Controlled placement of colloidal quantum dots in sub-15 nm clusters

Manipulation of multipartite entanglement in an array of quantum dots

Multipartite entanglement is indispensable in the implementation of quantum technologies and the fundamental test of quantum mechanics. Here we study how the W state and W-like state may be generated in a quantum-dot array by controlling the coupling between an incident photon and the quantum dots on a waveguide. We also discuss how the coupling may be controlled to observe the sudden death of entanglement. Our work can find potential applications in quantum information processing.

Deterministic Positioning of Colloidal Quantum Dots on Silicon Nitride Nanobeam Cavities

Engineering an array of precisely located cavity-coupled active media poses a major experimental challenge in the field of hybrid integrated photonics. We deterministically position solution-processed colloidal quantum dots (QDs) on high quality (Q)-factor silicon nitride nanobeam cavities and demonstrate light-matter coupling. By lithographically defining a window on top of an encapsulated cavity that is cladded in a polymer resist, and spin coating the QD solution, we can precisely control the placement of the QDs, which subsequently couple to the cavity. We show rudimentary control of the number of QDs coupled to the cavity by modifying the size of the window. Furthermore, we demonstrate Purcell enhancement and saturable photoluminescence in this QD-cavity platform. Finally, we deterministically position QDs on a photonic molecule and observe QD-coupled cavity supermodes. Our results pave the way for precisely controlling the number of QDs coupled to a cavity by engineering the window size, the QD dimension, and the solution chemistry and will allow advanced studies in cavity enhanced single photon emission, ultralow power nonlinear optics, and quantum many-body simulations with interacting photons.

Fabrication of carbon quantum dots with nano-defined position and pattern in one step via sugar-electron-beam writing

Quantum dots (QDs) are promising materials in nanophotonics, biological imaging, and even quantum computing. Precise positioning and patterning of QDs is a prerequisite for realizing their actual applications. Contrary to the traditional two discrete steps of fabricating and positioning QDs, herein, a novel sugar-electron-beam writing (SEW) method is reported for producing QDs via electron-beam lithography (EBL) that uses a carefully chosen synthetic resist, poly(2-(methacrylamido)glucopyranose) (PMAG). Carbon QDs (CQDs) could be fabricated in situ through electron beam exposure, and the nanoscale position and luminescence intensity of the produced CQDs could be precisely controlled without the assistance of any other fluorescent matter. We have demonstrated that upon combining an electron beam with a glycopolymer, in situ production of CQDs occurs at the electron beam spot center with nanoscale precision at any place and with any patterns, an advancement that we believe will stimulate innovations in future applications.

Non-avalanche single photon detection without carrier transit-time delay through quantum capacitive coupling

Searching for innovative approaches to detect single photons remains at the center of science and technology for decades. This paper proposes a zero transit-time, non-avalanche quantum capacitive photodetector to register single photons. In this detector, the absorption of a single photon changes the wave function of a single electron trapped in a quantum dot (QD), leading to a charge density redistribution nearby. This redistribution translates into a voltage signal through capacitive coupling between the QD and the measurement probe. Using InAs QD/AlAs barrier as a model system, the simulation shows that the output signal reaches ~4 mV per absorbed photon, promising for high-sensitivity, ps single-photon detection.

DNA-Mediated Patterning of Single Quantum Dot Nanoarrays: A Reusable Platform for Single-Molecule Control

We present a facile strategy of general applicability for the assembly of individual nanoscale moieties in array configurations with single-molecule control. Combining the programming ability of DNA as a scaffolding material with a one-step lithographic process, we demonstrate the patterning of single quantum dots (QDs) at predefined locations on silicon and transparent glass surfaces: as proof of concept, clusters of either one, two, or three QDs were assembled in highly uniform arrays with a 60 nm interdot spacing within each cluster. Notably, the platform developed is reusable after a simple cleaning process and can be designed to exhibit different geometrical arrangements.

Alternative Patterning Process for Realization of Large-Area, Full-Color, Active Quantum Dot Display

Although various colloidal quantum dot (QD) coating and patterning techniques have been developed to meet the demands in optoelectronic applications over the past years, each of the previously demonstrated methods has one or more limitations and trade-offs in forming multicolor, high-resolution, or large-area patterns of QDs. In this study, we present an alternative QD patterning technique using conventional photolithography combined with charge-assisted layer-by-layer (LbL) assembly to solve the trade-offs of the traditional patterning processes. From our demonstrations, we show repeatable QD patterning process that allows multicolor QD patterns in both large-area and microscale. Also, we show that the QD patterns are robust against additional photolithography processes and that the thickness of the QD patterns can be controlled at each position. To validate that this process can be applied to actual device applications as an active material, we have fabricated inverted, differently colored, active QD light-emitting device (QD-LED) on a pixelated substrate, which achieved maximum electroluminescence intensity of 23 770 cd/m², and discussed the results. From our findings, we believe that our process provides a solution to achieving both high-resolution and large-scale QD pattern applicable to not only display, but also to practical photonic device research and development.

Robust, directed assembly of fluorescent nanodiamonds

Arrays of fluorescent nanoparticles are highly sought after for applications in sensing, nanophotonics and quantum communications. Here we present a simple and robust method of assembling fluorescent nanodiamonds into macroscopic arrays. Remarkably, the yield of this directed assembly process is greater than 90% and the assembled patterns withstand ultra-sonication for more than three hours. The assembly process is based on covalent bonding of carboxyl to amine functional carbon seeds and is applicable to any material, and to non-planar surfaces. Our results pave the way to directed assembly of sensors and nanophotonics devices.

Nanoscale and Single-Dot Patterning of Colloidal Quantum Dots

Using an optimized lift-off process we develop a technique for both nanoscale and single-dot patterning of colloidal quantum dot films, demonstrating feature sizes down to ~30 nm for uniform films and a yield of 40% for single-dot positioning, which is in good agreement with a newly developed theoretical model. While first of all presenting a unique tool for studying physics of single quantum dots, the process also provides a pathway toward practical quantum dot-based optoelectronic devices.

Plasmonic control of radiative properties of semiconductor quantum dots coupled to plasmonic ring cavities

In recent years, a lot of effort has been made to achieve controlled delivery of target particles to the hotspots of plasmonic nanoantennas, in order to probe and/or exploit the extremely large field enhancements produced by such structures. While in many cases such high fields are advantageous, there are instances where they should be avoided. In this work, we consider the implications of using the standard nanoantenna geometries when colloidal quantum dots are employed as target entities. We show that in this case, and for various reasons, dimer antennas are not the optimum choice. Plasmonic ring cavities are a better option despite low field enhancements, as they allow collective coupling of many quantum dots in a reproducible and predictable manner. In cases where larger field enhancements are required, or for larger quantum dots, nonconcentric ring-disk cavities can be employed instead.

Determining the resolution limits of electron-beam lithography: direct measurement of the point-spread function

One challenge existing since the invention of electron-beam lithography (EBL) is understanding the exposure mechanisms that limit the resolution of EBL. To overcome this challenge, we need to understand the spatial distribution of energy density deposited in the resist, that is, the point-spread function (PSF). During EBL exposure, the processes of electron scattering, phonon, photon, plasmon, and electron emission in the resist are combined, which complicates the analysis of the EBL PSF. Here, we show the measurement of delocalized energy transfer in EBL exposure by using chromatic aberration-corrected energy-filtered transmission electron microscopy (EFTEM) at the sub-10 nm scale. We have defined the role of spot size, electron scattering, secondary electrons, and volume plasmons in the lithographic PSF by performing EFTEM, momentum-resolved electron energy loss spectroscopy (EELS), sub-10 nm EBL, and Monte Carlo simulations. We expect that these results will enable alternative ways to improve the resolution limit of EBL. Furthermore, our approach to study the resolution limits of EBL may be applied to other lithographic techniques where electrons also play a key role in resist exposure, such as ion-beam-, X-ray-, and extreme-ultraviolet lithography.