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Tan P, Niu C, Lin Z, Lin JY, Long L, Zhang Y, Wilk G, Wang H, Ye PD. Wafer-Scale Atomic Layer-Deposited TeO x/Te Heterostructure P-Type Thin-Film Transistors. NANO LETTERS 2024; 24:12433-12441. [PMID: 39351960 DOI: 10.1021/acs.nanolett.4c02969] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/10/2024]
Abstract
There is an increasing demand for p-type semiconductors with scalable growth, excellent device performance, and back-end-of-line (BEOL) compatibility. Recently, tellurium (Te) has emerged as a promising candidate due to its appealing electrical properties and potential low-temperature production. So far, nearly all of the scalable production and integration of Te with complementary metal oxide semiconductor (CMOS) technology have been based on physical vapor deposition. Here we demonstrate wafer-scale atomic layer-deposited (ALD) TeOx/Te heterostructure thin-film transistors with high uniformity and integration compatibility. The wafer-scale uniformity of the film is evidenced by spatial Raman mappings and statistical electrical analysis. Furthermore, surface accumulation-induced good ohmic contact has been observed and explained by the unique band alignment of the charge neutrality level inside the Te valence band. These results demonstrate ALD TeOx/Te as a promising p-type semiconductor for monolithic three-dimensional integration in BEOL CMOS applications incorporated with well-established n-type ALD oxide semiconductors.
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Affiliation(s)
- Pukun Tan
- Elmore Family School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907, United States
- Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, United States
| | - Chang Niu
- Elmore Family School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907, United States
- Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, United States
| | - Zehao Lin
- Elmore Family School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907, United States
- Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, United States
| | - Jian-Yu Lin
- Elmore Family School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907, United States
- Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, United States
| | - Linjia Long
- Elmore Family School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907, United States
- Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, United States
| | - Yizhi Zhang
- School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, United States
| | - Glen Wilk
- ASM, Phoenix, Arizona 85034, United States
| | - Haiyan Wang
- School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907, United States
| | - Peide D Ye
- Elmore Family School of Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907, United States
- Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, United States
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Lee S, Kishi T, Bellouard Y. Wide-Field Polarimetric Second-Harmonic Imaging for Rapid and Nondestructive Investigation of Laser-Induced Crystallization Phenomena. ACS NANO 2024; 18:24929-24940. [PMID: 39177946 PMCID: PMC11394348 DOI: 10.1021/acsnano.4c05554] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/24/2024]
Abstract
The selective and controlled formation of nanocrystals in glass is emerging as a versatile method to achieve functional photonics, optoelectronics, and quantum devices, such as single-photon emitters. Here, we investigate the use of wide-field polarimetric second-harmonic (SH) microscopy as a method to rapidly and nondestructively examine nanoscale crystal arrangements in laser-processed glass. As a case study, we investigate tellurite glass, where the formation of a trigonal tellurium (t-Te) nanocrystalline phase after femtosecond laser exposure was recently demonstrated. Combined with theoretical models, we show that wide-field polarimetric SH microscopy offers comprehensive information on the nanocrystals' orientation, distribution, and chirality. With its high imaging throughput and spatial resolution, this method has the potential not only to significantly accelerate investigations on laser-induced glass crystallization processes but also to provide a valuable tool for in situ process monitoring.
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Affiliation(s)
- Seonwoo Lee
- Galatea Lab, STI IEM, Ecole Polytechnique Fédérale de Lausanne (EPFL), Rue de la Maladière 71b, Neuchâtel CH-2002, Switzerland
| | - Tetsuo Kishi
- Department of Chemistry and Materials Science, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8550, Japan
| | - Yves Bellouard
- Galatea Lab, STI IEM, Ecole Polytechnique Fédérale de Lausanne (EPFL), Rue de la Maladière 71b, Neuchâtel CH-2002, Switzerland
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Zhao Y, Zhao S, Pang X, Zhang A, Li C, Lin Y, Du X, Cui L, Yang Z, Hao T, Wang C, Yin J, Xie W, Zhu J. Biomimetic wafer-scale alignment of tellurium nanowires for high-mobility flexible and stretchable electronics. SCIENCE ADVANCES 2024; 10:eadm9322. [PMID: 38578997 PMCID: PMC10997201 DOI: 10.1126/sciadv.adm9322] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/15/2023] [Accepted: 03/05/2024] [Indexed: 04/07/2024]
Abstract
Flexible and stretchable thin-film transistors (TFTs) are crucial in skin-like electronics for wearable and implantable applications. Such electronics are usually constrained in performance owing to a lack of high-mobility and stretchable semiconducting channels. Tellurium, a rising semiconductor with superior charge carrier mobilities, has been limited by its intrinsic brittleness and anisotropy. Here, we achieve highly oriented arrays of tellurium nanowires (TeNWs) on various substrates with wafer-scale scalability by a facile lock-and-shear strategy. Such an assembly approach mimics the alignment process of the trailing tentacles of a swimming jellyfish. We further apply these TeNW arrays in high-mobility TFTs and logic gates with improved flexibility and stretchability. More specifically, mobilities over 100 square centimeters per volt per second and on/off ratios of ~104 are achieved in TeNW-TFTs. The TeNW-TFTs on polyethylene terephthalate can sustain an omnidirectional bending strain of 1.3% for more than 1000 cycles. Furthermore, TeNW-TFTs on an elastomeric substrate can withstand a unidirectional strain of 40% with no performance degradation.
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Affiliation(s)
- Yingtao Zhao
- School of Materials Science and Engineering, National Institute for Advanced Materials, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin 300350, P. R. China
| | - Sanchuan Zhao
- School of Materials Science and Engineering, National Institute for Advanced Materials, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin 300350, P. R. China
| | - Xixi Pang
- School of Materials Science and Engineering, National Institute for Advanced Materials, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin 300350, P. R. China
| | - Anni Zhang
- School of Materials Science and Engineering, National Institute for Advanced Materials, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin 300350, P. R. China
| | - Chenning Li
- School of Materials Science and Engineering, National Institute for Advanced Materials, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin 300350, P. R. China
| | - Yuxuan Lin
- School of Materials Science and Engineering, National Institute for Advanced Materials, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin 300350, P. R. China
| | - Xiaomeng Du
- College of Chemistry, Nankai University, Tianjin 300071, P. R. China
| | - Lei Cui
- School of Materials Science and Engineering, National Institute for Advanced Materials, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin 300350, P. R. China
| | - Zhenhua Yang
- School of Materials Science and Engineering, National Institute for Advanced Materials, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin 300350, P. R. China
| | - Tailang Hao
- School of Materials Science and Engineering, National Institute for Advanced Materials, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin 300350, P. R. China
| | - Chaopeng Wang
- School of Materials Science and Engineering, National Institute for Advanced Materials, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin 300350, P. R. China
| | - Jun Yin
- School of Materials Science and Engineering, National Institute for Advanced Materials, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin 300350, P. R. China
| | - Wei Xie
- College of Chemistry, Nankai University, Tianjin 300071, P. R. China
| | - Jian Zhu
- School of Materials Science and Engineering, National Institute for Advanced Materials, Smart Sensing Interdisciplinary Science Center, Nankai University, Tianjin 300350, P. R. China
- Tianjin Key Laboratory of Metal and Molecule-Based Material Chemistry, Nankai University, Tianjin 300350, P. R. China
- Tianjin Key Laboratory for Rare Earth Materials and Applications, Nankai University, Tianjin 300350, P. R. China
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Rani P, Alegaonkar AP, Biswas R, Jewariya Y, Kanta Haldar K, Alegaonkar PS. Reduced graphene oxide doped tellurium nanotubes for high performance supercapacitor. Front Chem 2022; 10:1027554. [PMID: 36329860 PMCID: PMC9623563 DOI: 10.3389/fchem.2022.1027554] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/25/2022] [Accepted: 09/30/2022] [Indexed: 11/16/2022] Open
Abstract
Supercapacitors have been achieving great interest in energy storage systems for the past couple of decades. Such devices with superior performance, mainly, depending on the material architecture of the electrodes. We report on the preparation of Tellurium nanotubes (Te-tubes diameter ∼100 nm and length ∼700 nm), with variable doping of conducting network reduced graphene oxide (rGO) to fabricate high-performance electrode characteristics of rGO @ Te. The prepared material was characterized using XRD, FTIR, FESEM, and Raman spectroscopy techniques, including Brunauer-Emmett-Teller, Barrett-Joyner-Halenda measurements. FTIR study revealed that 15% rGO @ Te has a wide C-O vibration band at ∼ 1,100–1,300 cm−1, over other compositions. FESEM study shows the Te-tubes dispersion in rGO layers. The EDX study revealed that 15% of the composition has an optimistic concentration of C and O elements. In other compositions, either at lower/higher rGO concentration, an uneven count of C and O is observed. These support efficient charge dynamics to achieve superior ultra-capacitor characteristics, thereby achieving specific capacitance Csp 170 + F/g @ 10 mV/s in a symmetric configuration. The reported values are thirty times higher than pristine Te-tubes (∼5 F/g). This finding suggests that rGO @ Te is a promising candidate for supercapacitor.
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Affiliation(s)
- Pinki Rani
- Department of Physics, School of Basic Sciences, Central University of Punjab, Bathinda, India
| | | | - Rathindranath Biswas
- Department of Chemistry, School of Basic Sciences, Central University of Punjab, Bathinda, India
| | - Yogesh Jewariya
- Department of Physics, School of Basic Sciences, Central University of Punjab, Bathinda, India
| | - Krishna Kanta Haldar
- Department of Chemistry, School of Basic Sciences, Central University of Punjab, Bathinda, India
| | - Prashant S. Alegaonkar
- Department of Physics, School of Basic Sciences, Central University of Punjab, Bathinda, India
- *Correspondence: Prashant S. Alegaonkar,
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Zhao X, Shi J, Yin Q, Dong Z, Zhang Y, Kang L, Yu Q, Chen C, Li J, Liu X, Zhang K. Controllable synthesis of high-quality two-dimensional tellurium by a facile chemical vapor transport strategy. iScience 2022; 25:103594. [PMID: 35005543 PMCID: PMC8718972 DOI: 10.1016/j.isci.2021.103594] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/30/2021] [Revised: 11/10/2021] [Accepted: 12/03/2021] [Indexed: 11/25/2022] Open
Abstract
Recently, as an elementary material, tellurium (Te) has received widespread attention for its high carrier mobility, intriguing topological properties, and excellent environmental stability. However, it is difficult to obtain two-dimensional (2D) Te with high crystalline quality owing to its intrinsic helical chain structure. Herein, a facile strategy for controllable synthesis of high-quality 2D Te nanoflakes through chemical vapor transport in one step is reported. With carefully tuning the growth kinetics determined mainly by temperature, tellurium nanoflakes in lateral size of up to ∼40 μm with high crystallinity can be achieved. We also investigated the second harmonic generation of Te nanoflakes, which demonstrates that it can be used as frequency doubling crystals and has potential applications in nonlinear optical devices. In addition, field effect transistor devices based on the 2D Te nanoflakes were fabricated and exhibited excellent electrical properties with high mobility of 379 cm2 V−1 s−1. High-quality 2D Te nanoflakes were directly synthesized by CVT method The growth mechanisms of 2D Te nanoflakes were systematically studied 2D Te nanoflakes have potential applications in nonlinear optical devices 2D Te nanoflakes-based FETs exhibit high mobility of ∼379 cm2 V−1 s−1
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Affiliation(s)
- Xinxin Zhao
- School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei 230026, China
- CAS Key Laboratory of Nanophotonic Materials and Devices and Key Laboratory of Nanodevices and Applications, i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences, Suzhou 215123, China
| | - Jianwei Shi
- CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing 100190, China
| | - Qin Yin
- CAS Key Laboratory of Nanophotonic Materials and Devices and Key Laboratory of Nanodevices and Applications, i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences, Suzhou 215123, China
| | - Zhuo Dong
- School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei 230026, China
- CAS Key Laboratory of Nanophotonic Materials and Devices and Key Laboratory of Nanodevices and Applications, i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences, Suzhou 215123, China
| | - Yan Zhang
- School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei 230026, China
- CAS Key Laboratory of Nanophotonic Materials and Devices and Key Laboratory of Nanodevices and Applications, i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences, Suzhou 215123, China
| | - Lixing Kang
- Division of Advanced Materials, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences, Suzhou 215123, China
| | - Qiang Yu
- CAS Key Laboratory of Nanophotonic Materials and Devices and Key Laboratory of Nanodevices and Applications, i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences, Suzhou 215123, China
| | - Cheng Chen
- School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei 230026, China
- CAS Key Laboratory of Nanophotonic Materials and Devices and Key Laboratory of Nanodevices and Applications, i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences, Suzhou 215123, China
| | - Jie Li
- CAS Key Laboratory of Nanophotonic Materials and Devices and Key Laboratory of Nanodevices and Applications, i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences, Suzhou 215123, China
- Corresponding author
| | - Xinfeng Liu
- CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing 100190, China
- Corresponding author
| | - Kai Zhang
- CAS Key Laboratory of Nanophotonic Materials and Devices and Key Laboratory of Nanodevices and Applications, i-Lab, Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences, Suzhou 215123, China
- Corresponding author
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