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Frankberg EJ, Lambai A, Zhang J, Kalikka J, Khakalo S, Paladino B, Cabrioli M, Mathews NG, Salminen T, Hokka M, Akola J, Kuronen A, Levänen E, Di Fonzo F, Mohanty G. Exceptional Microscale Plasticity in Amorphous Aluminum Oxide at Room Temperature. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2303142. [PMID: 37515520 DOI: 10.1002/adma.202303142] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/04/2023] [Revised: 07/20/2023] [Indexed: 07/31/2023]
Abstract
Oxide glasses are an elementary group of materials in modern society, but brittleness limits their wider usability at room temperature. As an exception to the rule, amorphous aluminum oxide (a-Al2 O3 ) is a rare diatomic glassy material exhibiting significant nanoscale plasticity at room temperature. Here, it is shown experimentally that the room temperature plasticity of a-Al2 O3 extends to the microscale and high strain rates using in situ micropillar compression. All tested a-Al2 O3 micropillars deform without fracture at up to 50% strain via a combined mechanism of viscous creep and shear band slip propagation. Large-scale molecular dynamics simulations align with the main experimental observations and verify the plasticity mechanism at the atomic scale. The experimental strain rates reach magnitudes typical for impact loading scenarios, such as hammer forging, with strain rates up to the order of 1 000 s-1 , and the total a-Al2 O3 sample volume exhibiting significant low-temperature plasticity without fracture is expanded by 5 orders of magnitude from previous observations. The discovery is consistent with the theoretical prediction that the plasticity observed in a-Al2 O3 can extend to macroscopic bulk scale and suggests that amorphous oxides show significant potential to be used as light, high-strength, and damage-tolerant engineering materials.
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Affiliation(s)
- Erkka J Frankberg
- Materials Science and Environmental Engineering Unit, Tampere University, Korkeakoulunkatu 6, Tampere, 33720, Finland
- Center for Nano Science and Technology CNST@Polimi, Istituto Italiano di Tecnologia, Via Pascoli 70/3, Milano, 20133, Italy
| | - Aloshious Lambai
- Materials Science and Environmental Engineering Unit, Tampere University, Korkeakoulunkatu 6, Tampere, 33720, Finland
| | - Jiahui Zhang
- Materials Science and Environmental Engineering Unit, Tampere University, Korkeakoulunkatu 6, Tampere, 33720, Finland
- Department of Physics, University of Helsinki, P.O. Box 43, Helsinki, FI-00014, Finland
| | - Janne Kalikka
- Computational Physics Laboratory, Tampere University, Korkeakoulunkatu 6, Tampere, 33720, Finland
| | - Sergei Khakalo
- Integrated Computational Materials Engineering, VTT Technical Research Centre of Finland Ltd., Vuorimiehentie 2, Espoo, 02044, Finland
- Department of Civil Engineering, Aalto University, Rakentajanaukio 4, Espoo, 02150, Finland
| | - Boris Paladino
- Center for Nano Science and Technology CNST@Polimi, Istituto Italiano di Tecnologia, Via Pascoli 70/3, Milano, 20133, Italy
| | - Mattia Cabrioli
- Center for Nano Science and Technology CNST@Polimi, Istituto Italiano di Tecnologia, Via Pascoli 70/3, Milano, 20133, Italy
| | - Nidhin G Mathews
- Materials Science and Environmental Engineering Unit, Tampere University, Korkeakoulunkatu 6, Tampere, 33720, Finland
| | - Turkka Salminen
- Tampere Microscopy Center, Tampere University, Korkeakoulunkatu 6, Tampere, 33720, Finland
| | - Mikko Hokka
- Materials Science and Environmental Engineering Unit, Tampere University, Korkeakoulunkatu 6, Tampere, 33720, Finland
| | - Jaakko Akola
- Computational Physics Laboratory, Tampere University, Korkeakoulunkatu 6, Tampere, 33720, Finland
- Department of Physics, Norwegian University of Science and Technology (NTNU), Høgskoleringen 5, Trondheim, NO-7491, Norway
| | - Antti Kuronen
- Department of Physics, University of Helsinki, P.O. Box 43, Helsinki, FI-00014, Finland
| | - Erkki Levänen
- Materials Science and Environmental Engineering Unit, Tampere University, Korkeakoulunkatu 6, Tampere, 33720, Finland
| | - Fabio Di Fonzo
- Center for Nano Science and Technology CNST@Polimi, Istituto Italiano di Tecnologia, Via Pascoli 70/3, Milano, 20133, Italy
- X-nano s.r.l, Via Rubattino 8, Milano, 20134, Italy
| | - Gaurav Mohanty
- Materials Science and Environmental Engineering Unit, Tampere University, Korkeakoulunkatu 6, Tampere, 33720, Finland
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Ye H, Wang P, Li G, Shi Y, Chen B, Li X, Hu J. Expanding the Set of Three-Input Logic Functions in Inverted T-Shaped TFETs. MICROMACHINES 2023; 14:445. [PMID: 36838145 PMCID: PMC9962397 DOI: 10.3390/mi14020445] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 01/31/2023] [Revised: 02/09/2023] [Accepted: 02/13/2023] [Indexed: 06/18/2023]
Abstract
Three-input logic primitives show high efficiency in logic synthesis compared to traditional two-input logic, which encourages researchers to implement three-input logic gates with emerging nanotechnologies. This paper demonstrates a compact implementation of three-input monotone logic gates based on the inverted T-shaped TFET. Firstly, based on the gate coupling mechanism in the novel inverted T channel, the BTBT current can be suppressed in the vertical or horizontal region to achieve the channel strobe. Therefore, the typical three-input monotone logic functions, Majority, OrAnd, and AndOr, are successfully implemented on a single transistor. Then, a simplified potential model describing gate coupling is established to describe the impact of key device parameters on the logic behavior. Combined with TCAD simulation, the design rules of devices with different logic functions are given. Finally, a series of three-input monotonic logic gates are designed and verified. The results show that the use of the proposed TFETs can effectively save the number of transistors in the three-input logic gate, which indicates that the three-input TFET is a compact and flexible candidate for three-input logic gates.
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Affiliation(s)
- Hao Ye
- College of Electrical and Electronic engineering, Wenzhou University, Wenzhou 325000, China
| | - Pengjun Wang
- College of Electrical and Electronic engineering, Wenzhou University, Wenzhou 325000, China
| | - Gang Li
- College of Electrical and Electronic engineering, Wenzhou University, Wenzhou 325000, China
| | - Yijian Shi
- College of Electrical and Electronic engineering, Wenzhou University, Wenzhou 325000, China
| | - Bo Chen
- College of Electrical and Electronic engineering, Wenzhou University, Wenzhou 325000, China
| | - Xiangyu Li
- College of Electrical and Electronic engineering, Wenzhou University, Wenzhou 325000, China
| | - Jianping Hu
- College of Electrical Engineering and Computer Sciences, Ningbo University, Ningbo 315211, China
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Frankberg EJ, Kalikka J, García Ferré F, Joly-Pottuz L, Salminen T, Hintikka J, Hokka M, Koneti S, Douillard T, Le Saint B, Kreiml P, Cordill MJ, Epicier T, Stauffer D, Vanazzi M, Roiban L, Akola J, Di Fonzo F, Levänen E, Masenelli-Varlot K. Highly ductile amorphous oxide at room temperature and high strain rate. Science 2019; 366:864-869. [DOI: 10.1126/science.aav1254] [Citation(s) in RCA: 66] [Impact Index Per Article: 11.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/20/2018] [Revised: 07/03/2019] [Accepted: 10/08/2019] [Indexed: 11/02/2022]
Affiliation(s)
- Erkka J. Frankberg
- Unit of Materials Science and Environmental Engineering, Tampere University, Tampere, Finland
- Université de Lyon, INSA-Lyon, UCBL, MATEIS, CNRS UMR 5510, Villeurbanne, France
- Center for Nano Science and Technology @PoliMi, Istituto Italiano di Tecnologia, Milano, Italy
| | - Janne Kalikka
- Computational Physics Laboratory, Tampere University, Tampere, Finland
| | - Francisco García Ferré
- Center for Nano Science and Technology @PoliMi, Istituto Italiano di Tecnologia, Milano, Italy
| | - Lucile Joly-Pottuz
- Université de Lyon, INSA-Lyon, UCBL, MATEIS, CNRS UMR 5510, Villeurbanne, France
| | - Turkka Salminen
- Tampere Microscopy Center, Tampere University, Tampere, Finland
| | - Jouko Hintikka
- Unit of Materials Science and Environmental Engineering, Tampere University, Tampere, Finland
| | - Mikko Hokka
- Unit of Materials Science and Environmental Engineering, Tampere University, Tampere, Finland
| | - Siddardha Koneti
- Université de Lyon, INSA-Lyon, UCBL, MATEIS, CNRS UMR 5510, Villeurbanne, France
| | - Thierry Douillard
- Université de Lyon, INSA-Lyon, UCBL, MATEIS, CNRS UMR 5510, Villeurbanne, France
| | - Bérangère Le Saint
- Université de Lyon, INSA-Lyon, UCBL, MATEIS, CNRS UMR 5510, Villeurbanne, France
| | - Patrice Kreiml
- Erich Schmid Institute of Materials Science, Austrian Academy of Sciences, Leoben, Austria
| | - Megan J. Cordill
- Erich Schmid Institute of Materials Science, Austrian Academy of Sciences, Leoben, Austria
| | - Thierry Epicier
- Université de Lyon, INSA-Lyon, UCBL, MATEIS, CNRS UMR 5510, Villeurbanne, France
| | | | - Matteo Vanazzi
- Center for Nano Science and Technology @PoliMi, Istituto Italiano di Tecnologia, Milano, Italy
| | - Lucian Roiban
- Université de Lyon, INSA-Lyon, UCBL, MATEIS, CNRS UMR 5510, Villeurbanne, France
| | - Jaakko Akola
- Computational Physics Laboratory, Tampere University, Tampere, Finland
- Department of Physics, Norwegian University of Science and Technology, Trondheim, Norway
| | - Fabio Di Fonzo
- Center for Nano Science and Technology @PoliMi, Istituto Italiano di Tecnologia, Milano, Italy
| | - Erkki Levänen
- Unit of Materials Science and Environmental Engineering, Tampere University, Tampere, Finland
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