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Meisenheimer PB, Steinhardt RA, Sung SH, Williams LD, Zhuang S, Nowakowski ME, Novakov S, Torunbalci MM, Prasad B, Zollner CJ, Wang Z, Dawley NM, Schubert J, Hunter AH, Manipatruni S, Nikonov DE, Young IA, Chen LQ, Bokor J, Bhave SA, Ramesh R, Hu JM, Kioupakis E, Hovden R, Schlom DG, Heron JT. Engineering new limits to magnetostriction through metastability in iron-gallium alloys. Nat Commun 2021; 12:2757. [PMID: 33980848 PMCID: PMC8115637 DOI: 10.1038/s41467-021-22793-x] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.7] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/21/2020] [Accepted: 03/30/2021] [Indexed: 11/09/2022] Open
Abstract
Magnetostrictive materials transduce magnetic and mechanical energies and when combined with piezoelectric elements, evoke magnetoelectric transduction for high-sensitivity magnetic field sensors and energy-efficient beyond-CMOS technologies. The dearth of ductile, rare-earth-free materials with high magnetostrictive coefficients motivates the discovery of superior materials. Fe1-xGax alloys are amongst the highest performing rare-earth-free magnetostrictive materials; however, magnetostriction becomes sharply suppressed beyond x = 19% due to the formation of a parasitic ordered intermetallic phase. Here, we harness epitaxy to extend the stability of the BCC Fe1-xGax alloy to gallium compositions as high as x = 30% and in so doing dramatically boost the magnetostriction by as much as 10x relative to the bulk and 2x larger than canonical rare-earth based magnetostrictors. A Fe1-xGax - [Pb(Mg1/3Nb2/3)O3]0.7-[PbTiO3]0.3 (PMN-PT) composite magnetoelectric shows robust 90° electrical switching of magnetic anisotropy and a converse magnetoelectric coefficient of 2.0 × 10-5 s m-1. When optimally scaled, this high coefficient implies stable switching at ~80 aJ per bit.
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Affiliation(s)
- P B Meisenheimer
- Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA
| | - R A Steinhardt
- Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA
| | - S H Sung
- Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA
| | - L D Williams
- Department of Materials Design and Innovation, University at Buffalo - The State University of New York, Buffalo, NY, USA
| | - S Zhuang
- Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI, USA
| | - M E Nowakowski
- Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA
| | - S Novakov
- Department of Physics, University of Michigan, Ann Arbor, MI, USA
| | - M M Torunbalci
- OxideMEMS Lab, Purdue University, West Lafayette, IN, USA
| | - B Prasad
- Department of Materials Science and Engineering, University of California, Berkeley, CA, USA
| | - C J Zollner
- School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA
| | - Z Wang
- School of Applied and Engineering Physics, Cornell University, Ithaca, NY, USA
| | - N M Dawley
- Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA
| | - J Schubert
- Peter Grünberg Institute (PGI-9) and JARA Fundamentals of Future Information Technology, Forschungszentrum Jülich GmbH, Jülich, Germany
| | - A H Hunter
- Michigan Center for Materials Characterization, University of Michigan, Ann Arbor, MI, USA
| | - S Manipatruni
- Components Research, Intel Corporation, Hillsboro, OR, USA
| | - D E Nikonov
- Components Research, Intel Corporation, Hillsboro, OR, USA
| | - I A Young
- Components Research, Intel Corporation, Hillsboro, OR, USA
| | - L Q Chen
- Department of Materials Science and Engineering, Penn State University, State College, PA, USA
| | - J Bokor
- Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA
| | - S A Bhave
- OxideMEMS Lab, Purdue University, West Lafayette, IN, USA
| | - R Ramesh
- Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.,Materials Sciences Division, Lawrence Berkeley National Laboratory, CA, USA.,Department of Physics, University of California, Berkeley, CA, USA
| | - J-M Hu
- Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI, USA
| | - E Kioupakis
- Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA
| | - R Hovden
- Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA
| | - D G Schlom
- Department of Materials Science and Engineering, Cornell University, Ithaca, NY, USA.,Kavli Institute at Cornell for Nanoscale Science, Ithaca, NY, USA.,Leibniz-Institut für Kristallzüchtung, Max-Born-Str. 2, Berlin, Germany
| | - J T Heron
- Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA.
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