Subplantation model for film growth from hyperthermal species

Optical Properties of Amorphous Carbon Thin Films Fabricated Using a High-Energy-Impulse Magnetron-Sputtering Technique

This paper reports the results of amorphous carbon thin films fabricated by using the gas-impulse-injection magnetron-sputtering method and differing the accelerating voltage (1.0-1.4 kV). The obtained layers were investigated using Raman spectroscopy, X-ray photoelectron spectroscopy (XRD), and spectroscopic ellipsometry (SE). The analysis of the Raman and XPS spectra point to the significant content of sp3 hybridization in the synthesized materials (above 54-73%). The refractive index of the films is very high-above 2.45 in the infrared spectral range. The band-gap energy (determined using the inversed-logarithmic-derivative method) depends on the discharging voltage and is in the range from 1.58 eV (785 nm) to 2.45 eV (506 nm). Based on the obtained results, we have elaborated a model explaining the a-C layers' formation process.

Effects of Substrate Bias Voltage on Structure of Diamond-Like Carbon Films on AISI 316L Stainless Steel: A Molecular Dynamics Simulation Study

With the recent significant advances in micro- and nanoscale fabrication techniques, deposition of diamond-like carbon films on stainless steel substrates has been experimentally achieved. However, the underlying mechanism for the formation of film microstructures has remained elusive. In this study, the growth processes of diamond-like carbon films on AISI 316L substrate are studied via the molecular dynamics method. Effects of substrate bias voltage on the structure properties and sp³ hybridization ratio are investigated. A diamond-like carbon film with a compact structure and smooth surface is obtained at 120 V bias voltage. Looser structures with high surface roughness are observed in films deposited under bias voltages of 0 V or 300 V. In addition, sp³ fraction increases with increasing substrate bias voltage from 0 V to 120 V, while an opposite trend is obtained when the bias voltage is further increased from 120 V to 300 V. The highest magnitude of sp³ fraction was about 48.5% at 120 V bias voltage. The dependence of sp³ fraction in carbon films on the substrate bias voltage achieves a high consistency within the experiment results. The mechanism for the dependence of diamond-like carbon structures on the substrate bias voltage is discussed as well.

Thermal stability and diffusion characteristics of ultrathin amorphous carbon films grown on crystalline and nitrogenated silicon substrates by filtered cathodic vacuum arc deposition

Amorphous carbon (a-C) films are widely used as protective overcoats in many technology sectors, principally due to their excellent thermophysical properties and chemical inertness. The growth and thermal stability of sub-5-nm-thick a-C films synthesized by filtered cathodic vacuum arc on pure (crystalline) and nitrogenated (amorphous) silicon substrate surfaces were investigated in this study. Samples of a-C/Si and a-C/SiN_x/Si stacks were thermally annealed for various durations and subsequently characterized by high-resolution transmission electron microscopy (TEM) and electron energy loss spectroscopy (EELS). The TEM images confirmed the continuity and uniformity of the a-C films and the 5-nm-thick SiN_x underlayer formed by silicon nitrogenation using radio-frequency sputtering. The EELS analysis of cross-sectional samples revealed the thermal stability of the a-C films and the efficacy of the SiN_x underlayer to prevent carbon migration into the silicon substrate, even after prolonged heating. The obtained results provide insight into the important attributes of an underlayer in heated multilayered media for preventing elemental intermixing with the substrate, while preserving the structural stability of the a-C film at the stack surface. An important contribution of this investigation is the establishment of an experimental framework for accurately assessing the thermal stability and elemental diffusion in layered microstructures exposed to elevated temperatures.

Nucleation of diamond films on heterogeneous substrates: a review

Diamond thin films are known to have properties similar to bulk diamond and have applications in both industry and fundamental studies in academia. The high surface energy of diamond makes it extremely difficult to grow diamond films on foreign substrates. Hence, to grow diamond films on non-diamond substrates, a nucleation step is needed. In this review various techniques used for diamond nucleation/seeding will be discussed. At present electrostatic seeding by diamond nanoparticles is the most commonly used seeding technique for nanocrystalline growth. In this technique the substrate is dipped in a nanodiamond solution to form a mono layer of diamond seeds. These seeds when exposed to appropriate conditions grow to form diamond layers. This technique is suitable for most substrates. For heteroepitaxial growth, bias enhanced nucleation is the primary technique. In this technique the substrate is biased to form diamond nuclei in the initial stages of growth. This technique can be used for any conducting flat surface. For growth on ceramics, polishing by diamond grit or electrostatic seeding can be used. Polishing the ceramics with diamond powder leaves small diamond particles embedded in the substrate. These small particles then act as seeds for subsequent diamond growth. Apart from these techniques, chemical nucleation, interlayer driven nucleation and mixed techniques have been discussed. The advantages and disadvantages of individual techniques have also been discussed.

Growth of diamond film on heterogeneous substrates assisted by nucleation/seeding.

Competition between diamond nucleation and growth under bias voltage by microwave plasma chemical vapor deposition

A competition between diamond nucleation and growth is proposed in which the surface and bulk nucleation coexist and compete.

Comparison of Carbon Thin Films with Low Secondary Electron Yield Deposited in Neon and Argon

Modification of vacuum chamber surface properties by introducing a layer of material with low secondary electron yield (SEY) is one of the most useful solutions to suppress the electron-cloud in high-energy particle accelerators. In the present work, amorphous carbon thin films have been produced by DC magnetron sputtering with Neon and Argon sputtering gases. Microstructures of the thin films have been characterized by using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The sp2 and sp3 hybridized carbon atoms are evaluated using X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. The amorphous carbon coatings comprise tiny granularities of tens of nanometers. The amorphous carbon films show more graphite-like properties as revealed by XPS and Raman spectroscopy. The secondary electron emission measurement results indicate that amorphous carbon coatings present SEY of <1.2. The thin film deposited by Ne exhibits a higher sp2 hybridization content, leading to a slightly lower SEY compared with the film produced with Ar.

Room and High Temperature Tribological Behaviour of W-DLC Coatings Produced by DCMS and Hybrid DCMS-HiPIMS Configuration

Carbon-based coatings are used in many applications, particularly in sliding contacts to reduce friction and wear. To improve the tribological properties, these coatings are usually alloyed with metals; W is one of the most used since it helps improve the tribological performance at high temperatures. In this work, we compared the tribological performance of Diamond-Like Carbon alloyed with tungsten (DLC-W) films deposited by direct current magnetron sputtering (DCMS) with films deposited in a hybrid configuration DCMS + high power impulse magnetron sputtering (HiPIMS). The DLC-W coatings were produced with approximately the same W content. One hydrogenated film was deposited with the hybrid configuration for comparison purposes. Microstructure, structure, mechanical properties, and tribological behaviour were used to compare the coatings. All the films displayed a low-order structure of tungsten carbide embedded in an amorphous carbon matrix. The use of the hybrid HiPIMS/DCMS results in coatings with more compact morphologies due to the high ionization fraction of the species produced on the W target (W and Ar ionized species), which primarily will oppose the shadowing effect as the ions will reach the substrate at angles close to 90°. HiPIMS non-hydrogenated film is the more tribological, performing either at room or high temperature (150 °C) due to the much more compact morphology, which avoids the detachment of hard W-C particles, which are responsible for more efficiently scratching the film surface. Experiments revealed that wear behaviour in all the films is governed by the contact of the tribolayer formed on the counterpart composed of W–C, C and W–O against the surface of the film.

Structural properties of protective diamond-like-carbon thin films grown on multilayer graphene

In spite of the versatility of electronic properties of graphene, its fragility and low resistance to damage and external deformations reduce the practical value of this material for many applications. Coating of graphene with a thin layer of hard amorphous carbon is considered as a viable solution to protect the 2D material against accidental scratches and other external damaging impacts. In this study, we investigate the relationship between the deposition condition and quality of diamond-like-carbon (DLC) on top of multilayer graphene by means of molecular dynamics simulations. Deposition of carbon atoms with 70 eV incident energy at 100 K resulted in the highest content of [Formula: see text]-bonded C atoms. An increase of the number of dangling bonds at the interface between the top graphene layer and the DLC film indicates that decrease of the incident energy reduces the adhesion quality of DLC thin film on graphene. Analysis of radial distribution function indicates that [Formula: see text] hybridized carbon atoms tend to grow near already existing [Formula: see text]-atoms. This explains why the quality of the DLC structures grown on graphene have generally a lower content of [Formula: see text] C atoms compared to those grown directly on diamond. Ring analysis further shows that a DLC structure grown on the [Formula: see text]-rich structures like graphene contains a higher fraction of disordered ring structures.

Nanostructure, structural stability, and diffusion characteristics of layered coatings for heat-assisted magnetic recording head media

The intense laser heating in heat-assisted magnetic recording (HAMR) has been a major hindrance to HAMR technology from becoming commercially viable. Thermal damage of the near-field transducer (NFT) and write pole (WP) embedded in the trailing edge of the magnetic head due to failure of the protective carbon overcoat after prolonged heating at an elevated temperature are major obstacles. Therefore, the main objective of this study was to develop an effective coating method for HAMR heads. This was accomplished by introducing a new class of layered coatings consisting of ultrathin amorphous carbon (a-C) overcoat, adhesion (SiN) layer, and buffer (NiCr or TaO_x) layer sequentially deposited onto Au and FeCo base layers to mimic the layer stacking of NFT and WP elements, respectively. The structural stability of the a-C overcoats and diffusion characteristics of each comprising layer under conditions of heating at 350 °C for 30 min in an Ar atmosphere were investigated by high-resolution transmission electron microscopy (HRTEM), scanning transmission electron microscopy (STEM), and electron energy loss spectroscopy (EELS). For most stacking configurations the HRTEM/STEM and EELS results generally revealed some layer intermixing and minute carbon atom rehybridization in the heated a-C overcoats. The findings of this investigation suggest that further optimization of the developed layered coatings can provide a viable solution to thermal damage of HAMR heads.

Ultrathin amorphous carbon films synthesized by filtered cathodic vacuum arc used as protective overcoats of heat-assisted magnetic recording heads

Despite numerous investigations of amorphous carbon (a-C) films, a comprehensive study of the feasibility and optimization of sub-5-nm-thick a-C films deposited onto the write pole of heat-assisted magnetic recording (HAMR) heads is lacking. The main objective of this study was to identify the role of pulse substrate bias voltage and C+ ion incidence angle on the structure and thickness of 1-4-nm-thick a-C films deposited by a rather new thin-film deposition method, known as filtered cathodic vacuum arc (FCVA). The cross-sectional structure of a-C films synthesized under various FCVA conditions was examined by high-resolution transmission electron microscopy (HRTEM), scanning transmission electron microscopy (STEM), and electron energy loss spectroscopy (EELS). It was found that film growth under process conditions of low-to-intermediate substrate bias voltage (in the range of -25 to -100  V), low ion incidence angle (10°), very short deposition time (6 s), and fixed other deposition parameters (65% duty cycle of substrate pulse biasing and 1.48 × 1019 ions/m2·s ion flux) yields a-C films of thickness ≤4 nm characterized by a significant content (~50-60 at%) of tetrahedral (sp3) carbon atom hybridization. A threshold where sp3 hybridization is greatly reduced due to limited film growth was determined from the HRTEM/STEM and EELS measurements. The results of this study demonstrate the viability of FCVA to produce extremely thin and uniform protective a-C films with relatively high sp3 contents for HAMR heads.

Characterization of sp3 bond content of carbon films deposited by high power gas injection magnetron sputtering method by UV and VIS Raman spectroscopy

This paper presents the results of investigations of carbon films deposited by a modified version of the magnetron sputtering method - HiPGIMS (High Power Gas Injection Magnetron Sputtering). In this experiment, the magnetron system with inversely polarized electrodes (sputtered cathode at ground potential and positively biased, spatially separated anode) was used. This arrangement allowed us to conduct the experiment using voltages ranging from 1 to 2kV and a power supply system equipped with 25/50μF capacitor battery. Carbon films were investigated by VIS/UV Raman spectroscopy. Sp³/sp² bonding ratio was evaluated basing the elementary components of registered spectra. Our investigation showed that sp³ bond content increases with discharge power but up to specific value only. In extreme conditions of generating plasma impulses, we detected a reversed relation of the sp³/sp² ratio. In our opinion, a energy of plasma pulse favors nucleation of a sp³ phase because of a relatively higher ionization state but in extreme cases the influence of energy is reversed.

Metal (Ag/Ti)-Containing Hydrogenated Amorphous Carbon Nanocomposite Films with Enhanced Nanoscratch Resistance: Hybrid PECVD/PVD System and Microstructural Characteristics

This study aimed to develop hydrogenated amorphous carbon thin films with embedded metallic nanoparticles (a–C:H:Me) of controlled size and concentration. Towards this end, a novel hybrid deposition system is presented that uses a combination of Plasma Enhanced Chemical Vapor Deposition (PECVD) and Physical Vapor Deposition (PVD) technologies. The a–C:H matrix was deposited through the acceleration of carbon ions generated through a radio-frequency (RF) plasma source by cracking methane, whereas metallic nanoparticles were generated and deposited using terminated gas condensation (TGC) technology. The resulting material was a hydrogenated amorphous carbon film with controlled physical properties and evenly dispersed metallic nanoparticles (here Ag or Ti). The physical, chemical, morphological and mechanical characteristics of the films were investigated through X-ray reflectivity (XRR), Raman spectroscopy, Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), Transmission Electron Microscopy (TEM) and nanoscratch testing. The resulting amorphous carbon metal nanocomposite films (a–C:H:Ag and a–C:H:Ti) exhibited enhanced nanoscratch resistance (up to +50%) and low values of friction coefficient (<0.05), properties desirable for protective coatings and/or solid lubricant applications. The ability to form nanocomposite structures with tunable coating performance by potentially controlling the carbon bonding, hydrogen content, and the type/size/percent of metallic nanoparticles opens new avenues for a broad range of applications in which mechanical, physical, biological and/or combinatorial properties are required.

Superior wear resistance and low friction in hybrid ultrathin silicon nitride/carbon films: synergy of the interfacial chemistry and carbon microstructure

Amorphous carbon-based films are commonly investigated as protective nanocoatings in macro- to nano-scale devices due to their exceptional tribological and mechanical properties. However, with further device miniaturization where even thinner coatings are required, the wear durability of the nanocoating rapidly degrades at the expense of lower thickness. Here we discover that for sub-10 nm coating thicknesses, a hybrid bi-layer film structure, comprising a high sp³-bonded amorphous carbon top layer and a silicon nitride (SiN_x) bottom layer, consistently outperforms its single-layer amorphous carbon counterpart in terms of wear durability on a commercial tape drive head, while exhibiting low, stable friction and excellent wear resistance on a flat ceramic substrate. The superior performance of the hybrid film is attributed to the constructive synergy of the sp³-rich carbon microstructure and an enhanced interfacial chemistry arising from additional interfacial bonding. Moreover, a high energy C⁺ ion treatment step, introduced either directly to the substrate or to the SiN_x layer before carbon deposition, also aids in increasing atomic mixing that contributes to further improvement in the wear resistance. This study highlights the importance of both the carbon microstructure and interfacial chemistry in the design of wear-durable nanocoatings at few-nanometer thicknesses, particularly for aggressive wear conditions.

Ion mass and energy selective hyperthermal ion-beam assisted deposition setup

For the synthesis of high-quality thin films, ion-beam assisted deposition (IBAD) is a frequently used technique providing precise control over several substantial film properties. IBAD typically relies on the use of a broad-beam ion source. Such ion sources suffer from the limitation that they deliver a blend of ions with different ion masses, each of them possessing a certain distribution of kinetic energy. In this paper, a compact experimental setup is presented that enables the separate control of ion mass and ion kinetic energy in the region of hyperthermal energies (few 1 eV - few 100 eV). This ion energy region is of increasing interest not only for ion-assisted film growth but also for the wide field of preparative mass spectrometry. The setup consists of a constricted glow-discharge plasma beam source and a tailor-made, compact quadrupole system equipped with entry and exit ion optics. It is demonstrated that the separation of monoatomic and polyatomic nitrogen ions (N⁺ and N₂⁺) is accomplished. For both ion species, the kinetic energy is shown to be selectable in the region of hyperthermal energies. At the sample position, ion current densities are found to be in the order of 1 μA/cm² and the full width at half maximum of the ion beam profile is in the order of 10 mm. Thus, the requirements for homogeneous deposition processes in sufficiently short periods of time are fulfilled. Finally, employing the described setup, for the first time in practice epitaxial GaN films were deposited. This opens up the opportunity to fundamentally study the influence of the simultaneous irradiation with hyperthermal ions on the thin film growth in IBAD processes and to increase the flexibility of the technique.

Controlled Distribution and Clustering of Silver in Ag-DLC Nanocomposite Coatings Using a Hybrid Plasma Approach

Incorporation of selected metallic elements into diamond-like carbon (DLC) has emerged as an innovative approach to add unique functional properties to DLC coatings, thus opening up a range of new potential applications in fields as diverse as sensors, tribology, and biomaterials. However, deposition by plasma techniques of metal-containing DLC coatings with well-defined structural properties and metal distribution is currently hindered by the limited understanding of their growth mechanisms. We report here a silver-incorporated diamond-like carbon coating (Ag-DLC) prepared in a hybrid plasma reactor which allowed independent control of the metal content and the carbon film structure and morphology. Morphological and chemical analyses of Ag-DLC films were performed by atomic force microscopy, scanning electron microscopy, and X-ray photoelectron spectroscopy. The vertical distribution of silver from the surface toward the coating bulk was found to be highly inhomogeneous due to top surface segregation and clustering of silver nanoparticles. Two plasma parameters, the sputtered Ag flux and ion energy, were shown to influence the spatial distribution of silver particles. On the basis of these findings, a mechanism for Ag-DLC growth by plasma was proposed.

Atomic Scale Interface Manipulation, Structural Engineering, and Their Impact on Ultrathin Carbon Films in Controlling Wear, Friction, and Corrosion

Reducing friction, wear, and corrosion of diverse materials/devices using <2 nm thick protective carbon films remains challenging, which limits the developments of many technologies, such as magnetic data storage systems. Here, we present a novel approach based on atomic scale interface manipulation to engineer and control the friction, wear, corrosion, and structural characteristics of 0.7-1.7 nm carbon-based films on CoCrPt:oxide-based magnetic media. We demonstrate that when an atomically thin (∼0.5 nm) chromium nitride (CrNx) layer is sandwiched between the magnetic media and an ultrathin carbon overlayer (1.2 nm), it modifies the film-substrate interface, creates various types of interfacial bonding, increases the interfacial adhesion, and tunes the structure of carbon in terms of its sp(3) bonding. These contribute to its remarkable functional properties, such as stable and lowest coefficient of friction (∼0.15-0.2), highest wear resistance and better corrosion resistance despite being only ∼1.7 nm thick, surpassing those of ∼2.7 nm thick current commercial carbon overcoat (COC) and other overcoats in this work. While this approach has direct implications for advancing current magnetic storage technology with its ultralow thickness, it can also be applied to advance the protective and barrier capabilities of other ultrathin materials for associated technologies.

Ultrathin Carbon with Interspersed Graphene/Fullerene-like Nanostructures: A Durable Protective Overcoat for High Density Magnetic Storage

One of the key issues for future hard disk drive technology is to design and develop ultrathin (<2 nm) overcoats with excellent wear- and corrosion protection and high thermal stability. Forming carbon overcoats (COCs) having interspersed nanostructures by the filtered cathodic vacuum arc (FCVA) process can be an effective approach to achieve the desired target. In this work, by employing a novel bi-level surface modification approach using FCVA, the formation of a high sp³ bonded ultrathin (~1.7 nm) amorphous carbon overcoat with interspersed graphene/fullerene-like nanostructures, grown on magnetic hard disk media, is reported. The in-depth spectroscopic and microscopic analyses by high resolution transmission electron microscopy, scanning tunneling microscopy, time-of-flight secondary ion mass spectrometry, and Raman spectroscopy support the observed findings. Despite a reduction of ~37 % in COC thickness, the FCVA-processed thinner COC (~1.7 nm) shows promising functional performance in terms of lower coefficient of friction (~0.25), higher wear resistance, lower surface energy, excellent hydrophobicity and similar/better oxidation corrosion resistance than current commercial COCs of thickness ~2.7 nm. The surface and tribological properties of FCVA-deposited COC was further improved after deposition of lubricant layer.

The Role of Ambient Gas and Pressure on the Structuring of Hard Diamond-Like Carbon Films Synthesized by Pulsed Laser Deposition

Hard carbon thin films were synthesized on Si (100) and quartz substrates by the Pulsed Laser Deposition (PLD) technique in vacuum or methane ambient to study their suitability for applications requiring high mechanical resistance. The deposited films’ surface morphology was investigated by scanning electron microscopy, crystalline status by X-ray diffraction, packing and density by X-ray reflectivity, chemical bonding by Raman and X-ray photoelectron spectroscopy, adherence by “pull-out” measurements and mechanical properties by nanoindentation tests. Films synthesized in vacuum were a-C DLC type, while films synthesized in methane were categorized as a-C:H. The majority of PLD films consisted of two layers: one low density layer towards the surface and a higher density layer in contact with the substrate. The deposition gas pressure played a crucial role on films thickness, component layers thickness ratio, structure and mechanical properties. The films were smooth, amorphous and composed of a mixture of sp³-sp² carbon, with sp³ content ranging between 50% and 90%. The thickness and density of the two constituent layers of a film directly determined its mechanical properties.

Probing the role of carbon microstructure on the thermal stability and performance of ultrathin (<2 nm) overcoats on L10 FePt media for heat-assisted magnetic recording

An understanding of the factors influencing the thermal stability of ultrathin carbon overcoats (COCs) is crucial for their application in heat-assisted magnetic recording (HAMR) at densities ≥ 1 Tb/in(2). Two types of non-hydrogenated ultrathin (∼1.5 nm) COCs were investigated after being subjected to laser-induced localized heating (at temperatures > 700 K) as envisaged in HAMR. Filtered cathodic vacuum arc (FCVA)-processed carbon with tuned C(+) ion energies of 350 eV followed by 90 eV provides significantly higher sp(3) C-C hybridization than magnetron sputter deposition even at very low thicknesses of ∼1.5 nm. As a result, the FCVA-deposited ultrathin carbon overcoats displayed excellent thermal stability along with improved wear and corrosion resistance. On the other hand, the sputtered carbon exhibited carbon loss and topographical and structural changes after laser irradiation owing to lower sp(3) hybridization. Therefore, this study highlights the pivotal role of carbon microstructure, primarily sp(3) hybridization, in non-hydrogenated carbon overcoats to maintain excellent thermal stability during the recurring high-temperature cycles in a HAMR process.

Recent advances in the mechanical and tribological properties of fluorine-containing DLC films

This review article summarizes the recent advances of F-DLC films in deposition mechanisms, desirable mechanical and prominent tribological properties.

Particle beam experiments for the analysis of reactive sputtering processes in metals and polymer surfaces

A beam experiment is presented to study heterogeneous reactions relevant to plasma-surface interactions in reactive sputtering applications. Atom and ion sources are focused onto the sample to expose it to quantified beams of oxygen, nitrogen, hydrogen, noble gas ions, and metal vapor. The heterogeneous surface processes are monitored in situ by means of a quartz crystal microbalance and Fourier transform infrared spectroscopy. Two examples illustrate the capabilities of the particle beam setup: oxidation and nitriding of aluminum as a model of target poisoning during reactive magnetron sputtering, and plasma pre-treatment of polymers (PET, PP).

Re-ordering chaotic carbon: origins and application of textured carbon

Formation of nanocrystals with preferred orientation within the amorphous carbon matrix has attracted lots of theoretical and experimental attentions recently. Interesting properties of this films, easy fabrication methods and practical problems associated with the growth of other carbon nanomaterials such as carbon nanotubes (CNTs) and graphene gives this new class of carbon nanostructure a potential to be considered as a replacement for some applications such as thermal management at nanoscale and interconnects. In this short review paper, the fabrication techniques and associated formation mechanisms of these nanostructured films have been discussed. Besides, electrical and thermal properties of these nanostructured films have been compared with CNTs and graphene.

Disorder and optical gaps in strained dense amorphous carbon and diamond nanocomposites

We employ empirical tight-binding simulations on strained tetrahedral amorphous carbon and diamond nanocomposite networks. For each applied strain, the optoelectronic properties are monitored through the absorption coefficient and the dielectric function. These lead to the optical gaps and are able to quantify the amount of disorder in the structures. We compare our results to those of unstrained nanostructured diamond and amorphous carbon (a-C) phases and link the degree of disorder in these materials to their structural details as a function of the external load. The atomic rearrangements and distortions imposed by the external strain in these structures are directly observable in their optoelectronic properties. We thoroughly discuss the interplay between increased external strain, structural and topological disorder, atomic rearrangements and their effect on the calculated optoelectronic properties.

Oriented Graphitic Carbon Film Grown by Mass-Selected Ion Beam Deposition at Elevated Temperatures

Mass-selected ion-beam deposition using 120 eV C+ ions has been used to grow a carbon film on a Si substrate held at 200° C. The structure of the film has been characterized by transmission electron microscopy and electron energy loss spectroscopy. The film is graphitic and highly oriented with the c-axis lying parallel to the substrate. Moreover, the film is under significant biaxial stress such that the graphitic layer spacing is reduced by 4% from that of ambient pressure graphite. This oriented structure evolves due to the mobility of the carbon atoms at 200 °C. The material is sufficiently crystalline on the nanometer scale so as to produce Bragg diffraction discs in a convergent beam electron diffraction pattern using a 2.5 nm probe.

Molecular dynamics simulation of the formation of sp3 hybridized bonds in hydrogenated diamondlike carbon deposition processes

The formation process of sp3 hybridized carbon networks (i.e., diamondlike structures) in hydrogenated diamondlike carbon (DLC) films has been studied with the use of molecular-dynamics simulations. The processes simulated in this study are injections of hydrocarbon (CH3 and CH) beams into amorphous carbon (a-C) substrates. It has been shown that diamondlike sp3 structures are formed predominantly at a subsurface level when the beam energy is relatively high, as in the "subplantation" process for hydrogen-free DLC deposition. However, for hydrogenated DLC deposition, the presence of abundant hydrogen at subsurface levels, together with thermal spikes caused by energetic ion injections, substantially enhances the formation of carbon-to-carbon sp3 bonds. Therefore, the sp3 bond formation process for hydrogenated DLC films essentially differs from that for hydrogen-free DLC films.

Direct-current cathodic vacuum arc system with magnetic-field mechanism for plasma stabilization

Filtered cathodic vacuum arc (FCVA) deposition is characterized by plasma beam directionality, plasma energy adjustment via substrate biasing, macroparticle filtering, and independent substrate temperature control. Between the two modes of FCVA deposition, namely, direct current (dc) and pulsed arc, the dc mode yields higher deposition rates than the pulsed mode. However, maintaining the dc arc discharge is challenging because of its inherent plasma instabilities. A system generating a special configuration of magnetic field that stabilizes the dc arc discharge during film deposition is presented. This magnetic field is also part of the out-of-plane magnetic filter used to focus the plasma beam and prevent macroparticle film contamination. The efficiency of the plasma-stabilizing magnetic-field mechanism is demonstrated by the deposition of amorphous carbon (a-C) films exhibiting significantly high hardness and tetrahedral carbon hybridization (sp3) contents higher than 70%. Such high-quality films cannot be produced by dc arc deposition without the plasma-stabilizing mechanism presented in this study.

Physical properties of ultrafast deposited micro- and nanothickness amorphous hydrogenated carbon films for medical devices and prostheses

Hydrogenated amorphous carbon films with diamond-like structures have been formed on different substrates at very low energies and temperatures by a plasma-enhanced chemical vapour deposition (PECVD) process employing acetylene as the precursor gas. The plasma source was of a cascaded arc type with argon as the carrier gas. The films grown at very high deposition rates were found to have a practical thickness limit of ∼1.5 μm, above which delamination from the substrate occurred. Deposition on silicon (100), glass, and plastic substrates has been studied and the films characterized in terms of sp3 content, roughness, hardness, adhesion, and optical properties. Deposition rates of up to 20 nm/s have been achieved at substrate temperatures below 100 °C. A typical sp3 content of 60-75 per cent in the films was determined by X-ray-generated Auger electron spectroscopy (XAES). The hardness, reduced modulus, and adhesion of the films were measured using a MicroMaterials NanoTest indenter/scratch tester. Hardness was found to vary from 4 to 13 GPa depending on the admixed acetylene flow and substrate temperature. The adhesion of the film to the substrate was significantly influenced by the substrate temperature and whether an in situ d.c. cleaning was employed prior to the deposition process. The hydrogen content in the film was measured by a combination of the Fourier transformation infrared (FTIR) spectroscopy and Rutherford backscattering (RBS) techniques. From the results it is concluded that the films formed by the process described here are ideal for the coating of long-term implantable medical devices, such as prostheses, stents, invasive probes, catheters, biosensors, etc. The properties reported in this publication are comparable with good-quality films deposited by other PECVD methods. The advantages of these films are the low ion energy and temperature of deposition, ensuring that no damage is done to sensitive substrates, very high deposition rates, relatively low capital cost of the equipment required, and the ease of adjustment of plasma parameters, which facilitates film properties to be tailored according to the desired application.

Low-temperature epitaxial Ni silicidation: The role of hyperthermal species

We present the results of Ni silicidation on a Si111 surface employing a mass-selected hyperthermal ion beam at 100 eV and discuss the reaction mechanism compared with the conventional Ni silicidation process. It is found that the Ni silicide formation using this technique is different from that achieved by conventional methods such as high-energy Ni-ion implantation or evaporation with thermal species. Namely, the Ni silicide phase formed at 230 degrees C using hyperthermal ions in this study is Ni-rich Ni2Si, in contrast to Si-rich disilicide NiSi2, ordinarily formed when high-energy Ni ions or thermal Ni beams react with Si at elevated temperatures. In addition, this layer is formed epitaxially on Si in spite of a low substrate temperature of 230 degrees C, while a polycrystalline Ni silicide layer is formed with conventional Ni-rich silicidation. This suggests that the reaction mechanism of the silicide formation with hyperthermal Ni particles is different from that using higher- or thermal-energy Ni particles. The atomic rearrangement induced by the thermal spikes most likely plays an important role in the Ni silicidation process employing hyperthermal species.

Elemental distribution in fluorinated amorphous carbon thin films

Focused ion beam-secondary ion mass spectrometry (FIB-SIMS) with 20 nm spatial resolution has been used to analyze amorphous fluorinated carbon thin films, deposited by plasma assisted chemical vapor deposition (PACVD), at micro- to nano-scale. Mass spectra and ion imaging of film surface were acquired and the presence and distribution of contaminants were investigated. Surface images show the secondary ion distribution for F(-), CH(-), CF(-). A change in size and topology of fluorine-rich areas is correlated with film hardness and with microstructure transition from diamond-like to polymer-like, as indicated by infrared and Raman spectroscopies. Based on the surface distributions of CF(-) and CH(-) and on the vibrational spectroscopy results, a mechanism of fluorine substitution for hydrogen and an attempt to explain the film structure and microstructure is proposed.

Visualization of diamond nucleation and growth from energetic species

The mystery of diamond nucleation by energetic species is resolved via a special deposition scheme. The evolution of the precursor material for diamond nucleation and the development of the nanodiamond crystallites are visualized by high resolution electron microscopy and other spectroscopies. The diamond precipitation and growth are explained in terms of our recently proposed mechanism [Science 297, 1531 (2002)]]: (i) precipitation of sp(3) clusters a small fraction of which are perfect diamond; (ii) growth of diamond crystallites by preferential displacement of amorphous carbon atoms leaving diamond atoms intact. This general scheme is applicable to other materials such as cubic boron nitride.

The mechanism of diamond nucleation from energetic species

A model for diamond nucleation by energetic species (for example, bias-enhanced nucleation) is proposed. It involves spontaneous bulk nucleation of a diamond embryo cluster in a dense, amorphous carbon hydrogenated matrix; stabilization of the cluster by favorable boundary conditions of nucleation sites and hydrogen termination; and ion bombardment-induced growth through a preferential displacement mechanism. The model is substantiated by density functional tight-binding molecular dynamics simulations and an experimental study of the structure of bias-enhanced and ion beam-nucleated films. The model is also applicable to the nucleation of other materials by energetic species, such as cubic boron nitride.

Deposition of diamond-like carbon

Diamond-like carbon refers to forms of amorphous carbon and hydrogenated amorphous carbon containing a sizeable fraction of sp 3 bonding, which makes them mechanically hard, infrared transparent and chemically inert. This paper discusses the various thin film deposition processes used to form diamond-like carbon and the deposition mechanisms responsible for promoting the metastable sp 3 bonding.