Chlorine oxide radical (ClO) enables the enhanced degradation of antibiotic resistance genes during UV/chlorine treatment by selectively inducing base damage

Mechanistic Aspects of Photodegradation of Deoxynucleosides Induced by Triplet State of Effluent Organic Matter

Excited triplet states of wastewater effluent organic matter (3EfOM*) are known as important photo-oxidants in the degradation of extracellular antibiotic resistance genes (eArGs) in sunlit waters. In this work, we further found that 3EfOM* showed highly selective reactivity toward 2'-deoxyguanosine (dG) sites within eArGs in irradiated EfOM solutions at pH 7.0, while it showed no photosensitizing capacity toward 2'-deoxyadenosine, 2'-deoxythymidine, and 2'-deoxycytidine (the basic structures of eArGs). The 3EfOM* contributed to the photooxidation of dG primarily via one-electron transfer mechanism, with second-order reaction rate constants of (1.58-1.74) × 108 M-1 s-1, forming the oxidation intermediates of dG (dG(-H)•). The formed dG(-H)• could play a significant role in hole hopping and damage throughout eArGs. Using the four deoxynucleosides as probes, the upper limit for the reduction potential of 3EfOM* is estimated to be between 1.47 and 1.94 VNHE. Compared to EfOM, the role of the triplet state of terrestrially natural organic matter (3NOM*) in dG photooxidation was minor (∼15%) mainly due to the rapid reverse reactions of dG(-H)• by the antioxidant moieties of NOM. This study advances our understanding of the difference in the photosensitizing capacity and electron donating capacity between NOM and EfOM and the photodegradation mechanism of eArGs induced by 3EfOM*.

Oxidant-mediated radical reactions of the azole fungicide TEB in aquatic media: Degradation mechanism and toxicity evolution

The degradation of tebuconazole (TEB) by UV/H2O2, UV/NaClO, and ozonation was investigated in this research. The experimental findings unveiled that under the specified conditions, the degradation percentages of TEB were raised to 99% within 40 s, 5 min, and 3 min for UV/H2O2, UV/NaClO and ozonation, respectively. The mineralization percentages within 1 h were 59%, 31% and 8% for the three AOPs. UV/H2O2 and UV/NaClO technologies mainly acted through OH·, while O3 treatment primarily relied on the free radicals such as 1O2 and O2·-. UV-based AOPs achieved almost complete dechlorination within 1 h, whereas O3 treatment had a less effective dechlorination, reaching only 27.61%. Notably, UV alone achieved a dechlorination percentage of 43.07%. By identifying the TPs, we found that the three AOPs shared three similar degradation pathways. The degradation mechanism of TEB mainly entailed the removal of the benzene ring, tert-butyl group and triazolyl group. Toxicity assessment revealed an initial increase followed by a gradual decrease in toxicity for UV/NaClO and O3 treatments, whereas UV/H2O2 treatment exhibited a sustained decrease. This was due to the presence of TP278 and TP303 by UV/NaClO and TP168 and TP153 by ozonation. After estimating the costs of the three AOPs, UV/H2O2 standed out as the best choice for achieving a 90% degradation percentage and exhibiting lower toxicity performance, while O3 treatment was favored for low TOC demands. These research findings provided valuable reference for understanding the degradation mechanism and developing a new technology of the removal of TEB.