Imaging and Patterning of Monomolecular Resists by Zone-Plate-Focused X-ray Microprobe

Energy-Selective Decomposition of Organometallic Compounds by Slow Electrons: The Case of Chloro(dimethyl sulfide)gold(I)

Gold-containing compounds offer many applications in nanoscale materials science, and electron-beam methods are versatile for shaping nanostructures. In this study, we report the energy-selective fragmentation of chloro(dimethyl sulfide)gold(I) (ClAuS(CH₃)₂) induced by slow electrons. We observe the resonant formation of four fragment anions, namely [Cl]^-, [S]^-, [CH₂S]^-, and [ClAuH···SH]^-, which are generated in the energy range of 0-9 eV. The predominant fragment anion is formed below 1 eV from the cleavage of a single Au-Cl bond to produce the [Cl]^- anion. The resonant states and the energetics of the fragmentation are investigated by DFT methods. These findings may contribute to future strategies in the elaboration of specific nanomaterials or for selective chemistry using electron-beam techniques.

Self-assembled monolayer-assisted negative lithography

Self-assembled monolayers (SAMs) have been widely employed as etching resists in wet lithography systems to form patterns in which the ordered molecular packing of the SAM regions significantly delays the etchant attack. A generally accepted recognition is that the SAMs ability to resist etching is positively correlated to the quality of the surface-assembled structures, and a more ordered molecular packing would correspond to a better etching resistance. Such a classical belief is debated in the present work by providing an alternative SAM-assisted negative lithography where ordered SAM regions are etched more quickly than their disordered counterparts. This method features a unique photoirradiation-imprinted patterning process that simply consists of two steps: (1) UV irradiation on an OH-terminated SAM-modified gold surface through a photomask and (2) the subsequent immersion of the exposed substrate in an aqueous etching solution of N-bromosuccinimide/pyridine to develop a wet lithographic pattern. The entire experimental process reveals a finding from previous work that the etching rate on the UV-exposed regions with disordered molecular packing could be modulated to be slower than that in the unexposed well-defined SAM regions. Longer irradiation times would also revert the patterns from negative to positive. Thus, by merely using one kind of SAM-modified surface to provide both positive and negative micropatterns on gold layers, one could obtain flexible opportunities for high-resolution micro/nanofabrication resembling photolithography.

Exposure of Monomolecular Lithographic Patterns to Ambient: An X-ray Photoemission Spectromicroscopy Study

Patterned self-assembled monolayers (SAMs) of alkanethiolates (AT) on Au and Ag substrates were imaged and characterized by scanning photoelectron microscopy (SPEM). The patterns were prepared in situ by direct writing with the zone-plate-focused X-ray beam provided by the SPEM station. Whereas both AT/Au and AT/Ag behaved alike upon the irradiation, which resulted in similar contrasts in the fabricated patterns and similar microspot spectra from the irradiated areas, the intensity relationship between the patterned and nonpatterned areas changed by different pathways for the Au and Ag substrates after the exposure of the patterns to ambient. The SPEM data imply that weakly bound molecular fragments are desorbed from the irradiated areas upon air exposure in the case of Ag, whereas adsorption of airborne molecules from ambient occurs for the Au substrate. The origin of the observed differences is presumably related to the specific branching patterns of irradiation-induced modification of AT/Au and AT/Ag.

Sum Frequency Generation Microscopy of Microcontact-Printed Mixed Self-Assembled Monolayers

Sum frequency generation imaging microscopy (SFGIM) is used to image the chemically distinct regions of a microcontact-printed monolayer surface. The contrast in the images is based on the vibrational spectrum of each component in the monolayer. Mixtures of C16 thiols on gold with CH3 and phenyl termination are imaged with a resolution of approximately 10 microm. Microcontact printing produces films that are different compared to the immersion procedure of forming self-assembled monolayers. The SFGIM technique is able to obtain a vibrational spectrum at each point on the surface and demonstrate that the stamped area has significant mixing with the molecules deposited from the backfilling solution.

X-ray Absorption Spectromicroscopy Studies for the Development of Lithography with a Monomolecular Resist

Soft X-ray absorption microscopy was applied to image and characterize molecular patterns produced by electron irradiation of aliphatic and aromatic thiol-derived self-assembled monolayers (SAMs) on Au substrates. The measurements were performed at all relevant absorption edges. The fabricated patterns could be clearly imaged with a lateral resolution better than 150 nm, which, for example, allowed us to distinguish a fine structure of 1 microm features. The X-ray absorption microspot spectra derived from different areas of the SAM patterns provided specific chemical information on pristine and irradiated areas and unexpected features in these patterns. The quality of the microspot spectra is comparable with that of the analogous X-ray absorption spectra acquired with standard equipment from homogeneous SAMs. In particular, a chemical transformation of the functional tail groups within the irradiated areas of the patterned aromatic SAMs could be directly monitored.