1
|
Chang M, Qian J, Li Z, Cheng X, Wang Y, Fan L, Cao J, Ding L. Ku-Band Mixers Based on Random-Oriented Carbon Nanotube Films. Nanomaterials (Basel) 2024; 14:450. [PMID: 38470780 DOI: 10.3390/nano14050450] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/31/2023] [Revised: 02/21/2024] [Accepted: 02/27/2024] [Indexed: 03/14/2024]
Abstract
Carbon nanotubes (CNTs) are a type of nanomaterial that have excellent electrical properties such as high carrier mobility, high saturation velocity, and small inherent capacitance, showing great promise in radio frequency (RF) applications. Decades of development have been made mainly on cut-off frequency and amplification; however, frequency conversion for RF transceivers, such as CNT-based mixers, has been rarely reported. In this work, based on randomly oriented carbon nanotube films, we focused on exploring the frequency conversion capability of CNT-based RF mixers. CNT-based RF transistors were designed and fabricated with a gate length of 50 nm and gate width of 100 μm to obtain nearly 30 mA of total current and 34 mS of transconductance. The Champion RF transistor has demonstrated cut-off frequencies of 78 GHz and 60 GHz for fT and fmax, respectively. CNT-based mixers achieve high conversion gain from -11.4 dB to -17.5 dB at 10 to 15 GHz in the X and Ku bands. Additionally, linearity is achieved with an input third intercept (IIP3) of 18 dBm. It is worth noting that the results from this work have no matching technology or tuning instrument assistance, which lay the foundations for the application of Ku band transceivers integrated with CNT amplifiers.
Collapse
Affiliation(s)
- Mengnan Chang
- Key Laboratory of Luminescence & Optical Information, Ministry of Education, School of Physical Science and Engineering, Beijing Jiaotong University, Beijing 100044, China
| | - Jiale Qian
- Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Xiangtan 411105, China
| | - Zhaohui Li
- Key Laboratory of Luminescence & Optical Information, Ministry of Education, School of Physical Science and Engineering, Beijing Jiaotong University, Beijing 100044, China
| | - Xiaohan Cheng
- Academy for Advanced Interdisciplinary Studies, Peking University, Beijing 100871, China
| | - Ying Wang
- Key Laboratory of Luminescence & Optical Information, Ministry of Education, School of Physical Science and Engineering, Beijing Jiaotong University, Beijing 100044, China
| | - Ling Fan
- Key Laboratory of Luminescence & Optical Information, Ministry of Education, School of Physical Science and Engineering, Beijing Jiaotong University, Beijing 100044, China
| | - Juexian Cao
- Hunan Institute of Advanced Sensing and Information Technology, Xiangtan University, Xiangtan 411105, China
| | - Li Ding
- Key Laboratory for the Physics and Chemistry of Nanodevices and Center for Carbon-Based Electronics, School of Electronics, Peking University, Beijing 100871, China
| |
Collapse
|
2
|
Jeong J, Kim SK, Kim J, Geum DM, Kim D, Jo E, Jeong H, Park J, Jang JH, Choi S, Kwon I, Kim S. Heterogeneous and Monolithic 3D Integration of III-V-Based Radio Frequency Devices on Si CMOS Circuits. ACS Nano 2022; 16:9031-9040. [PMID: 35437991 DOI: 10.1021/acsnano.2c00334] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Next-generation wireless communication such as sixth-generation (6G) and beyond is expected to require high-frequency, multifunctionality, and power-efficiency systems. A III-V compound semiconductor is a promising technology for high-frequency applications, and a Si complementary metal-oxide-semiconductor (CMOS) is the never-beaten technology for highly integrated digital circuits. To harness the advantages of these two technologies, monolithic integration of III-V and Si electronics is beneficial, so that there have been everlasting efforts to accomplish the monolithic integration. Considering that the on horizon 6G wireless communication requires faster and more energy-efficient system-on-chip technologies, it is imperative to realize a radio frequency (RF) system in which III-V technology and Si CMOS technology are integrated at a device level. Here we report heterogeneous and monolithic three-dimensional (3D) analog/RF-digital mixed-signal integrated circuits that contain two types of InGaAs high-electron-mobility transistors (HEMTs) designed for high fT and fMAX in the top and Si CMOS mixed-signal circuits consisting of an analog-to-digital converter and digital-to-analog converter in the bottom. A high unity current gain cutoff frequency of 448 GHz and unity power gain cutoff frequency of 742 GHz have been achieved by the fT oriented and fMAX oriented InGaAs HEMTs, respectively, without being affected by mixed-signal interference. At the same time, the bottom Si CMOS circuits provide valid signals without any performance degradation by the integration process.
Collapse
Affiliation(s)
- Jaeyong Jeong
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Seong Kwang Kim
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Jongmin Kim
- Division of Device Technology, Korea Advanced Nano Fab Center (KANC), Suwon 16229, Republic of Korea
| | - Dae-Myeong Geum
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Duckhyun Kim
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Eunju Jo
- Korea Atomic Energy Research Institute (KAERI), Daejeon 34057, Republic of Korea
| | - Hakcheon Jeong
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Juyeong Park
- School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), Gwangju 61005, Republic of Korea
| | - Jae-Hyung Jang
- School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology (GIST), Gwangju 61005, Republic of Korea
- School of Energy Engineering, Korea Institute of Energy Technology (KENTECH), Naju 58330, Republic of Korea
| | - Shinhyun Choi
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea
| | - Inyong Kwon
- Korea Atomic Energy Research Institute (KAERI), Daejeon 34057, Republic of Korea
- Department of Nuclear and Radiation Safety, Korea University of Science and Technology (UST), Daejeon 34113, Republic of Korea
| | - Sanghyeon Kim
- School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea
| |
Collapse
|
3
|
Yeh CH, Teng PY, Chiu YC, Hsiao WT, Hsu SSH, Chiu PW. Gigahertz Field-Effect Transistors with CMOS-Compatible Transfer-Free Graphene. ACS Appl Mater Interfaces 2019; 11:6336-6343. [PMID: 30652465 DOI: 10.1021/acsami.8b16957] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
High-quality graphene grown on metal-free substrates represents a vital milestone that provides an atomic clean interface and a complementary metal-oxide-semiconductor-compatible manufacturing process for electronic applications. We report a scalable approach to fabricate radio frequency field-effect transistors with a graphene channel grown directly on the sapphire substrate using the technique of remote-catalyzed chemical vapor deposition (CVD). A mushroom-shaped AlO x top gate is used to allow the self-aligned drain/source contacts, yielding remarkable increase of device transconductance and reduction of the associated parasitic resistance. The quality of thus-grown graphene is reflected in the high extrinsic cutoff frequency and maximum oscillation frequency of 10.1 and 5.6 GHz for the graphene channel of length 200 nm and width 80 μm, respectively, potentially comparable with those of transferred CVD graphene at the same channel length and holding promise for applications in high-speed wireless communications.
Collapse
Affiliation(s)
- Chao-Hui Yeh
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| | - Po-Yuan Teng
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| | - Yu-Chiao Chiu
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| | - Wen-Ting Hsiao
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| | - Shawn S H Hsu
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| | - Po-Wen Chiu
- Department of Electrical Engineering , National Tsing Hua University , Hsinchu 30013 , Taiwan
| |
Collapse
|