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Kokkonen E, Kaipio M, Nieminen HE, Rehman F, Miikkulainen V, Putkonen M, Ritala M, Huotari S, Schnadt J, Urpelainen S. Ambient pressure x-ray photoelectron spectroscopy setup for synchrotron-based in situ and operando atomic layer deposition research. Rev Sci Instrum 2022; 93:013905. [PMID: 35104956 DOI: 10.1063/5.0076993] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/29/2021] [Accepted: 12/28/2021] [Indexed: 06/14/2023]
Abstract
An ambient pressure cell is described for conducting synchrotron-based x-ray photoelectron spectroscopy (XPS) measurements during atomic layer deposition (ALD) processes. The instrument is capable of true in situ and operando experiments in which it is possible to directly obtain elemental and chemical information from the sample surface using XPS as the deposition process is ongoing. The setup is based on the ambient pressure XPS technique, in which sample environments with high pressure (several mbar) can be created without compromising the ultrahigh vacuum requirements needed for the operation of the spectrometer and the synchrotron beamline. The setup is intended for chemical characterization of the surface intermediates during the initial stages of the deposition processes. The SPECIES beamline and the ALD cell provide a unique experimental platform for obtaining new information on the surface chemistry during ALD half-cycles at high temporal resolution. Such information is valuable for understanding the ALD reaction mechanisms and crucial in further developing and improving ALD processes. We demonstrate the capabilities of the setup by studying the deposition of TiO2 on a SiO2 surface by using titanium(IV) tetraisopropoxide and water as precursors. Multiple core levels and the valence band of the substrate surface were followed during the film deposition using ambient pressure XPS.
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Affiliation(s)
- E Kokkonen
- MAX IV Laboratory, Lund University, Box 118, 221 00 Lund, Sweden
| | - M Kaipio
- Department of Chemistry, University of Helsinki, FI-00014 Helsinki, Finland
| | - H-E Nieminen
- Department of Chemistry, University of Helsinki, FI-00014 Helsinki, Finland
| | - F Rehman
- Division of Synchrotron Radiation Research, Department of Physics, Lund University, P.O. Box 118, 221 00 Lund, Sweden
| | - V Miikkulainen
- Department of Chemistry and Materials Science, Aalto University, 00076 Aalto, Finland
| | - M Putkonen
- Department of Chemistry, University of Helsinki, 00014 Helsinki, Finland
| | - M Ritala
- Department of Chemistry, University of Helsinki, 00014 Helsinki, Finland
| | - S Huotari
- Department of Physics, University of Helsinki, 00014 Helsinki, Finland
| | - J Schnadt
- MAX IV Laboratory, Lund University, Box 118, 221 00 Lund, Sweden
| | - S Urpelainen
- Nano and Molecular Systems Research Unit, University of Oulu, 90014 Oulu, Finland
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David C, Gorelick S, Rutishauser S, Krzywinski J, Vila-Comamala J, Guzenko VA, Bunk O, Färm E, Ritala M, Cammarata M, Fritz DM, Barrett R, Samoylova L, Grünert J, Sinn H. Author Correction: Nanofocusing of hard X-ray free electron laser pulses using diamond based Fresnel zone plates. Sci Rep 2020; 10:6282. [PMID: 32269231 PMCID: PMC7142139 DOI: 10.1038/s41598-020-62784-4] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Download PDF] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/13/2022] Open
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Autere A, Karvonen L, Säynätjoki A, Roussey M, Färm E, Kemell M, Tu X, Liow TY, Lo GQ, Ritala M, Leskelä M, Honkanen S, Lipsanen H, Sun Z. Slot waveguide ring resonators coated by an atomic layer deposited organic/inorganic nanolaminate. Opt Express 2015; 23:26940-26951. [PMID: 26480355 DOI: 10.1364/oe.23.026940] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
In this study, slot waveguide ring resonators patterned on a silicon-on-insulator (SOI) wafer and coated with an atomic layer deposited nanolaminate consisting of alternating layers of tantalum pentoxide and polyimide were fabricated and characterized. To the best of our knowledge, this is the first demonstration of atomic layer deposition (ALD) of organic materials in waveguiding applications. In our nanolaminate ring resonators, the optical power is not only confined in the narrow central air slot but also in several parallel sub-10 nm wide vertical polyimide slots. This indicates that the mode profiles in the silicon slot waveguide can be accurately tuned by the ALD method. Our results show that ALD of organic and inorganic materials can be combined with conventional silicon waveguide fabrication techniques to create slot waveguide ring resonators with varying mode profiles. This can potentially open new possibilities for various photonic applications, such as optical sensing and all-optical signal processing.
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David C, Gorelick S, Rutishauser S, Krzywinski J, Vila-Comamala J, Guzenko VA, Bunk O, Färm E, Ritala M, Cammarata M, Fritz DM, Barrett R, Samoylova L, Grünert J, Sinn H. Nanofocusing of hard X-ray free electron laser pulses using diamond based Fresnel zone plates. Sci Rep 2011; 1:57. [PMID: 22355576 PMCID: PMC3216544 DOI: 10.1038/srep00057] [Citation(s) in RCA: 115] [Impact Index Per Article: 8.8] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/17/2011] [Accepted: 07/15/2011] [Indexed: 11/18/2022] Open
Abstract
A growing number of X-ray sources based on the free-electron laser (XFEL) principle are presently under construction or have recently started operation. The intense, ultrashort pulses of these sources will enable new insights in many different fields of science. A key problem is to provide x-ray optical elements capable of collecting the largest possible fraction of the radiation and to focus into the smallest possible focus. As a key step towards this goal, we demonstrate here the first nanofocusing of hard XFEL pulses. We developed diamond based Fresnel zone plates capable of withstanding the full beam of the world's most powerful x-ray laser. Using an imprint technique, we measured the focal spot size, which was limited to 320 nm FWHM by the spectral band width of the source. A peak power density in the focal spot of 4×1017 W/cm2 was obtained at 70 fs pulse length.
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Affiliation(s)
- C David
- Paul Scherrer Institut, CH-5232 Villigen, Switzerland.
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Nygård K, Gorelick S, Vila-Comamala J, Färm E, Bergamaschi A, Cervellino A, Gozzo F, Patterson BD, Ritala M, David C. Beam-induced damage on diffractive hard X-ray optics. J Synchrotron Radiat 2010; 17:786-90. [PMID: 20975225 PMCID: PMC2964115 DOI: 10.1107/s0909049510028487] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/25/2010] [Accepted: 07/16/2010] [Indexed: 05/30/2023]
Abstract
The issue of beam-induced damage on diffractive hard X-ray optics is addressed. For this purpose a systematic study on the radiation damage induced by a high-power X-ray beam is carried out in both ambient and inert atmospheres. Diffraction gratings fabricated by three different techniques are considered: electroplated Au gratings both with and without the polymer mold, and Ir-coated Si gratings. The beam-induced damage is monitored by X-ray diffraction and evaluated using scanning electron microscopy.
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Affiliation(s)
- K Nygård
- Paul Scherrer Institut, CH-5232 Villigen PSI, Switzerland.
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Vila-Comamala J, Jefimovs K, Pilvi T, Ritala M, Sarkar SS, Solak HH, Guzenko VA, Stampanoni M, Marone F, Raabe J, Tzvetkov G, Fink RH, Grolimund D, Borca CN, Kaulich B, David C. Advanced X-ray diffractive optics. ACTA ACUST UNITED AC 2009. [DOI: 10.1088/1742-6596/186/1/012078] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/12/2022]
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Ritala M, Jungersen O, Holm P, Schæfer T, Kristensen HG. A Comparison Between Binders in the Wet Phase of Granulation in a High Shear Mixer. Drug Dev Ind Pharm 2008. [DOI: 10.3109/03639048609042603] [Citation(s) in RCA: 30] [Impact Index Per Article: 1.9] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/13/2022]
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Ritala M, Holm P, Schaefer T, Kristensen HG. Influence of Liquid Bonding Strength on Power Consumption During Granulation in a High Shear Mixer. Drug Dev Ind Pharm 2008. [DOI: 10.3109/03639048809151919] [Citation(s) in RCA: 56] [Impact Index Per Article: 3.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/13/2022]
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Suni N, Haapala M, Mäkinen A, Sainiemi L, Franssila S, Färm E, Puukilainen E, Ritala M, Yli-Kauhaluoma J, Kostiainen R. Selective surface patterning with electric discharge. Eur J Pharm Sci 2008. [DOI: 10.1016/j.ejps.2008.02.104] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
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Jefimovs K, Vila-Comamala J, Pilvi T, Raabe J, Ritala M, David C. Zone-doubling technique to produce ultrahigh-resolution x-ray optics. Phys Rev Lett 2007; 99:264801. [PMID: 18233580 DOI: 10.1103/physrevlett.99.264801] [Citation(s) in RCA: 68] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/18/2007] [Indexed: 05/25/2023]
Abstract
A method for the fabrication of ultrahigh-resolution Fresnel zone plate lenses for x-ray microscopy is demonstrated. It is based on the deposition of a zone plate material (Ir) onto the sidewalls of a prepatterned template structure (Si) using an atomic layer deposition technique. This results in a doubling of the effective zone density, thus improving the achievable resolution of x-ray microscopes. Test structures with lines and spaces down to 15 nm were resolved in a scanning transmission x-ray microscope at 1 keV photon energy.
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Affiliation(s)
- K Jefimovs
- Paul Scherrer Institut, CH-5232 Villigen PSI, Switzerland and EMPA, CH-8600 Dübendorf, Switzerland
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Niskanen A, Hatanpää T, Arstila K, Leskelä M, Ritala M. Radical-Enhanced Atomic Layer Deposition of Silver Thin Films Using Phosphine-Adducted Silver Carboxylates. ACTA ACUST UNITED AC 2007. [DOI: 10.1002/cvde.200606519] [Citation(s) in RCA: 61] [Impact Index Per Article: 3.6] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/10/2022]
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Vehkamäki M, Hatanpää T, Ritala M, Leskelä M, Väyrynen S, Rauhala E. Atomic Layer Deposition of BaTiO3 Thin Films—Effect of Barium Hydroxide Formation. ACTA ACUST UNITED AC 2007. [DOI: 10.1002/cvde.200606538] [Citation(s) in RCA: 48] [Impact Index Per Article: 2.8] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/10/2022]
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Ritala M, Kemell M, Lautala M, Niskanen A, Leskelä M, Lindfors S. Rapid Coating of Through-Porous Substrates by Atomic Layer Deposition. ACTA ACUST UNITED AC 2006. [DOI: 10.1002/cvde.200604228] [Citation(s) in RCA: 28] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/06/2022]
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Kemell M, Pore V, Ritala M, Leskelä M. Ir/Oxide/Cellulose Composites for Catalytic Purposes Prepared by Atomic Layer Deposition. ACTA ACUST UNITED AC 2006. [DOI: 10.1002/cvde.200604224] [Citation(s) in RCA: 40] [Impact Index Per Article: 2.2] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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Färm E, Kemell M, Ritala M, Leskelä M. Self-Assembled Octadecyltrimethoxysilane Monolayers Enabling Selective-Area Atomic Layer Deposition of Iridium. ACTA ACUST UNITED AC 2006. [DOI: 10.1002/cvde.200604219] [Citation(s) in RCA: 57] [Impact Index Per Article: 3.2] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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Kukli K, Ritala M, Pore V, Leskelä M, Sajavaara T, Hegde R, Gilmer D, Tobin P, Jones A, Aspinall H. Atomic Layer Deposition and Properties of Lanthanum Oxide and Lanthanum-Aluminum Oxide Films. ACTA ACUST UNITED AC 2006. [DOI: 10.1002/cvde.200506388] [Citation(s) in RCA: 51] [Impact Index Per Article: 2.8] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/12/2022]
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Harjuoja J, Hatanpää T, Vehkamäki M, Väyrynen S, Putkonen M, Niinistö L, Ritala M, Leskelä M, Rauhala E. New Approach to the ALD of Bismuth Silicates; Bi(CH2SiMe3)3 Acting as a Precursor for both Bismuth and Silicon. ACTA ACUST UNITED AC 2005. [DOI: 10.1002/cvde.200506378] [Citation(s) in RCA: 17] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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Aaltonen T, Ritala M, Arstila K, Keinonen J, Leskelä M. Atomic Layer Deposition of Ruthenium Thin Films from Ru(thd)3 and Oxygen. ACTA ACUST UNITED AC 2004. [DOI: 10.1002/cvde.200306288] [Citation(s) in RCA: 128] [Impact Index Per Article: 6.4] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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Pore V, Rahtu A, Leskelä M, Ritala M, Sajavaara T, Keinonen J. Atomic Layer Deposition of Photocatalytic TiO2 Thin Films from Titanium Tetramethoxide and Water. ACTA ACUST UNITED AC 2004. [DOI: 10.1002/cvde.200306289] [Citation(s) in RCA: 192] [Impact Index Per Article: 9.6] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/11/2022]
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Kukli K, Ritala M, Leskelä M, Sajavaara T, Keinonen J, Jones A, Tobin N. Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Hydroxylamide and Water. ACTA ACUST UNITED AC 2004. [DOI: 10.1002/cvde.200306281] [Citation(s) in RCA: 26] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/08/2022]
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Kukli K, Ritala M, Leskelä M, Sajavaara T, Keinonen J, Jones A, Roberts J. Atomic Layer Deposition of Hafnium Dioxide Films Using Hafnium Bis(2-butanolate)bis(1-methoxy-2-methyl-2-propanolate) and Water. ACTA ACUST UNITED AC 2003. [DOI: 10.1002/cvde.200306263] [Citation(s) in RCA: 41] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/05/2022]
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Vehkamäki M, Hänninen T, Ritala M, Leskelä M, Sajavaara T, Rauhala E, Keinonen J. Atomic Layer Deposition of SrTiO3 Thin Films from a Novel Strontium Precursor-Strontium-bis(tri-isopropyl cyclopentadienyl). ACTA ACUST UNITED AC 2001. [DOI: 10.1002/1521-3862(200103)7:2<75::aid-cvde75>3.0.co;2-b] [Citation(s) in RCA: 97] [Impact Index Per Article: 4.2] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/08/2022]
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Ritala M, Kukli K, Rahtu A, Raisanen PI, Leskela M, Sajavaara T, Keinonen J. Atomic layer deposition of oxide thin films with metal alkoxides as oxygen sources. Science 2000; 288:319-21. [PMID: 10764641 DOI: 10.1126/science.288.5464.319] [Citation(s) in RCA: 417] [Impact Index Per Article: 17.4] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/02/2022]
Abstract
A chemical approach to atomic layer deposition (ALD) of oxide thin films is reported here. Instead of using water or other compounds for an oxygen source, oxygen is obtained from a metal alkoxide, which serves as both an oxygen and a metal source when it reacts with another metal compound such as a metal chloride or a metal alkyl. These reactions generally enable deposition of oxides of many metals. With this approach, an alumina film has been deposited on silicon without creating an interfacial silicon oxide layer that otherwise forms easily. This finding adds to the other benefits of the ALD method, especially the atomic-level thickness control and excellent uniformity, and takes a major step toward the scientifically challenging and technologically important task of replacing silica as the gate dielectric in the future generations of metal oxide semiconductor field effect transistors.
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Affiliation(s)
- M Ritala
- Department of Chemistry, University of Helsinki, Post Office Box 55, FIN-00014 University of Helsinki, Finland. Accelerator Laboratory, University of Helsinki, Post Office Box 43, FIN-00014 University of Helsinki, Finland
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Matero R, Ritala M, Leskelä M, Salo T, Aromaa J, Forsén O. Atomic layer deposited thin films for corrosion protection. ACTA ACUST UNITED AC 1999. [DOI: 10.1051/jp4:1999862] [Citation(s) in RCA: 65] [Impact Index Per Article: 2.6] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/14/2022]
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Ritala M, Juppo M, Kukli K, Rahtu A, Leskelä M. In situ characterization of atomic layer deposition processes by a mass spectrometer. ACTA ACUST UNITED AC 1999. [DOI: 10.1051/jp4:19998127] [Citation(s) in RCA: 21] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/14/2022]
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Jokinen M, Pätsi M, Rahiala H, Peltola T, Ritala M, Rosenholm JB. Influence of sol and surface properties on in vitro bioactivity of sol-gel-derived TiO2 and TiO2-SiO2 films deposited by dip-coating method. J Biomed Mater Res 1998; 42:295-302. [PMID: 9773826 DOI: 10.1002/(sici)1097-4636(199811)42:2<295::aid-jbm15>3.0.co;2-i] [Citation(s) in RCA: 112] [Impact Index Per Article: 4.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/08/2022]
Abstract
Different sol-gel-derived titania and titania-silica films were prepared and their properties related to in vitro bioactivity. The films were prepared by depositing the sols on the substrate surface using a dip-coating method. The sols were monitored carefully as a function of time, using rheological techniques and dynamic light scattering. The topography of the films was characterized using atomic force microscopy, and thicknesses and refractive indexes of the films were evaluated by fitting transmittance spectra measured in a wave length region of 370-1100 nm with a spectrophotometer. The in vitro bioactivity tests were performed in simulated body fluid. Surface topography was found to be of great importance with respect to the bioactivity of the studied films.
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Affiliation(s)
- M Jokinen
- Department of Physical Chemistry, Abo Akademi University, Turku, Finland
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Kukli K, Ritala M, Leskelä M. Properties of (Nb1 − xTax)2O5 solid solutions and (Nb1 − xTax)2O5-ZrO2 nanolaminates grown by Atomic Layer Epitaxy. ACTA ACUST UNITED AC 1997. [DOI: 10.1016/s0965-9773(98)00003-8] [Citation(s) in RCA: 30] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/18/2022]
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