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For: Lang N, Röpcke J, Zimmermann H, Steinbach A, Wege S. In situ monitoring of plasma etch processes with a quantum cascade laser arrangement in semiconductor industrial environment. ACTA ACUST UNITED AC 2009. [DOI: 10.1088/1742-6596/157/1/012007] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/11/2022]
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1
Zhang L, Tian G, Li J, Yu B. Applications of absorption spectroscopy using quantum cascade lasers. APPLIED SPECTROSCOPY 2014;68:1095-1107. [PMID: 25239063 DOI: 10.1366/14-00001] [Citation(s) in RCA: 17] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/03/2023]
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