X-ray reflectivity measurement of interdiffusion in metallic multilayers during rapid heating

Millisecond X-ray reflectometry and neural network analysis: unveiling fast processes in spin coating

X-ray reflectometry (XRR) is a powerful tool for probing the structural characteristics of nanoscale films and layered structures, which is an important field of nanotechnology and is often used in semiconductor and optics manufacturing. This study introduces a novel approach for conducting quantitative high-resolution millisecond monochromatic XRR measurements. This is an order of magnitude faster than in previously published work. Quick XRR (qXRR) enables real time and in situ monitoring of nanoscale processes such as thin film formation during spin coating. A record qXRR acquisition time of 1.4 ms is demonstrated for a static gold thin film on a silicon sample. As a second example of this novel approach, dynamic in situ measurements are performed during PMMA spin coating onto silicon wafers and fast fitting of XRR curves using machine learning is demonstrated. This investigation primarily focuses on the evolution of film structure and surface morphology, resolving for the first time with qXRR the initial film thinning via mass transport and also shedding light on later thinning via solvent evaporation. This innovative millisecond qXRR technique is of significance for in situ studies of thin film deposition. It addresses the challenge of following intrinsically fast processes, such as thin film growth of high deposition rate or spin coating. Beyond thin film growth processes, millisecond XRR has implications for resolving fast structural changes such as photostriction or diffusion processes.

X-ray reflectivity from curved surfaces as illustrated by a graphene layer on molten copper

The X-ray reflectivity technique can provide out-of-plane electron-density profiles of surfaces, interfaces, and thin films, with atomic resolution accuracy. While current methodologies require high surface flatness, this becomes challenging for naturally curved surfaces, particularly for liquid metals, due to the very high surface tension. Here, the development of X-ray reflectivity measurements with beam sizes of a few tens of micrometres on highly curved liquid surfaces using a synchrotron diffractometer equipped with a double crystal beam deflector is presented. The proposed and developed method, which uses a standard reflectivity θ-2θ scan, is successfully applied to study in situ the bare surface of molten copper and molten copper covered by a graphene layer grown in situ by chemical vapor deposition. It was found that the roughness of the bare liquid surface of copper at 1400 K is 1.25 ± 0.10 Å, while the graphene layer is separated from the liquid surface by a distance of 1.55 ± 0.08 Å and has a roughness of 1.26 ± 0.09 Å.

Nanomaterials by design: a review of nanoscale metallic multilayers

Nanoscale metallic multilayers have been shown to have a wide range of outstanding properties, which differ to a great extent from those observed in monolithic films. Their exceptional properties are mainly associated with the large number of interfaces and the nanoscale layer thicknesses. Many studies have investigated these materials focusing on magnetic, mechanical, optical, or radiation tolerance properties. Thus, this review provides a summary of the findings in each area, including a description of the general attributes, the adopted synthesis methods and most common characterization techniques used. This information is followed by a compendium of the material properties and a brief discussion of related experimental data, as well as existing and promising applications. Other phenomena of interest, including thermal stability studies, self-propagating reactions and the progression from nano multilayers to amorphous and/or crystalline alloys, are also covered. In general, this review highlights the use of nano multilayer architectures as viable routes to overcome the challenges of designing and implementing new engineering materials at the nanoscale.

Shedding X-ray Light on the Interfacial Electrochemistry of Silicon Anodes for Li-Ion Batteries

Electrochemical alloying reactions of group IV elements, such as Si, Ge, or Sn, with lithium provide a promising route to next-generation anode materials for lithium-ion batteries (LIBs) due to their high volumetric and gravimetric capacities. However, commercialization of these anodes is still sparse owing to quick capacity fading and limited Coulombic efficiency, which arise from large volume expansion leading to particle cracking and subsequent electrochemical inactivity. As a result, the solid electrolyte interphase (SEI), originating in the decomposition of the electrolyte upon battery operation outside the electrolyte's thermodynamic stability window, grows uncontrollably. While a large number of mitigation strategies have been developed, an improved nanometer level fundamental understanding of the (de)lithiation process and SEI formation, growth, and evolution is necessary to overcome these challenges. Toward this end, many experimental and theoretical approaches have been utilized but still provide an incomplete picture. This is due to the difficulty of investigating buried interfaces and interphases of lithiation products and thin SEI layers (nanometer-scale) in situ and with the desired nanometer accuracy. In this Account, we illustrate the utilization of in situ X-ray reflectivity (XRR) to provide nanometer-scale insights on the SEI nucleation, growth, and evolution, and well as the (de)lithiation process of Si electrodes. XRR is a nondestructive and surface- and interface-sensitive technique that allows for in situ investigations during battery operation under realistic electrochemical conditions. Insight into the system is provided via the surface-normal density profile, which is interpreted in terms of thickness, density, and roughness of individual surface layers, allowing monitoring of the interfacial morphology and chemistry evolution, through which the SEI growth and Si (de)lithiation process can be resolved. We utilized a model battery anode consisting of a native oxide terminated single crystalline Si wafer in half cell configuration with standard electrolyte in a specifically designed in situ XRR electrochemical cell. We have resolved the nucleation and formation process of the inner inorganic SEI and have observed two well-defined inorganic SEI layers on Si anodes: a bottom-SEI layer (adjacent to the electrode) formed via the lithiation of the native oxide and a top-SEI layer mainly consisting of the electrolyte decomposition product, LiF. This SEI layer grows during lithiation and contracts during delithiation. Further, our results show that the lithiation of crystalline Si (c-Si) is a layer-by-layer, reaction-limited, two-phase process with a well-defined phase boundary between Li_xSi lithiation product and c-Si; in contrast, the delithiation of Li_xSi and the lithiation of amorphous Si (a-Si) are reaction-limited, single-phase processes. Moreover, we resolved the influences of current density and the Si crystallographic orientation of the reaction interface on the (de)lithiation process. The implications of our findings are discussed with regard to battery performance.

Quick X-ray reflectivity using monochromatic synchrotron radiation for time-resolved applications

A new technique for the parallel collection of X-ray reflectivity (XRR) data, compatible with monochromatic synchrotron radiation and flat substrates, is described and applied to the in situ observation of thin-film growth. The method employs a polycapillary X-ray optic to produce a converging fan of radiation, incident onto a sample surface, and an area detector to simultaneously collect the XRR signal over an angular range matching that of the incident fan. Factors determining the range and instrumental resolution of the technique in reciprocal space, in addition to the signal-to-background ratio, are described in detail. This particular implementation records ∼5° in 2θ and resolves Kiessig fringes from samples with layer thicknesses ranging from 3 to 76 nm. The value of this approach is illustrated by showing in situ XRR data obtained with 100 ms time resolution during the growth of epitaxial La0.7Sr0.3MnO3 on SrTiO3 by pulsed laser deposition at the Cornell High Energy Synchrotron Source (CHESS). Compared with prior methods for parallel XRR data collection, this is the first method that is both sample-independent and compatible with the highly collimated, monochromatic radiation typical of third-generation synchrotron sources. Further, this technique can be readily adapted for use with laboratory-based sources.