Exposure to Volatile Organic Compounds and Possibility of Exposure to By-product Volatile Organic Compounds in Photolithography Processes in Semiconductor Manufacturing Factories

Nontarget Screening and Occurrence of Emerging Per- and Polyfluoroalkyl Substances in Municipal and Semiconductor Industrial Wastewater: A Large-Scale Survey in China

Due to the lack of transparency in the production and applications of emerging per- and polyfluoroalkyl substances (PFAS), it is a huge challenge to grasp the real PFAS pollution profile in a specific region or industry by target analysis. This study collected extensive samples across China, including municipal wastewater from 9 major cities and wastewater from various manufacturing stages at 3 large semiconductor factories. Suspect and nontarget screening were conducted along with target analysis, and 82 PFAS in 25 classes were identified. Notably, this is the first study to investigate PFAS contamination in semiconductor wastewater on the Chinese mainland. Moreover, 13 classes of PFAS were reported for the first time worldwide in semiconductor wastewater, including multiple hydrosubstituted perfluoroalkyl carboxylic acid (mH-PFCA), ether-inserted PFCA (OPFCA), and perfluoroalkyl alcohol (PA) derivatives. The highest total concentrations of target, suspect, and nontarget PFAS in semiconductor wastewater (12 μg/L) were substantially higher than those measured in all municipal wastewater (25-950 ng/L). The composition of PFAS varied regionally in semiconductor wastewater. Total oxidizable precursor assay revealed the presence of unknown precursors (0.043-0.83 nmol/L), which cannot be directly monitored but may pose a greater PFAS contamination risk in semiconductor water treatment and discharge processes.

Interactions and Curing Dynamics Between UV-Triggered Epoxy Acrylate Binder, Curing Agents and Photoinitiators

This study investigated the interaction between UV-triggered curing binders and photoinitiators, focusing on their thermal, mechanical, and morphological properties. Using epoxy acrylate as the matrix and three potential photoinitiators with varying phosphorus contents, UV curing systems were fabricated and analyzed. 2-hydroxy-2-methyl-1-phenyl-1-propanone (HMPP), 2,4,6-trimethyl benzoyl diphenyl phosphine oxide (TPO), and their mixture were utilized as photoinitiators. We observed that the curing process significantly reduced residual double bonds within the first 5 s of UV irradiation time. The glass transition temperature (Tg) increased with curing time due to enhanced network density. For instance, in the MyA-TPO formulation, Tg of the cured sample tended to increase to 67.3 °C for 3 s to 79.8 °C for 15 s. Mechanical analysis revealed that HMPP facilitated the formation of robust network structures. Notably, the MyA-HMPP formulation exhibited a tensile strength of 63 MPa and a Young's modulus of 21 MPa, indicating excellent mechanical strength. SEM imaging confirmed these findings, illustrating distinct fracture morphologies that correlated with mechanical performance. These results provide insights into optimizing UV-curable materials for applications requiring high precision and durability. In particular, the combination of high Tg, superior tensile strength, and uniform fracture morphology indicates excellent thermal stability, mechanical integrity, and crack resistance-critical requirements in semiconductor packaging. These properties, along with rapid UV curing, support the suitability of the proposed systems for advanced applications such as system-in-package (SiP) and 3D integration.

Biomonitoring of Exposures to Solvents and Metals in Electronics Manufacturing Facilities in Batam, Indonesia

Concerns about chemical exposure in the electronics manufacturing industry have long been recognized, but data are lacking in Southeast Asia. We conducted a study in Batam, Indonesia, to evaluate chemical exposures in electronics facilities, using participatory research and biological monitoring approaches. A convenience sample of 36 workers (28 exposed, 8 controls) was recruited, and urine samples were collected before and after shifts. Five solvents (acetone, methyl ethyl ketone, toluene, benzene, and xylenes) were found in 46%-97% of samples, and seven metals (arsenic, cadmium, cobalt, tin, antimony, lead, and vanadium) were detected in 60%-100% of samples. Biological monitoring and participatory research appeared to be useful in assessing workers' exposure when workplace air monitoring is not feasible due to a lack of cooperation from the employer. Several logistical challenges need to be addressed in future biomonitoring studies of electronics workers in Asia in factories where employers are reluctant to track workers' exposure and health.

Real-Time Automated Solubility Screening Method Using Deep Neural Networks with Handcrafted Features

Solubility measurements are essential in various research and industrial fields. With the automation of processes, the importance of automatic and real-time solubility measurements has increased. Although end-to-end learning methods are commonly used for classification tasks, the use of handcrafted features is still important for specific tasks with the limited labeled images of solutions used in industrial settings. In this study, we propose a method that uses computer vision algorithms to extract nine handcrafted features from images and train a DNN-based classifier to automatically classify solutions based on their dissolution states. To validate the proposed method, a dataset was constructed using various solution images ranging from undissolved solutes in the form of fine particles to those completely covering the solution. Using the proposed method, the solubility status can be automatically screened in real time by using a display and camera on a tablet or mobile phone. Therefore, by combining an automatic solubility changing system with the proposed method, a fully automated process could be achieved without human intervention.

Semiconductor Work, Leukemia, and Cancer Risk: A Systematic Review and Meta-Analysis

BACKGROUND

With the development of the semiconductor industry over the past 60 years, various occupational diseases have been reported to coincide with rapid industrial growth. Among these occupational diseases, the association between semiconductor work and cancers, including leukemia, remains controversial. Therefore, this systematic review and meta-analysis assesses the associations between semiconductor work, leukemia, and cancer risk.

METHODS

The core research databases, including PubMed, were screened for studies published until 31 July 2022. All eligible studies assessed cancer risk among workers in the semiconductor industry.

RESULTS

Nine studies were selected after a literature review. The employment period of semiconductor workers in each study was between 1965 and 2009. Semiconductor work was not significantly associated with the risk of leukemia (Relative Risk [RR], 1.02; 95% Confidence Interval [CI], 0.74-1.41) or cancer (RR, 1.00; 95% CI, 0.93-1.07).

CONCLUSION

In this meta-analysis, semiconductor work was not significantly associated with leukemia or cancer risk. Internal comparisons, such as non-fab workers, quality of the study, employment period, and healthy worker effect, should be considered for interpretation. Furthermore, a prospective cohort study based on overall semiconductor workers in the industry could be useful to assess occupational disease risk as a mandatory component of health assessment.

Two Semiconductor Companies' Financial Support Compensation (FSC) Programs for Semiconductor Workers with Suspected Work-Related Diseases (WRDs)

This study described two companies’ financial compensation programs for semiconductor workers with suspected work-related diseases (WRDs) and discussed the major related issues. The key contents of the programs found on the websites opened by two semiconductor companies (Samsung and SK Hynix) were cited. In order to select the suspected WRDs for the FSC, all available epidemiologic studies related to health problems conducted in the semiconductor industry were reviewed. Most program contents are similar, although the amount of financial compensation and a few types of disease available for compensation differ between the companies. The group of cancer, rare disease, childhood rare disease among children born to semiconductor workers (hereafter selected diseases among offspring), and fetal loss, including spontaneous abortion (SAB) and stillbirth, were considered for compensation. An employment duration of longer than one year on a semiconductor production line is required for FSC for cancer or rare disease. The FSC for SAB and offspring disease require a period of employment longer than one month, either before three months prior to conception or between conception and childbirth. The maximum amount of compensation per type of cancer and rare disease was fixed based on the medical treatment fee. The FSC programs of the two companies have been operated successfully to date. These programs are arguably considered to contribute to resolving the conflict between companies and workers with WRDs.

Synthesis of Vapochromic Dyes Having Sensing Properties for Vapor Phase of Organic Solvents Used in Semiconductor Manufacturing Processes and Their Application to Textile-Based Sensors

Two vapochromic dyes (DMx and DM) were synthesized to be used for textile-based sensors detecting the vapor phase of organic solvents. They were designed to show sensitive color change properties at a low concentration of vapors at room temperature. They were applied to cotton fabrics as a substrate of the textile-based sensors to examine their sensing properties for nine organic solvents frequently used in semiconductor manufacturing processes, such as trichloroethylene, dimethylacetamide, iso-propanol, methanol, n-hexane, ethylacetate, benzene, acetone, and hexamethyldisilazane. The textile sensor exhibited strong sensing properties of polar solvents rather than non-polar solvents. In particular, the detection of dimethylacetamide was the best, showing a color difference of 15.9 for DMx and 26.2 for DM under 300 ppm exposure. Even at the low concentration of 10 ppm of dimethylacetamide, the color change values reached 7.7 and 13.6, respectively, in an hour. The maximum absorption wavelength of the textile sensor was shifted from 580 nm to 550 nm for DMx and 550 nm to 540 nm for DM, respectively, due to dimethylacetamide exposure. The sensing mechanism was considered to depend on solvatochromism, the aggregational properties of the dyes and the adsorption amounts of the solvent vapors on the textile substrates to which the dyes were applied. Finally, the reusability of the textile sensor was tested for 10 cycles.

Inkjet Printing: A Viable Technology for Biosensor Fabrication

Printing technology promises a viable solution for the low-cost, rapid, flexible, and mass fabrication of biosensors. Among the vast number of printing techniques, screen printing and inkjet printing have been widely adopted for the fabrication of biosensors. Screen printing provides ease of operation and rapid processing; however, it is bound by the effects of viscous inks, high material waste, and the requirement for masks, to name a few. Inkjet printing, on the other hand, is well suited for mass fabrication that takes advantage of computer-aided design software for pattern modifications. Furthermore, being drop-on-demand, it prevents precious material waste and offers high-resolution patterning. To exploit the features of inkjet printing technology, scientists have been keen to use it for the development of biosensors since 1988. A vast number of fully and partially inkjet-printed biosensors have been developed ever since. This study presents a short introduction on the printing technology used for biosensor fabrication in general, and a brief review of the recent reports related to virus, enzymatic, and non-enzymatic biosensor fabrication, via inkjet printing technology in particular.

Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990-2010

BACKGROUND

This study aimed to assess the possibility of benzene exposure in workers of a Korean semiconductor manufacturing company by reviewing the issued patents.

METHODS

A systematic patent search was conducted with the Google "Advanced Patent Search" engine using the keywords "semiconductor" and "benzene" combined with all of the words accessed on January 24, 2016.

RESULTS

As a result of the search, we reviewed 75 patent documents filed by a Korean semiconductor manufacturing company from 1994 to 2010. From 22 patents, we found that benzene could have been used as one of the carbon sources in chemical vapor deposition for capacitor; as diamond-like carbon for solar cell, graphene formation, or etching for transition metal thin film; and as a solvent for dielectric film, silicon oxide layer, nanomaterials, photoresist, rise for immersion lithography, electrophotography, and quantum dot ink.

CONCLUSION

Considering the date of patent filing, it is possible that workers in the chemical vapor deposition, immersion lithography, and graphene formation processes could be exposed to benzene from 1996 to 2010.

Health Risk Assessment of Photoresists Used in an Optoelectronic Semiconductor Factory

Photoresist materials are indispensable in photolithography, a process used in semiconductor fabrication. The work process and potential hazards in semiconductor production have raised concerns as to adverse health effects. We therefore performed a health risk assessment of occupational exposure to positive photoresists in a single optoelectronic semiconductor factory in Taiwan. Positive photoresists are widely used in the optoelectronic semiconductor industry for photolithography. Occupational exposure was estimated using the Stoffenmanager® model. Bayesian modeling incorporated available personal air sampling data. We examined the composition and by-products of the photoresists according to descriptions published in the literature and patents; the main compositions assessed were propylene glycol methyl ether acetate (PGMEA), novolac resin, photoactive compound, phenol, cresol, benzene, toluene, and xylene. Reference concentrations for each compound were reassessed and updated if necessary. Calculated hazard quotients were greater than 1 for benzene, phenol, xylene, and PGMEA, indicating that they have the potential for exposures that exceed reference levels. The information from our health risk assessment suggests that benzene and phenol have a higher level of risk than is currently acknowledged. Undertaking our form of risk assessment in the workplace design phase could identify compounds of major concern, allow for the early implementation of control measures and monitoring strategies, and thereby reduce the level of exposure to health risks that workers face throughout their career.

Evaluation of Hazardous Chemicals with Material Safety Data Sheet and By-products of a Photoresist Used in the Semiconductor-Manufacturing Industry

Background

The photolithography process in the semiconductor industry uses various chemicals with little information on their constitution. This study aimed to identify the chemical constituents of photoresist (PR) products and their by-products and to compare these constituents with material safety data sheets (MSDSs) and analytical results.

Methods

A total of 51 PRs with 48 MSDSs were collected. Analysis consisted of two parts: First, the constituents of the chemical products were identified and analyzed using MSDS data; second, for verification of the by-products of PR, volatile organic compounds were analyzed. The chemical constituents were categorized according to hazards.

Results

Forty-five of 48 products contained trade secrets in amounts ranging from 1 to 65%. A total of 238 ingredients with multiple counting (35 ingredients without multiple counting) were identified in the MSDS data, and 48.7% of ingredients were labeled as trade secrets under the Korea Occupational Safety and Health Act. The concordance rate between the MSDS data and the analytical result was 41.7%. The by-product analysis identified 129 chemicals classified according to Chemical Abstracts Service No., with 17 chemicals that are carcinogenic, mutagenic, and reprotoxic substances. Formaldehyde was found to be released from 12 of 21 products that use novolak resin.

Conclusion

We confirmed that several PRs contain carcinogens, and some were not specified in the toxicological information in the MSDS. Hazardous chemicals, including benzene and formaldehyde, are released from PRs products as by-products. Therefore, it is necessary to establish a systematic management system for chemical compounds and the working environment.

Extremely Low Frequency-Magnetic Field (ELF-MF) Exposure Characteristics among Semiconductor Workers

We assessed the exposure of semiconductor workers to extremely low frequency-magnetic fields (ELF-MF) and identified job characteristics affecting ELF-MF exposure. These were demonstrated by assessing the exposure of 117 workers involved in wafer fabrication (fab) and chip packaging wearing personal dosimeters for a full shift. A portable device was used to monitor ELF-MF in high temporal resolution. All measurements were categorized by operation, job and working activity during working time. ELF-MF exposure of workers were classified based on the quartiles of ELF-MF distribution. The average levels of ELF-MF exposure were 0.56 µT for fab workers, 0.59 µT for chip packaging workers and 0.89 µT for electrical engineers, respectively. Exposure to ELF-MF differed among types of factory, operation, job and activity. Workers engaged in the diffusion and chip testing activities showed the highest ELF-MF exposure. The ELF-MF exposures of process operators were found to be higher than those of maintenance engineers, although peak exposure and/or patterns varied. The groups with the highest quartile ELF-MF exposure level are operators in diffusion, ion implantation, module and testing operations, and maintenance engineers in diffusion, module and testing operations. In conclusion, ELF-MF exposure among workers can be substantially affected by the type of operation and job, and the activity or location.

Exposure Reconstruction and Risk Analysis for Six Semiconductor Workers With Lymphohematopoietic Cancers

OBJECTIVE

To investigate whether workplace exposures to recognized lymphohematopoietic carcinogens were possibly related to cancers in six semiconductor-manufacturing workers.

METHODS

A job-exposure matrix was developed for chemical and physical process agents and anticipated by-products. Potential cumulative occupational exposures of the six cases were reconstructed. The role of workplace exposures in cancer was evaluated through quantitative risk assessment and by comparison with epidemiological literature.

RESULTS

Two workers were potentially exposed to agents capable of causing their diagnosed cancers. Reconstructed exposures were similar to levels in outdoor environments and lower than exposures associated with increased risks in epidemiological studies. Cancer risks were estimated to be less than 1 in 10,000 persons.

CONCLUSIONS

The development of cancer among the six workers was unlikely to be explained by occupational exposures to recognized lymphohematopoietic carcinogens.

Reproductive Hazards Still Persist in the Microelectronics Industry: Increased Risk of Spontaneous Abortion and Menstrual Aberration among Female Workers in the Microelectronics Industry in South Korea

OBJECTIVES

Despite the global expansion of supply chains and changes to the production process, few studies since the mid-1990 s and 2000s have examined reproductive risks of the microelectronics industry; we examined the reproductive risks among female microelectronics workers in South Korea.

METHODS

Based on claim data from the National Health Insurance (2008-2012), we estimated age-specific rates of spontaneous abortion (SAB) and menstrual aberration (MA) among women aged 20 to 39 years. We compared data between microelectronics workers and three different control groups: economically inactive women, the working population as a whole, and workers employed in the bank industry. For an effect measure, age-stratified relative risks (RRs) were estimated.

RESULTS

Female workers in the microelectronics industry showed significantly higher risk for SAB and MA compared to control groups. The RRs for SAB with reference to economically inactive women, working population, and bank workers in their twenties were 1.57, 1.40, and 1.37, respectively, and the RRs for MA among females in their twenties were 1.54, 1.38, and 1.48, respectively. For women in their thirties, RRs for SAB were 1.58, 1.67, and 1.13, and those for MA were 1.25, 1.35, and 1.23 compared to the three control populations, respectively. All RRs were statistically significant at a level of 0.05, except for the SAB case comparison with bank workers in their thirties.

CONCLUSIONS

Despite technical innovations and health and safety measures, female workers in microelectronics industry in South Korea have high rates of SAB and MA, suggesting continued exposure to reproductive hazards. Further etiologic studies based on primary data collection and careful surveillance are required to confirm these results.

The current status and the future of occupational safety and health in Korea

From the 1970s to 2000, the occupational accident rate in Korea showed a continuous decline. However, the rate has remained stagnant since 2000 even when the fatal injury rate has decreased 40% from that year. Injuries caused by being caught in objects have decreased while those caused by slips and falls on same level and falls from the height have increased. In 2010, the non-fatal injury rate per 100 employees was 0.63 while the fatal injury rate per 100,000 employees was 9.74. The construction industry accounted for 40.2% of all fatal injuries, and falls from the height caused 54.3% of the fatality. Musculoskeletal diseases accounted for 78.8% of the non-fatal occupational diseases while cardio-cerebrovascular diseases and pneumoconiosis are the two major fatal occupational diseases. Occupational diseases caused by chemical agents have decreased to 0.6% of all cases. However, there were several social disputes related to occupational diseases caused by low level of chemicals such as leukemia in a semiconductor company. Korea planned to reduce the fatal injury rate and total workday loss by 30% by 2015. In order to achieve this goal, the government will focus on vulnerable groups in collaboration with allies such as professional associations or organizations.

Cancer mortality and incidence in korean semiconductor workers

Objectives

The purpose of this study was to evaluate cancer risks in the Korean semiconductor industry.

Methods

A retrospective cohort study was performed in eight semiconductor factories between 1998 and 2008. The number of subjects was 113,443 for mortality and 108,443 for incidence. Standardized mortality ratios (SMR) and standardized incidence ratios (SIR) were calculated.

Results

The SMR of leukemia was 0.39 (95% Confidence Interval 0.08-1.14) in males (2 cases) and 1.37 (0.55-2.81) in females (7 cases). The SMR of non-Hodgkin's lymphoma (NHL) was 1.33 (0.43-3.09, 5 cases) in males and 2.5 (0.68-6.40, 4 cases) in females. The SIR of leukemia was 0.69 (0.30-1.37, 8 cases) in males and 1.28 (0.61-2.36, 10 cases) in females. The SIR of NHL in females was 2.31 (1.23-3.95, 13 cases) and that of thyroid cancer in males was 2.11 (1.49-2.89, 38 cases). The excess incidence of NHL was significant in female assembly operators [SIR=3.15 (1.02-7.36, 5 cases)], but not significant in fabrication workers. The SIR of NHL in the group working for 1-5 years was higher than the SIR of NHL for those working for more than five years. The excess incidence of male thyroid cancer was observed in both office and manufacturing workers.

Conclusion

There was no significant increase of leukemia in the Korean semiconductor industry. However, the incidence of NHL in females and thyroid cancer in males were significantly increased even though there was no definite association between work and those diseases in subgroup analysis according to work duration. This result should be interpreted cautiously, because the majority of the cohort was young and the number of cases was small.

Cases series of malignant lymphohematopoietic disorder in korean semiconductor industry

OBJECTIVES

Seven cases of malignant lymphohematopoietic (LHP) disorder were claimed to have developed from occupational exposure at two plants of a semiconductor company from 2007 to 2010. This study evaluated the possibility of exposure to carcinogenic agents for the cases.

METHODS

Clinical courses were reviewed with assessing possible exposure to carcinogenic agents related to LHP cancers. Chemicals used at six major semiconductor companies in Korea were reviewed. Airborne monitoring for chemicals, including benzene, was conducted and the ionizing radiation dose was measured from 2008 to 2010.

RESULTS

The latency of seven cases (five leukemiae, a Non-Hodgkin's lymphoma, and an aplastic anemia) ranged from 16 months to 15 years and 5 months. Most chemical measurements were at levels of less than 10% of the Korean Occupational Exposure Limit value. No carcinogens related to LHP cancers were used or detected. Complete-shielded radiation-generating devices were used, but the ionizing radiation doses were 0.20-0.22 uSv/hr (background level: 0.21 µSv/hr). Airborne benzene was detected at 0.31 ppb when the detection limit was lowered as low as possible. Ethylene oxide and formaldehyde were not found in the cases' processes, while these two were determined to be among the 263 chemicals in the list that was used at the six semiconductor companies at levels lower than 0.1%. Exposures occurring before 2002 could not be assessed because of the lack of information.

CONCLUSION

Considering the possibility of exposure to carcinogenic agents, we could not find any convincing evidence for occupational exposure in all investigated cases. However, further study is needed because the semiconductor industry is a newly developing one.