Effects of bromide ion on the formation and toxicity alteration of halonitromethanes from nitrate containing humic acid water during UV/chlor(am)ine disinfection

UV/chlor(am)ine are efficient for achieving multiple-barrier disinfection and maintaining residuals, while bromide (Br^-) has notable impacts on the formation and toxicity of halonitromethanes (HNMs) during UV/chlor(am)ine disinfection. This study investigated the effects of Br^- on HNMs formation and toxicity alteration during UV/chlor(am)ine disinfection of nitrate containing humic acid (HA) water. Results reveal that the maximum concentration of HNMs during UV/chlorine disinfection was 12.03 μg L^-1 with 0.2 mg L^-1 Br^-, which was 22.5% higher than that without Br^-, and the predominant species of HNMs were converted from trichloronitromethane (TCNM) to dibromonitromethane (DBNM) and tribromonitromethane (TBNM). However, the maximum concentration of HNMs during UV/chloramine disinfection was 3.69 μg L^-1 with 0.2 mg L^-1 Br^-, which was increased by 26.0% than that without Br^-, and the predominant species of HNMs were converted from dichloronitromethane (DCNM) to bromochloronitromethane (BCNM) and DBNM. Notably, the HNMs species and yields during UV/chloramine disinfection were less than those during UV/chlorine disinfection, primarily due to the higher concentrations of HO· and reactive chlorine/bromine species in UV/chlorine. Also, in the ranges of the Br^-:Cl₂ molar ratio from 0 to 0.32 and pH from 6.0 to 8.0, the Br^-:Cl₂ molar ratio of 0.16 and acidic pH contributed to the HNMs formation during UV/chlorine disinfection, and a high Br^-:Cl₂ molar ratio and neutral pH contributed to the HNMs formation during UV/chloramine disinfection. Note that the incorporation of Br^- significantly improved the calculated cytotoxicity (CTI) and genotoxicity (GTI) of HNMs formed, and the calculated CTI and GTI of HNMs formed during UV/chloramine disinfection were 28.19 and 48.90% of those during UV/chlorine disinfection. Based on the diversity of nitrogen sources, the possible formation pathways of HNMs from nitrate containing HA water were proposed during UV/chlor(am)ine disinfection in the presence of Br^-. Results of this study indicated that UV/chloramine can reduce the formation and toxicity of HNMs efficiently.

The optimal dose of oxidants in UV-based advanced oxidation processes with respect to primary radical concentrations

UV-based advanced oxidation processes (AOPs) via photolysis of precursor chemical oxidants have been of interest to numerous researchers over the past several decades due to their capacity to generate highly active radical species and interesting radical chemistry. However, applications of UV-based AOPs have been commonly optimized case by case, due to the lack of theoretical investigations on process optimization, especially on oxidant doses. In this study, a simple equation for UV/H₂O₂ (•OH as the sole primary reactive species (PRS)) to obtain the theoretical optimal concentration (C_{opt-theoretical}) for H₂O₂ was derived (C_{opt-theoretical}=A_b·S_cε·k). The equation was then validated for its accuracy in the calculation of C_{opt-theoretical} for H₂O₂ in the UV/H₂O₂ AOP using a well-established comprehensive kinetic model. A competition kinetics method for the measurement of scavenging capacity (S_c, the unknown parameter for the simple equation) was designed, for which nitrobenzene was employed as the probe compound and tert‑butyl alcohol was introduced as the standard compound. Based on this simple equation, we calculated the C_{opt-theoretical} of 77 environmental water samples and introduced the concept of a practical optimal oxidants dose for the UV/H₂O₂ AOP, while minimizing the operation costs in engineering applications. Moreover, this study mathematically proved that the simple equation obtained from UV/H₂O₂ could be successfully extended to other UV-based AOPs, including UV/chlorine, UV/NH₂Cl, UV/S₂O₈^2-, and UV/peracetic acid. The simple equation of C_{opt-theoretical} derived in this study may not only help to provide instructions for engineering applications, but also point out the ultimate treatment capability of each UV-based AOPs.