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Ji X, Zhang J, Zhang G, Li N, Wang R, Lin H, Duan X. Dual interfacing with metallic cobalt boosts the electron shuttle of CdS-carbide nanoassemblies. J Colloid Interface Sci 2024;660:810-822. [PMID: 38277838 DOI: 10.1016/j.jcis.2024.01.142] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/13/2023] [Revised: 01/07/2024] [Accepted: 01/21/2024] [Indexed: 01/28/2024]
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