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For: Mahan AH, Mason A, Nelson BP, Gallagher AC. The Influence of W Filament Alloying on the Electronic Properties of Hwcvd Deposited a-Si:H Films. ACTA ACUST UNITED AC 2011. [DOI: 10.1557/proc-609-a6.6] [Citation(s) in RCA: 20] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/13/2022]
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