Impact of Etch Processes on the Chemistry and Surface States of the Topological Insulator Bi2Se3

Top-down patterning of topological surface and edge states using a focused ion beam

The conducting boundary states of topological insulators appear at an interface where the characteristic invariant ℤ2 switches from 1 to 0. These states offer prospects for quantum electronics; however, a method is needed to spatially-control ℤ2 to pattern conducting channels. It is shown that modifying Sb2Te3 single-crystal surfaces with an ion beam switches the topological insulator into an amorphous state exhibiting negligible bulk and surface conductivity. This is attributed to a transition from ℤ2 = 1 → ℤ2 = 0 at a threshold disorder strength. This observation is supported by density functional theory and model Hamiltonian calculations. Here we show that this ion-beam treatment allows for inverse lithography to pattern arrays of topological surfaces, edges and corners which are the building blocks of topological electronics.

Hexagonal Zr3X (X = Al, Ga, In) Metals: High Dynamic Stability, Nodal Loop, and Perfect Nodal Surface States

In recent years, topological semimetals/metals, including nodal point, nodal line, and nodal surface semimetals/metals, have been studied extensively because of their potential applications in spintronics and quantum computers. In this study, we predict a family of materials, Zr₃X (X = Al, Ga, In), hosting the nodal loop and nodal surface states in the absence of spin–orbit coupling. Remarkably, the energy variation of the nodal loop and nodal surface states in Zr₃X are very small, and these topological signatures lie very close to the Fermi level. When the effect of spin–orbit coupling is considered, the nodal loop and nodal surface states exhibit small energy gaps (<25 and 35 meV, respectively) that are suitable observables that reflect the spin-orbit coupling response of these topological signatures and can be detected in experiments. Moreover, these compounds are dynamically stable, and they consequently form potential material platforms to study nodal loop and nodal surface semimetals.

Effects of Ion Energy and Density on the Plasma Etching-Induced Surface Area, Edge Electrical Field, and Multivacancies in MoSe2 Nanosheets for Enhancement of the Hydrogen Evolution Reaction

Plasma functionalization can increase the efficiency of MoSe₂ in the hydrogen evolution reaction (HER) by providing multiple species but the interactions between the plasma and catalyst are not well understood. In this work, the effects of the ion energy and plasma density on the catalytic properties of MoSe₂ nanosheets are studied. The through-holes resulting from plasma etching and multi-vacancies induced by plasma-induced damage enhance the HER efficiency as exemplified by a small overpotential of 148 mV at 10 mA cm^-2 and Tafel slope of 51.6 mV dec^-1 after the plasma treatment using a power of 20 W. The interactions between the plasma and catalyst during etching and vacancies generation are evaluated by plasma simulation. Finite element and first-principles density functional theory calculations are also conducted and the results are consistent with the experimental results, indicating that the improved HER catalytic activity stems from the enhanced electric field and more active sites on the catalyst, and reduced bandgap and adsorption energy arising from the etched through-holes and vacancies, respectively. The results convey new fundamental knowledge about the plasma effects and means to enhance the efficiency of catalysts in water splitting as well insights into the design of high-performance HER catalysts.