Nitro-Carbazole Based Oxime Esters as Dual Photo/Thermal Initiators for 3D Printing and Composite Preparation

Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)

Resists that enable high-throughput and high-resolution patterning are essential in driving the semiconductor technology forward. The ultimate patterning performance of a resist in lithography is limited because of the trade-off between resolution, line-width roughness, and sensitivity; improving one or two of these parameters typically leads to a loss in the third. As the patterned feature sizes approach angstrom scale, the trade-off between these three metrics becomes increasingly hard to resolve and calls for a fundamental rethinking of the resist chemistry. Low-molecular-mass monodispersed metal-containing resists of high atom economy can provide not only very high resolution but also very low line-width roughness without sacrificing sensitivity. Here we describe a modular metal-containing resist platform (molecular mass <500 Da) where a molecular resist consists of just two components: a metal and a radical initiator bonded to it. This simple system not only is amenable to high-resolution electron beam lithography (EBL) and extreme ultraviolet lithography (EUVL) but also unites them mechanistically, giving a consolidated perspective of molecular and chemical processes happening during exposure. Irradiation of the resist leads to the production of secondary electrons that generate radicals in the initiator bonded to metal. This brings about an intramolecular rearrangement and causes solubility switch in the exposed resist. We demonstrate record 1.9-2.0 nm isolated patterns and 7 nm half-pitch dense line-space features over a large area using EBL. With EUVL, 12 nm half-pitch line-space features are shown at a dose of 68 mJ/cm2. In both of these patterning techniques, the line-width roughness was found to be ≤2 nm, a record low value for any resist platform, also leading to a low-performance trade-off metric, Z factor, of 0.6 × 10-8 mJ·nm3. With the ultimate resolution limited by instrumental factors, potential patterning at the level of a unit cell can be envisaged, making low-molecular-mass resists best poised for angstrom-scale lithography.

Photopolymerization Approach to Advanced Polymer Composites: Integration of Surface-Modified Nanofillers for Enhanced Properties

The incorporation of functionalized nanofillers into polymers via photopolymerization approach has gained significant attention in recent years due to the unique properties of the resulting composite materials. Surface modification of nanofillers plays a crucial role in their compatibility and polymerization behavior within the polymer matrix during photopolymerization. This review focuses on the recent developments in surface modification of various nanofillers, enabling their integration into polymer systems through photopolymerization. The review discusses the key aspects of surface modification of nanofillers, including the selection of suitable surface modifiers, such as photoinitiators and polymerizable groups, as well as the optimization of modification conditions to achieve desired surface properties. The influence of surface modification on the interfacial interactions between nanofillers and the polymer matrix is also explored, as it directly impacts the final properties of the nanocomposites. Furthermore, the review highlights the applications of nanocomposites prepared by photopolymerization, such as sensors, gas separation membranes, purification systems, optical devices, and biomedical materials. By providing a comprehensive overview of the surface modification strategies and their impact on the photopolymerization process and the resulting nanocomposite properties, this review aims to inspire new research directions and innovative ideas in the development of high-performance polymer nanocomposites for diverse applications.

Recent Advances on Furan-Based Visible Light Photoinitiators of Polymerization

Photopolymerization is an active research field enabling to polymerize in greener conditions than that performed with traditional thermal polymerization. At present, a great deal of effort is devoted to developing visible light photoinitiating systems. Indeed, the traditional UV photoinitiating systems are currently the focus of numerous safety concerns so alternatives to UV light are being actively researched. However, visible light photons are less energetic than UV photons so the reactivity of the photoinitiating systems should be improved to address this issue. In this field, furane constitutes an interesting candidate for the design of photocatalysts of polymerization due to its low cost and its easy chemical modification. In this review, an overview concerning the design of furane-based photoinitiators is provided. Comparisons with reference systems are also established to demonstrate evidence of the interest of these photoinitiators in innovative structures.

High-Performance Photoinitiating Systems for LED-Induced Photopolymerization

Currently, increasing attention has been focused on light-emitting diodes (LEDs)-induced photopolymerization. The common LEDs (e.g., LED at 365 nm and LED at 405 nm) possess narrow emission bands. Due to their light absorption properties, most commercial photoinitiators are sensitive to UV light and cannot be optimally activated under visible LED irradiation. Although many photoinitiators have been designed for LED-induced free radical polymerization and cationic polymerization, there is still the issue of the mating between photoinitiators and LEDs. Therefore, the development of novel photoinitiators, which could be applied under LED irradiation, is significant. Many photoinitiating systems have been reported in the past decade. In this review, some recently developed photoinitiators used in LED-induced photopolymerization, mainly in the past 5 years, are summarized and categorized as Type Ⅰ photoinitiators, Type Ⅱ photoinitiators, and dye-based photoinitiating systems. In addition, their light absorption properties and photoinitiation efficiencies are discussed.

Naphthalene-Based Oxime Esters as Type I Photoinitiators for Free Radical Photopolymerization

In order to discuss the polymerization effect from the substituted position and methoxy group of Type I photinitiators, a series of naphthalene-based oxime esters was designed and synthesized. Compared to the 2-naphthalene-substituted compound, the UV absorption region of the 1-naphthalene-based compound was greatly improved. In addition, the methoxy substitution exhibited longer absorption characteristics than did the methoxy-free one. The photochemical reaction behavior of these novel compounds was also studied by photolysis, cyclic voltammetry (CV), and electron spin resonance (ESR) experiments. Finally, the initiation abilities of naphthalene-based oxime esters toward trimethylolpropane triacrylate (TMPTA) monomer were conducted through the photo-DSC instrument under UV and a 405@nm LED lamp. Remarkedly, the naphthalene-based oxime ester (NA-3) that contains 1-naphthalene with o-methoxy substituent showed the rather red-shifted absorption region with the highest final conversion efficiency under UV (46%) and 405@nm LED (41%) lamp irradiation.

Naphthoquinone-based Imidazolyl Esters as Blue-Light-Sensitive Type I Photoinitiators

In this work, a series of Type I photoinitiators (PIs) based on the naphthoquinone scaffold were designed and synthesized for the first time, in order to induce photopolymerization under visible...

Effect of the Steric Hindrance and Branched Substituents on Visible Phenylamine Oxime Ester Photoinitiators: Photopolymerization Kinetics Investigation through Photo-DSC Experiments

In this work, free radical photopolymerization (FRP) kinetics for series of different phenylamine oxime ester structures (DMA-P, DEA-P, DMA-M, TP-2P, TP-2M and TP-3M) was investigated. Steric hindrance and branched substituents were prepared to realize the corresponding electronic and photopolymerization effects. The photophysical, electrochemical, thermal properties and radical concentration were investigated by UV-visible spectroscopy, cyclic voltammetry (CV), thermogravimetric analysis (TGA), differential scanning calorimetry (DSC) and electron paramagnetic resonance (EPR). Furthermore, the structure-reactivity relationships were also studied in detail through photo-DSC experiment. We demonstrate that the introduction of alkyl chains and/or numbers of oxime esters affects significantly the photoreactivity. Under the same weight ratio of formulation and irradiated condition, TP-3M containing three oxime esters in its structure and methyl group in the periphery exhibits the highest double-bond conversion efficiency. TP-3M-based formulation also shows a wide operation window under different contents and light intensities. Importantly, the photoreactivity of the TP-3M-based system was found to be better than the commercial photoinitiator (OXE-01) under LED@405 nm at a low concentration. This work could provide some significance to the design of oxime esters with enhanced photoreactivity.

Imidazole based dual photo/thermal initiators for highly efficient radical polymerization under air with a metal-free approach

A metal-free visible LED photopolymerization process, initiated by imidazole based charge transfer complexes under mild conditions (room temperature, without an inert atmosphere, monomer purification or stabilizer removal), is reported.