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Camarillo-Salazar E, Garcia-Diaz R, Romero de la Cruz MT, Avila-Alvarado Y, Fernandez-Escamilla HN, Hernández Cocoletzi G, Guerrero-Sanchez J. Transition metal (Ti, Cu, Zn, Pt) single-atom modified graphene/AS 2 (A = Mo, W) van der Waals heterostructures for removing airborne pollutants. Phys Chem Chem Phys 2023. [PMID: 38018167 DOI: 10.1039/d3cp03269h] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2023]
Abstract
Air pollution is a worldwide issue that affects human health and the environment. The scientific community tries to control it through different approaches, from experimental to theoretical assessments. Here, we perform DFT calculations to describe CO2, NO2, and SO2 detection on a single-atom (Ti, Cu, Zn, Pt) graphene supported on 2D molybdenum disulfide (MoS2) and tungsten disulfide (WS2). Transition metal single atoms on graphene improve the monolayer reactivity by generating an effective way to remove airborne pollutants. Results indicate that SO2 and NO2 chemically adsorb on all tested transition metals, whereas CO2 stands on top of the incorporated atoms through van der Waals interactions. Since strong Ti-O interactions appear, the Ti single-atom graphene/MoS2(WS2) systems efficiently remove CO2 from the environment. Compared to pristine graphene, our proposed heterostructures improve the SO2, NO2, and CO2 adsorption energies. The heterostructures' electronic properties change once the molecules interact with the transition metals, generating sensible and selective pollutant molecule detection and removal.
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Affiliation(s)
- Erika Camarillo-Salazar
- Universidad Autónoma de Coahuila, Facultad de Ciencias Químicas, Boulevard Venustiano Carranza e Ing. José Cárdenas, 25280, Saltillo, Coahuila, Mexico.
| | - Reyes Garcia-Diaz
- CONAHCyT, Universidad Autónoma de Coahuila, Facultad de Ciencias Físico Matemáticas, Unidad Camporredondo, Edif. A, 25000, Saltillo, Coahuila, Mexico.
| | - María Teresa Romero de la Cruz
- Universidad Autónoma de Coahuila, Facultad de Ciencias Físico Matemáticas, Unidad Camporredondo, Edif. A 25000, Saltillo, Coahuila, Mexico.
| | - Yuliana Avila-Alvarado
- Universidad Autónoma de Coahuila, Facultad de Sistemas, Carretera a México Km 13, 25350 Arteaga, Saltillo, Coahuila, Mexico.
| | - H N Fernandez-Escamilla
- CICFIM Facultad de Ciencias Físico Matemáticas, Universidad Autónoma de Nuevo León, Nuevo Leon, 66450, San Nicolás de los Garza, Mexico
| | - Gregorio Hernández Cocoletzi
- Benemérita Universidad Autónoma de Puebla, Instituto de Física "Ing. Luis Rivera Terrazas", Apartado Postal J-48, 72570, Puebla, Puebla, Mexico.
| | - J Guerrero-Sanchez
- Universidad Nacional Autónoma de México, Centro de Nanociencias y Nanotecnología, Apartado 5 Postal 14, 22800, Ensenada, Baja California, Mexico.
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Rocha Robledo AK, Flores Salazar M, Muñiz Martínez BA, Torres-Rosales ÁA, Lara-Alfaro HF, Del Pozo-Zamudio O, Cerda-Méndez EA, Jiménez-Sandoval S, De Luna Bugallo A. Interlayer charge transfer in supported and suspended MoS2/Graphene/MoS2 vertical heterostructures. PLoS One 2023; 18:e0283834. [PMID: 37490510 PMCID: PMC10368229 DOI: 10.1371/journal.pone.0283834] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/11/2023] [Accepted: 03/15/2023] [Indexed: 07/27/2023] Open
Abstract
In this letter, we report on the optical and structural properties of supported and suspended MoS2/Graphene/MoS2 vertical heterostructures using Raman and photoluminescence (PL) spectroscopies. Vertical heterostructures (VH) are formed by multiple wet transfers on micro-sized holes in SiO2/Si substrates, resulting in VH with different configurations. The strong interlayer coupling is confirmed by Raman spectroscopy. Additionally, we observe an enhancement of the PL emission in the three-layer VH (either support or suspended) compared with bare MoS2 or MoS2/Graphene. This suggests the formation of a spatial type-II band alignment assisted by the graphene layer and thus, the operation of the VH as a n++/metal/n junction.
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Affiliation(s)
| | - Mario Flores Salazar
- Departamento de Nanotecnología, Centro de Física Aplicada y Tecnología Avanzada, Universidad Nacional Autónoma de México, Querétaro, México
| | | | - Ángel A. Torres-Rosales
- Instituto de Investigación en Comunicación Óptica Universidad Autónoma de San Luis Potosí San Luis Potosí, San Luis, S.L.P. México
| | - Héctor F. Lara-Alfaro
- Instituto de Investigación en Comunicación Óptica Universidad Autónoma de San Luis Potosí San Luis Potosí, San Luis, S.L.P. México
| | - Osvaldo Del Pozo-Zamudio
- Instituto de Investigación en Comunicación Óptica Universidad Autónoma de San Luis Potosí San Luis Potosí, San Luis, S.L.P. México
| | - Edgar A. Cerda-Méndez
- Instituto de Investigación en Comunicación Óptica Universidad Autónoma de San Luis Potosí San Luis Potosí, San Luis, S.L.P. México
| | | | - Andres De Luna Bugallo
- Departamento de Nanotecnología, Centro de Física Aplicada y Tecnología Avanzada, Universidad Nacional Autónoma de México, Querétaro, México
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Samy O, Belmoubarik M, Otsuji T, El Moutaouakil A. A Voltage-Tuned Terahertz Absorber Based on MoS 2/Graphene Nanoribbon Structure. Nanomaterials (Basel) 2023; 13:nano13111716. [PMID: 37299619 DOI: 10.3390/nano13111716] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/18/2023] [Revised: 05/07/2023] [Accepted: 05/19/2023] [Indexed: 06/12/2023]
Abstract
Terahertz frequency has promising applications in communication, security scanning, medical imaging, and industry. THz absorbers are one of the required components for future THz applications. However, nowadays, obtaining a high absorption, simple structure, and ultrathin absorber is a challenge. In this work, we present a thin THz absorber that can be easily tuned through the whole THz range (0.1-10 THz) by applying a low gate voltage (<1 V). The structure is based on cheap and abundant materials (MoS2/graphene). Nanoribbons of MoS2/graphene heterostructure are laid over a SiO2 substrate with an applied vertical gate voltage. The computational model shows that we can achieve an absorptance of approximately 50% of the incident light. The absorptance frequency can be tuned through varying the structure and the substrate dimensions, where the nanoribbon width can be varied approximately from 90 nm to 300 nm, while still covering the whole THz range. The structure performance is not affected by high temperatures (500 K and above), so it is thermally stable. The proposed structure represents a low-voltage, easily tunable, low-cost, and small-size THz absorber that can be used in imaging and detection. It is an alternative to expensive THz metamaterial-based absorbers.
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Affiliation(s)
- Omnia Samy
- College of Engineering, United Arab University, Al Ain P.O. Box 15551, United Arab Emirates
| | - Mohamed Belmoubarik
- International Iberian Nanotechnology Laboratory, INL, Av. Mestre José Veiga s/n, 4715-330 Braga, Portugal
| | - Taiichi Otsuji
- Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
| | - Amine El Moutaouakil
- College of Engineering, United Arab University, Al Ain P.O. Box 15551, United Arab Emirates
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Quan C, Xing X, Jia T, Zhang Z, Wang C, Huang S, Liu Z, Du J, Leng Y. Hot Carrier Transfer in PtSe 2/Graphene Enabled by the Hot Phonon Bottleneck. J Phys Chem Lett 2022; 13:9456-9463. [PMID: 36197092 DOI: 10.1021/acs.jpclett.2c02378] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/16/2023]
Abstract
The charge transfer (CT) process of two-dimensional (2D) graphene/transition metal dichalcogenides (TMDs) heterostructures makes the photoelectric conversion ability of TMDs into a wider spectral range for the light harvester and photoelectric detector applications. However, the direct in situ investigation of the hot carrier transport in graphene/TMDs heterostructures has been rarely reported. Herein, using the optical pump and a terahertz (THz) probe (OPTP) spectroscopy, the CT process from graphene to five-layer PtSe2 in the PtSe2/graphene (P/G) heterostructure is demonstrated to be related to the pump fluence, which is enabled by the hot phonon bottleneck (HPB) effect in graphene. Furthermore, the frequency dispersion conductivity and the THz emission spectroscopy of the P/G heterostructure confirmed the existence of interlayer CT and its pump fluence-dependent behavior. Our results provide in-depth physical insights into the CT mechanism at the P/G van der Waals interface, which is crucial for further exploration of optoelectronic devices based on P/G heterostructures.
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Affiliation(s)
- Chenjing Quan
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai201800, People's Republic of China
- School of Physics Science and Engineering, Tongji University, Shanghai200092, People's Republic of China
| | - Xiao Xing
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai201800, People's Republic of China
| | - Tingyuan Jia
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai201800, People's Republic of China
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, Zhejiang310024, People's Republic of China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing100049, People's Republic of China
| | - Zeyu Zhang
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai201800, People's Republic of China
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, Zhejiang310024, People's Republic of China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing100049, People's Republic of China
| | - Chunwei Wang
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai201800, People's Republic of China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing100049, People's Republic of China
| | - Sihao Huang
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai201800, People's Republic of China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing100049, People's Republic of China
| | - Zhengzheng Liu
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai201800, People's Republic of China
| | - Juan Du
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai201800, People's Republic of China
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, Zhejiang310024, People's Republic of China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing100049, People's Republic of China
| | - Yuxin Leng
- State Key Laboratory of High Field Laser Physics and CAS Center for Excellence in Ultra-intense Laser Science, Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences (CAS), Shanghai201800, People's Republic of China
- School of Physics Science and Engineering, Tongji University, Shanghai200092, People's Republic of China
- Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, Zhejiang310024, People's Republic of China
- Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing100049, People's Republic of China
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Kumar S, Kumar S. Large interfacial contribution to ultrafast THz emission by inverse spin Hall effect in CoFeB/Ta heterostructure. iScience 2022. [PMID: 35865133 PMCID: PMC9293784 DOI: 10.1016/j.isci.2022.104718] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/21/2022] [Revised: 05/30/2022] [Accepted: 06/29/2022] [Indexed: 11/24/2022] Open
Abstract
Ultrafast THz radiation generation from ferromagnetic/nonmagnetic (FM/NM) spintronic heterostructures generally exploits the spin-charge conversion within the nonmagnetic layer and its interface with the ferromagnetic layer. Various possible sub-contributions to the underlying mechanism need to be exploited not only for investigating the intricacies at the fundamental level in the material properties themselves but also for improving their performance for broadband and high-power THz emission. Here, we report ultrafast THz emission from (CoFeB,Fe)/(Ta,Pt) bilayers at varying sample temperatures to unravel the role of intrinsic and extrinsic spin-charge conversion processes through the extracted values of spin-Hall conductivities. An enhanced THz emission along with temperature-dependent THz signal polarity reversal is observed in the case of annealed CoFeB/Ta. These results demonstrate a large interfacial contribution to the overall spin-Hall angle arising from the modified interface in the annealed CoFeB/Ta. Temperature-dependent THz emission from spintronic heterostructures THz polarity reversal at a certain temperature in the annealed CoFeB/Ta Determination of spin-Hall conductivity from the efficiency of THz emission Distinguishing the intrinsic/extrinsic contributions to spin-charge conversion
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Degert J, Tondusson M, Freysz V, Abraham E, Kumar S, Freysz E. Ultrafast, broadband and tunable terahertz reflector and neutral density filter based on high resistivity silicon. Opt Express 2022; 30:18995-19004. [PMID: 36221687 DOI: 10.1364/oe.456012] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/11/2022] [Accepted: 04/12/2022] [Indexed: 06/16/2023]
Abstract
We report THz transmission and reflection properties of an ultrafast optically excited highly resistive silicon wafer. Amplified Ti:Sapphire femtosecond laser pulses at 800 nm were used to create fluence-dependent carrier density on the front surface of the wafer which modifies the dielectric properties at the THz frequencies. Time-resolved experiments in the optical pump-THz probe configuration were conducted in which THz pulses reflected off from the surface at 0° and 45° angles of incidence make it possible to measure the pump-fluence dependent ultrafast evolution of the reflection and transmission coefficients in 0.5-6 THz range. An analytical model, where both the Drude contributions from the photo-excited electrons and holes account for the change of the dielectric constant of the photo-excited silicon, has been used to evaluate the THz reflection and transmission coefficients at steady state. Thus obtained results match well with the experimental results and demonstrate an all-optical means to convert a silicon wafer into an ultrafast, tunable and broadband neutral density filter or reflector in the THz frequency range.
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