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Azmy A, Zhao X, Angeli GK, Welton C, Raval P, Wojtas L, Zibouche N, Manjunatha Reddy GN, Trikalitis PN, Cai J, Spanopoulos I. One-Year Water-Stable and Porous Bi(III) Halide Semiconductor with Broad-Spectrum Antibacterial Performance. ACS Appl Mater Interfaces 2023; 15:42717-42729. [PMID: 37639320 DOI: 10.1021/acsami.3c06394] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 08/31/2023]
Abstract
Hybrid metal halide semiconductors are a unique family of materials with immense potential for numerous applications. For this to materialize, environmental stability and toxicity deficiencies must be simultaneously addressed. We report here a porous, visible light semiconductor, namely, (DHS)Bi2I8 (DHS = [2.2.2] cryptand), which consists of nontoxic, earth-abundant elements, and is water-stable for more than a year. Gas- and vapor-sorption studies revealed that it can selectively and reversibly adsorb H2O and D2O at room temperature (RT) while remaining impervious to N2 and CO2. Solid-state NMR measurements and density functional theory (DFT) calculations verified the incorporation of H2O and D2O in the molecular cages, validating the porous nature. In addition to porosity, the material exhibits broad band-edge light emission centered at 600 nm with a full width at half-maximum (fwhm) of 99 nm, which is maintained after 6 months of immersion in H2O. Moreover, (DHS)Bi2I8 exhibits bacteriocidal action against three Gram-positive and three Gram-negative bacteria, including antibiotic-resistant strains. This performance, coupled with the recorded water stability and porous nature, renders it suitable for a plethora of applications, from solid-state batteries to water purification and disinfection.
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Affiliation(s)
- Ali Azmy
- Department of Chemistry, University of South Florida, Tampa, Florida 33620, United States
| | - Xue Zhao
- Department of Chemistry, University of South Florida, Tampa, Florida 33620, United States
| | - Giasemi K Angeli
- Department of Chemistry, University of Crete, 71003 Heraklion, Greece
| | - Claire Welton
- Univ. Lille, CNRS, Centrale Lille Institut, Univ. Artois, UMR8181-UCCS-Unité de Catalyse et Chimie du Solide, F-59000 Lille, France
| | - Parth Raval
- Univ. Lille, CNRS, Centrale Lille Institut, Univ. Artois, UMR8181-UCCS-Unité de Catalyse et Chimie du Solide, F-59000 Lille, France
| | - Lukasz Wojtas
- Department of Chemistry, University of South Florida, Tampa, Florida 33620, United States
| | - Nourdine Zibouche
- Department of Chemistry, Lancaster University, Bailrigg, LancasterLA1 4YB, U.K
| | - G N Manjunatha Reddy
- Univ. Lille, CNRS, Centrale Lille Institut, Univ. Artois, UMR8181-UCCS-Unité de Catalyse et Chimie du Solide, F-59000 Lille, France
| | | | - Jianfeng Cai
- Department of Chemistry, University of South Florida, Tampa, Florida 33620, United States
| | - Ioannis Spanopoulos
- Department of Chemistry, University of South Florida, Tampa, Florida 33620, United States
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Abstract
With the advent of silicon-based semiconductors, a plethora of previously unknown technologies became possible. The development of lightweight low-dimensional organic semiconductors followed soon after. However, the efficient charge/electron transfers enabled by the non-porous 3D structure of silicon is rather challenging to be realized by their (metal-)organic counterparts. Nevertheless, the demand for lighter, more efficient semiconductors is steadily increasing resulting in a growing interest in (metal-)organic semiconductors. These novel materials are faced with a variety of challenges originating from their chemical design, their packing and crystallinity. Although the effect of molecular design is quite well understood, the influence of dimensionality and the associated change in properties (porosity, packing, conjugation) is still an uncharted area in (metal-)organic semiconductors, yet highly important for their practical utilization. In this Minireview, an overview on the design and synthesis of porous semiconductors, with a particular emphasis on organic semiconductors, is presented and the influence of dimensionality is discussed.
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Affiliation(s)
- Patrick W Fritz
- Department of Chemistry, University of Fribourg, Chemin du Musée 9, 1700, Fribourg, Switzerland
| | - Ali Coskun
- Department of Chemistry, University of Fribourg, Chemin du Musée 9, 1700, Fribourg, Switzerland
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Baby TT, Rommel M, von Seggern F, Friederich P, Reitz C, Dehm S, Kübel C, Wenzel W, Hahn H, Dasgupta S. Sub-50 nm Channel Vertical Field-Effect Transistors using Conventional Ink-Jet Printing. Adv Mater 2017; 29:1603858. [PMID: 27859773 DOI: 10.1002/adma.201603858] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/20/2016] [Revised: 09/18/2016] [Indexed: 06/06/2023]
Abstract
A printed vertical field-effect transistor is demonstrated, which decouples critical device dimensions from printing resolution. A printed mesoporous semiconductor layer, sandwiched between vertically stacked drive electrodes, provides <50 nm channel lengths. A polymer-electrolyte-based gate insulator infiltrates the percolating pores of the mesoporous channel to accumulate charge carriers at every semiconductor domain, thereby, resulting in an unprecedented current density of MA cm-2 .
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Affiliation(s)
- Tessy Theres Baby
- Institute for Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
| | - Manuel Rommel
- Institute for Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
| | - Falk von Seggern
- Institute for Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
- KIT-TUD Joint Research Laboratory Nanomaterials, Technische Universität Darmstadt (TUD), Institute of Materials Science, Jovanka-Bontschits-Str. 2, 64287, Darmstadt, Germany
| | - Pascal Friederich
- Institute for Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
| | - Christian Reitz
- Institute for Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
| | - Simone Dehm
- Institute for Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
| | - Christian Kübel
- Institute for Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
- Karlsruhe Nano Micro Facility, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
| | - Wolfgang Wenzel
- Institute for Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
| | - Horst Hahn
- Institute for Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
- KIT-TUD Joint Research Laboratory Nanomaterials, Technische Universität Darmstadt (TUD), Institute of Materials Science, Jovanka-Bontschits-Str. 2, 64287, Darmstadt, Germany
| | - Subho Dasgupta
- Institute for Nanotechnology, Karlsruhe Institute of Technology (KIT), Hermann-von-Helmholtz Platz 1, 76344, Eggenstein-Leopoldshafen, Germany
- Department of Materials Engineering, Indian Institute of Science, Bangalore, 560012, India
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Zimin SP, Gorlachev ES, Skok FO. Abnormal conductivity behavior in porous lead telluride films. Nanoscale Res Lett 2012; 7:442. [PMID: 22873648 PMCID: PMC3467186 DOI: 10.1186/1556-276x-7-442] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 04/24/2012] [Accepted: 07/11/2012] [Indexed: 06/01/2023]
Abstract
We report the experimental observation of the novel phenomenon of the resistivity decrease in porous PbTe layers during the pore formation process. Investigations were performed on the n-PbTe films with 2.3-μm thickness, which were near the point of the conductivity-type inversion at room temperature. Anodic electrochemical treatment for the porous layers with 41% to 52% porosity fabrication was performed using a KOH-based Norr electrolyte solution. For the porous lead telluride layers, the resistivity value at 300 K decreased 2.5 to 3 times. For the explanation of the observed phenomenon, a physical model is proposed which takes into account the Pb/Te ratio change during the anodic treatment.
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Affiliation(s)
- Sergey P Zimin
- Microelectronics Department, Yaroslavl State University, Sovetskaya Street 14, Yaroslavl, 150000, Russia
| | - Egor S Gorlachev
- Microelectronics Department, Yaroslavl State University, Sovetskaya Street 14, Yaroslavl, 150000, Russia
- Yaroslavl Branch of the Institute of Physics and Technology of Russian Academy of Sciences, Universitetskaya Street 21, Yaroslavl, 150007, Russia
| | - Fedor O Skok
- Microelectronics Department, Yaroslavl State University, Sovetskaya Street 14, Yaroslavl, 150000, Russia
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Gerngross MD, Carstensen J, Föll H. Electrochemical and galvanic fabrication of a magnetoelectric composite sensor based on InP. Nanoscale Res Lett 2012; 7:379. [PMID: 22776718 PMCID: PMC3629719 DOI: 10.1186/1556-276x-7-379] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 04/25/2012] [Accepted: 07/09/2012] [Indexed: 06/01/2023]
Abstract
: A process chain for a magnetoelectric device based on porous InP will be presented using only chemical, electrochemical, photoelectrochemical, photochemical treatments and the galvanic deposition of metals in high-aspect-ratio structures. All relevant process steps starting with the formation of a self-ordered array of current-line oriented pores followed by the membrane fabrication and a post-etching step, as well as the galvanic metal filling of membrane structures are presented and discussed. The resistivity of a porous InP structure could be drastically increased and, thus, the piezoelectric performance of the porous InP structure. The developed galvanic Ni filling process is capable to homogeneously fill high aspect-ratio membranes.
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Affiliation(s)
- Mark-Daniel Gerngross
- Institute for Materials Science, Christian-Albrechts-University of Kiel, Kaiserstrasse 2, Germany
| | - Jürgen Carstensen
- Institute for Materials Science, Christian-Albrechts-University of Kiel, Kaiserstrasse 2, Germany
| | - Helmut Föll
- Institute for Materials Science, Christian-Albrechts-University of Kiel, Kaiserstrasse 2, Germany
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Zimin SP, Gorlachev ES, Naumov VV, Skok FO. Investigations of the pore formation in the lead selenide films using glacial acetic acid- and nitric acid-based electrolyte. Nanoscale Res Lett 2012; 7:338. [PMID: 22726822 PMCID: PMC3458891 DOI: 10.1186/1556-276x-7-338] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [What about the content of this article? (0)] [Affiliation(s)] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 04/25/2012] [Accepted: 06/22/2012] [Indexed: 06/01/2023]
Abstract
We report a novel synthesis of porous PbSe layers on Si substrates using anodic electrochemical treatment of PbSe/CaF2/Si(111) epitaxial structures in an electrolyte solution based on glacial acetic acid and nitric acid. Electron microscopy, x-ray diffractometry, and local chemical microanalysis investigations results for the porous layers are presented. Average size of the synthesized mesopores with ~1010 cm-2 surface density was determined to be 22 nm. The observed phenomenon of the active selenium redeposition on the mesopore walls during anodic treatment is discussed.
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Affiliation(s)
- Sergey P Zimin
- Microelectronics Department, Yaroslavl State University, Yaroslavl, 150000, Russia
| | - Egor S Gorlachev
- Microelectronics Department, Yaroslavl State University, Yaroslavl, 150000, Russia
- Yaroslavl Branch of the Institute of Physics and Technology of Russian Academy of Sciences, Yaroslavl, 150007, Russia
| | - Viktor V Naumov
- Yaroslavl Branch of the Institute of Physics and Technology of Russian Academy of Sciences, Yaroslavl, 150007, Russia
| | - Fedor O Skok
- Microelectronics Department, Yaroslavl State University, Yaroslavl, 150000, Russia
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