Ultrafast Self-Limited Growth of Strictly Monolayer WSe2 Crystals

Growth of Wafer-Scale Single-Crystal 2D Semiconducting Transition Metal Dichalcogenide Monolayers

Due to extraordinary electronic and optoelectronic properties, large-scale single-crystal two-dimensional (2D) semiconducting transition metal dichalcogenide (TMD) monolayers have gained significant interest in the development of profit-making cutting-edge nano and atomic-scale devices. To explore the remarkable properties of single-crystal 2D monolayers, many strategies are proposed to achieve ultra-thin functional devices. Despite substantial attempts, the controllable growth of high-quality single-crystal 2D monolayer still needs to be improved. The quality of the 2D monolayer strongly depends on the underlying substrates primarily responsible for the formation of grain boundaries during the growth process. To restrain the grain boundaries, the epitaxial growth process plays a crucial role and becomes ideal if an appropriate single crystal substrate is selected. Therefore, this perspective focuses on the latest advances in the growth of large-scale single-crystal 2D TMD monolayers in the light of enhancing their industrial applicability. In the end, recent progress and challenges of 2D TMD materials for various potential applications are highlighted.

Atomic insight into the effects of precursor clusters on monolayer WSe2

Two-dimensional (2D) transition metal dichalcogenides (TMDCs) have been attracting much attention due to their rich physical and chemical properties. At the end of the chemical vapor deposition growth of 2D TMDCs, the adsorption of excess precursor clusters onto the sample is unavoidable, which will have significant effects on the properties of TMDCs. This is a concern to the academic community. However, the structures of the supported precursor clusters and their effects on the properties of the prepared 2D TMDCs are still poorly understood. Herein, taking monolayer WSe2 as the prototype, we investigated the structure and electronic properties of SeN, WN (N = 1-8), and W8-NSeN (N = 1-7) clusters adsorbed on monolayer WSe2 to gain atomic insight into the precursor cluster adsorption. In contrast to W clusters that tightly bind to the WSe2 surface, Se clusters except for Se1 and Se2 are weakly adsorbed onto WSe2. The interaction between W8-NSeN (N = 1-7) clusters and the WSe2 monolayer decreases with the increase in the Se/W ratio and eventually becomes van der Waals interaction for W1Se7. According to the phase diagram, increasing the Se/W ratio by changing the experimental conditions will increase the ratio of SeN and W1Se7 clusters in the precursor, which can be removed by proper annealing after growth. W clusters induce lots of defect energy levels in the band gap region, while the adsorption of W1Se7 and SeN clusters (N = 3-6, 8) promotes the spatial separation of photo generated carriers at the interface, which is important for optoelectronic applications. Our results indicate that by controlling the Se/W ratio, the interaction between the precursor clusters and WSe2 as well as the electronic properties of the prepared WSe2 monolayer can be effectively tuned, which is significant for the high-quality growth and applications of WSe2.

Sequential Growth of Vertical Transition-Metal Dichalcogenide Heterostructures on Rollable Aluminum Foil

Vertical van der Waals heterostructures (vdWhs), which are made by layer-by-layer stacking of two-dimensional (2D) materials, offer great opportunities for the development of extraordinary physics and devices such as topological superconductivity, robust quantum Hall phenomenon, electron-hole pair condensation, Coulomb drag, and tunneling devices. However, the size of vdWhs is still limited to the order of a few micrometers, which restricts the large-scale roll-to-roll processes for industrial applications. Herein, we report the sequential growth of a 14 in. vertical vdWhs on a rollable Al foil via chemical vapor deposition. By supplying chalcogen precursors to liquid transition-metal precursor-coated Al foils, we grew a wide range of individual 2D transition-metal dichalcogenide (TMD) films, including MoS₂, VS₂, ReS₂, WS₂, SnS₂, WSe₂, and vanadium-doped MoS₂. Additionally, by repeating the growth process, we successfully achieved the layer-by-layer growth of ReS₂/MoS₂ and SnS₂/ReS₂/MoS₂ vdWhs. The chemically inert Al native oxide layer inhibits the diffusion of chalcogen and metal atoms into Al foils, allowing for the growth of diverse TMDs and their vdWhs. The conductive Al substrate enables the effective use of vdWhs/Al as a hydrogen evolution reaction electrocatalyst with a transfer-free process. This work provides a robust route for the commercialization of 2D TMDs and their vdWhs at a low cost.

Tuning the morphology of 2D transition metal chalcogenides via oxidizing conditions

Two-dimensional transition metal chalcogenides (TMCs) are emerging as an intriguing platform to realize nascent properties in condensed matter physics, materials science and device engineering. Controllable growing of TMCs becomes increasingly important, especially for the layer number, doping, and morphology. Here, we successfully tune the morphology of MoS₂, MoSe₂, WS₂and WSe₂, from homogenous films to individual single crystalline grains only via changing the oxidizing growth conditions. The oxidization degrees are determined by the oxygen that adsorbed on substrates and the oxygen concentrations in reaction gas together. We find the homogenous films are easily formed under the reductive conditions, triangular grains prefer the weak oxidizing conditions, and medium oxidizing conditions bring in dendritic grains with higher oxygen doping and inhomogenous photoluminescence intensities from edge to interior regions shown in the dendritic grains. These growth rules under different oxidizing conditions are easily generalized to other TMCs, which also show potential for growing specific TMCs with designed oxygen doping levels.

Gradual Edge Contact between Mo and MoS2 Formed by Graphene-Masked Sulfurization for High-Performance Field-Effect Transistors

Two-dimensional materials have attracted great attention for their outstanding electronic properties. In particular, molybdenum disulfide (MoS₂) shows great potential as a next-generation semiconductor due to its tunable direct bandgap with a high on-off ratio and extraordinary stability. However, the performance of MoS₂ synthesized by physical vapor deposition has been limited by contact resistance between an electrode and MoS₂, which determines overall device characteristics. Here, in order to reduce the contact resistance, we use in situ sulfurization of Mo by H₂S gas treatment masked by a patterned graphene gas barrier, so that the Mo channel area can be selectively formed, resulting in a gradual edge contact between Mo and MoS₂. Compared with field-effect transistors with a top contact between the Au/Ti electrode and the MoS₂ channel, a gradual edge contact between the Mo electrode and the MoS₂ channel provides a considerably enhanced electrical performance.

Growth and in situ characterization of 2D materials by chemical vapour deposition on liquid metal catalysts: a review

2D materials (2DMs) have now been established as unique and attractive alternatives to replace current technological materials in a number of applications. Chemical vapour deposition (CVD), is undoubtedly the most renowned technique for thin film synthesis and meets all requirements for automated large-scale production of 2DMs. Currently most CVD methods employ solid metal catalysts (SMCat) for the growth of 2DMs however their use has been found to induce structural defects such as wrinkles, fissures, and grain boundaries among others. On the other hand, liquid metal catalysts (LMCat), constitute a possible alternative for the production of defect-free 2DMs albeit with a small temperature penalty. This review is a comprehensive report of past attempts to employ LMCat for the production of 2DMs with emphasis on graphene growth. Special attention is paid to the underlying mechanisms that govern crystal growth and/or grain consolidation and film coverage. Finally, the advent of online metrology which is particularly effective for monitoring the chemical processes under LMCat conditions is also reviewed and certain directions for future development are drawn.

Synthesis and Characterization of Highly Crystalline Vertically Aligned WSe2 Nanosheets

Here, we report on the synthesis of tungsten diselenide (WSe2) nanosheets using an atmospheric pressure chemical vapor deposition technique via the rapid selenization of thin tungsten films. The morphology and the structure, as well as the optical properties, of the so-produced material have been studied using electron microscopies, X-ray photoelectron spectroscopy, photoluminescence, UV–visible and Raman spectroscopies, and X-ray diffraction. These studies confirmed the high crystallinity, quality, purity, and orientation of the WSe2 nanosheets, in addition to the unexpected presence of mixed phases, instead of only the most thermodynamically stable 2H phase. The synthesized material might be useful for applications such as gas sensing or for hydrogen evolution reaction catalysis.

Methane-Mediated Vapor Transport Growth of Monolayer WSe2 Crystals

The electrical and optical properties of semiconducting transition metal dichalcogenides (TMDs) can be tuned by controlling their composition and the number of layers they have. Among various TMDs, the monolayer WSe₂ has a direct bandgap of 1.65 eV and exhibits p-type or bipolar behavior, depending on the type of contact metal. Despite these promising properties, a lack of efficient large-area production methods for high-quality, uniform WSe₂ hinders its practical device applications. Various methods have been investigated for the synthesis of large-area monolayer WSe₂, but the difficulty of precisely controlling solid-state TMD precursors (WO₃, MoO₃, Se, and S powders) is a major obstacle to the synthesis of uniform TMD layers. In this work, we outline our success in growing large-area, high-quality, monolayered WSe₂ by utilizing methane (CH₄) gas with precisely controlled pressure as a promoter. When compared to the catalytic growth of monolayered WSe₂ without a gas-phase promoter, the catalytic growth of the monolayered WSe₂ with a CH₄ promoter reduced the nucleation density to 1/1000 and increased the grain size of monolayer WSe₂ up to 100 μm. The significant improvement in the optical properties of the resulting WSe₂ indicates that CH₄ is a suitable candidate as a promoter for the synthesis of TMD materials, because it allows accurate gas control.

Recent Progress in CVD Growth of 2D Transition Metal Dichalcogenides and Related Heterostructures

In recent years, 2D layered materials have received considerable research interest on account of their substantial material systems and unique physicochemical properties. Among them, 2D layered transition metal dichalcogenides (TMDs), a star family member, have already been explored over the last few years and have exhibited excellent performance in electronics, catalysis, and other related fields. However, to fulfill the requirement for practical application, the batch production of 2D TMDs is essential. Recently, the chemical vapor deposition (CVD) technique was considered as an elegant alternative for successfully growing 2D TMDs and their heterostructures. The latest research advances in the controllable synthesis of 2D TMDs and related heterostructures/superlattices via the CVD approach are illustrated here. The controlled growth behavior, preparation strategies, and breakthroughs on the synthesis of new 2D TMDs and their heterostructures, as well as their unique physical phenomena, are also discussed. Recent progress on the application of CVD-grown 2D materials is revealed with particular attention to electronics/optoelectronic devices and catalysts. Finally, the challenges and future prospects are considered regarding the current development of 2D TMDs and related heterostructures.

Precise Vapor-Phase Synthesis of Two-Dimensional Atomic Single Crystals

Two-dimensional atomic single crystals (2DASCs) have drawn immense attention because of their potential for fundamental research and new technologies. Novel properties of 2DASCs are closely related to their atomic structures, and effective modulation of the structures allows for exploring various practical applications. Precise vapor-phase synthesis of 2DASCs with tunable thickness, selectable phase, and controllable chemical composition can be realized to adjust their band structures and electronic properties. This review highlights the latest advances in the precise vapor-phase synthesis of 2DASCs. We thoroughly elaborate on strategies toward the accurate control of layer number, phase, chemical composition of layered 2DASCs, and thickness of non-layered 2DASCs. Finally, we suggest forward-looking solutions to the challenges and directions of future developments in this emerging field.

Controlled synthesis of 2D Mo2C/graphene heterostructure on liquid Au substrates as enhanced electrocatalytic electrodes

2D Mo₂C has drawn considerable interest recently for its excellent properties in 2D superconductivity and enhanced hydrogen evolution reaction (HER). Liquid metals have been demonstrated to be an ideal substrate for large-area 2D Mo₂C growth. However, the growth mechanism of 2D Mo₂C on liquid metals has rarely been explored. Here we report the synthesis of high-quality 2D Mo₂C crystals and Mo₂C/graphene heterostructures on liquid Au by chemical vapor deposition method. A sunk growth mode of 2D Mo₂C on liquid Au substrates has revealed, by atomic force microscope characterizations, that some Mo₂C crystals grow below the level of Au terraces around tens of nanometers. Furthermore, graphene/Mo₂C heterostructure is controllably synthesized by tuning the hydrogen/carbon ratio, which is proven to be an enhanced electrocatalyst for HER against pure Mo₂C crystal grown on liquid Au substrates.

Scalable Epitaxial Growth of WSe2 Thin Films on SiO2/Si via a Self-Assembled PtSe2 Buffer Layer

The growth of large-area epitaxial transition metal dichalgogenides (TMDCs) are of central importance for scalable integrated device applications. Different methods have been developed to achieve large-sized high quality films. However, reliable approaches for centimeter-sized or even wafer-level epitaxial growth of TMDCs are still lacking. Here we demonstrate a new method to grow inch-sized epitaxial WSe₂ films on SiO₂/Si substrates at a much lower temperature with high repeatability and scalability. High quality crystalline films are achieved through direct selenization of a tungsten film with platinum as the underlayer. The self-assembled PtSe₂ buffer layer, formed during selenization, assists epitaxial growth of WSe₂. Using fabricated WSe₂ films, excellent performance memory devices are demonstrated. As a member of the TMDC family, our findings based on WSe₂ may also be applied to other TMDC materials for large-scale production of high quality TMDC films for various applications.

Nanophase graphene frameworks

Nanophase graphene frameworks (NGFs) assembled by interconnected domains have massive interfaces, where the interfacial interaction and the compact architectures drastically elevate the durability of graphene towards physical and chemical destruction. The excellent electrical conductivity of the NGFs can be perfectly maintained even after 1500 friction cycles or 3 h flame treatment.

Recent Developments in Controlled Vapor-Phase Growth of 2D Group 6 Transition Metal Dichalcogenides

An overview of recent developments in controlled vapor-phase growth of 2D transition metal dichalcogenide (2D TMD) films is presented. Investigations of thin-film formation mechanisms and strategies for realizing 2D TMD films with less-defective large domains are of central importance because single-crystal-like 2D TMDs exhibit the most beneficial electronic and optoelectronic properties. The focus is on the role of the various growth parameters, including strategies for efficiently delivering the precursors, the selection and preparation of the substrate surface as a growth assistant, and the introduction of growth promoters (e.g., organic molecules and alkali metal halides) to facilitate the layered growth of (Mo, W)(S, Se, Te)₂ atomic crystals on inert substrates. Critical factors governing the thermodynamic and kinetic factors related to chemical reaction pathways and the growth mechanism are reviewed. With modification of classical nucleation theory, strategies for designing and growing various vertical/lateral TMD-based heterostructures are discussed. Then, several pioneering techniques for facile observation of structural defects in TMDs, which substantially degrade the properties of macroscale TMDs, are introduced. Technical challenges to be overcome and future research directions in the vapor-phase growth of 2D TMDs for heterojunction devices are discussed in light of recent advances in the field.

Atomic-Scale Structural Modification of 2D Materials

2D materials have attracted much attention since the discovery of graphene in 2004. Due to their unique electrical, optical, and magnetic properties, they have potential for various applications such as electronics and optoelectronics. Owing to thermal motion and lattice growth kinetics, different atomic-scale structures (ASSs) can originate from natural or intentional regulation of 2D material atomic configurations. The transformations of ASSs can result in the variation of the charge density, electronic density of state and lattice symmetry so that the property tuning of 2D materials can be achieved and the functional devices can be constructed. Here, several kinds of ASSs of 2D materials are introduced, including grain boundaries, atomic defects, edge structures, and stacking arrangements. The design strategies of these structures are also summarized, especially for atomic defects and edge structures. Moreover, toward multifunctional integration of applications, the modulation of electrical, optical, and magnetic properties based on atomic-scale structural modification are presented. Finally, challenges and outlooks are featured in the aspects of controllable structure design and accurate property tuning for 2D materials with ASSs. This work may promote research on the atomic-scale structural modification of 2D materials toward functional applications.

Regulation of Two-Dimensional Lattice Deformation Recovery

The lattice directly determines the electronic structure, and it enables controllably tailoring the properties by deforming the lattices of two-dimensional (2D) materials. Owing to the unbalanced electrostatic equilibrium among the dislocated atoms, the deformed lattice is thermodynamically unstable and would recover to the initial state. Here, we demonstrate that the recovery of deformed 2D lattices could be directly regulated via doping metal donors to reconstruct electrostatic equilibrium. Compared with the methods that employed external force fields with intrinsic instability and nonuniformity, the stretched 2D molybdenum diselenide (MoSe₂) could be uniformly retained and permanently preserved via doping metal atoms with more outermost electrons and smaller electronegativity than Mo. We believe that the proposed strategy could open up a new avenue in directly regulating the atomic-thickness lattice and promote its practical applications based on 2D crystals.

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Regulation of the deformation recovery of 2D lattices by doping metal donors

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Achieving 2D MoSe₂ with uniformly and permanently stabilized lattice deformation

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Demonstration of the efficient micromanipulation of strict 2D lattices

Controllable Growth of Graphene on Liquid Surfaces

Controllable fabrication of graphene is necessary for its practical application. Chemical vapor deposition (CVD) approaches based on solid metal substrates with morphology-rich surfaces, such as copper (Cu) and nickel (Ni), suffer from the drawbacks of inhomogeneous nucleation and uncontrollable carbon precipitation. Liquid substrates offer a quasiatomically smooth surface, which enables the growth of uniform graphene layers. The fast surface diffusion rates also lead to unique growth and etching kinetics for achieving graphene grains with novel morphologies. The rheological surface endows the graphene grains with self-adjusted rotation, alignment, and movement that are driven by specific interactions. The intermediary-free transfer or the direct growth of graphene on insulated substrates is demonstrated using liquid metals. Here, the controllable growth process of graphene on a liquid surface to promote the development of attractive liquid CVD strategies is in focus. The exciting progress in controlled growth, etching, self-assembly, and delivery of graphene on a liquid surface is presented and discussed in depth. In addition, prospects and further developments in these exciting fields of graphene growth on a liquid surface are discussed.

Chemical vapor deposition growth of sub-centimeter single crystal WSe2 monolayer by NaCl-assistant

Monolayer WSe₂ exhibits unique optical and electronic properties, showing great potential applications in functional integrated devices, such as electronic devices and optoelectronics. Understanding the growth behavior and process are the key points for the salt-assisted growth of large domain WSe₂ monolayers, it is also very important for its further application in on-chip laser and opto-devices. Here, we report a NaCl-assistant method for controlled growth of single crystal monolayer WSe₂ with a domain size up to 0.57 mm on SiO₂/Si substrate. Atomic-resolution scanning transmission electron microscopy reveals that the Se₁ and Se₂ vacancy point defects are the main defect type of those materials. The growth behavior of the salt-assisted method have been systemly investigated. The loading mass of NaCl powder prefers to be less with the controllable vapor process. The flow of hydrogen gas was also preferred to be suitable with a weak etching effect. The morphology of monolayer WSe₂ shows a sensitive temperature dependence evolution with the growth temperature increasing. A screw dislocation growth behavior with 15° angle is also observed with the NaCl-assistant method. The results provide a deep understanding of the mechanism for the NaCl-assistant growth of large size monolayer WSe₂.

Controllable Fabrication of Graphene and Related Two-Dimensional Materials on Liquid Metals via Chemical Vapor Deposition

Due to the confinement of the charge, spin, and heat transport in the plane, graphene and related two-dimensional (2D) materials have been demonstrated to own many unique and excellent properties and witnessed many breakthroughs in physics. They show great application potential in many fields, especially for electronics and optoelectronics. However, a bottleneck to widespread applications is precise and reliable fabrication, in which the control of the layer number and domain assembly is the most basic and important since they directly determine the qualities and properties of 2D materials. The chemical vapor deposition (CVD) strategy was regarded as the frontrunner to achieve this target, and the design of the catalytic substrate is of great significance since it has the most direct influence on the catalysis and mass transfer, which can be the most essential elemental steps. In recent years, as compared to traditional solid metal catalysts, the emergence of liquid metal catalysts has brought a brand-new perspective and contributes to a huge change and optimization in the fabrication of 2D materials. On one hand, strictly self-limited growth behavior is discovered and is robust to the variation of the growth parameters. The atoms in the liquid metal tend to move intensely and arrange in an amorphous and isotropic way. The liquid surface is smooth and isotropic, and the vacancies in the fluidic liquid phase enable the embedding of heteroatoms. The phase transition from liquid to solid will facilitate the unique control of the mass-transfer path, which can trigger new growth mechanisms. On the other hand, the excellent rheological properties of liquid metals allow us to explore self-assembly of the 2D materials grown on the surface, which can activate new applications based on the derived collective properties, such as the integrated devices. Indeed, liquid metals show many unique behaviors in the catalytic growth and assembly of 2D materials. Thus, this Account aims to highlight the controllable fabrication of graphene and related 2D materials on liquid metals. By utilizing the phase transition of liquid metals, the segregation of precursors in the bulk can be controlled, leading to self-limited growth. By utilizing the fluidity of the liquid metals, 2D material crystals can achieve self-assembly on their surface, including oriented stitching, ordered assembly, and heterostacking, which enables the creation of new multilevel or hybrid structures, leading to property and function extension and even the emergence of new physics. Finally, the unique liquid characteristic of liquid metals can also offer us new ideas about the transfer process. By utilizing the shear transformation of liquid metals, the direct sliding transfer of 2D materials onto arbitrary substrates can be realized. The research concerning the self-limited growth, self-assembly, and sliding transfer of 2D materials on liquid metals is just raising the curtain on the behavioral study of 2D materials on liquid metals. We believe these primary technology developments revealed by liquid metals will establish a solid foundation for both fundamental research and practical application of 2D materials.

Recent Advances in Synthesis and Applications of 2D Junctions

Recent progress in the methods of integration of 2D materials is reviewed. Integrated 2D circuits are one of the most promising candidates for advanced electronics and flexible devices. Specifically, methods such as mechanical transfer, chemical vapor deposition growth, high temperature conversion, phase engineering, surface doping, electrostatic doping, and so on to fabricate 2D heterostructures are discussed in detail. Applications of these integrated 2D heterostructures in p-n junctions, ohmic contact, high-performance transistors, and phototransistors are also highlighted. Finally, challenges and opportunities of methods to integrate 2D materials are proposed.

Suppressing Nucleation in Metal-Organic Chemical Vapor Deposition of MoS2 Monolayers by Alkali Metal Halides

Toward the large-area deposition of MoS₂ layers, we employ metal-organic precursors of Mo and S for a facile and reproducible van der Waals epitaxy on c-plane sapphire. Exposing c-sapphire substrates to alkali metal halide salts such as KI or NaCl together with the Mo precursor prior to the start of the growth process results in increasing the lateral dimensions of single crystalline domains by more than 2 orders of magnitude. The MoS₂ grown this way exhibits high crystallinity and optoelectronic quality comparable to single-crystal MoS₂ produced by conventional chemical vapor deposition methods. The presence of alkali metal halides suppresses the nucleation and enhances enlargement of domains while resulting in chemically pure MoS₂ after transfer. Field-effect measurements in polymer electrolyte-gated devices result in promising electron mobility values close to 100 cm² V^-1 s^-1 at cryogenic temperatures.

Ultrafast Growth of High-Quality Monolayer WSe2 on Au

The ultrafast growth of high-quality uniform monolayer WSe₂ is reported with a growth rate of ≈26 µm s^-1 by chemical vapor deposition on reusable Au substrate, which is ≈2-3 orders of magnitude faster than those of most 2D transition metal dichalcogenides grown on nonmetal substrates. Such ultrafast growth allows for the fabrication of millimeter-size single-crystal WSe₂ domains in ≈30 s and large-area continuous films in ≈60 s. Importantly, the ultrafast grown WSe₂ shows excellent crystal quality and extraordinary electrical performance comparable to those of the mechanically exfoliated samples, with a high mobility up to ≈143 cm² V^-1 s^-1 and ON/OFF ratio up to 9 × 10⁶ at room temperature. Density functional theory calculations reveal that the ultrafast growth of WSe₂ is due to the small energy barriers and exothermic characteristic for the diffusion and attachment of W and Se on the edges of WSe₂ on Au substrate.