layer, thus significantly increasing mobility and reducing hysteresis in the hybrid FETs. Our results provide a foundation for improving the reliability and performance of TMD-based FETs by hybridizing them with solution-based perovskites.
Collapse
Affiliation(s)
- Yae Zy Kang
- Department of Physics, Research Institute for Nanoscale Science and Technology, Chungbuk National University, 1, Chungdae-ro, Seowon-gu, Cheongju, Chungcheongbuk-do 28644, Republic of Korea
| | - Gwang Hwi An
- Department of Physics, Research Institute for Nanoscale Science and Technology, Chungbuk National University, 1, Chungdae-ro, Seowon-gu, Cheongju, Chungcheongbuk-do 28644, Republic of Korea
| | - Min-Gi Jeon
- Department of Materials Science and Engineering, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon 34134, Republic of Korea
| | - So Jeong Shin
- Department of Physics, Research Institute for Nanoscale Science and Technology, Chungbuk National University, 1, Chungdae-ro, Seowon-gu, Cheongju, Chungcheongbuk-do 28644, Republic of Korea
| | - Su Jin Kim
- Department of Physics, Research Institute for Nanoscale Science and Technology, Chungbuk National University, 1, Chungdae-ro, Seowon-gu, Cheongju, Chungcheongbuk-do 28644, Republic of Korea
| | - Min Choi
- Department of Physics, Research Institute for Nanoscale Science and Technology, Chungbuk National University, 1, Chungdae-ro, Seowon-gu, Cheongju, Chungcheongbuk-do 28644, Republic of Korea
| | - Jae Baek Lee
- Department of Physics, Research Institute for Nanoscale Science and Technology, Chungbuk National University, 1, Chungdae-ro, Seowon-gu, Cheongju, Chungcheongbuk-do 28644, Republic of Korea
| | - Tae Yeon Kim
- Department of Physics, Research Institute for Nanoscale Science and Technology, Chungbuk National University, 1, Chungdae-ro, Seowon-gu, Cheongju, Chungcheongbuk-do 28644, Republic of Korea
| | - Ikhwan Nur Rahman
- Department of Physics, Research Institute for Nanoscale Science and Technology, Chungbuk National University, 1, Chungdae-ro, Seowon-gu, Cheongju, Chungcheongbuk-do 28644, Republic of Korea
| | - Hyun Young Seo
- Department of Advanced Material Engineering, Chungbuk National University, 1, Chungdae-ro, Seowon-gu, Cheongju, Chungcheongbuk-do 28644, Republic of Korea
| | - Seyoung Oh
- Department of Advanced Material Engineering, Chungbuk National University, 1, Chungdae-ro, Seowon-gu, Cheongju, Chungcheongbuk-do 28644, Republic of Korea
| | - Byungjin Cho
- Department of Advanced Material Engineering, Chungbuk National University, 1, Chungdae-ro, Seowon-gu, Cheongju, Chungcheongbuk-do 28644, Republic of Korea
| | - Jihoon Choi
- Department of Materials Science and Engineering, Chungnam National University, 99 Daehak-ro, Yuseong-gu, Daejeon 34134, Republic of Korea
| | - Hyun Seok Lee
- Department of Physics, Research Institute for Nanoscale Science and Technology, Chungbuk National University, 1, Chungdae-ro, Seowon-gu, Cheongju, Chungcheongbuk-do 28644, Republic of Korea
| |
Collapse
|
21
|
Kim T, Choi CH, Hur JS, Ha D, Kuh BJ, Kim Y, Cho MH, Kim S, Jeong JK. Progress, Challenges, and Opportunities in Oxide Semiconductor Devices: A Key Building Block for Applications Ranging from Display Backplanes to 3D Integrated Semiconductor Chips. Adv Mater 2023; 35:e2204663. [PMID: 35862931 DOI: 10.1002/adma.202204663] [Citation(s) in RCA: 7] [Impact Index Per Article: 7.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/24/2022] [Revised: 07/04/2022] [Indexed: 06/15/2023]
Abstract
As Si has faced physical limits on further scaling down, novel semiconducting materials such as 2D transition metal dichalcogenides and oxide semiconductors (OSs) have gained tremendous attention to continue the ever-demanding downscaling represented by Moore's law. Among them, OS is considered to be the most promising alternative material because it has intriguing features such as modest mobility, extremely low off-current, great uniformity, and low-temperature processibility with conventional complementary-metal-oxide-semiconductor-compatible methods. In practice, OS has successfully replaced hydrogenated amorphous Si in high-end liquid crystal display devices and has now become a standard backplane electronic for organic light-emitting diode displays despite the short time since their invention in 2004. For OS to be implemented in next-generation electronics such as back-end-of-line transistor applications in monolithic 3D integration beyond the display applications, however, there is still much room for further study, such as high mobility, immune short-channel effects, low electrical contact properties, etc. This study reviews the brief history of OS and recent progress in device applications from a material science and device physics point of view. Simultaneously, remaining challenges and opportunities in OS for use in next-generation electronics are discussed.
Collapse
Affiliation(s)
- Taikyu Kim
- Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea
| | - Cheol Hee Choi
- Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea
| | - Jae Seok Hur
- Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea
| | - Daewon Ha
- Semiconductor R&D Center, Samsung Electronics, Hwaseong, Gyeonggi-do, 18848, Republic of Korea
| | - Bong Jin Kuh
- Semiconductor R&D Center, Samsung Electronics, Hwaseong, Gyeonggi-do, 18848, Republic of Korea
| | - Yongsung Kim
- Samsung Advanced Institute of Technology, Samsung Electronics, Suwon, Gyeonggi-do, 16678, Republic of Korea
| | - Min Hee Cho
- Semiconductor R&D Center, Samsung Electronics, Hwaseong, Gyeonggi-do, 18848, Republic of Korea
| | - Sangwook Kim
- Samsung Advanced Institute of Technology, Samsung Electronics, Suwon, Gyeonggi-do, 16678, Republic of Korea
| | - Jae Kyeong Jeong
- Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea
| |
Collapse
|
22
|
Zhang J, Barin GB, Furrer R, Du CZ, Wang XY, Müllen K, Ruffieux P, Fasel R, Calame M, Perrin ML. Determining the Number of Graphene Nanoribbons in Dual-Gate Field-Effect Transistors. Nano Lett 2023; 23:8474-8480. [PMID: 37671914 PMCID: PMC10540264 DOI: 10.1021/acs.nanolett.3c01931] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/25/2023] [Revised: 08/29/2023] [Indexed: 09/07/2023]
Abstract
Bottom-up synthesized graphene nanoribbons (GNRs) are increasingly attracting interest due to their atomically controlled structure and customizable physical properties. In recent years, a range of GNR-based field-effect transistors (FETs) has been fabricated, with several demonstrating quantum-dot (QD) behavior at cryogenic temperatures. However, understanding the relationship between the cryogenic charge-transport characteristics and the number of the GNRs in the device is challenging, as the length and location of the GNRs in the junction are not precisely controlled. Here, we present a methodology based on a dual-gate FET that allows us to identify different scenarios, such as single GNRs, double or multiple GNRs in parallel, and a single GNR interacting with charge traps. Our dual-gate FET architecture therefore offers a quantitative approach for comprehending charge transport in atomically precise GNRs.
Collapse
Affiliation(s)
- Jian Zhang
- Transport
at Nanoscale Interfaces Laboratory, Empa
Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland
| | - Gabriela Borin Barin
- nanotech@surfaces
Laboratory, Empa Swiss Federal Laboratories
for Materials Science and Technology, 8600 Dübendorf, Switzerland
| | - Roman Furrer
- Transport
at Nanoscale Interfaces Laboratory, Empa
Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland
| | - Cheng-Zhuo Du
- State
Key Laboratory of Elemento-Organic Chemistry College of Chemistry, Nankai University, 300071 Tianjin, China
| | - Xiao-Ye Wang
- State
Key Laboratory of Elemento-Organic Chemistry College of Chemistry, Nankai University, 300071 Tianjin, China
| | - Klaus Müllen
- Max
Planck Institute for Polymer Research, 55128 Mainz, Germany
| | - Pascal Ruffieux
- nanotech@surfaces
Laboratory, Empa Swiss Federal Laboratories
for Materials Science and Technology, 8600 Dübendorf, Switzerland
| | - Roman Fasel
- nanotech@surfaces
Laboratory, Empa Swiss Federal Laboratories
for Materials Science and Technology, 8600 Dübendorf, Switzerland
- Department
of Chemistry Biochemistry and Pharmaceutical Sciences, University of Bern, 3012 Bern, Switzerland
| | - Michel Calame
- Transport
at Nanoscale Interfaces Laboratory, Empa
Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland
- Department
of Physics, University of Basel, 4056 Basel, Switzerland
- Swiss
Nanoscience Institute, University of Basel, 4056 Basel, Switzerland
| | - Mickael L. Perrin
- Transport
at Nanoscale Interfaces Laboratory, Empa
Swiss Federal Laboratories for Materials Science and Technology, 8600 Dübendorf, Switzerland
- Department
of Information Technology and Electrical Engineering, ETH Zurich, 8092 Zurich, Switzerland
- Quantum
Center, ETH Zürich, 8093 Zürich, Switzerland
| |
Collapse
|
23
|
Azzaroni O, Piccinini E, Fenoy G, Marmisollé W, Ariga K. Field-effect transistors engineered via solution-based layer-by-layer nanoarchitectonics. Nanotechnology 2023; 34:472001. [PMID: 37567153 DOI: 10.1088/1361-6528/acef26] [Citation(s) in RCA: 3] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/07/2023] [Accepted: 08/10/2023] [Indexed: 08/13/2023]
Abstract
The layer-by-layer (LbL) technique has been proven to be one of the most versatile approaches in order to fabricate functional nanofilms. The use of simple and inexpensive procedures as well as the possibility to incorporate a very wide range of materials through different interactions have driven its application in a wide range of fields. On the other hand, field-effect transistors (FETs) are certainly among the most important elements in electronics. The ability to modulate the flowing current between a source and a drain electrode via the voltage applied to the gate electrode endow these devices to switch or amplify electronic signals, being vital in all of our everyday electronic devices. In this topical review, we highlight different research efforts to engineer field-effect transistors using the LbL assembly approach. We firstly discuss on the engineering of the channel material of transistors via the LbL technique. Next, the deposition of dielectric materials through this approach is reviewed, allowing the development of high-performance electronic components. Finally, the application of the LbL approach to fabricate FETs-based biosensing devices is also discussed, as well as the improvement of the transistor's interfacial sensitivity by the engineering of the semiconductor with polyelectrolyte multilayers.
Collapse
Affiliation(s)
- Omar Azzaroni
- Instituto de Investigaciones Fisicoquímica Teóricas y Aplicadas (INIFTA)-Universidad Nacional de La Plata-CONICET-Diagonal 113 y 64 (1900), Argentina
| | - Esteban Piccinini
- Instituto de Investigaciones Fisicoquímica Teóricas y Aplicadas (INIFTA)-Universidad Nacional de La Plata-CONICET-Diagonal 113 y 64 (1900), Argentina
| | - Gonzalo Fenoy
- Instituto de Investigaciones Fisicoquímica Teóricas y Aplicadas (INIFTA)-Universidad Nacional de La Plata-CONICET-Diagonal 113 y 64 (1900), Argentina
| | - Waldemar Marmisollé
- Instituto de Investigaciones Fisicoquímica Teóricas y Aplicadas (INIFTA)-Universidad Nacional de La Plata-CONICET-Diagonal 113 y 64 (1900), Argentina
| | - Katsuhiko Ariga
- Research Center for Materials Nanoarchitectonics, National Institute for Materials Science (NIMS), Tsukuba 305-0044, Japan
- Graduate School of Frontier Sciences, The University of Tokyo, Kashiwa 277-0825, Japan
| |
Collapse
|
24
|
Mahdaoui D, Hirata C, Nagaoka K, Miyazawa K, Fujii K, Ando T, Abderrabba M, Ito O, Yagyu S, Liu Y, Nakajima Y, Tsukagoshi K, Wakahara T. Ambipolar to Unipolar Conversion in C 70/Ferrocene Nanosheet Field-Effect Transistors. Nanomaterials (Basel) 2023; 13:2469. [PMID: 37686977 PMCID: PMC10490395 DOI: 10.3390/nano13172469] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/14/2023] [Revised: 08/28/2023] [Accepted: 08/29/2023] [Indexed: 09/10/2023]
Abstract
Organic cocrystals, which are assembled by noncovalent intermolecular interactions, have garnered intense interest due to their remarkable chemicophysical properties and practical applications. One notable feature, namely, the charge transfer (CT) interactions within the cocrystals, not only facilitates the formation of an ordered supramolecular network but also endows them with desirable semiconductor characteristics. Here, we present the intriguing ambipolar CT properties exhibited by nanosheets composed of single cocrystals of C70/ferrocene (C70/Fc). When heated to 150 °C, the initially ambipolar monoclinic C70/Fc nanosheet-based field-effect transistors (FETs) were transformed into n-type face-centered cubic (fcc) C70 nanosheet-based FETs owing to the elimination of Fc. This thermally induced alteration in the crystal structure was accompanied by an irreversible switching of the semiconducting behavior of the device; thus, the device transitions from ambipolar to unipolar. Importantly, the C70/Fc nanosheet-based FETs were also found to be much more thermally stable than the previously reported C60/Fc nanosheet-based FETs. Furthermore, we conducted visible/near-infrared diffuse reflectance and photoemission yield spectroscopies to investigate the crucial role played by Fc in modulating the CT characteristics. This study provides valuable insights into the overall functionality of these nanosheet structures.
Collapse
Affiliation(s)
- Dorra Mahdaoui
- Electronic Functional Macromolecules Group, Research Center for Macromolecules and Biomaterials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Ibaraki, Japan; (C.H.); (K.N.); (K.F.); (T.A.); (O.I.)
- Laboratory of Materials, Molecules and Applications, Preparatory Institute for Scientific and Technical Studies, University of Carthage, B.P. 51, La Marsa 2075, Tunisia;
| | - Chika Hirata
- Electronic Functional Macromolecules Group, Research Center for Macromolecules and Biomaterials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Ibaraki, Japan; (C.H.); (K.N.); (K.F.); (T.A.); (O.I.)
| | - Kahori Nagaoka
- Electronic Functional Macromolecules Group, Research Center for Macromolecules and Biomaterials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Ibaraki, Japan; (C.H.); (K.N.); (K.F.); (T.A.); (O.I.)
| | - Kun’ichi Miyazawa
- Department of Industrial Chemistry, Faculty of Engineering, Tokyo University of Science, 6-3-1 Niijuku, Katsushika-ku, Tokyo 125-8585, Japan;
| | - Kazuko Fujii
- Electronic Functional Macromolecules Group, Research Center for Macromolecules and Biomaterials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Ibaraki, Japan; (C.H.); (K.N.); (K.F.); (T.A.); (O.I.)
| | - Toshihiro Ando
- Electronic Functional Macromolecules Group, Research Center for Macromolecules and Biomaterials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Ibaraki, Japan; (C.H.); (K.N.); (K.F.); (T.A.); (O.I.)
| | - Manef Abderrabba
- Laboratory of Materials, Molecules and Applications, Preparatory Institute for Scientific and Technical Studies, University of Carthage, B.P. 51, La Marsa 2075, Tunisia;
| | - Osamu Ito
- Electronic Functional Macromolecules Group, Research Center for Macromolecules and Biomaterials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Ibaraki, Japan; (C.H.); (K.N.); (K.F.); (T.A.); (O.I.)
| | - Shinjiro Yagyu
- Nano Electronics Device Materials Group, Research Center for Electronic and Optical Materials, 1-1 Namiki, Tsukuba 305-0044, Ibaraki, Japan;
| | - Yubin Liu
- RIKEN KEIKI Co., Ltd., 2-7-6, Azusawa, Itabashi-ku, Tokyo 174-8744, Japan; (Y.L.); (Y.N.)
| | - Yoshiyuki Nakajima
- RIKEN KEIKI Co., Ltd., 2-7-6, Azusawa, Itabashi-ku, Tokyo 174-8744, Japan; (Y.L.); (Y.N.)
| | - Kazuhito Tsukagoshi
- International Center for Materials Nanoarchitectonics (WPI-MANA), National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Ibaraki, Japan;
| | - Takatsugu Wakahara
- Electronic Functional Macromolecules Group, Research Center for Macromolecules and Biomaterials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Ibaraki, Japan; (C.H.); (K.N.); (K.F.); (T.A.); (O.I.)
| |
Collapse
|
25
|
Gao L, Zhang X, Yu H, Hong M, Wei X, Chen Z, Zhang Q, Liao Q, Zhang Z, Zhang Y. Deciphering Vacancy Defect Evolution of 2D MoS 2 for Reliable Transistors. ACS Appl Mater Interfaces 2023; 15:38603-38611. [PMID: 37542456 DOI: 10.1021/acsami.3c07806] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/07/2023]
Abstract
Two-dimensional (2D) MoS2 is an excellent candidate channel material for next-generation integrated circuit (IC) transistors. However, the reliability of MoS2 is of great concern due to the serious threat of vacancy defects, such as sulfur vacancies (VS). Evaluating the impact of vacancy defects on the service reliability of MoS2 transistors is crucial, but it has always been limited by the difficulty in systematically tracking and analyzing the changes and effects of vacancy defects in the service environment. Here, a simulated initiator is established for deciphering the evolution of vacancy defects in MoS2 and their influence on the reliability of transistors. The results indicate that VS below 1.3% are isolated by slow enrichment during initiation. Over 1.3% of VS tend to enrich in pairs and over 3.5% of the enriched VS easily evolve into nanopores. The enriched VS with electron doping in the channel cause the threshold voltage (Vth) negative drift approaching 6 V, while the expanded nanopores initiate the Vth roll-off and punch-through of transistors. Finally, sulfur steam deposition has been proposed to constrain VS enrichment, and reliable MoS2 transistors are constructed. Our research provides a new method for deciphering and identifying the impact of defects.
Collapse
Affiliation(s)
- Li Gao
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
| | - Xiankun Zhang
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
| | - Huihui Yu
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
| | - Mengyu Hong
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
| | - Xiaofu Wei
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
| | - Zhangyi Chen
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
| | - Qinghua Zhang
- Collaborative Innovation Center of Quantum Matter, Beijing National Laboratory for Condensed Matter Physics, Institute of Physics Chinese Academy of Sciences, Beijing 100190, People's Republic of China
| | - Qingliang Liao
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
- Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
| | - Zheng Zhang
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
- Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
| | - Yue Zhang
- Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
- Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, People's Republic of China
| |
Collapse
|
26
|
Abstract
Appropriate gate dielectrics must be identified to fabricate metal-insulator-semiconductor field-effect transistors (MISFETs); however, this has been challenging for compound semiconductors owing to the absence of high-quality native oxides. This study uses the liquid-gallium squeezing technique to fabricate 2D amorphous gallium oxide (GaOX) with a high dielectric constant, where its thickness is precisely controlled at the atomic scale (monolayer, ∼4.5 nm; bilayer, ∼8.5 nm). Beta-phase gallium oxide (β-Ga2O3) with an ultrawide energy bandgap (4.5-4.9 eV) has emerged as a next-generation power semiconductor material and is presented here as the channel material. The 2D amorphous GaOX dielectric is combined with a β-Ga2O3 conducting nanolayer, and the resulting β-Ga2O3 MISFET is stable up to 250 °C. The 2D amorphous GaOX is oxygen-deficient, and a high-quality interface with excellent uniformity and scalability forms between the 2D amorphous GaOX and β-Ga2O3. The fabricated MISFET exhibits a wide gate-voltage swing of approximately +5 V, a high current on/off ratio, moderate field-effect carrier mobility, and a decent three-terminal breakdown voltage (∼138 V). The carrier transport of the Ni/GaOX/β-Ga2O3 metal-insulator-semiconductor (MIS) structure displays a combination of Schottky emission and Fowler-Nordheim (F-N) tunneling in the high-gate-bias region at 25 °C, whereas at elevated temperatures it shows Schottky emission and F-N tunneling in the low- and high-gate-bias regions, respectively. This study demonstrates that a 2D GaOX gate dielectric layer can be produced and incorporated into an active channel layer to form an MIS structure at room temperature (∼25 °C), which enables the facile fabrication of MISFET devices.
Collapse
Affiliation(s)
- Sanghyun Moon
- School of Chemical and Biological Engineering, Seoul National University, Seoul 08826, Republic of Korea
| | - Donggyu Lee
- School of Chemical and Biological Engineering, Seoul National University, Seoul 08826, Republic of Korea
| | - Jehwan Park
- School of Chemical and Biological Engineering, Seoul National University, Seoul 08826, Republic of Korea
| | - Jihyun Kim
- School of Chemical and Biological Engineering, Seoul National University, Seoul 08826, Republic of Korea
| |
Collapse
|
27
|
Liang Y, Xiao M, Xie J, Li J, Zhang Y, Liu H, Zhang Y, He J, Zhang G, Wei N, Peng LM, Ke Y, Zhang ZY. Amplification-Free Detection of SARS-CoV-2 Down to Single Virus Level by Portable Carbon Nanotube Biosensors. Small 2023; 19:e2208198. [PMID: 37046180 DOI: 10.1002/smll.202208198] [Citation(s) in RCA: 4] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/28/2022] [Revised: 03/18/2023] [Indexed: 06/19/2023]
Abstract
The rapid and sensitive detection of trace-level viruses in a simple and reliable way is of great importance for epidemic prevention and control. Here, a multi-functionalized floating gate carbon nanotube field effect transistor (FG-CNT FET) based biosensor is reported for the single virus level detection of SARS-CoV-2 virus antigen and RNA rapidly with a portable sensing platform. The aptamers functionalized sensors can detect SARS-CoV-2 antigens from unprocessed nasopharyngeal swab samples within 1 min. Meanwhile, enhanced by a multi-probe strategy, the FG-CNT FET-based biosensor can detect the long chain RNA directly without amplification down to single virus level within 1 min. The device, constructed with packaged sensor chips and a portable sensing terminal, can distinguish 10 COVID-19 patients from 10 healthy individuals in clinical tests both by the RNAs and antigens by a combination detection strategy with an combined overall percent agreement (OPA) close to 100%. The results provide a general and simple method to enhance the sensitivity of FET-based biochemical sensors for the detection of nucleic acid molecules and demonstrate that the CNT FG FET biosensor is a versatile and reliable integrated platform for ultrasensitive multibiomarker detection without amplification and has great potential for point-of-care (POC) clinical tests.
Collapse
Affiliation(s)
- Yuqi Liang
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, School of Electronics, Peking University, Beijing, 100871, China
| | - Mengmeng Xiao
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, School of Electronics, Peking University, Beijing, 100871, China
- Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Hunan, 411105, China
| | - Jing Xie
- Chinese PLA Center for Disease Control and Prevention, Beijing, 100071, China
| | - Jiahao Li
- School of Laboratory Medicine, Hubei University of Chinese Medicine, Huangjia Lake West Road, Wuhan, 430065, China
| | - Yuyan Zhang
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, School of Electronics, Peking University, Beijing, 100871, China
| | - Haiyang Liu
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, School of Electronics, Peking University, Beijing, 100871, China
| | - Yang Zhang
- Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Hunan, 411105, China
| | - Jianping He
- Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Hunan, 411105, China
| | - Guojun Zhang
- School of Laboratory Medicine, Hubei University of Chinese Medicine, Huangjia Lake West Road, Wuhan, 430065, China
| | - Nan Wei
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, School of Electronics, Peking University, Beijing, 100871, China
| | - Lian-Mao Peng
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, School of Electronics, Peking University, Beijing, 100871, China
- Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Hunan, 411105, China
| | - Yuehua Ke
- Chinese PLA Center for Disease Control and Prevention, Beijing, 100071, China
| | - Zhi-Yong Zhang
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-based Electronics, School of Electronics, Peking University, Beijing, 100871, China
- Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Hunan, 411105, China
| |
Collapse
|
28
|
Ravichandran H, Knobloch T, Pannone A, Karl A, Stampfer B, Waldhoer D, Zheng Y, Sakib NU, Karim Sadaf MU, Pendurthi R, Torsi R, Robinson JA, Grasser T, Das S. Observation of Rich Defect Dynamics in Monolayer MoS 2. ACS Nano 2023. [PMID: 37490390 DOI: 10.1021/acsnano.2c12900] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 07/27/2023]
Abstract
Defects play a pivotal role in limiting the performance and reliability of nanoscale devices. Field-effect transistors (FETs) based on atomically thin two-dimensional (2D) semiconductors such as monolayer MoS2 are no exception. Probing defect dynamics in 2D FETs is therefore of significant interest. Here, we present a comprehensive insight into various defect dynamics observed in monolayer MoS2 FETs at varying gate biases and temperatures. The measured source-to-drain currents exhibit random telegraph signals (RTS) owing to the transfer of charges between the semiconducting channel and individual defects. Based on the modeled temperature and gate bias dependence, oxygen vacancies or aluminum interstitials are probable defect candidates. Several types of RTSs are observed including anomalous RTS and giant RTS indicating local current crowding effects and rich defect dynamics in monolayer MoS2 FETs. This study explores defect dynamics in large area-grown monolayer MoS2 with ALD-grown Al2O3 as the gate dielectric.
Collapse
Affiliation(s)
- Harikrishnan Ravichandran
- Engineering Science and Mechanics, Penn State University, University Park, Pennsylvania 16802, United States
| | - Theresia Knobloch
- Institute for Microelectronics (TU Wien), Gusshausstrasse 27-29, 1040 Vienna, Austria
| | - Andrew Pannone
- Engineering Science and Mechanics, Penn State University, University Park, Pennsylvania 16802, United States
| | - Alexander Karl
- Institute for Microelectronics (TU Wien), Gusshausstrasse 27-29, 1040 Vienna, Austria
| | - Bernhard Stampfer
- Institute for Microelectronics (TU Wien), Gusshausstrasse 27-29, 1040 Vienna, Austria
| | - Dominic Waldhoer
- Institute for Microelectronics (TU Wien), Gusshausstrasse 27-29, 1040 Vienna, Austria
| | - Yikai Zheng
- Engineering Science and Mechanics, Penn State University, University Park, Pennsylvania 16802, United States
| | - Najam U Sakib
- Engineering Science and Mechanics, Penn State University, University Park, Pennsylvania 16802, United States
| | - Muhtasim Ul Karim Sadaf
- Engineering Science and Mechanics, Penn State University, University Park, Pennsylvania 16802, United States
| | - Rahul Pendurthi
- Engineering Science and Mechanics, Penn State University, University Park, Pennsylvania 16802, United States
| | - Riccardo Torsi
- Materials Science and Engineering, Penn State University, University Park, Pennsylvania 16802, United States
| | - Joshua A Robinson
- Materials Science and Engineering, Penn State University, University Park, Pennsylvania 16802, United States
- Department of Chemistry, Penn State University, University Park, Pennsylvania 16802, United States
- Department of Physics, Penn State University, University Park, Pennsylvania 16802, United States
| | - Tibor Grasser
- Institute for Microelectronics (TU Wien), Gusshausstrasse 27-29, 1040 Vienna, Austria
| | - Saptarshi Das
- Engineering Science and Mechanics, Penn State University, University Park, Pennsylvania 16802, United States
- Materials Science and Engineering, Penn State University, University Park, Pennsylvania 16802, United States
- Materials Research Institute, Penn State University, University Park, Pennsylvania 16802, United States
- Electrical Engineering, Penn State University, University Park, Pennsylvania 16802, United States
| |
Collapse
|
29
|
Bulgarevich K, Horiuchi S, Takimiya K. Crystal-Structure Simulation of Methylthiolated Peri-Condensed Polycyclic Aromatic Hydrocarbons for Identifying Promising Molecular Semiconductors: Discovery of 1,3,8,10-tetrakis(methylthio)peropyrene Showing Ultrahigh Mobility. Adv Mater 2023:e2305548. [PMID: 37468127 DOI: 10.1002/adma.202305548] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/09/2023] [Revised: 07/10/2023] [Accepted: 07/17/2023] [Indexed: 07/21/2023]
Abstract
The crystal structures of molecular semiconductors critically affect their carrier-transport properties. One of the promising crystal structures that afford high carrier mobility is a brickwork structure recently reported for 1,3,6,8-tetrakis(methylthio)pyrene (MT-pyrene) showing ultrahigh mobility. However, such ultrahigh mobility is not realized in other methylchalocogenolated pyrenes, owing to subtle differences in the molecular positions in their crystal structures. This means that, for developing superior molecular semiconductors, it is desirable to simulate the crystal structure with sufficient quality before time-consuming and labor-intensive synthetic trials. To realize this, a new computational approach is developed to simulate crystal structures of all methylchalocogenolated pyrenes, which is then applied to MT-pyrene-related methylthiolated peri-condensed polycyclic aromatic hydrocarbons including perylene, peropyrene, and terrylene derivatives. Among these, 1,3,8,10-tetrakis(methylthio)peropyrene (MT-peropyrene) is expected to show high mobility based on the simulated crystal structures. Thus, MT-peropyrene is chosen as the synthetic target, and a new peropyrene synthesis method is developed. Thus synthesized MT-peropyrene has virtually the same crystal structure as the simulated one, and its single-crystal field-effect transistors show mobility as high as 30 cm2 V-1 s-1 and band-like transport behaviors. These results indicate that the present crystal-structure simulation is a powerful tool for exploring promising molecular semiconductors.
Collapse
Affiliation(s)
- Kirill Bulgarevich
- RIKEN Center for Emergent Matter Science (CEMS), 2-1 Hirosawa, Wako, Saitama, 351-0198, Japan
| | - Shingo Horiuchi
- RIKEN Center for Emergent Matter Science (CEMS), 2-1 Hirosawa, Wako, Saitama, 351-0198, Japan
- Department of Chemistry, Graduate School of Science, Tohoku University, 6-3 Aoba, Aramaki, Aoba-ku, Sendai, Miyagi, 980-8578, Japan
| | - Kazuo Takimiya
- RIKEN Center for Emergent Matter Science (CEMS), 2-1 Hirosawa, Wako, Saitama, 351-0198, Japan
- Department of Chemistry, Graduate School of Science, Tohoku University, 6-3 Aoba, Aramaki, Aoba-ku, Sendai, Miyagi, 980-8578, Japan
- Tohoku University Advanced Institute for Materials Research (AIMR), 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi, 980-8577, Japan
| |
Collapse
|
30
|
Chen J, Wu G, Ding Y, Chen Q, Gao W, Zhang T, Jing X, Lin H, Xue F, Tao L. Antioxidative 2D Bismuth Selenide via Halide Passivation for Enhanced Device Stability. Nanomaterials (Basel) 2023; 13:2056. [PMID: 37513067 PMCID: PMC10383381 DOI: 10.3390/nano13142056] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/28/2023] [Revised: 07/01/2023] [Accepted: 07/06/2023] [Indexed: 07/30/2023]
Abstract
The topological insulator 2D Bi2Se3 is promising for electronic devices due to its unique electronic properties; however, it is challenging to prepare antioxidative nanosheets since Bi2Se3 is prone to oxidation. Surface passivation using ligand agents after Bi2Se3 exfoliation works well to protect the surface, but the process is time-consuming and technically challenging; a passivation agent that is stable under a highly biased potential is significant for in situ passivation of the Bi2Se3 surface. In this work, the roles of halide anions (Cl-, Br-, and I-) in respect of the chemical properties of synthetic Bi2Se3 nanosheets during electrochemical intercalated exfoliation were investigated to determine the antioxidation capacity. It was found that Bi2Se3 nanosheets prepared in a solution of tetrabutylammonium chloride (TBA+ and Cl-) have the best oxidation resistance via the surface bonding of Bi with Cl, which promotes obtaining better device stability. This work paves an avenue for adjusting the components of the electrolyte to further promote the stability of 2D Bi2Se3-nanosheet-based electronic devices.
Collapse
Affiliation(s)
- Jiayi Chen
- School of Materials Science and Engineering, Southeast University, Nanjing 211189, China
- Jiangsu Key Laboratory for Advanced Metallic Materials, Southeast University, Nanjing 211189, China
| | - Guodong Wu
- School of Materials Science and Engineering, Southeast University, Nanjing 211189, China
- Jiangsu Key Laboratory for Advanced Metallic Materials, Southeast University, Nanjing 211189, China
| | - Yamei Ding
- School of Materials Science and Engineering, Southeast University, Nanjing 211189, China
- Jiangsu Key Laboratory for Advanced Metallic Materials, Southeast University, Nanjing 211189, China
| | - Qichao Chen
- School of Materials Science and Engineering, Southeast University, Nanjing 211189, China
- Jiangsu Key Laboratory for Advanced Metallic Materials, Southeast University, Nanjing 211189, China
| | - Wenya Gao
- School of Materials Science and Engineering, Southeast University, Nanjing 211189, China
- Jiangsu Key Laboratory for Advanced Metallic Materials, Southeast University, Nanjing 211189, China
| | - Tuo Zhang
- School of Materials Science and Engineering, Southeast University, Nanjing 211189, China
- Jiangsu Key Laboratory for Advanced Metallic Materials, Southeast University, Nanjing 211189, China
| | - Xu Jing
- School of Materials Science and Engineering, Southeast University, Nanjing 211189, China
- Jiangsu Key Laboratory for Advanced Metallic Materials, Southeast University, Nanjing 211189, China
| | - Huiwen Lin
- School of Materials Science and Engineering, Southeast University, Nanjing 211189, China
- Jiangsu Key Laboratory for Advanced Metallic Materials, Southeast University, Nanjing 211189, China
| | - Feng Xue
- School of Materials Science and Engineering, Southeast University, Nanjing 211189, China
- Jiangsu Key Laboratory for Advanced Metallic Materials, Southeast University, Nanjing 211189, China
| | - Li Tao
- School of Materials Science and Engineering, Southeast University, Nanjing 211189, China
- Jiangsu Key Laboratory for Advanced Metallic Materials, Southeast University, Nanjing 211189, China
| |
Collapse
|
31
|
Cho H, Jin HJ, Lee S, Jeon S, Cho Y, Park S, Jang M, Widiapradja LJ, Ryu DY, Park JH, Kim K, Im S. 5 nm Ultrathin Crystalline Ferroelectric P(VDF-TrFE)-Brush Tuned for Hysteresis-Free Sub 60 mV dec -1 Negative-Capacitance Transistors. Adv Mater 2023; 35:e2300478. [PMID: 36940281 DOI: 10.1002/adma.202300478] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/15/2023] [Revised: 02/23/2023] [Indexed: 06/02/2023]
Abstract
Negative-capacitance field-effect transistors (NC-FETs) have gathered enormous interest as a way to reduce subthreshold swing (SS) and overcome the issue of power dissipation in modern integrated circuits. For stable NC behavior at low operating voltages, the development of ultrathin ferroelectrics (FE), which are compatible with the industrial process, is of great interest. Here, a new scalable ultrathin ferroelectric polymer layer is developed based on trichloromethyl (CCl3 )-terminated poly(vinylidene difluoride-co-trifloroethylene) (P(VDF-TrFE)) to achieve the state-of-the-art performance of NC-FETs. The crystalline phase of 5-10 nm ultrathin P(VDF-TrFE) is prepared on AlOX by a newly developed brush method, which enables an FE/dielectric (DE) bilayer. FE/DE thickness ratios are then systematically tuned at ease to achieve ideal capacitance matching. NC-FETs with optimized FE/DE thickness at a thickness limit demonstrate hysteresis-free operation with an SS of 28 mV dec-1 at ≈1.5 V, which competes with the best reports. This P(VDF-TrFE)-brush layer can be broadly adapted to NC-FETs, opening an exciting avenue for low-power devices.
Collapse
Affiliation(s)
- Hyunmin Cho
- Van der Waals, Materials Research Center, Department of Physics, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea
| | - Hye-Jin Jin
- Van der Waals, Materials Research Center, Department of Physics, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea
| | - Sol Lee
- Van der Waals, Materials Research Center, Department of Physics, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea
- Center for Nanomedicine, Institute for Basic Science (IBS), Seoul, 03722, Republic of Korea
| | - Seungbae Jeon
- Department of Chemical and Biomolecular Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea
| | - Yongjae Cho
- Van der Waals, Materials Research Center, Department of Physics, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea
| | - Sam Park
- Van der Waals, Materials Research Center, Department of Physics, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea
| | - Myeongjin Jang
- Van der Waals, Materials Research Center, Department of Physics, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea
- Center for Nanomedicine, Institute for Basic Science (IBS), Seoul, 03722, Republic of Korea
| | - Livia Janice Widiapradja
- Van der Waals, Materials Research Center, Department of Physics, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea
| | - Du Yeol Ryu
- Department of Chemical and Biomolecular Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea
| | - Ji Hoon Park
- Department of Electronics and Electrical Engineering, Dankook University, Yongin, Gyeonggi-do, 16890, Republic of Korea
| | - Kwanpyo Kim
- Van der Waals, Materials Research Center, Department of Physics, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea
- Center for Nanomedicine, Institute for Basic Science (IBS), Seoul, 03722, Republic of Korea
| | - Seongil Im
- Van der Waals, Materials Research Center, Department of Physics, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea
| |
Collapse
|
32
|
Hu S, Tang B, Kershaw SV, Rogach AL. Metal Halide Perovskite Photo- Field-Effect Transistors with Chiral Selectivity. ACS Appl Mater Interfaces 2023. [PMID: 37218600 DOI: 10.1021/acsami.3c03201] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Subscribe] [Scholar Register] [Indexed: 05/24/2023]
Abstract
Organic-inorganic (hybrid) metal halide perovskites (MHPs) incorporating chiral organic ligand molecules are naturally sensitive to left- and right-handed circular polarized light, potentially enabling selective circular polarized photodetection. Here, the photoresponses in chiral MHP polycrystalline thin films made of ((S)-(-)-α-methyl benzylamine)2PbI4 and ((R)-(+)-α-methyl benzylamine)2PbI4, denoted as (S-MBA)2 PbI4 and (R-MBA)2PbI4, respectively, are investigated by employing a thin-film field-effect transistor (FET) configuration. The left-hand-sensitive films made of (S-MBA)2PbI4 perovskite show higher photocurrent under left-handed circularly polarized (LCP) light than under right-handed circularly polarized (RCP) illumination under otherwise identical conditions. Conversely, the right-hand-sensitive films made of (R-MBA)2PbI4 are more sensitive to RCP than LCP illumination over a wide temperature range of 77-300 K. Furthermore, based on FET measurements, we found evidence of two different carrier transport mechanisms with two distinct activation energies in the 77-260 and 280-300 K temperature ranges, respectively. In the former temperature range, shallow traps are dominant in the perovskite film, which are filled by thermally activated carriers with increasing temperature; in the latter temperature range, deep traps with one order of magnitude larger activation energy dominate. Both types of chiral MHPs show intrinsic p-type carrier transport behavior regardless of the handedness (S or R) of these materials. The optimal carrier mobility for both handedness of material is around (2.7 ± 0.2) × 10-7 cm2 V-1 s-1 at 270-280 K, which is two magnitudes larger than those reported in nonchiral perovskite MAPbI3 polycrystalline thin films. These findings suggest that chiral MHPs can be an excellent candidate for selective circular polarized photodetection applications, without additional polarizing optical components, enabling simplified construction of detection systems.
Collapse
Affiliation(s)
- Sile Hu
- Department of Materials Science and Engineering, and Centre for Functional Photonics (CFP), City University of Hong Kong, Hong Kong S.A.R., P. R. China
| | - Bing Tang
- Department of Materials Science and Engineering, and Centre for Functional Photonics (CFP), City University of Hong Kong, Hong Kong S.A.R., P. R. China
| | - Stephen V Kershaw
- Department of Materials Science and Engineering, and Centre for Functional Photonics (CFP), City University of Hong Kong, Hong Kong S.A.R., P. R. China
| | - Andrey L Rogach
- Department of Materials Science and Engineering, and Centre for Functional Photonics (CFP), City University of Hong Kong, Hong Kong S.A.R., P. R. China
| |
Collapse
|
33
|
Yang AJ, Wang SX, Xu J, Loh XJ, Zhu Q, Wang XR. Two-Dimensional Layered Materials Meet Perovskite Oxides: A Combination for High-Performance Electronic Devices. ACS Nano 2023. [PMID: 37171107 DOI: 10.1021/acsnano.3c00429] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/13/2023]
Abstract
As the Si-based transistors scale down to atomic dimensions, the basic principle of current electronics, which heavily relies on the tunable charge degree of freedom, faces increasing challenges to meet the future requirements of speed, switching energy, heat dissipation, and packing density as well as functionalities. Heterogeneous integration, where dissimilar layers of materials and functionalities are unrestrictedly stacked at an atomic scale, is appealing for next-generation electronics, such as multifunctional, neuromorphic, spintronic, and ultralow-power devices, because it unlocks technologically useful interfaces of distinct functionalities. Recently, the combination of functional perovskite oxides and two-dimensional layered materials (2DLMs) led to unexpected functionalities and enhanced device performance. In this paper, we review the recent progress of the heterogeneous integration of perovskite oxides and 2DLMs from the perspectives of fabrication and interfacial properties, electronic applications, and challenges as well as outlooks. In particular, we focus on three types of attractive applications, namely field-effect transistors, memory, and neuromorphic electronics. The van der Waals integration approach is extendible to other oxides and 2DLMs, leading to almost unlimited combinations of oxides and 2DLMs and contributing to future high-performance electronic and spintronic devices.
Collapse
Affiliation(s)
- Allen Jian Yang
- Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, 21 Nanyang Link, Singapore 637371, Singapore
| | - Su-Xi Wang
- Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis, #08-03, Singapore 13863, Singapore
| | - Jianwei Xu
- Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis, #08-03, Singapore 13863, Singapore
- Institute of Sustainability for Chemicals, Energy and Environment (ISCE2), Agency for Science, Technology and Research (A*STAR), 1 Pesek Road, Jurong Island, Singapore, 627833, Singapore
- Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis, #08-03, Singapore 13863, Singapore
| | - Xian Jun Loh
- Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis, #08-03, Singapore 13863, Singapore
- Institute of Sustainability for Chemicals, Energy and Environment (ISCE2), Agency for Science, Technology and Research (A*STAR), 1 Pesek Road, Jurong Island, Singapore, 627833, Singapore
- Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis, #08-03, Singapore 13863, Singapore
| | - Qiang Zhu
- Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis, #08-03, Singapore 13863, Singapore
- Institute of Sustainability for Chemicals, Energy and Environment (ISCE2), Agency for Science, Technology and Research (A*STAR), 1 Pesek Road, Jurong Island, Singapore, 627833, Singapore
- School of Chemistry, Chemical Engineering and Biotechnology, Nanyang Technological University, 21 Nanyang Link, Singapore 637371, Singapore
| | - Xiao Renshaw Wang
- Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, 21 Nanyang Link, Singapore 637371, Singapore
- School of Electrical and Electronic Engineering, Nanyang Technological University, 50 Nanyang Ave, Singapore 639798, Singapore
| |
Collapse
|
34
|
Yang S, Liu K, Xu Y, Liu L, Li H, Zhai T. Gate Dielectrics Integration for 2D Electronics: Challenges, Advances, and Outlook. Adv Mater 2023; 35:e2207901. [PMID: 36226584 DOI: 10.1002/adma.202207901] [Citation(s) in RCA: 5] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/30/2022] [Revised: 09/28/2022] [Indexed: 05/05/2023]
Abstract
2D semiconductors have emerged both as an ideal platform for fundamental studies and as promising channel materials in beyond-silicon field-effect-transistors due to their outstanding electrical properties and exceptional tunability via external field. However, the lack of proper dielectrics for 2D semiconductors has become a major roadblock for their further development toward practical applications. The prominent issues between conventional 3D dielectrics and 2D semiconductors arise from the integration and interface quality, where defect states and imperfections lead to dramatic deterioration of device performance. In this review article, the root causes of such issues are briefly analyzed and recent advances on some possible solutions, including various approaches of adapting conventional dielectrics to 2D semiconductors, and the development of novel dielectrics with van der Waals surface toward high-performance 2D electronics are summarized. Then, in the perspective, the requirements of ideal dielectrics for state-of-the-art 2D devices are outlined and an outlook for their future development is provided.
Collapse
Affiliation(s)
- Sijie Yang
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Kailang Liu
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Yongshan Xu
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Lixin Liu
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Huiqiao Li
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| | - Tianyou Zhai
- State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan, 430074, P. R. China
| |
Collapse
|
35
|
Wu Y, Xin Z, Zhang Z, Wang B, Peng R, Wang E, Shi R, Liu Y, Guo J, Liu K, Liu K. All-Transfer Electrode Interface Engineering Toward Harsh-Environment-Resistant MoS 2 Field-Effect Transistors. Adv Mater 2023; 35:e2210735. [PMID: 36652589 DOI: 10.1002/adma.202210735] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/18/2022] [Revised: 01/08/2023] [Indexed: 05/05/2023]
Abstract
Nanoscale electronic devices that can work in harsh environments are in high demand for wearable, automotive, and aerospace electronics. Clean and defect-free interfaces are of vital importance for building nanoscale harsh-environment-resistant devices. However, current nanoscale devices are subject to failure in these environments, especially at defective electrode-channel interfaces. Here, harsh-environment-resistant MoS2 transistors are developed by engineering electrode-channel interfaces with an all-transfer of van der Waals electrodes. The delivered defect-free, graphene-buffered electrodes keep the electrode-channel interfaces intact and robust. As a result, the as-fabricated MoS2 devices have reduced Schottky barrier heights, leading to a very large on-state current and high carrier mobility. More importantly, the defect-free, hydrophobic graphene buffer layer prevents metal diffusion from the electrodes to MoS2 and the intercalation of water molecules at the electrode-MoS2 interfaces. This enables high resistances of MoS2 devices with all-transfer electrodes to various harsh environments, including humid, oxidizing, and high-temperature environments, surpassing the devices with other kinds of electrodes. The work deepens the understanding of the roles of electrode-channel interfaces in nanoscale devices and provides a promising interface engineering strategy to build nanoscale harsh-environment-resistant devices.
Collapse
Affiliation(s)
- Yonghuang Wu
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing, 100084, China
| | - Zeqin Xin
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing, 100084, China
| | - Zhibin Zhang
- State Key Laboratory for Mesoscopic Physics, Frontiers Science Center for Nano-optoelectronics, School of Physics, Peking University, Beijing, 100871, China
| | - Bolun Wang
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing, 100084, China
| | - Ruixuan Peng
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing, 100084, China
| | - Enze Wang
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing, 100084, China
| | - Run Shi
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing, 100084, China
| | - Yiqun Liu
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing, 100084, China
| | - Jing Guo
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing, 100084, China
| | - Kaihui Liu
- State Key Laboratory for Mesoscopic Physics, Frontiers Science Center for Nano-optoelectronics, School of Physics, Peking University, Beijing, 100871, China
| | - Kai Liu
- State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing, 100084, China
| |
Collapse
|
36
|
Wu F, Gibertini M, Watanabe K, Taniguchi T, Gutiérrez-Lezama I, Ubrig N, Morpurgo AF. Gate-Controlled Magnetotransport and Electrostatic Modulation of Magnetism in 2D Magnetic Semiconductor CrPS 4. Adv Mater 2023:e2211653. [PMID: 37098224 DOI: 10.1002/adma.202211653] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/13/2022] [Revised: 03/30/2023] [Indexed: 06/13/2023]
Abstract
Using field-effect transistors (FETs) to explore atomically thin magnetic semiconductors with transport measurements is difficult, because the very narrow bands of most 2D magnetic semiconductors cause carrier localization, preventing transistor operation. Here, it is shown that exfoliated layers of CrPS4 -a 2D layered antiferromagnetic semiconductor whose bandwidth approaches 1 eV-allow the realization of FETs that operate properly down to cryogenic temperature. Using these devices, conductance measurements as a function of temperature and magnetic field are performed to determine the full magnetic phase diagram, which includes a spin-flop and a spin-flip phase. The magnetoconductance, which depends strongly on gate voltage, is determined. reaching values as high as 5000% near the threshold for electron conduction. The gate voltage also allows the magnetic states to be tuned, despite the relatively large thickness of the CrPS4 multilayers employed in the study. The results show the need to employ 2D magnetic semiconductors with sufficiently large bandwidth to realize properly functioning transistors, and identify a candidate material to realize a fully gate-tunable half-metallic conductor.
Collapse
Affiliation(s)
- Fan Wu
- Department of Quantum Matter Physics, University of Geneva, 24 Quai Ernest Ansermet, Geneva, CH-1211, Switzerland
- Department of Applied Physics, University of Geneva, 24 Quai Ernest Ansermet, Geneva, CH-1211, Switzerland
| | - Marco Gibertini
- Dipartimento di Scienze Fisiche, Informatiche e Matematiche, University of Modena and Reggio Emilia, Modena, IT-41125, Italy
- Centro S3, CNR Istituto Nanoscienze, Modena, IT-41125, Italy
| | - Kenji Watanabe
- Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan
| | - Takashi Taniguchi
- International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan
| | - Ignacio Gutiérrez-Lezama
- Department of Quantum Matter Physics, University of Geneva, 24 Quai Ernest Ansermet, Geneva, CH-1211, Switzerland
- Department of Applied Physics, University of Geneva, 24 Quai Ernest Ansermet, Geneva, CH-1211, Switzerland
| | - Nicolas Ubrig
- Department of Quantum Matter Physics, University of Geneva, 24 Quai Ernest Ansermet, Geneva, CH-1211, Switzerland
- Department of Applied Physics, University of Geneva, 24 Quai Ernest Ansermet, Geneva, CH-1211, Switzerland
| | - Alberto F Morpurgo
- Department of Quantum Matter Physics, University of Geneva, 24 Quai Ernest Ansermet, Geneva, CH-1211, Switzerland
- Department of Applied Physics, University of Geneva, 24 Quai Ernest Ansermet, Geneva, CH-1211, Switzerland
| |
Collapse
|
37
|
Xia J, Qiu X, Liu Y, Chen P, Guo J, Wei H, Ding J, Xie H, Lv Y, Li F, Li W, Liao L, Hu Y. Ferroelectric Wide-Bandgap Metal Halide Perovskite Field-Effect Transistors: Toward Transparent Electronics. Adv Sci (Weinh) 2023; 10:e2300133. [PMID: 36703612 PMCID: PMC10074105 DOI: 10.1002/advs.202300133] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 01/08/2023] [Indexed: 06/18/2023]
Abstract
Transparent field-effect transistors (FETs) are attacking intensive interest for constructing fancy "invisible" electronic products. Presently, the main technology for realizing transparent FETs is based on metal oxide semiconductors, which have wide-bandgap but generally demand sputtering technique or high-temperature (>350 °C) solution process for fabrication. Herein, a general device fabrication strategy for metal halide perovskite (MHP) FETs is shown, by which transparent perovskite FETs are successfully obtained using low-temperature (<150 °C) solution process. This strategy involves the employment of ferroelectric copolymer poly(vinylidene fluoride-co-trifluoroethylene) (PVDF-TrFE) as the dielectric, which conquers the challenging issue of gate-electric-field screening effect in MHP FETs. Additionally, an ultra-thin SnO2 is inserted between the source/drain electrodes and MHPs to facilitate electron injection. Consequently, n-type semi-transparent MAPbBr3 FETs and fully transparent MAPbCl3 FETs which can operate well at room temperature with mobility over 10-3 cm2 V-1 s-1 and on/off ratio >103 are achieved for the first time. The low-temperature solution processability of these FETs makes them particularly attractive for applications in low-cost, large-area transparent electronics.
Collapse
Affiliation(s)
- Jiangnan Xia
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of EducationSchool of Physics and ElectronicsHunan UniversityChangsha410082China
- Shenzhen Research Institute of Hunan UniversityShenzhen518063China
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan ProvinceCollege of Semiconductors (College of Integrated Circuits)Hunan UniversityChangsha410082China
| | - Xincan Qiu
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of EducationSchool of Physics and ElectronicsHunan UniversityChangsha410082China
| | - Yu Liu
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of EducationSchool of Physics and ElectronicsHunan UniversityChangsha410082China
| | - Ping‐An Chen
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of EducationSchool of Physics and ElectronicsHunan UniversityChangsha410082China
| | - Jing Guo
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of EducationSchool of Physics and ElectronicsHunan UniversityChangsha410082China
| | - Huan Wei
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of EducationSchool of Physics and ElectronicsHunan UniversityChangsha410082China
| | - Jiaqi Ding
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of EducationSchool of Physics and ElectronicsHunan UniversityChangsha410082China
| | - Haihong Xie
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of EducationSchool of Physics and ElectronicsHunan UniversityChangsha410082China
| | - Yawei Lv
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of EducationSchool of Physics and ElectronicsHunan UniversityChangsha410082China
| | - Fuxiang Li
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of EducationSchool of Physics and ElectronicsHunan UniversityChangsha410082China
| | - Wenwu Li
- Shanghai Frontiers Science Research Base of Intelligent Optoelectronics and PerceptionInstitute of OptoelectronicsDepartment of Materials ScienceFudan UniversityShanghai200433China
| | - Lei Liao
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan ProvinceCollege of Semiconductors (College of Integrated Circuits)Hunan UniversityChangsha410082China
| | - Yuanyuan Hu
- Key Laboratory for Micro/Nano Optoelectronic Devices of Ministry of EducationSchool of Physics and ElectronicsHunan UniversityChangsha410082China
- Shenzhen Research Institute of Hunan UniversityShenzhen518063China
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan ProvinceCollege of Semiconductors (College of Integrated Circuits)Hunan UniversityChangsha410082China
| |
Collapse
|
38
|
Chen PA, Guo J, Yan X, Liu Y, Wei H, Qiu X, Xia J, Guo J, Ding J, Gong Z, Chen C, Lei T, Chen H, Zeng Z, Hu Y. A Methodology of Fabricating Novel Electrodes for Semiconductor Devices: Doping and Van der Waals Integrating Organic Semiconductor Films. Small 2023:e2207858. [PMID: 36949014 DOI: 10.1002/smll.202207858] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/15/2022] [Revised: 03/03/2023] [Indexed: 06/18/2023]
Abstract
Electrodes are indispensable components in semiconductor devices, and now are mainly made from metals, which are convenient for use but not ideal for emerging technologies such as bioelectronics, flexible electronics, or transparent electronics. Here the methodology of fabricating novel electrodes for semiconductor devices using organic semiconductors (OSCs) is proposed and demonstrated. It is shown that polymer semiconductors can be heavily p- or n-doped to achieve sufficiently high conductivity for electrodes. In contrast with metals, the doped OSC films (DOSCFs) are solution-processable, mechanically flexible, and have interesting optoelectronic properties. By integrating the DOSCFs with semiconductors through van der Waals contacts different kinds of semiconductor devices can be constructed. Importantly, these devices exhibit higher performance than their counterparts with metal electrodes, and/or excellent mechanical or optical properties that are unavailable in metal-electrode devices, suggesting the superiority of DOSCF electrodes. Given the existing large amount of OSCs, the established methodology can provide abundant electrode choices to meet the demand of various emerging devices.
Collapse
Affiliation(s)
- Ping-An Chen
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, P. R. China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, P. R. China
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, P. R. China
| | - Junjun Guo
- Institute of Functional Nano & Soft Materials (FUNSOM) Jiangsu Key Laboratory for Carbon-Based Functional Materials and Devices, Soochow University, Suzhou, 215123, P. R. China
| | - Xinwen Yan
- Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, School of Materials Science and Engineering, Peking University, Beijing, 100871, P. R. China
| | - Yu Liu
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, P. R. China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, P. R. China
| | - Huan Wei
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, P. R. China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, P. R. China
| | - Xincan Qiu
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, P. R. China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, P. R. China
| | - Jiangnan Xia
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, P. R. China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, P. R. China
| | - Jing Guo
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, P. R. China
| | - Jiaqi Ding
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, P. R. China
| | - Zhenqi Gong
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, P. R. China
| | - Chen Chen
- Science and Technology on Advanced Ceramic Fibers and Composites Laboratory, College of Aerospace Science and Engineering, National University of Defense Technology, Changsha, 410000, P. R. China
| | - Ting Lei
- Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, School of Materials Science and Engineering, Peking University, Beijing, 100871, P. R. China
| | - Huajie Chen
- Key Laboratory of Environmentally Friendly Chemistry and Applications of Ministry of Education, College of Chemistry, Xiangtan University, Xiangtan, 411105, P. R. China
| | - Zebing Zeng
- State Key Laboratory of Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University, Changsha, 410082, P. R. China
| | - Yuanyuan Hu
- International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province, School of Physics and Electronics, Hunan University, Changsha, 410082, P. R. China
- Shenzhen Research Institute of Hunan University, Shenzhen, 518063, P. R. China
- Changsha Semiconductor Technology and Application Innovation Research Institute, College of Semiconductors (College of Integrated Circuits), Hunan University, Changsha, 410082, P. R. China
| |
Collapse
|
39
|
Si H, Huang G, Liao J, Fisher AC, Lin S. Light-Activated Interface Charge-Alternating Interaction on an Extended Gate Photoelectrode: A New Sensing Strategy for EGFET-Based Photoelectrochemical Sensors. ACS Appl Mater Interfaces 2023; 15:11866-11874. [PMID: 36826809 DOI: 10.1021/acsami.2c22970] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/18/2023]
Abstract
Integration of extended gate field-effect transistors (EGFET) and photoelectrochemical (PEC) measurement to construct highly sensitive sensors is an innovative research field that was proven feasible by our previous work. However, it remains a challenge on how to adjust the interaction between the extended gate and the analyte and study its influence on EGFET-based PEC sensors. Herein, a new sensing strategy was proposed by a mutual electrostatic interaction. Three-dimensional TiO2 and g-C3N4 core-shell heterojunction on flexible carbon cloth (TCN) was designed as the extended sensing gate. Tetracycline (TC) was also used as a model analyte, and it contains electron-donating groups (-NH2 and -OH) with negative charge. The designed TCN-extended sensing gate was negatively charged in the dark by introducing carbon vacancies with oxygen doping in the g-C3N4 shell, while it was positively charged under illustration due to the aggregation of photogenerated holes on the surface. Therefore, a light-activated PEC sensing platform for the sensitive and selective determination of tetracycline (TC) was demonstrated. Such a PEC sensor exhibited wide linear ranges within 100 pM to 1 μM and 1-100 μM with a low detection limit of 0.42 pM. Furthermore, the sensing platform possessed excellent selectivity, good reproducibility, and stability. The proposed sensing strategy in this work can expand the paradigm for developing a light-regulated FET-based PEC sensor by mutual electrostatic interaction, and we believe that this work will offer a new perspective for the design of interface interaction in PEC devices.
Collapse
Affiliation(s)
- Hewei Si
- State Key Laboratory of Marine Resource Utilization in the South China Sea, School of Materials Science and Engineering, Hainan University, Haikou, Hainan 570228, China
| | - Gu Huang
- State Key Laboratory of Marine Resource Utilization in the South China Sea, School of Materials Science and Engineering, Hainan University, Haikou, Hainan 570228, China
| | - Jianjun Liao
- School of Ecology and Environment, Hainan University, Haikou, Hainan 570228, China
| | - Adrian C Fisher
- Department of Chemical Engineering and Biotechnology, University of Cambridge, West Cambridge Site, Philippa Fawcett Drive, Cambridge CB3 0AS, United Kingdom
| | - Shiwei Lin
- State Key Laboratory of Marine Resource Utilization in the South China Sea, School of Materials Science and Engineering, Hainan University, Haikou, Hainan 570228, China
| |
Collapse
|
40
|
Shen Z, Lu W, Wei P, Zhu Y, Jiang Y, Bu L, Lu G. Highly Conductive Ultrathin Layers of Conjugated Polymers for Metal-Free Coplanar Transistors with Single-Polymer Transport Layers. ACS Appl Mater Interfaces 2023; 15:12099-12108. [PMID: 36808932 DOI: 10.1021/acsami.2c20298] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/18/2023]
Abstract
Although metal or oxide conductive films are widely used as electrodes of electronic devices, organic electrodes would be more favorable for next-generation organic electronics. Here, using some model conjugated polymers as examples, we report a class of highly conductive and optically transparent polymer ultrathin layers. Vertical phase separation of semiconductor/insulator blends leads to a highly ordered two-dimensional (2D) ultrathin layer of conjugated-polymer chains on the insulator. Afterwards, the thermally evaporated dopants on the ultrathin layer lead to a conductivity of up to 103 S cm-1 and a sheet resistance 103 Ω/square for a model conjugated polymer poly(2,5-bis(3-hexadecylthiophen-2-yl)thieno[3,2-b]thiophenes) (PBTTT). The high conductivity is due to the high hole mobility (∼ 20 cm2 V-1 s-1), although doping-induced charge density is still in the moderate range of 1020 cm-3 with a 1 nm thick dopant. Metal-free monolithic coplanar field-effect transistors using the same conjugated-polymer ultrathin layer with alternatively doped regions as electrodes and a semiconductor layer are realized. The field-effect mobility of this monolithic transistor is over 2 cm2 V-1 s-1 for PBTTT, one order higher than that of the conventional PBTTT transistor using metal electrodes. The optical transparency of the single conjugated-polymer transport layer is over 90%, demonstrating a bright future for all-organic transparent electronics.
Collapse
Affiliation(s)
- Zichao Shen
- Frontier Institute of Science and Technology, Xi'an Jiaotong University, Xi'an 710054, China
- State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an Jiaotong University, Xi'an 710049, China
| | - Wanlong Lu
- Frontier Institute of Science and Technology, Xi'an Jiaotong University, Xi'an 710054, China
- State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an Jiaotong University, Xi'an 710049, China
| | - Peng Wei
- Frontier Institute of Science and Technology, Xi'an Jiaotong University, Xi'an 710054, China
- State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an Jiaotong University, Xi'an 710049, China
| | - Yuanwei Zhu
- Frontier Institute of Science and Technology, Xi'an Jiaotong University, Xi'an 710054, China
- State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an Jiaotong University, Xi'an 710049, China
| | - Yihang Jiang
- Frontier Institute of Science and Technology, Xi'an Jiaotong University, Xi'an 710054, China
- State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an Jiaotong University, Xi'an 710049, China
| | - Laju Bu
- School of Chemistry, Xi'an Jiaotong University, Xi'an 710049, China
| | - Guanghao Lu
- Frontier Institute of Science and Technology, Xi'an Jiaotong University, Xi'an 710054, China
- State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an Jiaotong University, Xi'an 710049, China
| |
Collapse
|
41
|
Yang WC, Chen YW, Yu YY, Lin YC, Higashihara T, Chen WC. Enhancing the Performance of Electret-Free Phototransistor Memory by Using All-Conjugated Block Copolymer. Macromol Rapid Commun 2023; 44:e2200756. [PMID: 36281923 DOI: 10.1002/marc.202200756] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/19/2022] [Revised: 10/11/2022] [Indexed: 11/09/2022]
Abstract
Conjugated polymers are of great interest owing to their potential in stretchable electronics to function under complex deformation conditions. To improve the performance of conjugated polymers, various structural designs have been proposed and these conjugated polymers are specially applied in exotic optoelectronics. In this work, a series of all-conjugated block copolymers (PII2T-b-PNDI2T) comprising poly(isoindigo-bithiophene) (PII2T) and poly(naphthalenediimide-bithiophene) (PNDI2T) are developed with varied compositions and applied to electret-free phototransistor memory. Accordingly, these memory devices present p-type transport capability and electrical-ON/photo-OFF memory behavior. The efficacy of the all-conjugated block copolymer design in improving the memory-photoresponse properties in phototransistor memory is revealed. By optimizing the composition of the block copolymer, the corresponding device achieves a wide memory window of 36 V and a high memory ratio of 7 × 104 . Collectively, the results of this study indicate a new concept for designing electret-free phototransistor memory by using all-conjugated block copolymer heterojunctions to mitigate the phase separation of conjugated polymer blends. Meanwhile, the intrinsic optoelectronic properties of the constituent conjugated polymers can be well-maintained by using an all-conjugated block copolymer design.
Collapse
Affiliation(s)
- Wei-Chen Yang
- Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan.,Advanced Research Center of Green Materials Science and Technology, National Taiwan University, Taipei, 10617, Taiwan
| | - Yi-Wen Chen
- Department of Materials Engineering, Ming Chi University of Technology, New Taipei City, 24301, Taiwan
| | - Yang-Yen Yu
- Department of Materials Engineering, Ming Chi University of Technology, New Taipei City, 24301, Taiwan
| | - Yan-Cheng Lin
- Advanced Research Center of Green Materials Science and Technology, National Taiwan University, Taipei, 10617, Taiwan.,Department of Chemical Engineering, National Cheng Kung University, Tainan City, 70101, Taiwan
| | - Tomoya Higashihara
- Department of Organic Materials Science, Graduate School of Organic Materials Science, Yamagata University, Yamagata, 992-8510, Japan
| | - Wen-Chang Chen
- Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan.,Advanced Research Center of Green Materials Science and Technology, National Taiwan University, Taipei, 10617, Taiwan
| |
Collapse
|
42
|
Matsushita S, Otsuka K, Sugihara T, Zhu G, Kittipaisalsilpa K, Lee M, Xiang R, Chiashi S, Maruyama S. Horizontal Arrays of One-Dimensional van der Waals Heterostructures as Transistor Channels. ACS Appl Mater Interfaces 2023; 15:10965-10973. [PMID: 36800512 DOI: 10.1021/acsami.2c22964] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/18/2023]
Abstract
The nanotube/dielectric interface plays an essential role in achieving superb switching characteristics of carbon nanotube-based transistors for energy-efficient computation. Formation of van der Waals heterostructures with hexagonal boron nitride nanotubes could be an effective means to reduce interface state density, but the need for isolating nanotubes during the formation of coaxial outer layers has hindered the fabrication of their horizontal arrays. Here, we develop a strategy to create isolated heterostructure arrays using aligned carbon nanotubes grown on a quartz substrate as starting materials. Air-suspended arrays of carbon nanotubes are prepared by a dry transfer technique and then used as templates for the coaxial wrapping of boron nitride nanotubes. We then fabricate the transistors, where boron nitride serves as interfacial layers between carbon nanotube channels and conventional gate dielectrics, showing hysteresis-free characteristics owing to the improved interfaces. We have also gained a deeper understanding of the strain applied on inner carbon nanotubes, as well as the inhomogeneity of the outer coating, by characterizing individual heterostructures over trenches and on a substrate surface. The device fabrication and characterization presented here essentially do not require elaborate electron microscopy, thus paving the way for the practical use of one-dimensional van der Waals heterostructures for nanoelectronics.
Collapse
Affiliation(s)
- Satoru Matsushita
- Department of Mechanical Engineering, The University of Tokyo, Tokyo 113-8656, Japan
| | - Keigo Otsuka
- Department of Mechanical Engineering, The University of Tokyo, Tokyo 113-8656, Japan
| | - Taiki Sugihara
- Department of Mechanical Engineering, The University of Tokyo, Tokyo 113-8656, Japan
| | - Guangyao Zhu
- Department of Mechanical Engineering, The University of Tokyo, Tokyo 113-8656, Japan
| | | | - Minhyeok Lee
- Department of Mechanical Engineering, The University of Tokyo, Tokyo 113-8656, Japan
| | - Rong Xiang
- Department of Mechanical Engineering, The University of Tokyo, Tokyo 113-8656, Japan
- State Key Laboratory of Fluid Power and Mechatronic Systems, School of Mechanical Engineering, Zhejiang University, Hangzhou 310027, China
| | - Shohei Chiashi
- Department of Mechanical Engineering, The University of Tokyo, Tokyo 113-8656, Japan
| | - Shigeo Maruyama
- Department of Mechanical Engineering, The University of Tokyo, Tokyo 113-8656, Japan
| |
Collapse
|
43
|
Behrle R, Krause V, Seifner MS, Köstler B, Dick KA, Wagner M, Sistani M, Barth S. Electrical and Structural Properties of Si 1-xGe x Nanowires Prepared from a Single-Source Precursor. Nanomaterials (Basel) 2023; 13:627. [PMID: 36838995 PMCID: PMC9963966 DOI: 10.3390/nano13040627] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 01/18/2023] [Revised: 02/02/2023] [Accepted: 02/03/2023] [Indexed: 06/18/2023]
Abstract
Si1-xGex nanowires (NWs) were prepared by gold-supported chemical vapor deposition (CVD) using a single-source precursor with preformed Si-Ge bonds. Besides the tamed reactivity of the precursor, the approach reduces the process parameters associated with the control of decomposition characteristics and the dosing of individual precursors. The group IV alloy NWs are single crystalline with a constant diameter along their axis. During the wire growth by low pressure CVD, an Au-containing surface layer on the NWs forms by surface diffusion from the substrate, which can be removed by a combination of oxidation and etching. The electrical properties of the Si1-xGex/Au core-shell NWs are compared to the Si1-xGex NWs after Au removal. Core-shell NWs show signatures of metal-like behavior, while the purely semiconducting NWs reveal typical signatures of intrinsic Si1-xGex. The synthesized materials should be of high interest for applications in nano- and quantum-electronics.
Collapse
Affiliation(s)
- Raphael Behrle
- Institute of Solid State Electronics, TU Wien, Gußhausstraße 25-25a, 1040 Vienna, Austria
| | - Vanessa Krause
- Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60438 Frankfurt, Germany
| | - Michael S. Seifner
- Centre for Analysis and Synthesis, Lund University, P.O. Box 124, 22100 Lund, Sweden
| | - Benedikt Köstler
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany
| | - Kimberly A. Dick
- Centre for Analysis and Synthesis, Lund University, P.O. Box 124, 22100 Lund, Sweden
| | - Matthias Wagner
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany
| | - Masiar Sistani
- Institute of Solid State Electronics, TU Wien, Gußhausstraße 25-25a, 1040 Vienna, Austria
| | - Sven Barth
- Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60438 Frankfurt, Germany
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany
| |
Collapse
|
44
|
Chiang YC, Yang WC, Hung CC, Ercan E, Chiu YC, Lin YC, Chen WC. Fully Photoswitchable Phototransistor Memory Comprising Perovskite Quantum Dot-Based Hybrid Nanocomposites as a Photoresponsive Floating Gate. ACS Appl Mater Interfaces 2023; 15:1675-1684. [PMID: 36562738 DOI: 10.1021/acsami.2c18064] [Citation(s) in RCA: 4] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/17/2023]
Abstract
Tremendous research efforts have been dedicated into the field of photoresponsive nonvolatile memory devices owing to their advantages of fast transmitting speed, low latency, and power-saving property that are suitable for replacing current electrical-driven electronics. However, the reported memory devices still rely on the assistance of gate bias to program them, and a real fully photoswitchable transistor memory is still rare. Herein, we report a phototransistor memory device comprising polymer/perovskite quantum dot (QD) hybrid nanocomposites as a photoresponsive floating gate. The perovskite QDs offer an effective discreteness with an excellent photoresponse that are suitable for photogate application. In addition, a series of ultraviolet (UV)-sensitive insulating polymer hosts were designed to investigate the effect of UV light on the memory behavior. We found that a fully photoswitchable memory device was fulfilled by using the independent and sequential photoexcitation between a UV-sensitive polymer host and a visible light-sensitive QD photogates, which produced decent photoresponse, memory switchability, and highly stable memory retention with a memory ratio of 104 over 104 s. This study not only unraveled the mystery in the fully photoswitchable functionality of nonvolatile memory but also enlightened their potential in the next-generation electronics for light-fidelity application.
Collapse
Affiliation(s)
- Yun-Chi Chiang
- Department of Chemical Engineering, National Taiwan University, Taipei 10617, Taiwan
| | - Wei-Chen Yang
- Department of Chemical Engineering, National Taiwan University, Taipei 10617, Taiwan
- Advanced Research Center for Green Materials Science and Technology, National Taiwan University, Taipei 10617, Taiwan
| | - Chih-Chien Hung
- Department of Chemical Engineering, National Taiwan University, Taipei 10617, Taiwan
- Advanced Research Center for Green Materials Science and Technology, National Taiwan University, Taipei 10617, Taiwan
| | - Ender Ercan
- Department of Chemical Engineering, National Taiwan University, Taipei 10617, Taiwan
- Advanced Research Center for Green Materials Science and Technology, National Taiwan University, Taipei 10617, Taiwan
| | - Yu-Cheng Chiu
- Advanced Research Center for Green Materials Science and Technology, National Taiwan University, Taipei 10617, Taiwan
- Department of Chemical Engineering, National Taiwan University of Science and Technology, Taipei 10607, Taiwan
| | - Yan-Cheng Lin
- Advanced Research Center for Green Materials Science and Technology, National Taiwan University, Taipei 10617, Taiwan
- Department of Chemical Engineering, National Cheng Kung University, Tainan City 70101, Taiwan
| | - Wen-Chang Chen
- Department of Chemical Engineering, National Taiwan University, Taipei 10617, Taiwan
- Advanced Research Center for Green Materials Science and Technology, National Taiwan University, Taipei 10617, Taiwan
| |
Collapse
|
45
|
Hu WP, Wu YM, Vu CA, Chen WY. Ultrasensitive Detection of Interleukin 6 by Using Silicon Nanowire Field-Effect Transistors. Sensors (Basel) 2023; 23:625. [PMID: 36679421 PMCID: PMC9865274 DOI: 10.3390/s23020625] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 11/15/2022] [Revised: 12/19/2022] [Accepted: 01/03/2023] [Indexed: 06/17/2023]
Abstract
Interleukin 6 (IL-6) has been regarded as a biomarker that can be applied as a predictor for the severity of COVID-19-infected patients. The IL-6 level also correlates well with respiratory dysfunction and mortality risk. In this work, three silanization approaches and two types of biorecognition elements were used on the silicon nanowire field-effect transistors (SiNW-FETs) to investigate and compare the sensing performance on the detection of IL-6. Experimental data revealed that the mixed-SAMs-modified silica surface could have superior surface morphology to APTES-modified and APS-modified silica surfaces. According to the data on detecting various concentrations of IL-6, the detection range of the aptamer-functionalized SiNW-FET was broader than that of the antibody-functionalized SiNW-FET. In addition, the lowest concentration of valid detection for the aptamer-functionalized SiNW-FET was 2.1 pg/mL, two orders of magnitude lower than the antibody-functionalized SiNW-FET. The detection range of the aptamer-functionalized SiNW-FET covered the concentration of IL-6, which could be used to predict fatal outcomes of COVID-19. The detection results in the buffer showed that the anti-IL-6 aptamer could produce better detection results on the SiNW-FETs, indicating its great opportunity in applications for sensing clinical samples.
Collapse
Affiliation(s)
- Wen-Pin Hu
- Department of Bioinformatics and Medical Engineering, Asia University, Taichung 41354, Taiwan
| | - Yu-Ming Wu
- Department of Chemical and Materials Engineering, National Central University, Taoyuan City 32001, Taiwan
| | - Cao-An Vu
- Department of Chemical and Materials Engineering, National Central University, Taoyuan City 32001, Taiwan
| | - Wen-Yih Chen
- Department of Chemical and Materials Engineering, National Central University, Taoyuan City 32001, Taiwan
| |
Collapse
|
46
|
Lee CS, Gwyther REA, Freeley M, Jones D, Palma M. Fabrication and Functionalisation of Nanocarbon-Based Field-Effect Transistor Biosensors. Chembiochem 2022; 23:e202200282. [PMID: 36193790 PMCID: PMC10092808 DOI: 10.1002/cbic.202200282] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/17/2022] [Revised: 10/03/2022] [Indexed: 01/25/2023]
Abstract
Nanocarbon-based field-effect transistor (NC-FET) biosensors are at the forefront of future diagnostic technology. By integrating biological molecules with electrically conducting carbon-based platforms, high sensitivity real-time multiplexed sensing is possible. Combined with their small footprint, portability, ease of use, and label-free sensing mechanisms, NC-FETs are prime candidates for the rapidly expanding areas of point-of-care testing, environmental monitoring and biosensing as a whole. In this review we provide an overview of the basic operational mechanisms behind NC-FETs, synthesis and fabrication of FET devices, and developments in functionalisation strategies for biosensing applications.
Collapse
Affiliation(s)
- Chang-Seuk Lee
- Department of Chemistry, School of Physical and Chemical Sciences, Queen Mary University of London, Mile End Road, London, E1 4NS, UK
| | - Rebecca E A Gwyther
- Molecular Biosciences Division, School of Biosciences, Cardiff University, Cardiff, CF10 3AX, UK
| | - Mark Freeley
- Department of Chemistry, School of Physical and Chemical Sciences, Queen Mary University of London, Mile End Road, London, E1 4NS, UK
| | - Dafydd Jones
- Molecular Biosciences Division, School of Biosciences, Cardiff University, Cardiff, CF10 3AX, UK
| | - Matteo Palma
- Department of Chemistry, School of Physical and Chemical Sciences, Queen Mary University of London, Mile End Road, London, E1 4NS, UK
| |
Collapse
|
47
|
Saeed M, Palacios P, Wei MD, Baskent E, Fan CY, Uzlu B, Wang KT, Hemmetter A, Wang Z, Neumaier D, Lemme MC, Negra R. Graphene-Based Microwave Circuits: A Review. Adv Mater 2022; 34:e2108473. [PMID: 34957614 DOI: 10.1002/adma.202108473] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/21/2021] [Revised: 12/21/2021] [Indexed: 06/14/2023]
Abstract
Over the past two decades, research on 2D materials has received much interest. Graphene is the most promising candidate regarding high-frequency applications thus far due to is high carrier mobility. Here, the research about the employment of graphene in micro- and millimeter-wave circuits is reviewed. The review starts with the different methodologies to grow and transfer graphene, before discussing the way graphene-based field-effect-transistors (GFETs) and diodes are built. A review on different approaches for realizing these devices is provided before discussing the employment of both GFETs and graphene diodes in different micro- and millimeter-wave circuits, showing the possibilities but also the limitations of this 2D material for high-frequency applications.
Collapse
Affiliation(s)
- Mohamed Saeed
- Chair of High Frequency Electronics, RWTH Aachen University, Koppernikusstr. 16, 52074, Aachen, Germany
| | - Paula Palacios
- Chair of High Frequency Electronics, RWTH Aachen University, Koppernikusstr. 16, 52074, Aachen, Germany
| | - Muh-Dey Wei
- Chair of High Frequency Electronics, RWTH Aachen University, Koppernikusstr. 16, 52074, Aachen, Germany
| | - Eyyub Baskent
- Chair of High Frequency Electronics, RWTH Aachen University, Koppernikusstr. 16, 52074, Aachen, Germany
| | - Chun-Yu Fan
- Chair of High Frequency Electronics, RWTH Aachen University, Koppernikusstr. 16, 52074, Aachen, Germany
| | - Burkay Uzlu
- AMO GmbH, Otto-Blumenthal-Str. 25, 52074, Aachen, Germany
- Chair of Electronic Devices, RWTH Aachen University, Otto-Blumenthal-Str. 25, 52074, Aachen, Germany
| | - Kun-Ta Wang
- AMO GmbH, Otto-Blumenthal-Str. 25, 52074, Aachen, Germany
- Chair of Electronic Devices, RWTH Aachen University, Otto-Blumenthal-Str. 25, 52074, Aachen, Germany
| | - Andreas Hemmetter
- AMO GmbH, Otto-Blumenthal-Str. 25, 52074, Aachen, Germany
- Chair of Electronic Devices, RWTH Aachen University, Otto-Blumenthal-Str. 25, 52074, Aachen, Germany
| | - Zhenxing Wang
- AMO GmbH, Otto-Blumenthal-Str. 25, 52074, Aachen, Germany
| | - Daniel Neumaier
- AMO GmbH, Otto-Blumenthal-Str. 25, 52074, Aachen, Germany
- Chair of Smart Sensor Systems, University of Wuppertal, Lise-Meitner-Str. 13, 42119, Wuppertal, Germany
| | - Max C Lemme
- AMO GmbH, Otto-Blumenthal-Str. 25, 52074, Aachen, Germany
- Chair of Electronic Devices, RWTH Aachen University, Otto-Blumenthal-Str. 25, 52074, Aachen, Germany
| | - Renato Negra
- Chair of High Frequency Electronics, RWTH Aachen University, Koppernikusstr. 16, 52074, Aachen, Germany
| |
Collapse
|
48
|
Liu CJ, Wan Y, Li LJ, Lin CP, Hou TH, Huang ZY, Hu VPH. 2D Materials-Based Static Random-Access Memory. Adv Mater 2022; 34:e2107894. [PMID: 34932857 DOI: 10.1002/adma.202107894] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/02/2021] [Revised: 12/14/2021] [Indexed: 06/14/2023]
Abstract
2D transition-metal dichalcogenide semiconductors, such as MoS2 and WSe2 , with adequate bandgaps are promising channel materials for ultrascaled logic transistors. This scalability study of 2D material (2DM)-based field-effect transistor (FET) and static random-access memory (SRAM) cells analyzing the impact of layer thickness reveals that the monolayer 2DM FET with superior electrostatics is beneficial for its ability to mitigate the read-write conflict in an SRAM cell at scaled technology nodes (1-2.1 nm). Moreover, the monolayer 2DM SRAM exhibits lower cell read access time and write time than the bilayer and trilayer 2DM SRAM cells at fixed leakage power. This simulation predicts that the optimization of 2DM SRAM designed with state-of-the-art contact resistance, mobility, and equivalent oxide thickness leads to excellent stability and operation speed at the 1-nm node. Applying the nanosheet (NS) gate-all-around (GAA) structure to 2DM further reduces cell read access time and write time and improves the area density of the SRAM cells, demonstrating a feasible scaling path beyond Si technology using 2DM NSFETs. In addition to the device design, the process challenges for 2DM NSFETs, including the cost-effective stacking of 2DM layers, formation of electrical contacts, suspended 2DM channels, and GAA structures, are also discussed.
Collapse
Affiliation(s)
- Chang-Ju Liu
- Department of Electrical Engineering, National Central University, Taoyuan, 320, Taiwan
| | - Yi Wan
- Department of Mechanical Engineering, The University of Hong Kong, Pokfulam, 9999077, Hong Kong
| | - Lain-Jong Li
- Department of Mechanical Engineering, The University of Hong Kong, Pokfulam, 9999077, Hong Kong
| | - Chih-Pin Lin
- Department of Electrical Engineering and Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu, 300, Taiwan
| | - Tuo-Hung Hou
- Department of Electrical Engineering and Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu, 300, Taiwan
| | - Zi-Yuan Huang
- Department of Electrical Engineering and Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, 106, Taiwan
| | - Vita Pi-Ho Hu
- Department of Electrical Engineering and Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, 106, Taiwan
| |
Collapse
|
49
|
Viana ER, Cifuentes N, González JC. Enhanced electronic transport properties of Te roll-like nanostructures. Beilstein J Nanotechnol 2022; 13:1284-1291. [PMID: 36447564 PMCID: PMC9663975 DOI: 10.3762/bjnano.13.106] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/30/2022] [Accepted: 10/12/2022] [Indexed: 06/16/2023]
Abstract
In this work, the electronic transport properties of Te roll-like nanostructures were investigated in a broad temperature range by fabricating single-nanostructure back-gated field-effect-transistors via photolithography. These one-dimensional nanostructures, with a unique roll-like morphology, were produced by a facile synthesis and extensively studied by scanning and transmission electron microscopy. The nanostructures are made of pure and crystalline Tellurium with trigonal structure (t-Te), and exhibit p-type conductivity with enhanced field-effect hole mobility between 273 cm2/Vs at 320 K and 881 cm2/Vs at 5 K. The thermal ionization of shallow acceptors, with small ionization energy between 2 and 4 meV, leads to free-hole conduction at high temperatures. The free-hole mobility follows a negative power-law temperature behavior, with an exponent between -1.28 and -1.42, indicating strong phonon scattering in this temperature range. At lower temperatures, the electronic conduction is dominated by nearest-neighbor hopping (NNH) conduction in the acceptor band, with a small activation energy E NNH ≈ 0.6 meV and an acceptor concentration of N A ≈ 1 × 1016 cm-3. These results demonstrate the enhanced electrical properties of these nanostructures, with a small disorder, and superior quality for nanodevice applications.
Collapse
Affiliation(s)
- E R Viana
- Departamento Acadêmico de Física, Universidade Tecnológica Federal do Paraná, Campus Curitiba, 80230-901, Curitiba, Brazil
| | - N Cifuentes
- Departamento de Física, Universidade Federal de Minas Gerais, 30123-970, Belo Horizonte, Brazil
| | - J C González
- Departamento de Física, Universidade Federal de Minas Gerais, 30123-970, Belo Horizonte, Brazil
| |
Collapse
|
50
|
Abu UO, Akter S, Nepal B, Pitton KA, Guiton BS, Strachan DR, Sumanasekera G, Wang H, Jasinski JB. Ultra-Narrow Phosphorene Nanoribbons Produced by Facile Electrochemical Process. Adv Sci (Weinh) 2022; 9:e2203148. [PMID: 36068163 PMCID: PMC9631066 DOI: 10.1002/advs.202203148] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/27/2022] [Revised: 08/16/2022] [Indexed: 06/15/2023]
Abstract
Phosphorene nanoribbons (PNRs) have inspired strong research interests to explore their exciting properties that are associated with the unique two-dimensional (2D) structure of phosphorene as well as the additional quantum confinement of the nanoribbon morphology, providing new materials strategy for electronic and optoelectronic applications. Despite several important properties of PNRs, the production of these structures with narrow widths is still a great challenge. Here, a facile and straightforward approach to synthesize PNRs via an electrochemical process that utilize the anisotropic Na+ diffusion barrier in black phosphorus (BP) along the [001] zigzag direction against the [100] armchair direction, is reported. The produced PNRs display widths of good uniformity (10.3 ± 3.8 nm) observed by high-resolution transmission electron microscopy, and the suppressed B2g vibrational mode from Raman spectroscopy results. More interestingly, when used in field-effect transistors, synthesized bundles exhibit the n-type behavior, which is dramatically different from bulk BP flakes which are p-type. This work provides insights into a new synthesis approach of PNRs with confined widths, paving the way toward the development of phosphorene and other highly anisotropic nanoribbon materials for high-quality electronic applications.
Collapse
Affiliation(s)
- Usman O. Abu
- Conn Center for Renewable Energy ResearchUniversity of LouisvilleLouisvilleKY40292USA
| | - Sharmin Akter
- Department of Mechanical EngineeringUniversity of LouisvilleLouisvilleKY40292USA
| | - Bimal Nepal
- Department of Physics and AstronomyUniversity of LouisvilleLouisvilleKY40292USA
| | - Kathryn A. Pitton
- Department of ChemistryUniversity of Kentucky125 Chemistry–Physics BuildingLexingtonKY40506‐0055USA
| | - Beth S. Guiton
- Department of ChemistryUniversity of Kentucky125 Chemistry–Physics BuildingLexingtonKY40506‐0055USA
| | - Douglas R. Strachan
- Department of Physics and AstronomyUniversity of Kentucky177 Chemistry–Physics BuildingLexingtonKY40506‐0055USA
| | - Gamini Sumanasekera
- Department of Physics and AstronomyUniversity of LouisvilleLouisvilleKY40292USA
| | - Hui Wang
- Department of Mechanical EngineeringUniversity of LouisvilleLouisvilleKY40292USA
| | - Jacek B. Jasinski
- Conn Center for Renewable Energy ResearchUniversity of LouisvilleLouisvilleKY40292USA
| |
Collapse
|