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Chen Z, Zhang Y, Zhao C, Xia Y, Li Z, Zhou X, Xiao L, Liu X, Zhang Y. Tailoring Graphite into Subnanometer Graphene. Adv Mater 2024; 36:e2310022. [PMID: 38088447 DOI: 10.1002/adma.202310022] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/27/2023] [Revised: 12/01/2023] [Indexed: 01/13/2024]
Abstract
Within the intersection of materials science and nanoscience/technology, extremely downsized (including quantum-sized and subnanometer-sized) materials attract increasing interest. However, the effective and controllable production of extremely downsized materials through physical strategies remains a great challenge. Herein, an all-physical top-down method for the production of sub-1 nm graphene with completely broken lattice is reported. The graphene subnanometer materials (GSNs) with monolayer structures and lateral sizes of ≈0.5 nm are obtained. Compared with their bulk, nanosheets, and quantum sheets, the intrinsic GSNs present extremely enhanced photoluminescence and nonlinear saturation absorption performances, as well as unique carrier behavior. The non-equilibrium states induced by the entirely exposed and broken, intrinsic lattices in sub-1 nm graphene can be determinative to their extreme performances. This work shows the great potential of broken lattice and provides new insights toward subnanometer materials.
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Affiliation(s)
- Zhexue Chen
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
- University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
| | - Yutong Zhang
- University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
- CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
| | - Ce Zhao
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
- University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
| | - Yuexing Xia
- University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
- CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
| | - Zhangqiang Li
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
- University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
| | - Xuanping Zhou
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
- University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
| | - Liuyang Xiao
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
- University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
| | - Xinfeng Liu
- University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
- CAS Key Laboratory of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
| | - Yong Zhang
- CAS Key Laboratory of Nanosystem and Hierarchical Fabrication, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing, 100190, P. R. China
- University of Chinese Academy of Sciences, Beijing, 100049, P. R. China
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Yan T, Hong R, Lian J, Tao C, Lin H, Wang Q, Han Z, Zhang D. Tunable Nonlinear Optical Response of ITO Films with Au@Ag Bimetallic Nanoparticles. Nanomaterials (Basel) 2023; 13:nano13101631. [PMID: 37242047 DOI: 10.3390/nano13101631] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/20/2023] [Revised: 05/08/2023] [Accepted: 05/09/2023] [Indexed: 05/28/2023]
Abstract
The nonlinear optical (NLO) response of indium tin oxide films covered with Au@Ag colloid layer was characterized by a femtosecond single-beam open aperture (OA) Z-scan technique in this study. As the Au@Ag thickness increased, the transition from saturated absorption (SA) to reverse saturated absorption (RSA) was found in these ITO matrix composites. The nonlinear absorption coefficient for these composite materials can be regulated from -6.85 × 10-7 m/W to 26.06 × 10-7 m/W. In addition, this work also characterized the structure, morphology, and other optical properties of the specimen, and the finite-difference time-domain (FDTD) results were consistent with the experimental results. The NLO response of the ITO/Au@Ag composites can be attributed to the phase properties, synergistic competition effect, strong interaction based on the epsilon-near-zero (ENZ) mode, and localized surface plasmon resonance (LSPR) between the indium tin oxide films and Au@Ag.
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Affiliation(s)
- Tingzhen Yan
- Engineering Research Center of Optical Instrument and System, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China
| | - Ruijin Hong
- Engineering Research Center of Optical Instrument and System, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China
| | - Jiqing Lian
- Department of Printing and Pack Aging Engineering, Shanghai Publishing and Printing College, No. 100 Shuifeng Road, Shanghai 200093, China
| | - Chunxian Tao
- Engineering Research Center of Optical Instrument and System, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China
| | - Hui Lin
- Engineering Research Center of Optical Instrument and System, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China
| | - Qi Wang
- Engineering Research Center of Optical Instrument and System, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China
| | - Zhaoxia Han
- Engineering Research Center of Optical Instrument and System, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China
| | - Dawei Zhang
- Engineering Research Center of Optical Instrument and System, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, Shanghai 200093, China
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