Resistless EUV lithography: Photon-induced oxide patterning on silicon

In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated silicon (100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due to its high resolution and throughput, but future progress in resolution can be hampered because of the inherent limitations of the resists. We show that EUV photons can induce surface reactions on a partially hydrogen-terminated silicon surface and assist the growth of an oxide layer, which serves as an etch mask. This mechanism is different from the hydrogen desorption in scanning tunneling microscopy-based lithography. We achieve silicon dioxide/silicon gratings with 75-nanometer half-pitch and 31-nanometer height, demonstrating the efficacy of the method and the feasibility of patterning with EUV lithography without the use of a photoresist. Further development of the resistless EUV lithography method can be a viable approach to nanometer-scale lithography by overcoming the inherent resolution and roughness limitations of photoresist materials.

Chirality Nanosensor with Direct Electric Readout by Coupling of Nanofloret Localized Plasmons with Electronic Transport

The detection of enantiopurity for small sample quantities is crucial, particularly in the pharmaceutical industry; however, existing methodologies rely on specific chiral recognition elements, or complex optical systems, limiting its utility. A nanoscale chirality sensor, for continuously monitoring molecular chirality using an electric circuit readout, is presented. This device design represents an alternative real-time scalable approach for chiral recognition of small quantity samples (less than 10³ adsorbed molecules). The active device component relies on a gold nanofloret hybrid structure, i.e., a high aspect ratio semiconductor-metal hybrid nanosystem in which a SiGe nanowire tip is selectively decorated with a gold metallic cap. The tip mechanically touches a counter electrode to generate a nanojunction, and upon exposure to molecules, a metal-molecule-metal junction is formed. Adsorption of chiral molecules at the gold tip induces chirality in the localized plasmonic resonance at the electrode-tip junction and manifests in an enantiospecific current response.

Improved broadband and omnidirectional light absorption in silicon nanopillars achieved through gradient mesoporosity induced leaky waveguide modulation

Omnidirectional and polarization insensitive light coupling through mesoporosity induced waveguiding in Si nanopillars, fabricated by metal assisted chemical etching and nanosphere lithography.