Highly ordered freestanding titanium oxide nanotube arrays using Si-containing block copolymer lithography and atomic layer deposition

Recent Advances in TiO2-based Photoanodes for Photoelectrochemical Water Splitting

Photoelectrochemical (PEC) water splitting has attracted a great attention in the past several decades which holds great promise to address global energy and environmental issues by converting solar energy into hydrogen. However, its low solar-to-hydrogen (STH) conversion efficiency remains a bottleneck for practical application. Developing efficient photoelectrocatalysts with high stability and high STH conversion efficiency is one of the key challenges. As a typical n-type semiconductor, titanium dioxide (TiO 2 ) exhibits high PEC water splitting performance, especially high chemical and photo stability. But, TiO 2 has also disadvantages such as wide band gap and fast electron-hole recombination rate, which seriously hinder its PEC performance. This review focuses on recent development in TiO 2 -based photoanodes as well as some key fundamentals. The corresponding mechanisms and key factors for high STH, and controllable synthesis and modification strategies are highlighted in this review. We conclude finally with an outlook providing a critical perspective on future trends on TiO 2 -based photoanodes for PEC water splitting.

Atomic Layer Assembly Based on Sacrificial Templates for 3D Nanofabrication

Three-dimensional (3D) nanostructures have attracted widespread attention in physics, chemistry, engineering sciences, and biology devices due to excellent functionalities which planar nanostructures cannot achieve. However, the fabrication of 3D nanostructures is still challenging at present. Reliable fabrication, improved controllability, and multifunction integration are desired for further applications in commercial devices. In this review, a powerful fabrication method to realize 3D nanostructures is introduced and reviewed thoroughly, which is based on atomic layer deposition assisted 3D assembly through various sacrificial templates. The aim of this review is to provide a comprehensive overview of 3D nanofabrication based on atomic layer assembly (ALA) in multifarious sacrificial templates for 3D nanostructures and to present recent advancements, with the ultimate aim to further unlock more potential of this method for nanodevice applications.

Metal Oxide/TiO₂ Hybrid Nanotubes Fabricated through the Organogel Route

Titanium dioxide (TiO₂) nanotube and its hybrid nanotubes (with various metal oxides such as Ta₂O₅, Nb₂O₅, ZrO2, and SiO₂) were fabricated by the sol-gel polymerization in the ethanol gels formed by simple l-lysine-based organogelator. The self-assembled nanofibers (gel fibers) formed by the gelator functioned as a template. The different calcination temperatures gave TiO₂ nanotubes with various crystalline structures; e.g., anatase TiO₂ nanotube was obtained by calcination at 600 °C, and rutile TiO₂ nanotube was fabricated at a calcination temperature of 750 °C. In the metal oxide/TiO₂ hybrid nanotubes, the metal oxide species were uniformly dispersed in the TiO₂ nanotube, and the percent content of metal oxide species was found to correspond closely to the feed ratio of the raw materials. This result indicated that the composition ratio of hybrid nanotubes was controllable by the feed ratio of the raw materials. It was found that the metal oxide species inhibited the crystalline phase transition of TiO₂ from anatase to rutile. Furthermore, the success of the hybridization of other metal oxides (except for TiO₂) indicated the usefulness of the organogel route as one of the fabrication methods of metal oxide nanotubes.

Photoanodes based on TiO2and α-Fe2O3for solar water splitting – superior role of 1D nanoarchitectures and of combined heterostructures

Solar driven photoelectrochemical water splitting represents a promising approach for a sustainable and environmentally friendly production of renewable energy vectors and fuel sources, such as H₂.

Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

Block copolymers (BCPs) and their directed self-assembly (DSA) has emerged as a realizable complementary tool to aid optical patterning of device elements for future integrated circuit advancements. Methods to enhance BCP etch contrast for DSA application and further potential applications of inorganic nanomaterial features (e.g., semiconductor, dielectric, metal and metal oxide) are examined. Strategies to modify, infiltrate and controllably deposit inorganic materials by utilizing neat self-assembled BCP thin films open a rich design space to fabricate functional features in the nanoscale regime. An understanding and overview on innovative ways for the selective inclusion/infiltration or deposition of inorganic moieties in microphase separated BCP nanopatterns is provided. Early initial inclusion methods in the field and exciting contemporary reports to further augment etch contrast in BCPs for pattern transfer application are described. Specifically, the use of evaporation and sputtering methods, atomic layer deposition, sequential infiltration synthesis, metal-salt inclusion and aqueous metal reduction methodologies forming isolated nanofeatures are highlighted in di-BCP systems. Functionalities and newly reported uses for electronic and non-electronic technologies based on the inherent properties of incorporated inorganic nanostructures using di-BCP templates are highlighted. We outline the potential for extension of incorporation methods to triblock copolymer features for more diverse applications. Challenges and emerging areas of interest for inorganic infiltration of BCPs are also discussed.

Fabrication of 50 nm scale Pt nanostructures by block copolymer (BCP) and its characteristics of surface-enhanced Raman scattering (SERS)

Surface-enhanced Raman scattering (SERS) represents an important phenomenon that can solve the low signal intensity of Raman spectroscopy. In this study, we investigated the effect of various Pt nanostructures on the sensitivity of SERS.

Epitaxial 1D electron transport layers for high-performance perovskite solar cells

We demonstrate high-performance perovskite solar cells with excellent electron transport properties using a one-dimensional (1D) electron transport layer (ETL). The 1D array-based ETL is comprised of 1D SnO2 nanowires (NWs) array grown on a F:SnO2 transparent conducting oxide substrate and rutile TiO2 nanoshells epitaxially grown on the surface of the 1D SnO2 NWs. The optimized devices show more than 95% internal quantum yield at 750 nm, and a power conversion efficiency (PCE) of 14.2%. The high quantum yield is attributed to dramatically enhanced electron transport in the epitaxial TiO2 layer, compared to that in conventional nanoparticle-based mesoporous TiO2 (mp-TiO2) layers. In addition, the open space in the 1D array-based ETL increases the prevalence of uniform TiO2/perovskite junctions, leading to reproducible device performance with a high fill factor. This work offers a method to achieve reproducible, high-efficiency perovskite solar cells with high-speed electron transport.

AAO-assisted synthesis of highly ordered, large-scale TiO2 nanowire arrays via sputtering and atomic layer deposition

Highly ordered nanoporous anodic aluminum oxide (AAO) thin films were fabricated in oxalic acid under a constant voltage via a two-step anodization process. To investigate the high-aspect-ratio (7.5:1) filling process, both sputtering and atomic layer deposition (ALD) were used to form TiO2 nanowires. Field emission scanning electron microscopy and high-resolution transmission electron microscopy images indicated that mushroom-like TiO2 structures were sputtered onto the AAO template surface, and the ALD-coated TiO2 exhibited fine filling results and clear crystal grain boundaries. Large-scale and free-standing TiO2 nanowire arrays were liberated by selectively removing the aluminum substrate and AAO template via a wet etching process with no collapsing or agglomeration after the drying process. ALD-deposited TiO2 nanowire arrays that were 67 nm in diameter and 400 nm high were transferred from the AAO template. The ALD process enabled the rapid, simple synthesis of highly ordered TiO2 nanowire arrays with desired parameters such as diameter, density, and thickness determined using diverse AAO templates.

The use of atomic layer deposition in advanced nanopatterning

Atomic layer deposition (ALD) is a method that allows for the deposition of thin films with atomic level control of the thickness and an excellent conformality on 3-dimensional surfaces. In recent years, ALD has been implemented in many applications in microelectronics, for which often a patterned film instead of full area coverage is required. This article reviews several approaches for the patterning of ALD-grown films. In addition to conventional methods relying on etching, there has been much interest in nanopatterning by area-selective ALD. Area-selective approaches can eliminate compatibility issues associated with the use of etchants, lift-off chemicals, or resist films. Moreover, the use of ALD as an enabling technology in advanced nanopatterning methods such as spacer defined double patterning or block copolymer lithography is discussed, as well as the application of selective ALD in self-aligned fabrication schemes.

Three-dimensional nanofabrication by block copolymer self-assembly

Thin films of block copolymers are widely seen as enablers for nanoscale fabrication of semiconductor devices, membranes, and other structures, taking advantage of microphase separation to produce well-organized nanostructures with periods of a few nm and above. However, the inherently three-dimensional structure of block copolymer microdomains could enable them to make 3D devices and structures directly, which could lead to efficient fabrication of complex heterogeneous structures. This article reviews recent progress in developing 3D nanofabrication processes based on block copolymers.