Plasmon excitation in electron energy-loss spectroscopy for determination of indium concentration in (In,Ga)N/GaN nanowires

Anisotropic Piezoelectric Response from InGaN Nanowires with Spatially Modulated Composition and Topography over a Textured Si(100) Substrate

An anisotropic piezoelectric response is demonstrated from InGaN nanowires (NWs) over a pyramid-textured Si(100) substrate with an interfacet composition and topography modulation induced by stationary molecular beam epitaxy growth conditions, taking advantage of the unidirectional source beam flux. The variations of InGaN NWs between the pyramid facets are verified in terms of morphology, element distribution, and crystalline properties. The piezoelectric response is investigated by electrical atomic force microscopy (AFM) with a statistic analyzing method. Representative pyramids from the ensemble, on top of which InGaN NWs grown with a substrate held at an oblique angle, were characterized for understanding and confirming the degree of anisotropy. The positive deviated oscillation of the peak force error is identified as a measure of the effective AFM tip/NW interaction with respect to the electrical contact and mechanical deformation. The Schottky contact between the metal-coated AFM tip and the NWs on the different facets reveals distinctions consistent with the interfacet composition variation. The interfacet variation of the piezoelectric response of the InGaN NWs is first evaluated by electrical AFM under zero bias. The average current monotonically depends on the scan frequency, which determines the average peak force error, that is, mechanical deformation, with a facet characteristic slope. A piezoelectric nanogenerator device is fabricated out of a sample with an ensemble of pyramids, which exhibits anisotropic output under periodic directional pressing. This work provides a universal strategy for the synthesis of composite semiconductor materials with an anisotropic piezoelectric response.

Multi-wavelength light emission from InGaN nanowires on pyramid-textured Si(100) substrate grown by stationary plasma-assisted molecular beam epitaxy

We demonstrate multi-wavelength light emission from InGaN nanowires (NWs) monolithically grown on pyramid-textured Si(100) substrates by plasma-assisted molecular beam epitaxy (MBE) under stationary conditions. Taking advantage of the highly unidirectional source material beam fluxes, the In content of the NWs is tuned on the different pyramid facets due to varied incidence angle. This is confirmed by distinct NW morphologies observed by scanning electron microscopy (SEM) and by energy-dispersive X-ray (EDX) element mapping. Photoluminescence and cathodoluminescence (CL) reveal multiple lines originating from InGaN NWs on the different pyramid facets. The anomalous temperature dependence of the emission wavelength results from carrier redistribution between localized or confined states, spontaneously formed within the NWs due to composition fluctuations, verified by high-resolution EDX elemental analysis. First-principles calculations show that the pyramid facet edges act as a barrier for atom migration and enhance atom incorporation. This leads to uniform composition within the facets for not too high a growth temperature, consistent with the SEM, EDX and CL results. At elevated temperature, InGaN decomposition and In desorption are enhanced on facets with low growth rate, accompanied by Ga inter-facet migration, leading to non-uniform composition over the Ga migration length which is deduced to be around 580 nm. Our study presents a method for the fabrication of multi-wavelength light sources by highly unidirectional MBE on textured Si substrates towards color temperature-tunable solid-state lighting and RGB light-emitting diode displays.

Measurement of Diffusion and Segregation in Semiconductor Quantum Dots and Quantum Wells by Transmission Electron Microscopy: A Guide

Strategies are discussed to distinguish interdiffusion and segregation and to measure key parameters such as diffusivities and segregation lengths in semiconductor quantum dots and quantum wells by electron microscopy methods. Spectroscopic methods are usually necessary when the materials systems are complex while imaging methods may suffice for binary or simple ternary compounds where atomic intermixing is restricted to one type of sub-lattice. The emphasis on methodology should assist microscopists in evaluating and quantifying signals from electron micrographs and related spectroscopic data. Examples presented include CdS/ZnS core/shell particles and SiGe, InGaAs and InGaN quantum wells.

Dopant-Induced Modifications of Ga xIn(1- x)P Nanowire-Based p-n Junctions Monolithically Integrated on Si(111)

Today, silicon is the most used material in photovoltaics, with the maximum conversion efficiency getting very close to the Shockley-Queisser limit for single-junction devices. Integrating silicon with higher band-gap ternary III-V absorbers is the path to increase the conversion efficiency. Here, we report on the first monolithic integration of Ga _xIn_{(1- x)}P vertical nanowires, and the associated p-n junctions, on silicon by the Au-free template-assisted selective epitaxy (TASE) method. We demonstrate that TASE allows for a high chemical homogeneity of ternary alloys through the nanowires. We then show the influence of doping on the chemical composition and crystal phase, the latter previously attributed to the role of the contact angle in the liquid phase in the vapor-liquid-solid technique. Finally, the emission of the p-n junction is investigated, revealing a shift in the energy of the intraband levels due to the incorporation of dopants. These results clarify some open questions on the effects of doping on ternary III-V nanowire growth and provide the path toward their integration on the silicon platform in order to apply them in next-generation photovoltaic and optoelectronic devices.

Electron energy loss spectroscopy on semiconductor heterostructures for optoelectronics and photonics applications

In this work, we present characterization methods for the analysis of nanometer-sized devices, based on silicon and III-V nitride semiconductor materials. These methods are devised in order to take advantage of the aberration corrected scanning transmission electron microscope, equipped with a monochromator. This set-up ensures the necessary high spatial and energy resolution for the characterization of the smallest structures. As with these experiments, we aim to obtain chemical and structural information, we use electron energy loss spectroscopy (EELS). The low-loss region of EELS is exploited, which features fundamental electronic properties of semiconductor materials and facilitates a high data throughput. We show how the detailed analysis of these spectra, using theoretical models and computational tools, can enhance the analytical power of EELS. In this sense, initially, results from the model-based fit of the plasmon peak are presented. Moreover, the application of multivariate analysis algorithms to low-loss EELS is explored. Finally, some physical limitations of the technique, such as spatial delocalization, are mentioned.

Light-emitting-diodes based on ordered InGaN nanocolumns emitting in the blue, green and yellow spectral range

The growth of ordered arrays of InGaN/GaN nanocolumnar light emitting diodes by molecular beam epitaxy, emitting in the blue (441 nm), green (502 nm), and yellow (568 nm) spectral range is reported. The device active region, consisting of a nanocolumnar InGaN section of nominally constant composition and 250 to 500 nm length, is free of extended defects, which is in strong contrast to InGaN (planar) layers of similar composition and thickness. Electroluminescence spectra show a very small blue shift with increasing current (almost negligible in the yellow device) and line widths slightly broader than those of state-of-the-art InGaN quantum wells.