Phase behavior of symmetric ternary block copolymer-homopolymer blends in thin films and on chemically patterned surfaces

Effect of Molecular Weight on Phase Equilibrium in the Polystyrene-Poly(methyl methacrylate) System

Data on the solubility of oligomer polystyrene (PS) and poly(methyl methacrylate) (PMMA) of various molecular weights have been obtained. The binodal and spinodal curves of the phase state diagram with the upper critical solution temperature (UCST) are constructed through simulation within the framework of the Flory-Huggins theory. The influence of the molecular weight of polymers on the contribution to their mixing has been compared, and correlation curves have been plotted. The interaction parameters were calculated and the mixing thermodynamics of the components was evaluated. The largest contribution was made by the entropy component. Also, it has been shown using IR spectroscopy that there is no interaction between the functional groups of polystyrene and poly(methyl methacrylate) in a homogeneous mixture.

Blending Linear and Cyclic Block Copolymers to Manipulate Nanolithographic Feature Dimensions

Block copolymers (BCPs) consist of two or more covalently bound chemically distinct homopolymer blocks. These macromolecules have emerging applications in photonics, membrane separations, and nanolithography stemming from their self-assembly into regular nanoscale structures. Theory suggests that cyclic BCPs should form features up to 40% smaller than their linear analogs while also exhibiting superior thin-film stability and assembly dynamics. However, the complex syntheses required to produce cyclic polymers mean that a need for pure cyclic BCPs would present a challenge to large-scale manufacturing. Here, we employ dissipative particle dynamics simulations to probe the self-assembly behavior of cyclic/linear BCP blends, focusing on nanofeature size and interfacial width as these qualities are critical to nanopatterning applications. We find that for mixtures of symmetric cyclic and linear polymers with equivalent lengths, up to 10% synthetic impurity has a minimal impact on cyclic BCP feature dimensions and interfacial roughness. On the other hand, blending with cyclic BCPs provides a route to "fine-tune" linear BCP feature sizes. We analyze simulated blend domain spacings within the context of strong segregation theory and find significant deviations between simulation and theory that arise from molecular-level packing motifs not included in theory. These insights into blend self-assembly will assist experimentalists in rationally designing BCP materials for advanced nanolithography applications.

Dissipative Particle Dynamics Study on Interfacial Properties of Symmetric Ternary Polymeric Blends

We investigated the interfacial properties of symmetric ternary A_n/A_mB_m/B_n and A_n/A_m/2B_mA_m/2/B_n polymeric blends by means of dissipative particle dynamics (DPD) simulations. We systematically analyzed the effects of composition, chain length, and concentration of the copolymers on the interfacial tensions, interfacial widths, and the structures of each polymer component in the blends. Our simulations show that: (i) the efficiency of the copolymers in reducing the interfacial tension is highly dependent on their compositions. The triblock copolymers are more effective in reducing the interfacial tension compared to that of the diblock copolymers at the same chain length and concentration; (ii) the interfacial tension of the blends increases with increases in the triblock copolymer chain length, which indicates that the triblock copolymers with a shorter chain length exhibit a better performance as the compatibilizers compared to that of their counterparts with longer chain lengths; and (iii) elevating the triblock copolymer concentration can promote copolymer enrichment at the center of the interface, which enlarges the width of the phase interfaces and reduces the interfacial tension. These findings illustrate the correlations between the efficiency of copolymer compatibilizers and their detailed molecular parameters.

Phase behavior of AB/CD diblock copolymer blends via coarse-grained simulation

The phase diagram of equimolar blends of AB and CD diblock copolymers has been studied using dissipative particle dynamics. All unlike blocks interacted with the same χ, except for the B-C interaction, for which χ_BC < 0 in order to prevent macrophase separation. The BC interaction was able to prevent macrophase separation except for low volume fractions of B and C (φ_BC⪅ 0.1) and relatively equal fractions of A and D. For high φ_BC (φ_BC⪆ 0.92), a disordered state was obtained. For all microphase separated states the shapes/morphologies were described by the ratios of the eigenvalues of the radius of gyration tensor and their sphericity. These were used to classify the domains as forming sphere, cylinders, lamellae, or branched/gyroidal structures. For φ_BC < 0.5 the BC domains acted as an interfacial region which compatibilized the A and D domains, while for φ_BC > 0.5 the BC domain filled in the space between A and D domains. Several interesting structures were formed including a novel connected/branched spheres morphology, hierarchical lamellae, concentric spheres/cylinders, and a combination of cylinders/lamellae. Comparisons are made with the linear diblock and linear triblock phase diagrams.

Bicontinuous Microemulsions in Partially Charged Ternary Polymer Blends

We describe the phase behavior of a partially charged ternary polymer blend model system, comprising a compositionally symmetric poly[(oligo(ethylene glycol) methyl ether methacrylate-co-oligo(ethylene glycol) propyl sodium sulfonate methacrylate)]-b-polystyrene (POEGMA23-PS) diblock polymer and the constituent POEGMA23 and PS homopolymers, along the volumetrically symmetric isopleth, where 23 denotes the percentage of charged monomers in the POEGMA chain. Small-angle neutron and X-ray scattering and dynamic mechanical spectroscopy measurements reveal morphological transitions from a layered superlattice to swollen lamellae to a bicontinuous microemulsion (BμE), followed by macroscopic phase separation, with increasing homopolymer content. The BμE channel occurs between 85 and 90% homopolymer addition, positioned approximately at the isotropic Lifshitz composition predicted by mean-field theory for neutral systems. The resulting BμE morphology exhibits a periodicity of 26 nm, yielding a mesoscopically structured but macroscopically disordered bicontinuous structure. That this structure can be achieved in a charged polymer system is surprising, given the huge asymmetries typically induced by adding charge to either diblock copolymers or binary polymer blends.

Role of Chain Connectivity across an Interface on the Dynamics of a Nanostructured Block Copolymer

Fluorescence labeling enables component- and location-specific measurements of the glass transition temperature (T_{g}) in complex polymer systems. Here we characterize the T_{g} of fluorescently labeled poly(methyl methacrylate) homopolymers (PMMA-py) blended at low concentrations into an unlabeled lamellar poly(n-butyl methacrylate-b-methyl methacrylate) diblock copolymer (PBMA-PMMA). In this system, the PMMA-py homopolymer is sequestered within the PMMA domains of the diblock copolymer and subject to soft confinement by the domains of the lower-T_{g} PBMA block, which lowers the homopolymer T_{g} by ∼5  K beyond the contribution of segmental mixing. In contrast to the PMMA block in the diblock copolymer, the PMMA-py homopolymer is not covalently bound to the interdomain interface. A comparison of T_{g} for the homopolymers in the blends to T_{g} for diblock copolymers with equivalent labeled segment density profiles reveals that the homopolymer's T_{g} is consistently ∼10  K higher than for diblock segments at the same location within the domain structure, highlighting the dominant contribution of a covalent bond across the interface to the perturbation of the chain dynamics in the block copolymer.

Nano-confinement of block copolymers in high accuracy topographical guiding patterns: modelling the emergence of defectivity due to incommensurability

Extreme ultraviolet interference lithography (EUV-IL) is used to manufacture topographical guiding patterns to direct the self-assembly of block copolymers. High-accuracy silicon oxide-like patterns with trenches ranging from 68 nm to 117 nm width are fabricated by exposing a hydrogen silsesquioxane (HSQ) resist layer using EUV-IL. We investigate how the accuracy, the low line width roughness and the low line edge roughness of the resulting patterns allow achieving DSA line/space patterns of a PS-b-PMMA (polystyrene-block-poly methyl methacrylate) block copolymer of 11 nm half-pitch with low defectivity. We conduct an in-depth study of the dependence of the DSA pattern morphology on the trench width and on how the neutral brush covers the guiding pattern. We identify the relation between trench width and the emergence of defects with nanometer precision. Based on these studies, we develop a model that extends available free energy models, which allows us to predict the patterning process window.

Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker

Block copolymers with various nanodomains, such as spheres, cylinders, and lamellae, have received attention for their applicability to nanolithography. However, those microdomains are determined by the volume fraction of one block. Meanwhile, nanopatterns with multiple shapes are required for the next-generation nanolithography. Although various methods have been reported to achieve dual nanopatterns, all the methods need sophisticated processes using E-beam. Here, we synthesized a miktoarm block copolymer capable of cleavage of one block by ultraviolet. Original cylindrical nanodomains of synthesized block copolymer were successfully transformed to lamellar nanodomains due to the change of molecular architecture by ultraviolet. We fabricated dual nanopatterns consisting of dots and lines at desired regions on a single substrate. We also prepared dual nanopatterns utilizing another phase transformation from spheres to cylinders in a block copolymer with higher interaction parameter. Since our concept has versatility to any block copolymer, it could be employed as next-generation nanolithography.

Tetragonal phase of cylinders self-assembled from binary blends of AB diblock and (A'B)n star copolymers

The phase behavior of binary blends composed of AB diblock and (A'B)_n star copolymers is studied using the polymeric self-consistent field theory, focusing on the formation and stability of the stable tetragonal phase of cylinders. In general, cylindrical domains self-assembled from AB-type block copolymers are packed into a hexagonal array, although a tetragonal array of cylinders could be more favourable for lithography applications in microelectronics. The polymer blends are designed such that there is an attractive interaction between the A and A' blocks, which increases the compatibility between the two copolymers and thus suppresses the macroscopic phase separation of the blends. With an appropriate choice of system parameters, a considerable stability window for the targeted tetragonal phase is identified in the blends. Importantly, the transition mechanism between the hexagonal and tetragonal phases is elucidated by examining the distribution of the two types of copolymers in the unit cell of the structure. The results reveal that the short (A'B)_n star copolymers are preferentially located in the bonding area connecting two neighboring domains in order to reduce extra stretching, whereas the long AB diblock copolymers are extended to further space of the unit cell.

Binary Polymer Brushes of Strongly Immiscible Polymers

The phenomenon of microphase separation is an example of self-assembly in soft matter and has been observed in block copolymers (BCPs) and similar materials (i.e., supramolecular assemblies (SMAs) and homo/block copolymer blends (HBCs)). In this study, we use microphase separation to construct responsive polymer brushes that collapse to generate periodic surfaces. This is achieved by a chemical reaction between the minor block (10%, poly(4-vinylpyridine)) of the block copolymer and a substrate. The major block of polystyrene (PS) forms mosaic-like arrays of grafted patches that are 10-20 nm in size. Depending on the nature of the assembly (SMA, HBC, or neat BCP) and annealing method (exposure to vapors of different solvents or heating above the glass transition temperature), a range of "mosaic" brushes with different parameters can be obtained. Successive grafting of a secondary polymer (polyacrylamide, PAAm) results in the fabrication of binary polymer brushes (BPBs). Upon being exposed to specific selective solvents, BPBs may adopt different conformations. The surface tension and adhesion of the binary brush are governed by the polymer occupying the top stratum. The "mosaic" brush approach allows for a combination of strongly immiscible polymers in one brush. This facilitates substantial contrast in the surface properties upon switching, previously only possible for substrates composed of predetermined nanostructures. We also demonstrate a possible application of such PS/PAAm brushes in a tunable bioadhesion-bioadhesive (PS on top) or nonbioadhesive (PAAm on top) surface as revealed by Escherichia coli bacterial seeding.

Precise pattern replication of polymer blends into nonuniform geometries via reducing interfacial tension between two polymers

Patterned polymer structures with different functionalities have many potential applications. Directed assembly of polymer blends using chemically functionalized patterns during spin-coating has been used to fabricate the patterned polymer structures. For bridging the gap between laboratorial experiments and manufacturing of nanodevices, the polymer blends structures are required to be precisely patterned into nonuniform geometries in a high-rate process, which still is a challenge. In this Article, we demonstrated for the first time that by decreasing the interfacial tension between two polymers polystyrene and poly(acrylic acid) via adding a compatibilizer (polystyrene-b-poly(acrylic acid) ), a polystyrene/poly(acrylic acid) blend was precisely patterned into nonuniform geometries in a high-rate fashion. The patterned nonuniform geometries included angled lines with angles varied from 30° to 150°, T-junctions, square arrays, circle arrays, and arbitrary letter-shaped geometries. The reduction in the interfacial tension improved the line edge roughness and the patterning efficiency of the patterned polymer blends. In addition, the commensurability between characteristic length and pattern periodicity for well-ordered morphologies was also expanded with decreasing interfacial tension. This approach can be easily extended to other functional polymers in a blend and facilitate the applications of patterned polymer structures in biosensors, organic thin-film electronics, and polymer solar cells.

Directed assembly of non-equilibrium ABA triblock copolymer morphologies on nanopatterned substrates

The majority of past work on directed assembly of block copolymers on chemically nanopatterned surfaces (or chemical patterns) has focused on AB diblock copolymers, and the resulting morphologies have generally corresponded to equilibrium states. Here we report a study on directed assembly of ABA triblock copolymers. Directed assembly of thin films of symmetric poly(methyl methacrylate-b-styrene-b-methyl methacrylate) (PMMA-b-PS-b-PMMA) triblock copolymers is shown to be capable of achieving a high degree of perfection, registration, and accuracy on striped patterns having periods, L(s), commensurate with the bulk period of the copolymer, L(o). When L(s) is incommensurate with L(o), the triblock copolymer domains can reach dimensions up to 55% larger or 13% smaller than L(o). The range over which triblock copolymers tolerate departures from a commensurate L(s) is significantly larger than that accessible with the corresponding diblock copolymer material on analogous directed assembly systems. The assembly kinetics of the triblock copolymer is approximately 3 orders of magnitude slower than observed in the diblock system. Theoretically informed simulations are used to interpret our experimental observations; a thermodynamic analysis reveals that triblocks can form highly ordered, non-equilibrium metastable structures that do not arise in the diblock.

Nanoporous polyethylene thin films templated by polymeric bicontinuous microemulsions: evolution of morphology on non-neutral substrates

Polymeric bicontinuous microemulsions (BμE), found in well-designed ternary blends of two homopolymers and a diblock copolymer, have been extensively studied in the bulk, for example, as versatile templates for the synthesis of nanoporous materials. However, there have been few reports regarding BμE-forming blends as films and the potential impact of confinement on the morphology of such blends. We have investigated the morphology of ternary blends of polyethylene (PE), poly(ethylene-alt-propylene) (PEP), and poly(ethylene-b-ethylene-alt-propylene) (PE-PEP) on a variety of substrates. The films were rendered nanoporous by selective extraction of the PEP component, which also created contrast for scanning electron microscopy (SEM). Blends that form BμEs in the bulk were found to undergo an evolution of morphology from a BμE to a macro-phase separated state, induced by the segregation of blend components to the film interfaces. The dynamics of the transformation are accelerated by decreasing film thickness. The results presented indicate that BμEs can be kinetically trapped on arbitrary substrates, which has important implications for the production of bicontinuous, nanoporous films.

Graphoepitaxial assembly of asymmetric ternary blends of block copolymers and homopolymers

Ternary blends of cylinder-forming polystyrene-block-poly(methyl methacrylate) block copolymers and polystyrene and poly(methyl methacrylate) homopolymers were assembled in trench features of constant width. Increasing the fraction of homopolymer in the blend increased the spacing and size of block copolymer domains, which were oriented perpendicular to the substrate to form a hexagonal lattice within the trench. The number of rows of cylinders within the trench was controlled by the blend composition. Depending on the domain size and spacing, the hexagonal lattice was stretched or compressed perpendicular to the trench walls but not perturbed parallel to the walls, indicating a decoupling of the perturbation in the perpendicular and parallel directions. The row spacing was uniform across the trench as a function of position from the trench wall. The results are compared with an analytical model and with Monte Carlo simulations.

Molecular transfer printing using block copolymers

Soft lithographic techniques augment or enhance the capabilities of traditional patterning processes and expand the diversity of materials that can be patterned. Realization of robust parallel techniques for creating chemical patterns at the nanoscale has been challenging. Here we present a method for creating and replicating chemical patterns that uses functionalized homopolymer inks that are preferentially segregated into the nanodomains of phase-separated diblock copolymer films. The inks are transferred by reaction to substrates that are brought into contact with block copolymer films, creating chemical patterns on the substrate that mirror the domain structure present at the film surface with high fidelity and resolution. In addition to printing from self-assembled domain structures, we can also direct the assembly of the block copolymer films from which transfer occurs using lithographically defined masters so as to replicate and transfer patterns of inks with controlled and well-defined geometries. The transferred patterns may be at higher resolution than the lithographically defined master, and the process can be repeated to create multiple copies of identical replicas. Transfer of one ink from one block of the copolymer is also possible, and filling the interspatial regions of the pattern with a second ink provides a pathway toward creating patterns with diverse chemical functionalities.

Block copolymer nanolithography: translation of molecular level control to nanoscale patterns

The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.

Theoretically informed coarse grain simulations of polymeric systems

A Monte Carlo formalism for the study of polymeric melts is described. The model is particle-based, but the interaction is derived from a local density functional that appears in the field-based model. The method enables Monte Carlo simulations in the nVT, nPT, semigrandcanonical and Gibbs ensembles, and direct calculation of free energies. The approach is illustrated in the context of two examples. In the first, we consider the phase separation of a binary homopolymer blend and present results for the phase diagram and the critical point. In the second, we address the microphase separation of a symmetric diblock copolymer, examine the distribution of local stresses in lamellae, and determine the order-disorder transition temperature.

Tip-induced orientational order of surfactant micelles on gold

Using liquid-cell atomic force microscopy, we investigate aqueous solutions of alkyltrimethylammonium halide surfactants at the Au111 surface. The long, micellar surfactant surface aggregates cover the gold surface completely and exhibit two types of orientational order for chloride and bromide counterions, respectively. We observe lateral forces perpendicular to the scanning direction, which we explain by anisotropic friction between the probe and the oriented micelles. Conversely, we show that these friction forces can be employed to modify the spatial conformation of the micellar adlayer. Where previous methods have failed to provide control over the orientation down to the level of individual micelles, we use this technique to achieve a very high degree of order over more than 100 micelle diameters.

Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries

Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to realize sub-100 nm dimensions, thermodynamic control over the size and uniformity and density of features, and inexpensive processing. The insertion point of these materials in the production of integrated circuits, however, is often conceptualized in the short term for niche applications using the dense periodic arrays of spots or lines that characterize bulk block copolymer morphologies, or in the long term for device layouts completely redesigned into periodic arrays. Here we show that the domain structure of block copolymers in thin films can be directed to assemble into nearly the complete set of essential dense and isolated patterns as currently defined by the semiconductor industry. These results suggest that block copolymer materials, with their intrinsically advantageous self-assembling properties, may be amenable for broad application in advanced lithography, including device layouts used in existing nanomanufacturing processes.