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Jurczyk J, Pillatsch L, Berger L, Priebe A, Madajska K, Kapusta C, Szymańska IB, Michler J, Utke I. In Situ Time-of-Flight Mass Spectrometry of Ionic Fragments Induced by Focused Electron Beam Irradiation: Investigation of Electron Driven Surface Chemistry inside an SEM under High Vacuum. NANOMATERIALS (BASEL, SWITZERLAND) 2022; 12:2710. [PMID: 35957140 PMCID: PMC9370286 DOI: 10.3390/nano12152710] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 06/15/2022] [Revised: 07/22/2022] [Accepted: 07/29/2022] [Indexed: 06/15/2023]
Abstract
Recent developments in nanoprinting using focused electron beams have created a need to develop analysis methods for the products of electron-induced fragmentation of different metalorganic compounds. The original approach used here is termed focused-electron-beam-induced mass spectrometry (FEBiMS). FEBiMS enables the investigation of the fragmentation of electron-sensitive materials during irradiation within the typical primary electron beam energy range of a scanning electron microscope (0.5 to 30 keV) and high vacuum range. The method combines a typical scanning electron microscope with an ion-extractor-coupled mass spectrometer setup collecting the charged fragments generated by the focused electron beam when impinging on the substrate material. The FEBiMS of fragments obtained during 10 keV electron irradiation of grains of silver and copper carboxylates and shows that the carboxylate ligand dissociates into many smaller volatile fragments. Furthermore, in situ FEBiMS was performed on carbonyls of ruthenium (solid) and during electron-beam-induced deposition, using tungsten carbonyl (inserted via a gas injection system). Loss of carbonyl ligands was identified as the main channel of dissociation for electron irradiation of these carbonyl compounds. The presented results clearly indicate that FEBiMS analysis can be expanded to organic, inorganic, and metal organic materials used in resist lithography, ice (cryo-)lithography, and focused-electron-beam-induced deposition and becomes, thus, a valuable versatile analysis tool to study both fundamental and process parameters in these nanotechnology fields.
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Affiliation(s)
- Jakub Jurczyk
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
- Faculty of Physics and Applied Computer Science, AGH University of Science and Technology Krakow, Al. Mickiewicza 30, 30-059 Kraków, Poland
| | - Lex Pillatsch
- TOFWERK AG, Schorenstrasse 39, CH-3645 Thun, Switzerland
| | - Luisa Berger
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
| | - Agnieszka Priebe
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
| | - Katarzyna Madajska
- Faculty of Chemistry, Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland
| | - Czesław Kapusta
- Faculty of Physics and Applied Computer Science, AGH University of Science and Technology Krakow, Al. Mickiewicza 30, 30-059 Kraków, Poland
| | - Iwona B. Szymańska
- Faculty of Chemistry, Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland
| | - Johann Michler
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
| | - Ivo Utke
- Laboratory for Mechanics of Materials and Nanostructures, Empa-Swiss Federal Laboratories for Materials Science and Technology, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland
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Utke I, Swiderek P, Höflich K, Madajska K, Jurczyk J, Martinović P, Szymańska I. Coordination and organometallic precursors of group 10 and 11: Focused electron beam induced deposition of metals and insight gained from chemical vapour deposition, atomic layer deposition, and fundamental surface and gas phase studies. Coord Chem Rev 2022. [DOI: 10.1016/j.ccr.2021.213851] [Citation(s) in RCA: 6] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/11/2022]
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Deminskyi P, Haider A, Eren H, Khan TM, Biyikli N. Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A: VACUUM, SURFACES, AND FILMS 2021; 39. [DOI: 10.1116/6.0000701] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/01/2023]
Abstract
The increasingly complex nanoscale three-dimensional and multilayered structures utilized in nanoelectronic, catalytic, and energy conversion/storage devices necessitate novel substrate-selective material deposition approaches featuring bottom-up and self-aligned precision processing. Here, we demonstrate the area-selective atomic layer deposition (AS-ALD) of two noble metals, Pt and Pd, by using a plasma-polymerized fluorocarbon layer as growth inhibition surfaces. The contact angle, x-ray photoelectron spectroscopy (XPS), and scanning electron microscopy measurements were performed to investigate the blocking ability of polymerized fluorocarbon (CFx) layers against ALD-grown metal films. Both Pt and Pd showed significant nucleation delays on fluorocarbon surfaces. Self-aligned film deposition is confirmed using this strategy by growing Pt and Pd on the microscale lithographically patterned CFx/Si samples. CFx blocking layer degradation during ozone exposure was analyzed using XPS measurements, which confirmed the oxygen physisorption as the main responsible surface reaction with further hydroxyl group formation on the CFx surface. Our work reveals that the CFx layer is compatible with an ozone coreactant until the blocking polymer cannot withstand oxygen physisorption. Our results could potentially be used to investigate and develop radical-assisted AS-ALD processes for a wider selection of materials.
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Affiliation(s)
- Petro Deminskyi
- UNAM—Institute of Materials Science and Nanotechnology, Bilkent University 1 , Ankara 06800, Turkey
| | - Ali Haider
- UNAM—Institute of Materials Science and Nanotechnology, Bilkent University 1 , Ankara 06800, Turkey
| | - Hamit Eren
- Department of Chemical Engineering, Delft University of Technology 2 , van der Maasweg 9, 2629 HZ Delft, The Netherlands
| | - Talha M. Khan
- UNAM—Institute of Materials Science and Nanotechnology, Bilkent University 1 , Ankara 06800, Turkey
| | - Necmi Biyikli
- Department of Electrical and Computer Engineering, University of Connecticut 3 , 371 Fairfield Way, Storrs, Connecticut 06269-4157
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