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Oubram O, Rodríguez-Vargas I, Jovani Guzmán E. Disorder impacts on transport and magnetoresistance properties in a gapless ferromagnetic/normal/ferromagnetic phosphorene junction. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2025; 37:215302. [PMID: 40273945 DOI: 10.1088/1361-648x/add070] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/03/2025] [Accepted: 04/24/2025] [Indexed: 04/26/2025]
Abstract
The ballistic electronic transport and tunneling magnetoresistance (TMR) in a ferromagnetic/normal/ferromagnetic (F/N/F) gapless phosphorene junction have been investigated. This study focuses on the effects of structural disorder-specifically, variations in the width and height of the electrostatic potential barrier and magnetic field-on transport and TMR properties. A low-energy two-band Hamiltonian, derived from the tight-binding model along the armchair direction of phosphorene, is used. Transmission, conductance, and magnetoresistance are calculated using the transfer matrix technique, the Landauer-Büttiker formalism, and the TMR relation, respectively. The findings reveal that structural disorder related to barrier width reduces transmission oscillations and moderately suppresses conductance. A key result is that even slight combined structural disorder significantly degrades TMR properties in a gapless phosphorene F/N/F junction. Furthermore, maintaining transport properties, particularly TMR, in this device requires precise control over fluctuations in externally applied fields, especially the magnetic field.
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Affiliation(s)
- Outmane Oubram
- Facultad de Ciencias Químicas e Ingeniería, Universidad Autónoma del Estado de Morelos, Av. Universidad 1001, Col. Chamilpa, 62209 Cuernavaca, Morelos, Mexico
| | - Isaac Rodríguez-Vargas
- Unidad Académica de Ciencia y Tecnología de la Luz y la Materia, Universidad Autónoma de Zacatecas, Circuito Marie Curie S/N, Parque de Ciencia y Tecnología QUANTUM Ciudad del Conocimiento, 98160 Zacatecas, Zacatecas, Mexico
| | - Eric Jovani Guzmán
- Unidad Morelia del Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Antigua Carretera a Pátzcuaro No. 8701, Col. Ex Hacienda de San José de la Huerta, 58190 Morelia, Michoacán, Mexico
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Park M, Ju H, Oh J, Park K, Lim H, Yoon SM, Song I. Proton-electron coupling and mixed conductivity in a hydrogen-bonded coordination polymer. Nat Commun 2025; 16:1316. [PMID: 39900570 PMCID: PMC11791098 DOI: 10.1038/s41467-025-56541-2] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/24/2024] [Accepted: 01/22/2025] [Indexed: 02/05/2025] Open
Abstract
The fundamental understanding of coupled proton-electron transport in mixed protonic-electronic conductors (MPECs) remains unexplored in materials science, despite its potential significance within the broader context of mixed ionic-electronic conductors (MIECs) and the possibility of controlled diffusion of protons using hydrogen-bond networks. To address these limitations, we present a hydrogen-bonded coordination polymer Ni-BAND ({[Ni(bpy)(H2O)2(DMF)2](NO3)2·2DMF}n), which demonstrates high mixed protonic-electronic conductivity at room temperature. Through detailed analysis, we unravel the coupled transport mechanism, offering insights for the rational design of high-performance MPECs. We demonstrate the practical implications of this mechanism by examining the humidity-dependent synaptic plasticity of Ni-BAND, showcasing how MPECs can expand into traditional MIEC applications while leveraging their unique proton-mediated advantages.
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Affiliation(s)
- Minju Park
- Department of Chemical and Biological Engineering, Andong National University (ANU), 1375 Gyeongdong-ro, Andong, Gyeongbuk, 36729, Republic of Korea
| | - Huiyeong Ju
- Research Center for Materials Analysis, Korea Basic Science Institute, Daejeon, 34133, Republic of Korea
| | - Joohee Oh
- Department of Chemistry, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju, 61005, Republic of Korea
- Center for Quantum Conversion Research (QCR), Institute of Basic Science (IBS), 123 Cheomdangwagi-ro, Buk-gu, Gwangju, 61005, Republic of Korea
| | - Kwangmin Park
- Department of Chemical and Biological Engineering, Andong National University (ANU), 1375 Gyeongdong-ro, Andong, Gyeongbuk, 36729, Republic of Korea
| | - Hyunseob Lim
- Department of Chemistry, Gwangju Institute of Science and Technology (GIST), 123 Cheomdangwagi-ro, Buk-gu, Gwangju, 61005, Republic of Korea.
- Center for Quantum Conversion Research (QCR), Institute of Basic Science (IBS), 123 Cheomdangwagi-ro, Buk-gu, Gwangju, 61005, Republic of Korea.
| | - Seok Min Yoon
- Department of Chemistry, Gyeongsang National University, 501 Jinjudae-ro, Jinju, Gyeongnam, 52828, Republic of Korea.
- Research Institute of Advanced Chemistry, Gyeongsang National University, 501 Jinjudae-ro, Jinju, Gyeongnam, 52828, Republic of Korea.
| | - Intek Song
- Department of Chemical and Biological Engineering, Andong National University (ANU), 1375 Gyeongdong-ro, Andong, Gyeongbuk, 36729, Republic of Korea.
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Alam MI, Sumichika R, Tsuchimoto J, Komeda T, Teramoto A. Interface analysis of oxide free MoS 2 films fabricated by solution process. Sci Rep 2024; 14:26779. [PMID: 39501037 PMCID: PMC11538538 DOI: 10.1038/s41598-024-78229-1] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/25/2024] [Accepted: 10/29/2024] [Indexed: 11/08/2024] Open
Abstract
We report a solution-based approach for the synthesis of oxidation-free MoS2 films, focusing on interface analysis. Through a sulfurization-free solution process and single-step annealing, the oxidation-free MoS2 film is successfully prepared on Si3N4 surfaces, showing improved uniformity with a surface roughness below 0.5 nm and a thickness of 4 nm at a precursor solution concentration of 30 mM, annealed between 700 and 800ºC. The MoS2 films exhibit a hexagonal lattice structure with crystallographic orientations of (1 1 0 0) and (1 2 1 0) with lattice spacings of 0.27 nm and 0.16 nm respectively. Interfacial analysis by X-ray photoelectron spectroscopy (XPS) on SiO2 reveals migration of oxygen species as evidenced by a shift in the Si 2p spectrum at binding energies between 102.6 eV and 102.8 eV. MoS2 films on Si3N4 show a complex Si 2p peak evolution at binding energies between 100.9 and 101.8 eV, providing valuable insights into the synthesis of oxide-free MoS2 films for potential applications in advanced electronic devices.
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Affiliation(s)
- Md Iftekharul Alam
- Research Institute for Semiconductor Engineering, Hiroshima University, 1-4-2 Kagamiyama, Higashi-Hiroshima, Hiroshima, 739-8530, Japan.
| | - Rikiya Sumichika
- Graduate School of Advanced Science and Engineering, Hiroshima University, 1-4-2 Kagamiyama, Higashi-Hiroshima, Hiroshima, 739-8530, Japan
| | - Junichi Tsuchimoto
- Research Institute for Semiconductor Engineering, Hiroshima University, 1-4-2 Kagamiyama, Higashi-Hiroshima, Hiroshima, 739-8530, Japan
| | - Tadahiro Komeda
- Institute of Multidisciplinary Research for Advanced Materials (IMRAM, Tagen), Tohoku University, 2-1-1, Katahira, Aoba-ku, Sendai, 980 -0877, Japan
| | - Akinobu Teramoto
- Research Institute for Semiconductor Engineering, Hiroshima University, 1-4-2 Kagamiyama, Higashi-Hiroshima, Hiroshima, 739-8530, Japan.
- Graduate School of Advanced Science and Engineering, Hiroshima University, 1-4-2 Kagamiyama, Higashi-Hiroshima, Hiroshima, 739-8530, Japan.
- Research Institute for Synchrotron Radiation Science, Hiroshima University, 2-313 Kagamiyama, Higashi-Hiroshima, Hiroshima 739-0046, Japan.
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Song I. Novel electrodes and gate dielectrics for
field‐effect
transistors based on
two‐dimensional
materials. B KOREAN CHEM SOC 2023. [DOI: 10.1002/bkcs.12686] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 03/05/2023]
Affiliation(s)
- Intek Song
- Department of Applied Chemistry Andong National University (ANU) Andong Gyeongbuk Republic of Korea
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Suleman M, Lee S, Kim M, Nguyen VH, Riaz M, Nasir N, Kumar S, Park HM, Jung J, Seo Y. NaCl-Assisted Temperature-Dependent Controllable Growth of Large-Area MoS 2 Crystals Using Confined-Space CVD. ACS OMEGA 2022; 7:30074-30086. [PMID: 36061644 PMCID: PMC9434612 DOI: 10.1021/acsomega.2c03108] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 05/18/2022] [Accepted: 08/10/2022] [Indexed: 06/15/2023]
Abstract
Due to its semiconducting nature, controlled growth of large-area chemical vapor deposition (CVD)-grown two-dimensional (2D) molybdenum disulfide (MoS2) has a lot of potential applications in photodetectors, sensors, and optoelectronics. Yet the controllable, large-area, and cost-effective growth of highly crystalline MoS2 remains a challenge. Confined-space CVD is a very promising method for the growth of highly crystalline MoS2 in a controlled manner. Herein, we report the large-scale growth of MoS2 with different morphologies using NaCl as a seeding promoter for confined-space CVD. Changes in the morphologies of MoS2 are reported by variation in the amount of seeding promoter, precursor ratio, and the growth temperature. Furthermore, the properties of the grown MoS2 are analyzed using optical microscopy, scanning electron microscopy (SEM), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), energy-dispersive X-ray spectroscopy (EDX), and atomic force microscopy (AFM). The electrical properties of the CVD-grown MoS2 show promising performance from fabricated field-effect transistors. This work provides new insight into the growth of large-area MoS2 and opens the way for its various optoelectronic and electronic applications.
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Affiliation(s)
- Muhammad Suleman
- Department of Nanotechnology
and Advanced Materials Engineering, and HMC, Sejong University, 05006 Seoul, South Korea
| | - Sohee Lee
- Department of Nanotechnology
and Advanced Materials Engineering, and HMC, Sejong University, 05006 Seoul, South Korea
| | - Minwook Kim
- Department of Nanotechnology
and Advanced Materials Engineering, and HMC, Sejong University, 05006 Seoul, South Korea
| | - Van Huy Nguyen
- Department of Nanotechnology
and Advanced Materials Engineering, and HMC, Sejong University, 05006 Seoul, South Korea
| | - Muhammad Riaz
- Department of Nanotechnology
and Advanced Materials Engineering, and HMC, Sejong University, 05006 Seoul, South Korea
| | - Naila Nasir
- Department of Nanotechnology
and Advanced Materials Engineering, and HMC, Sejong University, 05006 Seoul, South Korea
| | - Sunil Kumar
- Department of Nanotechnology
and Advanced Materials Engineering, and HMC, Sejong University, 05006 Seoul, South Korea
| | - Hyun Min Park
- Department of Nanotechnology
and Advanced Materials Engineering, and HMC, Sejong University, 05006 Seoul, South Korea
| | - Jongwan Jung
- Department of Nanotechnology
and Advanced Materials Engineering, and HMC, Sejong University, 05006 Seoul, South Korea
| | - Yongho Seo
- Department of Nanotechnology
and Advanced Materials Engineering, and HMC, Sejong University, 05006 Seoul, South Korea
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