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Chiu SK, Li MC, Ci JW, Hung YC, Tsai DS, Chen CH, Lin LH, Watanabe K, Taniguchi T, Aoki N, Hsieh YP, Chuang C. Enhancing optical characteristics of mediator-assisted wafer-scale MoS 2and WS 2on h-BN. NANOTECHNOLOGY 2023; 34:255703. [PMID: 36944230 DOI: 10.1088/1361-6528/acc5f1] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/19/2023] [Accepted: 03/20/2023] [Indexed: 06/18/2023]
Abstract
Two-dimensional (2D) materials and their heterostructures exhibit intriguing optoelectronic properties; thus, they are good platforms for exploring fundamental research and further facilitating real device applications. The key is to preserve the high quality and intrinsic properties of 2D materials and their heterojunction interface even in production scale during the transfer and assembly process so as to apply in semiconductor manufacturing field. In this study, we successfully adopted a wet transfer existing method to separate mediator-assisted wafer-scale from SiO2/Si growing wafer for the first time with intermediate annealing to fabricate wafer-scale MoS2/h-BN and WS2/h-BN heterostructures on a SiO2/Si wafer. Interestingly, the high-quality wafer-scale 2D material heterostructure optical properties were enhanced and confirmed by Raman and photoluminescence spectroscopy. Our approach can be applied to other 2D materials and expedite mass production for industrial applications.
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Affiliation(s)
- Sheng-Kuei Chiu
- Department of Materials Science and Engineering, Feng Chia University, Taichung 40724, Taiwan
| | - Ming-Chi Li
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan 320, Taiwan
| | - Ji-Wei Ci
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan 320, Taiwan
| | - Yuan-Chih Hung
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan 320, Taiwan
| | - Dung-Sheng Tsai
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan 320, Taiwan
- Research Center for Semiconductor Materials and Advanced Optics, Chung Yuan Christian University, Taoyuan 320, Taiwan
| | - Chien-Han Chen
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan 320, Taiwan
| | - Li-Hung Lin
- Department of Electrophysics, National Chiayi University, Chiayi 600, Taiwan
| | - Kenji Watanabe
- Research Center for Functional Materials, National Institute for Materials Science, Tsukuba 305-0044, Japan
| | - Takashi Taniguchi
- International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba 305-0044, Japan
| | - Nobuyuki Aoki
- Department of Materials Science, Chiba University, Chiba 263-8522, Japan
| | - Ya-Ping Hsieh
- Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 106, Taiwan
| | - Chiashain Chuang
- Department of Electronic Engineering, Chung Yuan Christian University, Taoyuan 320, Taiwan
- Research Center for Semiconductor Materials and Advanced Optics, Chung Yuan Christian University, Taoyuan 320, Taiwan
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Li H, Zheng G. Magnetical Manipulation of Hyperbolic Phonon Polaritons in Twisted Double-Layers of Molybdenum Trioxide. MICROMACHINES 2023; 14:648. [PMID: 36985055 PMCID: PMC10054559 DOI: 10.3390/mi14030648] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 02/21/2023] [Revised: 03/07/2023] [Accepted: 03/10/2023] [Indexed: 06/18/2023]
Abstract
Controlling the twist angle between double stacked van der Waals (vdW) crystals holds great promise for nanoscale light compression and manipulation in the mid-infrared (MIR) range. A lithography-free geometry has been proposed to mediate the coupling of phonon polaritons (PhPs) in double-layers of vdW α-MoO3. The anisotropic hyperbolic phonon polaritons (AHPhPs) are further hybridized by the anisotropic substrate environment of magneto-optic indium arsenide (InAs). The AHPhPs can be tuned by twisting the angle between the optical axes of the two separated layers and realize a topological transition from open to closed dispersion contours. Moreover, in the presence of external magnetic field, an alteration of the hybridization of PhPs will be met, which enable an efficient way for the control of light-matter interaction at nanoscale in the MIR region.
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Affiliation(s)
- Hongjing Li
- School of Electronics Engineering, Nanjing Xiaozhuang University, Nanjing 211171, China
| | - Gaige Zheng
- Jiangsu Collaborative Innovation Center on Atmospheric Environment and Equipment Technology (CICAEET), Nanjing University of Information Science and Technology, Nanjing 210044, China
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Zhong F, Chen C, Zheng J, Li L, Wen X. Zinc ion cross-linked sodium alginate modified hexagonal boron nitride to enhance the flame retardant properties of composite coatings. Colloids Surf A Physicochem Eng Asp 2022. [DOI: 10.1016/j.colsurfa.2022.129200] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
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Fiore S, Klinkert C, Ducry F, Backman J, Luisier M. Influence of the hBN Dielectric Layers on the Quantum Transport Properties of MoS 2 Transistors. MATERIALS 2022; 15:ma15031062. [PMID: 35161006 PMCID: PMC8840300 DOI: 10.3390/ma15031062] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 12/18/2021] [Revised: 01/22/2022] [Accepted: 01/27/2022] [Indexed: 02/01/2023]
Abstract
The encapsulation of single-layer 2D materials within hBN has been shown to improve the mobility of these compounds. Nevertheless, the interplay between the semiconductor channel and the surrounding dielectrics is not yet fully understood, especially their electron-phonon interactions. Therefore, here, we present an ab initio study of the coupled electrons and phonon transport properties of MoS2-hBN devices. The characteristics of two transistor configurations are compared to each other: one where hBN is treated as a perfectly insulating, non-vibrating layer and one where it is included in the ab initio domain as MoS2. In both cases, a reduction of the ON-state current by about 50% is observed as compared to the quasi-ballistic limit. Despite the similarity in the current magnitude, explicitly accounting for hBN leads to additional electron-phonon interactions at frequencies corresponding to the breathing mode of the MoS2-hBN system. Moreover, the presence of an hBN layer around the 2D semiconductor affects the Joule-induced temperature distribution within the transistor.
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Alzahrani A, Alruqi A, Karki B, Kalutara Koralalage M, Jasinski J, Sumanasekera G. Direct fabrication and characterization of vertically stacked Graphene/h-BN/Graphene tunnel junctions. NANO EXPRESS 2021. [DOI: 10.1088/2632-959x/ac2e9e] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/11/2022]
Abstract
Abstract
We have used a lithography free technique for the direct fabrication of vertically stacked two-dimensional (2D) material-based tunnel junctions and characterized by Raman, AFM, XPS. We fabricated Graphene/h-BN/Graphene devices by direct deposition of graphene (bottom layer), h-BN (insulating barrier) and graphene (top layer) sequentially using a plasma enhanced chemical vapor deposition on Si/SiO2 substrates. The thickness of the h-BN insulating layer was varied by tuning the plasma power and the deposition time. Samples were characterized by Raman, AFM, and XPS. The I-V data follows the barrier thickness dependent quantum tunneling behavior for equally doped graphene layers. The resonant tunneling behavior was observed at room temperature for oppositely doped graphene layers where hydrazine and ammonia were used for n-doping of one of the graphene layers. The resonance with negative differential conductance occurs when the band structures of the two electrodes are aligned. The doping effect of the resonant peak is observed for varying doping levels. The results are explained according to the Bardeen tunneling model.
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Han T, Liu H, Chen S, Wang S, Yang K. Preparation and Research of Monolayer WS 2 FETs Encapsulated by h-BN Material. MICROMACHINES 2021; 12:mi12091006. [PMID: 34577650 PMCID: PMC8464811 DOI: 10.3390/mi12091006] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 07/05/2021] [Revised: 07/30/2021] [Accepted: 08/22/2021] [Indexed: 11/25/2022]
Abstract
Functional devices that use vertical van der Waals (vdWs) heterostructure material can effectively combine the properties of single component materials, and the strong interlayer coupling effect can change their electronic and optical properties. According to our research, WS2/h-BN vertical vdWs heterostructure material can be synthesized by chemical vapor deposition (CVD) and wet transfer methods. Monolayer WS2 material and WS2/h-BN vertical vdWs heterostructure material can be tested and characterized using XPS, SEM, EDS, AFM and Raman spectroscopy, which can prove the existence of corresponding materials. When the thickness of the material decreases, the Coulomb scattering amongst two-dimensional (2D) layered materials increases. This is because both the shielding effect and the distance between the channel and the interface layer decrease. FET devices are then fabricated on WS2/h-BN vdWs heterostructure material by the electron beam lithography and evaporation processes. The effects of vdWs epitaxy on electrical transmission when WS2/h-BN vdWs heterostructure material is formed are explored. Finally, the related electrical performance of FET devices is tested and analyzed. Our experimental research provides guidance for the use of electronic devices with vdWs heterostructure material.
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Xu H, Zhu J, Ma Q, Ma J, Bai H, Chen L, Mu S. Two-Dimensional MoS 2: Structural Properties, Synthesis Methods, and Regulation Strategies toward Oxygen Reduction. MICROMACHINES 2021; 12:mi12030240. [PMID: 33673429 PMCID: PMC7996743 DOI: 10.3390/mi12030240] [Citation(s) in RCA: 20] [Impact Index Per Article: 6.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 01/29/2021] [Revised: 02/14/2021] [Accepted: 02/21/2021] [Indexed: 11/16/2022]
Abstract
Compared with three-dimensional (3D) and other materials, two-dimensional (2D) materials with unique properties such as high specific surface area, structurally adjustable band structure, and electromagnetic properties have attracted wide attention. In recent years, great progress has been made for 2D MoS2 in the field of electrocatalysis, and its exposed unsaturated edges are considered to be active sites of electrocatalytic reactions. In this review, we focus on the latest progress of 2D MoS2 in the oxygen reduction reaction (ORR) that has not received much attention. First, the basic properties of 2D MoS2 and its advantages in the ORR are introduced. Then, the synthesis methods of 2D MoS2 are summarized, and specific strategies for optimizing the performance of 2D MoS2 in ORRs, and the challenges and opportunities faced are discussed. Finally, the future of the 2D MoS2-based ORR catalysts is explored.
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Affiliation(s)
- Hanwen Xu
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China; (H.X.); (J.Z.); (Q.M.); (J.M.); (H.B.)
- Foshan Xianhu Laboratory of the Advanced Energy Science and Technology, Guangdong Laboratory, Xianhu Hydrogen Valley, Foshan 528200, China
| | - Jiawei Zhu
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China; (H.X.); (J.Z.); (Q.M.); (J.M.); (H.B.)
| | - Qianli Ma
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China; (H.X.); (J.Z.); (Q.M.); (J.M.); (H.B.)
| | - Jingjing Ma
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China; (H.X.); (J.Z.); (Q.M.); (J.M.); (H.B.)
| | - Huawei Bai
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China; (H.X.); (J.Z.); (Q.M.); (J.M.); (H.B.)
| | - Lei Chen
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China; (H.X.); (J.Z.); (Q.M.); (J.M.); (H.B.)
- Correspondence: (L.C.); (S.M.)
| | - Shichun Mu
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China; (H.X.); (J.Z.); (Q.M.); (J.M.); (H.B.)
- Foshan Xianhu Laboratory of the Advanced Energy Science and Technology, Guangdong Laboratory, Xianhu Hydrogen Valley, Foshan 528200, China
- Correspondence: (L.C.); (S.M.)
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